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1. 发明申请

US20080081121A1 COMPOSITION, FILM AND FORMATION PROCESS THEREOF 审中-公开
标题翻译：组合物，膜及其形成过程
公开(公告)号：US20080081121A1
公开(公告)日：2008-04-03
申请号：US11858644
申请日：2007-09-20
申请人： Kensuke MORITA , Haruki INABE
发明人： Kensuke MORITA , Haruki INABE
IPC分类号： C08F30/08 , B05D3/02
CPC分类号： C08F230/08
摘要： A composition includes at least one kind polymer, each of which includes a repeating unit(s) derived from at least one compound selected from the group consisting of compounds represented by the following formulas (I) to (IV): R4Si (I) R3Si—(X—SiR2)m—X—Si—R3 (II) *—(X—SiR2)n—* (III) m.RSi(O0.5)3 (IV) wherein the symbols in the formulas are defined in the specification.
摘要翻译：组合物包括至少一种聚合物，每种聚合物包括衍生自至少一种选自由下式（I）至（IV）表示的化合物的化合物的重复单元：<？在线 -formulae description =“In-line Formulas”end =“lead”？> R Si（I）<？in-line-formula description =“In-line Formulas”end =“tail” ？> <？in-line-formula description =“In-line Formulas”end =“lead”？> R 3 Si-（X-SiR 2）_{（n）-X-Si-R 3（II）<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line -formulae description =“In-line Formulas”end =“lead”？> * - （X-SiR 2） -formulae description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> m.RSi（O < （IV）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中公式中的符号在说明书中定义。}

2. 发明申请

US20080213492A1 INSULATING FILM FORMING COMPOSITION AND PRODUCTION METHOD OF INSULATING FILM 失效
标题翻译：绝缘膜形成组合物和绝缘膜生产方法
公开(公告)号：US20080213492A1
公开(公告)日：2008-09-04
申请号：US12040951
申请日：2008-03-03
申请人： Kensuke MORITA
发明人： Kensuke MORITA
IPC分类号： C08L77/00 , B05D3/00
CPC分类号： H01L21/3122 , C09D179/04 , C09D179/08 , C09D183/10 , H01L21/02137 , H01L21/02282 , H01L21/31695
摘要： An insulating film forming composition, includes: a polymer compound obtained by polymerizing a cage-type silsesquioxane compound having two or more unsaturated groups as substituents; a heat-resistant organic polymer compound having a carbon-carbon unsaturated bond; and an organic solvent, and a method for producing an insulating film, includes: coating the insulating film forming composition on a substrate; and then curing the coating.
摘要翻译：绝缘膜形成组合物包括：通过使具有两个或更多个不饱和基团作为取代基的笼型倍半硅氧烷化合物聚合而获得的高分子化合物; 具有碳 - 碳不饱和键的耐热有机高分子化合物; 有机溶剂和绝缘膜的制造方法包括：在基板上涂布绝缘膜形成组合物; 然后固化涂层。

3. 发明申请

US20090221778A1 FILM 有权
标题翻译：电影
公开(公告)号：US20090221778A1
公开(公告)日：2009-09-03
申请号：US12392794
申请日：2009-02-25
申请人： Makoto MURAMATSU , Akira ASANO , Kensuke MORITA
发明人： Makoto MURAMATSU , Akira ASANO , Kensuke MORITA
IPC分类号： C08F230/08 , C07C13/00 , C08G65/00 , C08F136/00
CPC分类号： C09D183/04 , C08G77/045 , Y10S427/104 , Y10T428/31663
摘要： A file is formed by coating a substrate with a film-forming composition including a compound having an alicyclic hydrocarbon structure and irradiating the coated composition with microwaves having a frequency of 5.8 GHz. An insulating film is formed by irradiating a film including a compound having a siloxane structure with microwave having a frequency of 5.8 GHz. These films possess excellent film properties such as dielectric constant and mechanical strength.
摘要翻译：通过用包含具有脂环族烃结构的化合物的成膜组合物涂布基材形成文件，并用频率为5.8GHz的微波照射涂布的组合物。通过用频率为5.8GHz的微波照射包含具有硅氧烷结构的化合物的膜来形成绝缘膜。这些膜具有优异的膜性质，例如介电常数和机械强度。

4. 发明申请

US20080213602A1 ANTIREFLECTION FILM FORMING COMPOSITION, ANITREFLECTION FILM AND OPTICAL DEVICE 有权
标题翻译：抗反射膜成膜组合物，抗反射膜和光学装置
公开(公告)号：US20080213602A1
公开(公告)日：2008-09-04
申请号：US12040941
申请日：2008-03-03
申请人： Kensuke MORITA , Makoto MURAMATSU , Kouji TONOHARA
发明人： Kensuke MORITA , Makoto MURAMATSU , Kouji TONOHARA
IPC分类号： B32B9/04 , B05D3/00 , C08L43/00
CPC分类号： C09D143/04 , G02B1/111 , Y10T428/31663
摘要： An antireflection film forming composition, includes: a polymerized product of Compound (I) having m number of RSi(O0.5)3 units, in which m stands for an integer of from 8 to 16, and Rs each independently represents a non-hydrolyzable group, with the proviso that at least two of Rs each represents a vinyl- or ethynyl-containing group, wherein each of the RSi(O0.5)3 units is linked to another RSi(O0.5)3 unit while having an oxygen atom in common and constitutes a cage structure, and wherein, of solids contained in the composition, the polymerized product obtained by a polymerization reaction of Compound (I) amounts to 60 mass % or greater and Compound (I) amounts to 15 mass % or less.
摘要翻译：一种防反射膜形成组合物，包括：具有m个RSi（O <0.5>）3个单元的化合物（I）的聚合产物，其中m代表整数 8至16，并且R 5各自独立地表示不可水解基团，条件是Rs中的至少两个表示含乙烯基或乙炔基的基团，其中每个RSi（O <0.5） >）3个单元与另一个RSi（O <0.5> 3）3 单元连接，同时具有共同的氧原子并构成笼结构，并且其中，通过化合物（I）的聚合反应得到的聚合产物为60质量％以上，化合物（I）为15质量％以下。

5. 发明申请

US20090043067A1 PROCESS FOR PRODUCING LENS, AND LENS 审中-公开
标题翻译：生产镜片和镜片的工艺
公开(公告)号：US20090043067A1
公开(公告)日：2009-02-12
申请号：US12134418
申请日：2008-06-06
申请人： Kensuke MORITA
发明人： Kensuke MORITA
IPC分类号： C08G77/20
CPC分类号： C08L83/04 , C08G77/12 , C08G77/20 , C08G77/70 , G02B1/041 , C08L83/00
摘要： A process for producing a lens is provided that includes a step of preparing a silicone resin composition that includes an organopolysiloxane containing a constituent unit represented by Formula (I), and a step of curing the silicone resin composition in a mold at a temperature of at least 220° C. There is also provided a lens produced by the production process.
摘要翻译：提供了一种制造透镜的方法，其包括制备包含含有由式（I）表示的构成单元的有机聚硅氧烷的有机硅树脂组合物的步骤，以及在模具中将硅酮树脂组合物在温度为至少220℃。还提供了通过生产方法生产的透镜。

6. 发明申请

US20080217746A1 INSULATING FILM 有权
标题翻译：绝缘膜
公开(公告)号：US20080217746A1
公开(公告)日：2008-09-11
申请号：US12040988
申请日：2008-03-03
申请人： Kensuke MORITA , Koji WARIISHI , Akira ASANO , Makoto MURAMATSU
发明人： Kensuke MORITA , Koji WARIISHI , Akira ASANO , Makoto MURAMATSU
IPC分类号： H01L29/51
CPC分类号： H01L21/3122 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/02348 , H01L21/02351 , H01L21/316 , H01L21/31695
摘要： An insulating film for semiconductor devices is obtained by curing, on a substrate, a high molecular compound obtained by polymerizing a cage-type silsesquioxane compound having two or more unsaturated groups as substituents and having a cyclic siloxane structure, wherein the structure of the cage-type silsesquioxane compound is not broken by curing, and the breakage of the cage structure can be detected by observing a peak at approximately 610 cm−1 in Raman spectrum of the film after curing.
摘要翻译：半导体器件用绝缘膜通过在基板上固化由具有两个以上不饱和基团作为取代基且具有环状硅氧烷结构的笼型倍半硅氧烷化合物而得到的高分子化合物，可以通过在固化后观察膜的拉曼光谱的约610cm -1处的峰值来检测笼结构的断裂，从而可以检测到倍半硅氧烷化合物的固化。

7. 发明申请

US20080214761A1 INSULATING FILM FORMING COMPOSITION 审中-公开
标题翻译：绝缘膜形成组合物
公开(公告)号：US20080214761A1
公开(公告)日：2008-09-04
申请号：US12041063
申请日：2008-03-03
申请人： Kensuke MORITA , Makoto MURAMATSU
发明人： Kensuke MORITA , Makoto MURAMATSU
IPC分类号： C08F4/04
CPC分类号： C09D183/04 , C08F230/08 , C08G77/04 , C08G77/20 , C08J5/18 , C08J2343/04
摘要： An insulating film forming composition, includes: a polymerized substance obtained by dissolving a cage-type silsesquioxane compound having two or more unsaturated groups as substituents in an organic solvent to give a concentration of 12 mass % or less, and polymerizing the cage-type silsesquioxane compound in presence of a polymerization initiator, wherein the polymerized substance obtained by reacting the cage-type silsesquioxane compound having two or more unsaturated groups as substituents totally amounts to 70 mass % or greater of a solid component contained in the insulating film forming composition.
摘要翻译：一种绝缘膜形成组合物，包括：通过将具有两个或更多个不饱和基团的笼型硅倍半氧烷化合物作为取代基溶解在有机溶剂中得到的聚合物质，得到12质量％以下的浓度，并使笼型倍半硅氧烷在聚合引发剂存在下，通过使具有两个或更多个不饱和基团的笼型硅倍半硅氧烷化合物作为取代基得到的聚合物质总计占绝缘膜形成组合物中所含的固体成分的70质量％以上。

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