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1. 发明授权

US11127616B2 Substrate accommodation device 有权
公开(公告)号：US11127616B2
公开(公告)日：2021-09-21
申请号：US16804631
申请日：2020-02-28
申请人： NISSIN ION EQUIPMENT CO., LTD.
发明人： Koyu Ueno , Masatoshi Onoda
IPC分类号： H01L21/677 , H01L21/673
摘要： A substrate accommodation device includes a casing, a gas supply that supplies a gas into the casing, and a transfer structure which retains substrates vertically spaced apart from each other and vertically transfers the substrates first-in-first-out from a carry-in position to a carry-out position within the casing. The gas heats or cools the substrates as the substrates are transferred first-in-first-out from the carry-in position to the carry-out position.

2. 发明申请

US20230140269A1 SUBSTRATE HOLDING DEVICE 有权
公开(公告)号：US20230140269A1
公开(公告)日：2023-05-04
申请号：US17871108
申请日：2022-07-22
申请人： Nissin Ion Equipment Co., Ltd.
发明人： Yusuke Otsuki , Masatoshi Onoda , Ippei Nishimura
IPC分类号： H01J37/20 , H01J37/317
摘要： Provided is a substrate holding device comprising: a holder that holds a substrate irradiated with an ion beam; and a driving device that rotates the holder around a predetermined axis to change an inclination of the held substrate with respect to the ion beam, wherein the driving device comprises: a power source that outputs power to rotate the holder; a reduction gear provided in the middle of a power transmission path from the power source to the holder; a first shaft member that rotates together with the holder by a power outputted from the reduction gear; a first detector that detects a rotational motion of the first shaft member; and a power control device that controls the power source based on a detection value of the first detector.

3. 发明申请

US20200286763A1 SUBSTRATE ACCOMMODATION DEVICE 审中-公开
公开(公告)号：US20200286763A1
公开(公告)日：2020-09-10
申请号：US16804631
申请日：2020-02-28
申请人： NISSIN ION EQUIPMENT CO., LTD.
发明人： Koyu Ueno , Masatoshi Onoda
IPC分类号： H01L21/677 , H01L21/673
摘要： A substrate accommodation device includes a casing, a gas supply that supplies a gas into the casing, and a transfer structure which retains substrates vertically spaced apart from each other and vertically transfers the substrates first-in-first-out from a carry-in position to a carry-out position within the casing. The gas heats or cools the substrates as the substrates are transferred first-in-first-out from the carry-in position to the carry-out position.

4. 发明申请

US20200211891A1 SUBSTRATE HOLDING DEVICE 审中-公开
公开(公告)号：US20200211891A1
公开(公告)日：2020-07-02
申请号：US16548959
申请日：2019-08-23
申请人： NISSIN ION EQUIPMENT CO., LTD.
发明人： Ippei NISHIMURA , Masatoshi Onoda
IPC分类号： H01L21/687 , H01L21/683 , H01J37/20
摘要： A substrate holding device is provided. The substrate holding device includes a substrate holder, a shaft attached to the substrate holder, a motor attached to the shaft, lifting pins, and a transmission assembly. The lifting pins are movable between a retracted position below a surface of the substrate holder, and a protruded position protruding from the surface. The transmission assembly is provided between the shaft and lifting pins and switches the substrate holding device between a transmittable state in which a driving force from the motor is transmitted to the lifting pins to move the lifting pins between the retracted position and the protruded position, and a non-transmittable state in which the driving force from the motor is not transmitted to the lifting pins but rotates the substrate holder.

5. 发明授权

US09784317B2 Vacuum processing system, vacuum processing device, lubricating agent supply device, and lubricating agent supplying method 有权
公开(公告)号：US09784317B2
公开(公告)日：2017-10-10
申请号：US14607661
申请日：2015-01-28
申请人： NISSIN ION EQUIPMENT CO., LTD
发明人： Masatoshi Onoda
IPC分类号： F16C33/66 , F16N21/00 , F16C29/00 , F16N29/02 , F16N35/00 , F16N7/38 , F16N9/00 , F16C29/06
CPC分类号： F16C33/6625 , F16C29/005 , F16C29/0645 , F16N7/385 , F16N9/00 , F16N21/00 , F16N29/02 , F16N35/00
摘要： A transport system is a vacuum processing system that includes a transport device that is provided in a vacuum, and a lubricating agent supply device that supplies lubricating agent to the transport device and provided in the ambient atmosphere. The transport device has a lubricating agent flow channel that is a channel for grease injected to a site subject to lubrication. The lubricating agent supply device has a grease server that stores a lubricating agent in the ambient atmosphere, a lubricating agent supply pipe which is a channel that guides the grease stored in the grease server to the lubricating agent flow channel and that connects the grease server and the lubricating agent flow channel, and an exhaust pump that exhausts the inside of the lubricating agent supply pipe.

6. 发明授权

US09230776B2 Ion irradiation apparatus and ion irradiation method 有权
标题翻译：离子照射装置和离子照射方法
公开(公告)号：US09230776B2
公开(公告)日：2016-01-05
申请号：US14596311
申请日：2015-01-14
申请人： NISSIN ION EQUIPMENT CO., LTD.
发明人： Takeshi Matsumoto , Koichi Orihira , Masatoshi Onoda
IPC分类号： H01J37/317 , H01J37/30 , H01J37/244 , H01J37/20
CPC分类号： H01J37/3171 , H01J37/20 , H01J37/244 , H01J37/3007 , H01J2237/31703
摘要： An ion irradiation apparatus is provided. The ion irradiation apparatus includes a support member, a measuring device, and a control device. The support member is larger than the substrate. The measuring device is disposed forwardly in a traveling direction of an ion beam. The ion irradiation apparatus operates in a first mode during which the measuring device is irradiated with a remaining part of the ion beam after being partially shielded by the support member, when the substrate is not irradiated with the ion beam after crossing the ion beam; and a second mode during which the measuring device is irradiated with the ion beam without being shielded by the support member, when the substrate is not irradiated with the ion beam after crossing the ion beam. The control device controls the substrate so that the ion treatment process is performed in the first mode at least one time during the treatment.
摘要翻译：提供了一种离子照射装置。离子照射装置包括支撑构件，测量装置和控制装置。支撑构件大于衬底。测量装置沿离子束的行进方向向前设置。离子照射装置在第一模式下工作，在第一模式中，当基板在与离子束交叉之后未被离子束照射时，在被部分被支撑构件屏蔽之后照射剩余部分的离子束; 以及第二模式，在该过程中当离子束穿过离子束之后，用离子束照射测量装置而不被支撑构件屏蔽。控制装置控制基板，使得在处理期间至少一次在第一模式中执行离子处理过程。

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