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1. 发明申请

US20110032494A1 APPARATUS AND METHOD OF APPLICATION AND DEVELOPMENT 有权
标题翻译：装置和应用与开发方法
公开(公告)号：US20110032494A1
公开(公告)日：2011-02-10
申请号：US12909191
申请日：2010-10-21
申请人： Nobuaki MATSUOKA , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
发明人： Nobuaki MATSUOKA , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
IPC分类号： G03B27/32
CPC分类号： H01L21/6715 , H01L21/67225 , Y10T29/49004 , Y10T29/49126 , Y10T29/49155 , Y10T29/53174 , Y10T29/53187 , Y10T29/532
摘要： A block for coating film formation and a block for a development process are stacked. A delivery stage to effect delivery of a substrate with a transportation unit for use in a block is provided for each process block at the carrier block side to constitute a shelf-type delivery stage group. A vertical transportation unit is provided to transport a substrate between the delivery stages in the delivery stage group. A substrate inspection unit is disposed at an upper empty space of the carrier block. A substrate is input to the substrate inspection unit directly by the vertical transportation unit or via a delivery stage in the delivery stage group. The substrate inspection unit may be disposed in the delivery stage group.
摘要翻译：层叠用于涂膜成膜的块和显影处理用块。针对载体块侧的每个处理块提供了用于在块中使用的运输单元实现基板输送的输送阶段，以构成货架式输送阶段组。提供垂直运输单元以在输送台组中的输送台之间输送基底。衬底检查单元设置在承载块的上空空间。基板由垂直运输单元直接输送到基板检查单元，或通过输送台组中的输送台输入。基板检查单元可以设置在输送台组中。

2. 发明申请

US20060213052A1 Apparatus and method of application and development 失效
标题翻译：仪器和应用与开发方法
公开(公告)号：US20060213052A1
公开(公告)日：2006-09-28
申请号：US11384323
申请日：2006-03-21
申请人： Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
发明人： Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
IPC分类号： H05K3/06 , G01R31/28
CPC分类号： H01L21/6715 , H01L21/67225 , Y10T29/49004 , Y10T29/49126 , Y10T29/49155 , Y10T29/53174 , Y10T29/53187 , Y10T29/532
摘要： A block for coating film formation and a block for a development process are stacked. A delivery stage to effect delivery of a substrate with a transportation unit for use in a block is provided for each process block at the carrier block side to constitute a shelf-type delivery stage group. A vertical transportation unit is provided to transport a substrate between the delivery stages in the delivery stage group. A substrate inspection unit is disposed at an upper empty space of the carrier block. A substrate is input to the substrate inspection unit directly by the vertical transportation unit or via a delivery stage in the delivery stage group. The substrate inspection unit may be disposed in the delivery stage group.
摘要翻译：层叠用于涂膜成膜的块和显影处理用块。针对载体块侧的每个处理块提供了用于在块中使用的运输单元实现基板输送的输送阶段，以构成货架式输送阶段组。提供垂直运输单元以在输送台组中的输送台之间输送基底。衬底检查单元设置在承载块的上空空间。基板由垂直运输单元直接输送到基板检查单元，或通过输送台组中的输送台输入。基板检查单元可以设置在输送台组中。

3. 发明授权

US08863373B2 Apparatus and method of application and development 有权
标题翻译：仪器和应用与开发方法
公开(公告)号：US08863373B2
公开(公告)日：2014-10-21
申请号：US12909191
申请日：2010-10-21
申请人： Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
发明人： Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
IPC分类号： B23P19/00 , H05K3/36 , H05K3/10 , H01L21/67
CPC分类号： H01L21/6715 , H01L21/67225 , Y10T29/49004 , Y10T29/49126 , Y10T29/49155 , Y10T29/53174 , Y10T29/53187 , Y10T29/532
摘要： An application and development apparatus has a plurality of vertically stacked blocks directed to coating film formation on a substrate. This plurality of blocks includes first processing units, a first substrate transportation region, and a first transportation unit for transporting substrates between the first processing units within the first transportation region. A development process block also is vertically stacked with the blocks directed to coating film formation to constitute a layered block as the process block. The development process block also includes second processing units and a second transportation unit for transporting substrates between the second processing units within the second transportation region. The application and development apparatus further has a shelf-type delivery stage group, a vertical transportation unit and a substrate inspection unit such that a substrate input into the inspection unit passes through the delivery stage group from the vertical transportation unit.
摘要翻译：应用和显影装置具有多个垂直堆叠的块，用于在基底上形成涂膜。该多个块包括第一处理单元，第一基板输送区域和用于在第一输送区域内的第一处理单元之间输送基板的第一输送单元。显影处理块也被垂直堆叠，其中块被指向涂膜形成以构成作为处理块的分层块。显影处理块还包括第二处理单元和用于在第二输送区域内的第二处理单元之间输送基板的第二输送单元。应用和开发设备还具有搁板式传送台组，垂直传送单元和基板检查单元，使得输入到检查单元的基板从垂直传送单元通过传送台组。

4. 发明授权

US07841072B2 Apparatus and method of application and development 失效
标题翻译：仪器和应用与开发方法
公开(公告)号：US07841072B2
公开(公告)日：2010-11-30
申请号：US11384323
申请日：2006-03-21
申请人： Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
发明人： Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
IPC分类号： B23P19/00 , B05C13/00 , B05C13/02 , B05C11/00
CPC分类号： H01L21/6715 , H01L21/67225 , Y10T29/49004 , Y10T29/49126 , Y10T29/49155 , Y10T29/53174 , Y10T29/53187 , Y10T29/532
摘要： Disclosed herein is a development apparatus having a plurality of coating units and a development process unit stacked on each other in a layered direction in a process block which is connected at the rear side of the carrier block. A first transportation unit, which ascends and descends in the layered direction, is provided in the carrier block. Also, in the carrier block, the bottom of a substrate inspection unit is located above a highest position to which the first transportation unit is able to ascend in the layered direction.
摘要翻译：这里公开了一种显影装置，其具有多个涂布单元和显影处理单元，该印刷单元和显影处理单元在连接在载体块的后侧的处理块中在层叠方向上堆叠。载体块中设置有沿分层方向上升和下降的第一输送单元。此外，在载体块中，基板检查单元的底部位于第一输送单元能够在分层方向上能够上升的最高位置的上方。

5. 发明授权

US07997813B2 Coating and developing system with a direct carrying device in a processing block, coating and developing method and storage medium 有权
标题翻译：涂装和显影系统，具有处理块中的直接承载装置，涂层和显影方法和存储介质
公开(公告)号：US07997813B2
公开(公告)日：2011-08-16
申请号：US12057846
申请日：2008-03-28
申请人： Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
发明人： Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
IPC分类号： G03D5/04
CPC分类号： H01L21/67745 , H01L21/67178
摘要： A coating and developing system includes processing blocks of the same construction each built by stacking up a plurality of unit blocks including a film forming unit block and a developing unit block in layers. The processing blocks are arranged longitudinally between a carrier block and an interface block. The number of processing blocks like the processing blocks arranged between the carrier block and the interface block is adjusted to adjust the throughput of the coating and developing system. Thus, a coating and developing system capable of achieving a desired throughput can be easily designed and manufactured.
摘要翻译：涂覆和显影系统包括具有相同结构的处理块，每个处理块通过堆叠多个单元块而构建，所述单元块包括成膜单元块和显影单元块。处理块被纵向地布置在载体块和接口块之间。调整布置在承载块和接口块之间的处理块的处理块的数量，以调整涂覆和显影系统的生产量。因此，可以容易地设计和制造能够实现期望生产量的涂布和显影系统。

6. 发明申请

US20080241403A1 COATING AND DEVELOPING SYSTEM, COATING AND DEVELOPING METHOD AND STORAGE MEDIUM 有权
标题翻译：涂料与开发系统，涂料和开发方法和储存介质
公开(公告)号：US20080241403A1
公开(公告)日：2008-10-02
申请号：US12058252
申请日：2008-03-28
申请人： Nobuaki MATSUOKA , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
发明人： Nobuaki MATSUOKA , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
IPC分类号： B05D3/00 , B05C13/00 , B05C11/00
CPC分类号： H01L21/67178 , H01L21/67745
摘要： A coating and developing system has a first processing block, a second processing block, and a transfer block interposed between the first and the second processing block. A first direct carrying means carries substrates from a carrier block to the transfer block. The transfer block distributes the substrates to respective film forming unit blocks of the first and the second processing block. Substrates on which films have been formed by the first and the second processing block are collected temporarily in the transfer block. A second direct carrying means carries the substrate collected in the transfer block from the transfer block to an interface block. Use of the first and the second processing block can improve the throughput of the coating and developing system. Since a carrying route from the carrier block to the first processing block, and a carrying route from the carrier block to the second processing block are the same, a carrying program is easy to create.
摘要翻译：涂覆和显影系统具有第一处理块，第二处理块和介于第一和第二处理块之间的传输块。第一直接承载装置将衬底从承载块运送到转移块。传送块将基板分配到第一和第二处理块的各个成膜单元块。由第一处理块和第二处理块形成了膜的基板被临时收集在转印块中。第二直接传送装置将从传送块收集的基板传送到接口块。使用第一和第二处理块可以提高涂层和显影系统的生产量。由于从承载块到第一处理块的承载路由和从承载块到第二处理块的承载路由相同，所以携带程序容易创建。

7. 发明申请

US20060165409A1 Coating and developing system and coating and developing method 有权
标题翻译：涂层开发系统及涂层开发方法
公开(公告)号：US20060165409A1
公开(公告)日：2006-07-27
申请号：US11335635
申请日：2006-01-20
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： G03D5/00
CPC分类号： H01L21/67184 , H01L21/00 , H01L21/6715 , H01L21/67178 , H01L21/6719
摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.
摘要翻译：涂覆显影系统包括：抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗反射膜下面的抗反射膜以及在小空间中覆盖抗蚀剂膜的抗反射膜。涂层显影系统能够应对形成防反射膜的情况和没有形成任何抗反射膜的情况，并且需要简单的软件。成膜单位块，即TCT层B 3，COT层B 4和BCT层B 5以及显影单元块，即DEV层B 1和B 2，层叠在处理块S 在形成防反射膜的情况下选择性地使用TCT层B 3，COT层B 4和BCT层B 5以及未形成任何抗反射膜的情况。涂层和显影系统由简单的携带程序和简单的软件控制。

8. 发明授权

US07955011B2 Coating and developing apparatus, substrate processing method, and storage medium 有权
标题翻译：涂布显影装置，基板处理方法和存储介质
公开(公告)号：US07955011B2
公开(公告)日：2011-06-07
申请号：US11733441
申请日：2007-04-10
申请人： Nobuaki Matsuoka , Yasushi Hayashida , Shinichi Hayashi
发明人： Nobuaki Matsuoka , Yasushi Hayashida , Shinichi Hayashi
IPC分类号： G03D5/04
CPC分类号： H01L21/67745 , H01L21/67178
摘要： A coating and developing apparatus is provided which requires a smaller occupation space even when it incorporates a substrate inspection unit, while eliminating a disadvantageous layout. A coating film forming part B3 including a plurality of process units and transfer mechanisms A3 and A4, and a developing part B1 including a plurality of process units 31 and a transfer mechanism A1 are vertically arranged in a process block S2. There are disposed in the process block S2 on a side of a carrier block S1, a plurality of vertically arranged transfer units TRS for transferring a substrate W between the same and transfer mechanisms for the respective parts, and a vertically movable transfer mechanism D1 for the transfer unit for transferring a substrate between these transfer units. At least one of the coating film forming part and the developing part includes a substrate inspection unit 43 for inspecting a substrate transferred by the transfer mechanism for the corresponding part.
摘要翻译：提供了一种涂覆和显影装置，即使当其包含基板检查单元时也需要较小的占用空间，同时消除不利的布局。包括多个处理单元和转印机构A3和A4的涂膜形成部分B3和包括多个处理单元31和转印机构A1的显影部分B1垂直地布置在处理块S2中。在载体块S1的一侧设置有处理块S2，多个垂直设置的传送单元TRS，用于将基板W传送到相应部件的传送机构和用于各部件的传送机构之间，转印单元，用于在这些转印单元之间转印衬底。涂膜形成部和显影部中的至少一个包括用于检查由相应部分的转印机构转印的基板的基板检查单元43。

9. 发明授权

US07591601B2 Coater/developer, coating/developing method, and storage medium 失效
标题翻译：涂布机/显影剂，涂布/显影方法和存储介质
公开(公告)号：US07591601B2
公开(公告)日：2009-09-22
申请号：US12107496
申请日：2008-04-22
申请人： Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
发明人： Nobuaki Matsuoka , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
IPC分类号： G03D5/00 , G03B27/32 , G03F7/00
CPC分类号： G03B27/32 , G03F7/162 , G03F7/3021
摘要： A coater/developer is disclosed that includes a heating module having a pair of rotary bodies configured to rotate about respective horizontal axles, the rotary bodies being spaced apart from each other in a direction along the conveyance path of a substrate so that the rotational axles thereof are parallel to each other; a conveyance path member engaged with and extended between the rotary bodies so as to move along an orbit, the conveyance path member forming a part of the conveyance path of the substrate placed on the conveyance path member; a first transfer part provided at the upstream end of the conveyance path; a second transfer part provided at the downstream end of the conveyance path; and a heating part provided between the upstream end and the downstream end of the conveyance path and configured to heat the substrate.
摘要翻译：公开了一种涂布机/显影剂，其包括具有一对旋转体的加热模块，所述一对旋转体构造成围绕各自的水平轴旋转，所述旋转体在沿着基板的传送路径的方向上彼此间隔开，使得其旋转轴彼此平行; 输送路径构件，其与所述旋转体接合并在所述旋转体之间延伸以沿着轨道移动，所述输送路径构件形成放置在所述输送路径构件上的所述基板的输送路径的一部分; 设置在所述输送路径的上游端的第一转印部; 设置在所述输送路径的下游端的第二输送部; 以及加热部，其设置在所述输送路径的上游端和下游端之间，并且构造成加热所述基板。

10. 发明授权

US07245348B2 Coating and developing system and coating and developing method with antireflection film and an auxiliary block for inspection and cleaning 有权
标题翻译：涂层和显影系统以及具有防反射膜和辅助块的检测和清洁的涂层和显影方法
公开(公告)号：US07245348B2
公开(公告)日：2007-07-17
申请号：US11117566
申请日：2005-04-29
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： G03B27/52
CPC分类号： H01L21/67184 , H01L21/6715 , H01L21/67178 , H01L21/6719
摘要： A coating and developing system includes an auxiliary block, a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with either a case where antireflection films are formed or a case where no antireflection film is formed. Film forming unit blocks, namely, a TCT layer, a COT layer and a BCT layer, and developing unit blocks, namely, DEV layers, are stacked up in layers in a processing block S2. The TCT layer, the COT layer and the BCT layer are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a carrying program.
摘要翻译：涂覆显影系统包括辅助块，抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗蚀剂膜下面的抗反射膜，以及抗反射膜，覆盖抗蚀剂膜空间。涂覆和显影系统可以应对形成防反射膜的情况或不形成抗反射膜的情况。成膜单位块，即TCT层，COT层和BCT层，以及显影单元块，即DEV层，在处理块S2中层叠。在形成防反射膜的情况下选择性地使用TCT层，COT层和BCT层以及未形成任何抗反射膜的情况。涂层和显影系统由携带程序控制。

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