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1. 发明授权

US08437003B2 Information processing apparatus and method 有权
标题翻译：信息处理装置和方法
公开(公告)号：US08437003B2
公开(公告)日：2013-05-07
申请号：US12812008
申请日：2009-01-28
申请人： Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazuyuki Ota , Kenji Saitoh , Masakazu Matsugu
发明人： Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazuyuki Ota , Kenji Saitoh , Masakazu Matsugu
IPC分类号： G01N21/55
CPC分类号： G01N21/57 , G01N21/4738 , G01N2021/4735
摘要： An information processing apparatus includes an obtaining unit configured to obtain first information regarding a distribution of reflected light from a target to be measured and second information regarding geometrical-optics components of the reflected light, a calculating unit configured to calculate third information on the basis of the first information and the second information, the third information indicating an approximation of the distribution of reflected light, and an output unit configured to output information regarding wave-optics components of the reflected light on the basis of the third information.
摘要翻译：一种信息处理设备，包括：获取单元，被配置为获得关于来自待测目标的反射光的分布的第一信息和关于反射光的几何光学分量的第二信息;计算单元，被配置为基于所述第一信息和所述第二信息，所述第三信息指示反射光的分布的近似值;以及输出单元，被配置为基于所述第三信息输出关于所述反射光的波长成分的信息。

2. 发明授权

US07924418B2 Inspection apparatus and method 有权
标题翻译：检验仪器及方法
公开(公告)号：US07924418B2
公开(公告)日：2011-04-12
申请号：US12171642
申请日：2008-07-11
申请人： Hiroshi Yoshikawa , Kenji Saitoh
发明人： Hiroshi Yoshikawa , Kenji Saitoh
IPC分类号： G01N21/00
CPC分类号： G01N21/952 , G01N21/4738 , G06T7/0004
摘要： An inspection apparatus includes a captured image acquiring unit configured to acquire a captured image that is acquired by shooting an inspection target, an acquiring unit configured to acquire from the captured image a first image region and a second image region whose intensity distributions of reflected light with respect to an incident angle of illumination light emitted to the inspection target are different, and an image processing unit configured to perform image processing for performing different surface inspections on the first image region and the second image region respectively.
摘要翻译：检查装置包括拍摄图像获取单元，被配置为获取通过拍摄检查对象获取的拍摄图像;获取单元，被配置为从拍摄图像获取第一图像区域和第二图像区域，其中反射光的强度分布与相对于发射到检查对象物的照明光的入射角度是不同的，图像处理单元被配置为执行对第一图像区域和第二图像区域进行不同的表面检查的图像处理。

3. 发明申请

US20070292088A1 ILLUMINATING APPARATUS AND IMAGE SENSING SYSTEM INCLUDING ILLUMINATING APPARATUS 有权
标题翻译：包括照明设备的照明设备和图像感测系统
公开(公告)号：US20070292088A1
公开(公告)日：2007-12-20
申请号：US11761967
申请日：2007-06-12
申请人： Kenji Saitoh , Yoshiharu Tenmyo
发明人： Kenji Saitoh , Yoshiharu Tenmyo
IPC分类号： G02B6/04
CPC分类号： G03B15/05 , G02B19/0028 , G02B19/0047 , G03B2215/0528 , G03B2215/0532
摘要： An illuminating apparatus includes a light source including a cylindrical light-emitting tube, a first optical system, a second optical system, and a third optical system. The first optical system has an incident surface on which light emitted from the light source to the object side are incident and an emergent surface from which the light passing through the incident surface are emitted. The second optical system has a reflecting surface from which light emitted from the light source to a first side are reflected. The third optical system has a reflecting surface from which light emitted from the light source to a second side opposite to the first side are reflected. The first to third optical systems each illuminate the entire illumination area of the object with light emitted from the light source and incident on the optical systems.
摘要翻译：照明装置包括：光源，包括圆柱形发光管，第一光学系统，第二光学系统和第三光学系统。第一光学系统具有从光源发射到物体侧的光入射的入射表面，并且发射穿过入射表面的光的出射表面。第二光学系统具有从光源发射到第一侧的光被反射的反射面。第三光学系统具有从光源发射到与第一侧相对的第二侧的光的反射表面。第一至第三光学系统各自使用从光源发射并入射到光学系统上的光来照亮物体的整个照明区域。

4. 发明授权

US06534242B2 Multiple exposure device formation 有权
标题翻译：多曝光装置形成
公开(公告)号：US06534242B2
公开(公告)日：2003-03-18
申请号：US09783600
申请日：2001-02-15
申请人： Mitsuro Sugita , Akiyoshi Suzuki , Miyoko Kawashima , Kenji Saitoh , Yuichi Iwasaki
发明人： Mitsuro Sugita , Akiyoshi Suzuki , Miyoko Kawashima , Kenji Saitoh , Yuichi Iwasaki
IPC分类号： G03C500
CPC分类号： G03F7/2022 , G03F7/7045 , G03F7/70466
摘要： An exposure method for transferring a device pattern to a resist, wherein the device pattern includes a first element and a second element having a linewidth narrower than the first element. The method includes a first exposure step for exposing the resist by use of an interference fringe, produced by interference of two light beams, through an exposure amount substantially not greater than a threshold of the resist, and a second exposure step for exposing the resist with a light pattern related to the first and second elements. A light component, of the light pattern, related to the first element bears an exposure amount greater than the threshold, a light component, of the light pattern, related to the second element bears an exposure amount not greater than the threshold and is to be combined with light in a portion of the interference fringe, and a sum of the exposure amount of the light component related to the second element and an exposure amount provided by the light in the portion of the interference fringe is greater than the threshold.
摘要翻译：一种用于将器件图案转印到抗蚀剂的曝光方法，其中所述器件图案包括第一元件和具有比所述第一元件窄的线宽的第二元件。该方法包括第一曝光步骤，用于通过使用由两个光束的干涉产生的干涉条纹曝光抗蚀剂，所述干涉条纹通过基本上不大于抗蚀剂阈值的曝光量，以及第二曝光步骤，用于将抗蚀剂与与第一和第二元素相关的光图案。与第一元件相关的光图案的光分量具有大于阈值的曝光量，与第二元件相关的光图案的光分量具有不大于阈值的曝光量，并且为与干涉条纹的一部分中的光结合，并且与第二元素相关的光分量的曝光量与干涉条纹部分中的光提供的曝光量之和大于阈值。

5. 发明授权

US6083650A Device manufacturing method utilizing concentric fan-shaped pattern mask 失效
标题翻译：使用同心扇形图案掩模的装置制造方法
公开(公告)号：US6083650A
公开(公告)日：2000-07-04
申请号：US105047
申请日：1998-06-26
申请人： Makoto Ogusu , Kenji Saitoh
发明人： Makoto Ogusu , Kenji Saitoh
IPC分类号： G02B5/18 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70425 , G03F7/70433 , G03F9/70
摘要： A method of manufacturing an element with a concentric pattern by use of a photolithographic process is disclosed, wherein the method includes preparing masks having segment patterns corresponding to fan-shaped regions, respectively, of the pattern which fan-shaped regions can be defined by dividing the pattern by at least one circle concentric with the pattern to provide plural zones and then by dividing each zone equiangularly, and-exposing regions of a substrate corresponding to the plural zones, respectively, by using the masks corresponding to the zones, respectively, while rotating the substrate by regular angles.
摘要翻译：公开了一种通过使用光刻工艺制造具有同心图案的元件的方法，其中该方法包括分别制备具有对应于图案的扇形区域的扇形图案的掩模，该扇形图案可以通过划分扇形区域来限定扇形区域所述图案与所述图案同心的至少一个圆圈以提供多个区域，然后通过分别使用对应于所述区域的掩模分别对每个区域进行等角度划分和曝光与多个区域对应的基板的区域，同时以规则的角度旋转基板。

6. 发明授权

US5891773A Non-volatile semiconductor storage apparatus and production thereof 失效
标题翻译：非易失性半导体存储装置及其制造
公开(公告)号：US5891773A
公开(公告)日：1999-04-06
申请号：US898960
申请日：1997-07-23
申请人： Kenji Saitoh
发明人： Kenji Saitoh
IPC分类号： H01L21/8247 , H01L27/112 , H01L27/115 , H01L29/788 , H01L29/792
CPC分类号： H01L27/115 , H01L27/11521
摘要： The invention provides a non-volatile semiconductor storage apparatus wherein silicon pillars are formed by epitaxial growth thereby to suppress a dispersion in channel length and improve the quality of a gate oxide film. In production, epitaxial silicon pillars are formed by selective epitaxial growth on a p-type silicon substrate, and a gate oxide film is formed over the overall area. Polycrystalline silicon is deposited and etched back to form a first polycrystalline silicon film serving as floating gates. Ion implantation is performed to form drain regions at the tops of the epitaxial silicon pillars and form a source region on the surface of the silicon substrate. A layered insulation film is formed, and polycrystalline silicon is deposited and etched back to form a second polycrystalline silicon film which covers over the side faces of the floating gates and serves as control gates. Bit lines are formed on the drain regions.
摘要翻译：本发明提供了一种非易失性半导体存储装置，其中通过外延生长形成硅柱，从而抑制沟道长度的分散并提高栅极氧化膜的质量。在生产中，通过在p型硅衬底上选择性外延生长形成外延硅柱，并且在整个区域上形成栅氧化膜。多晶硅沉积并回蚀以形成用作浮栅的第一多晶硅膜。进行离子注入以在外延硅柱的顶部形成漏极区，并在硅衬底的表面上形成源极区。形成层状绝缘膜，沉积多晶硅并回蚀以形成覆盖在浮动栅极的侧面上并用作控制栅极的第二多晶硅膜。位线形成在漏区。

7. 发明授权

US5717492A Position detecting apparatus and a method for manufacturing semiconductor devices using the apparatus 失效
标题翻译：位置检测装置及使用该装置制造半导体器件的方法
公开(公告)号：US5717492A
公开(公告)日：1998-02-10
申请号：US788350
申请日：1997-01-27
申请人： Koichi Sentoku , Kenji Saitoh , Hiroshi Osawa , Masanobu Hasegawa
发明人： Koichi Sentoku , Kenji Saitoh , Hiroshi Osawa , Masanobu Hasegawa
IPC分类号： G03F9/00 , H01L21/027 , G01B11/00
CPC分类号： G03F9/70
摘要： A position detection apparatus and method detects the relative positional relationship between first and second objects facing each other in a facing direction. First, second and third marks each serving as a physical optical element are provided on the first object, while a fourth mark serving as a physical optical element is provided on the second object. A light projector projects light onto the first and second objects A light detector detects a first light beam diffracted by the first mark and reflected by the second object, a second light beam diffracted by the second mark and reflected by the second object, and a third light beam diffracted by the third and fourth marks. A first position detector detects the relative positional relationship between the first and second objects in the facing direction based on signals representing the first and second light beams from the light detector. A second position detector detects the relative positional relationship between the first and second objects in a direction perpendicular to the facing direction based on signals representing the first, second and third light beams from the light detector.
摘要翻译：位置检测装置和方法检测朝向彼此面对的第一和第二物体之间的相对位置关系。首先，在第一物体上设置各自用作物理光学元件的第二和第三标记，而在第二物体上设置用作物理光学元件的第四标记。光投影仪将光投射到第一和第二物体上光检测器检测由第一标记衍射并由第二物体反射的第一光束，由第二标记衍射并被第二物体反射的第二光束，以及第三物体光束被第三和第四标记衍射。第一位置检测器基于表示来自光检测器的第一和第二光束的信号来检测面向方向上的第一和第二物体之间的相对位置关系。第二位置检测器基于表示来自光检测器的第一，第二和第三光束的信号来检测第一和第二物体在垂直于相对方向的方向上的相对位置关系。

8. 发明授权

US5343291A Method and apparatus for measuring an interval between two objects 失效
标题翻译：用于测量两个物体间隔的方法和装置
公开(公告)号：US5343291A
公开(公告)日：1994-08-30
申请号：US851109
申请日：1992-03-16
申请人： Mitsutoshi Ohwada , Masakazu Matsugu , Shigeyuki Suda , Minoru Yoshii , Yukichi Niwa , Noriyuki Nose , Kenji Saitoh , Masanobu Hasegawa
发明人： Mitsutoshi Ohwada , Masakazu Matsugu , Shigeyuki Suda , Minoru Yoshii , Yukichi Niwa , Noriyuki Nose , Kenji Saitoh , Masanobu Hasegawa
IPC分类号： G03F9/00 , G01B11/02
CPC分类号： G03F9/7023 , G03F9/7049
摘要： A device for measuring an interval between two plate-like objects includes a light source for projecting a light toward the objects, a detector for detecting a position of incidence, upon a predetermined surface, of the light projected by the light source and deflected by the two objects, and a calculating portion for measuring the interval of the two objects on the basis of the detection by the detector.
摘要翻译：用于测量两个板状物体之间的间隔的装置包括：用于向物体投射光的光源;检测器，用于检测由光源投射并被光源偏转的预定表面上的入射位置; 两个物体和用于根据检测器的检测来测量两个物体的间隔的计算部分。

9. 发明授权

US5332692A Method of manufacturing a semiconductor device having a polycide structure 失效
标题翻译：具有多晶硅结构的半导体器件的制造方法
公开(公告)号：US5332692A
公开(公告)日：1994-07-26
申请号：US47632
申请日：1993-04-19
申请人： Kenji Saitoh
发明人： Kenji Saitoh
IPC分类号： H01L21/203 , H01L21/28 , H01L21/3205 , H01L21/768 , H01L23/52 , H01L21/283
CPC分类号： H01L21/76838 , H01L21/76889 , Y10S148/017 , Y10S148/019
摘要： A sputtering technique is conducted within a sputtering device the inside of which is in the state of vacuum, whereby a second polycrystal silicon film (7) is deposited on a first polycrystal silicon film (3) on the surface of which a natural oxide film (4) exists. The inside of the sputtering device is maintained to be in the state of vacuum after the second polycrystal silicon film (7) is formed. With the same sputtering device, a metal silicide film (5) is deposited on the second polycrystal film under vacuum. When a silicon oxide film is formed on the silicide film, silicons to be oxidized are uniformly supplied through the silicide film. Therefore, the polycrystal silicon film and the silicide film are not separated from each other at the boundary face between them. Further, product yield rate is improved since it is not necessary to perform sputter etching.
摘要翻译：溅射技术在其内部处于真空状态的溅射装置内进行，由此第二多晶硅膜（7）沉积在第一多晶硅膜（3）上，该第一多晶硅膜（3）的表面上具有天然氧化物膜（ 4）存在。在第二多晶硅膜（7）形成之后，溅射装置的内部保持在真空状态。使用相同的溅射装置，在真空下在第二多晶膜上沉积金属硅化物膜（5）。当在硅化物膜上形成氧化硅膜时，通过硅化物膜均匀地供给被氧化的硅。因此，多晶硅膜和硅化物膜在它们之间的边界面处不分离。此外，由于不需要进行溅射蚀刻，产品产率提高。

10. 发明授权

US5319444A Position detecting method and apparatus 失效
标题翻译：位置检测方法和装置
公开(公告)号：US5319444A
公开(公告)日：1994-06-07
申请号：US20464
申请日：1993-02-22
申请人： Kenji Saitoh , Masakazu Matsugu , Yukichi Niwa , Noriyuki Nose , Minoru Yoshii , Shigeyuki Suda
发明人： Kenji Saitoh , Masakazu Matsugu , Yukichi Niwa , Noriyuki Nose , Minoru Yoshii , Shigeyuki Suda
IPC分类号： G03F9/00 , G01B11/14 , G01N21/86
CPC分类号： G03F9/7049
摘要： A method of detecting relative positional deviation between first and second objects. The method includes the steps of providing the first object with a first mark which functions as a lens, providing the second object with a second mark which functions as a lens, providing an optical system between the first and second objects, directing a radiation beam through the first mark and the optical system to the second mark, and detecting any shift of the radiation beam from the second mark irradiated with the radiation beam from the optical system, to detect the relative positional deviation of the first and second objects.
摘要翻译：一种检测第一和第二物体之间的相对位置偏差的方法。该方法包括以下步骤：向第一物体提供用作透镜的第一标记，为第二物体提供用作透镜的第二标记，在第一和第二物体之间提供光学系统，引导辐射束通过第一标记和第二标记的光学系统，并且检测来自用来自光学系统的辐射束照射的第二标记的辐射束的任何偏移，以检测第一和第二物体的相对位置偏差。

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