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    • 6. 发明授权
    • Ion irradiation apparatus and ion irradiation method
    • 离子照射装置和离子照射方法
    • US09230776B2
    • 2016-01-05
    • US14596311
    • 2015-01-14
    • NISSIN ION EQUIPMENT CO., LTD.
    • Takeshi MatsumotoKoichi OrihiraMasatoshi Onoda
    • H01J37/317H01J37/30H01J37/244H01J37/20
    • H01J37/3171H01J37/20H01J37/244H01J37/3007H01J2237/31703
    • An ion irradiation apparatus is provided. The ion irradiation apparatus includes a support member, a measuring device, and a control device. The support member is larger than the substrate. The measuring device is disposed forwardly in a traveling direction of an ion beam. The ion irradiation apparatus operates in a first mode during which the measuring device is irradiated with a remaining part of the ion beam after being partially shielded by the support member, when the substrate is not irradiated with the ion beam after crossing the ion beam; and a second mode during which the measuring device is irradiated with the ion beam without being shielded by the support member, when the substrate is not irradiated with the ion beam after crossing the ion beam. The control device controls the substrate so that the ion treatment process is performed in the first mode at least one time during the treatment.
    • 提供了一种离子照射装置。 离子照射装置包括支撑构件,测量装置和控制装置。 支撑构件大于衬底。 测量装置沿离子束的行进方向向前设置。 离子照射装置在第一模式下工作,在第一模式中,当基板在与离子束交叉之后未被离子束照射时,在被部分被支撑构件屏蔽之后照射剩余部分的离子束; 以及第二模式,在该过程中当离子束穿过离子束之后,用离子束照射测量装置而不被支撑构件屏蔽。 控制装置控制基板,使得在处理期间至少一次在第一模式中执行离子处理过程。