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1. 发明授权

US09530610B2 Blanking aperture array device for multi-beams, and fabrication method of blanking aperture array device for multi-beams 有权
标题翻译：用于多光束的消隐孔径阵列器件，以及用于多光束的孔径阵列器件的制作方法
公开(公告)号：US09530610B2
公开(公告)日：2016-12-27
申请号：US14953959
申请日：2015-11-30
申请人： NuFlare Technology, Inc. , NTT Advanced Technology Corporation
发明人： Kazuhiro Chiba , Hiroshi Matsumoto , Munehiro Ogasawara , Ryoichi Yoshikawa , Hirofumi Morita , Hirokazu Yamada , Teruaki Safu , Toshifumi Konishi , Takaaki Matsushima , Kazuhisa Kudo , Masaki Yano , Katsuyuki Machida
IPC分类号： H01J37/04 , H01J37/09 , G03F1/20
CPC分类号： H01J37/045 , H01J2237/043 , H01J2237/0432 , H01J2237/0437 , H01J2237/303 , H01J2237/3175 , H01J2237/31774
摘要： A method for fabricating a blanking aperture array device for multi-beams includes forming, using a substrate over which a first insulating film, a first metal film, a second insulating film, and a second metal film are laminated in order, electrodes and pads on the second metal film, removing a part of the second metal film, removing the second insulating film using, as a mask, the electrodes, the pads, and a remaining part of the second metal film, and forming openings each being between a pair of electrodes, wherein, a part of the second metal film is etched such that some part of it remains in regions each connecting one of the electrodes and one of the pads, and a region in which entire openings are formed except the openings themselves is configured by the electrodes, pads, and first and second metal films such that the insulating film is not exposed.
摘要翻译：一种用于制造用于多光束的消隐孔阵列器件的方法包括使用基板依次形成第一绝缘膜，第一金属膜，第二绝缘膜和第二金属膜，基板上依次层叠电极和焊盘第二金属膜，去除第二金属膜的一部分，使用作为掩模的电极，焊盘和第二金属膜的剩余部分去除第二绝缘膜，并且形成开口，每个开口分别位于一对电极，其中，第二金属膜的一部分被蚀刻，使得其中的一部分保留在每个连接电极中的一个和一个焊盘的区域中，并且除了开口本身之外还形成有开口本身的整个开口的区域电极，焊盘以及第一和第二金属膜，使得绝缘膜不被暴露。

2. 发明申请

US20160155600A1 BLANKING APERTURE ARRAY DEVICE FOR MULTI-BEAMS, AND FABRICATION METHOD OF BLANKING APERTURE ARRAY DEVICE FOR MULTI-BEAMS 有权
标题翻译：用于多层的空白阵列设备以及用于多层的孔径阵列设备的制造方法
公开(公告)号：US20160155600A1
公开(公告)日：2016-06-02
申请号：US14953959
申请日：2015-11-30
申请人： NuFlare Technology, Inc. , NTT Advanced Technology Corporation
发明人： Kazuhiro CHIBA , Hiroshi Matsumoto , Munehiro Ogasawara , Ryoichi Yoshikawa , Hirofumi Morita , Hirokazu Yamada , Teruaki Safu , Toshifumi Konishi , Takaaki Matsushima , Kazuhisa Kudo , Masaki Yano , Katsuyuki Machida
IPC分类号： H01J37/04
CPC分类号： H01J37/045 , H01J2237/043 , H01J2237/0432 , H01J2237/0437 , H01J2237/303 , H01J2237/3175 , H01J2237/31774
摘要： A method for fabricating a blanking aperture array device for multi-beams includes forming, using a substrate over which a first insulating film, a first metal film, a second insulating film, and a second metal film are laminated in order, electrodes and pads on the second metal film, removing a part of the second metal film, removing the second insulating film using, as a mask, the electrodes, the pads, and a remaining part of the second metal film, and forming openings each being between a pair of electrodes, wherein, a part of the second metal film is etched such that some part of it remains in regions each connecting one of the electrodes and one of the pads, and a region in which entire openings are formed except the openings themselves is configured by the electrodes, pads, and first and second metal films such that the insulating film is not exposed.
摘要翻译：一种用于制造用于多光束的消隐孔阵列器件的方法包括使用基板依次形成第一绝缘膜，第一金属膜，第二绝缘膜和第二金属膜，基板上依次层叠电极和焊盘第二金属膜，去除第二金属膜的一部分，使用作为掩模的电极，焊盘和第二金属膜的剩余部分去除第二绝缘膜，并且形成开口，每个开口分别位于一对电极，其中，第二金属膜的一部分被蚀刻，使得其中的一部分保留在每个连接电极中的一个和一个焊盘的区域中，并且除了开口本身之外还形成有开口本身的整个开口的区域电极，焊盘以及第一和第二金属膜，使得绝缘膜不被暴露。

3. 发明授权

US10388488B2 Multi charged particle beam drawing apparatus and multi charged particle beam drawing method 有权
公开(公告)号：US10388488B2
公开(公告)日：2019-08-20
申请号：US15993056
申请日：2018-05-30
申请人： NuFlare Technology, Inc.
发明人： Hirofumi Morita , Osamu Iizuka , Tsubasa Nanao
IPC分类号： H01J37/09 , H01J37/317 , H01J37/20 , H01J37/04
摘要： In one embodiment, a multi charged particle beam drawing apparatus includes an emitter emitting a charged particle beam, a shaping aperture array in which a plurality of first openings are formed, and which receives irradiation of the charged particle beam in an area including the plurality of first openings, and forms a multi-beam by allowing part of the charged particle beam to pass through a corresponding one of the plurality of first openings, a blanking aperture array in which a plurality of second openings are formed, through each of which a beam is passed, corresponding to part of the multi-beam which has passed through the plurality of first openings, the plurality of second openings each including a blanker that performs blanking deflection of a beam, and a movement controller moving the shaping aperture array or the blanking aperture array, and adjusting space between the shaping aperture array and the blanking aperture array.

4. 发明授权

US10224171B2 Blanking device for multi charged particle beams, and multi charged particle beam irradiation apparatus 有权
公开(公告)号：US10224171B2
公开(公告)日：2019-03-05
申请号：US15591767
申请日：2017-05-10
申请人： NuFlare Technology, Inc.
发明人： Takanao Touya , Hiroshi Matsumoto , Munehiro Ogasawara , Hirofumi Morita
IPC分类号： H01J37/04 , H01J37/317
摘要： A blanking device for multi charged particle beams includes a first substrate, in which plural first openings are formed in an array, to form multi-beams, a second substrate in which plural second openings are formed in an array, where a corresponding beam of the multi-beams passes through each of the plural second openings, plural control electrodes, which are on the second substrate and each of which is close to a corresponding one of the plural second openings and arranged not to be directly exposed to other second opening adjacent to the corresponding one of the plural second openings, to be switchably applied with first and second potentials, plural counter electrodes, each of which is facing a corresponding one of the plural control electrodes, to be applied with the second potential, and a shield film provided between the first substrate and the plural control electrodes.

5. 发明授权

US09330881B2 Blanking device for multi charged particle beams, and multi charged particle beam writing apparatus 有权
标题翻译：多带电粒子束消隐装置，多带电粒子束写入装置
公开(公告)号：US09330881B2
公开(公告)日：2016-05-03
申请号：US14828681
申请日：2015-08-18
申请人： NuFlare Technology, Inc.
发明人： Hiroshi Matsumoto , Hirofumi Morita
IPC分类号： H01J37/04 , H01J37/317
CPC分类号： H01J37/045 , H01J37/3177 , H01J2237/0437
摘要： A blanking device for multi-beams includes a substrate, a dielectric film formed on the substrate, plural first electrodes, at positions each exposed in a corresponding opening, to be applied with a first deflection potential, plural second electrodes, at positions each opposite to a corresponding first electrode with respect to the corresponding opening, to be applied with a second deflection potential, including a ground potential, for deflecting a corresponding beam of the multi-beams by a difference between the first and second deflection potentials, and a conductive film arranged in, other than plural first regions on the dielectric film each along a corresponding first electrode and being shaded by each first electrode in a case of being viewed from a position where a corresponding beam passes through a corresponding opening, a second region on the dielectric film, wherein insulation is provided between the plural first and second electrodes.
摘要翻译：用于多光束的消隐装置包括基板，形成在基板上的电介质膜，多个第一电极，在相应的开口中暴露的位置，以施加第一偏转电位，多个第二电极，相对于对应的开口的相应的第一电极，被施加包括地电位的第二偏转电位，用于通过第一和第二偏转电位之间的差来偏转多光束的相应光束，并且导电膜在电介质膜上除了多个第一区域之外，沿着相应的第一电极布置在除了从对应的光束通过相应的开口的位置观察的情况下被每个第一电极遮蔽的电介质膜之外的多个第一区域，电介质上的第二区域膜，其中在所述多个第一和第二电极之间提供绝缘。

6. 发明授权

US10811224B2 Multi-charged-particle beam writing apparatus 有权
公开(公告)号：US10811224B2
公开(公告)日：2020-10-20
申请号：US16142200
申请日：2018-09-26
申请人： NuFlare Technology, Inc.
发明人： Hirofumi Morita
IPC分类号： H01J37/30 , H01J37/04 , H01J37/317
摘要： In one embodiment, a multi-charged-particle beam writing apparatus includes an emission unit emitting a charged-particle beam, a limiting aperture substrate including a single first aperture, a shaping aperture array that has a plurality of second apertures and that is irradiated with the charged-particle beam having passed through the first aperture in a region including the plurality of second apertures and forms multi-beams by letting part of the charged-particle beam pass through the plurality of second apertures, and a blanking aperture array member including a plurality of third apertures through each of which a corresponding one of the multi-beams that have passed through the plurality of second apertures passes, the blanking aperture array member having a blanker in each of the third apertures, the blanker performing blanking deflection on the corresponding beam.

7. 发明授权

US09991086B2 Multi charged particle beam writing method and multi charged particle beam writing apparatus 有权
公开(公告)号：US09991086B2
公开(公告)日：2018-06-05
申请号：US15273900
申请日：2016-09-23
申请人： NuFlare Technology, Inc.
发明人： Hirofumi Morita
IPC分类号： H01J37/04 , H01J37/14 , H01J37/317
CPC分类号： H01J37/045 , H01J37/14 , H01J37/3177 , H01J2237/0435 , H01J2237/0453
摘要： In one embodiment, a multi charged particle beam writing method includes performing blanking deflection on each of multiple beams using a plurality of individual blankers, and collectively performing blanking deflection on the multiple beams using a common blanker. The beams controlled in the beam ON state by the individual blankers and the common blanker pass through a hole at central part of a liming aperture member. The beams deflected in the beam OFF state by the individual blankers or the common blanker are deviated from the hole and are interrupted by the limiting aperture member. When one of the common blanker and the individual blanker deflects one of the beams to the beam OFF state while the other of them deflects the beam in the beam OFF state, the beam moves on the limiting aperture member such that the beam is away from the hole.

8. 发明申请

US20170345612A1 BLANKING DEVICE FOR MULTI CHARGED PARTICLE BEAMS, AND MULTI CHARGED PARTICLE BEAM IRRADIATION APPARATUS 审中-公开
公开(公告)号：US20170345612A1
公开(公告)日：2017-11-30
申请号：US15591767
申请日：2017-05-10
申请人： NuFlare Technology, Inc.
发明人： Takanao TOUYA , Hiroshi Matsumoto , Munehiro Ogasawara , Hirofumi Morita
IPC分类号： H01J37/04 , H01J37/317
CPC分类号： H01J37/045 , H01J37/3177 , H01J2237/0435 , H01J2237/31774
摘要： A blanking device for multi charged particle beams includes a first substrate, in which plural first openings are formed in an array, to form multi-beams, a second substrate in which plural second openings are formed in an array, where a corresponding beam of the multi-beams passes through each of the plural second openings, plural control electrodes, which are on the second substrate and each of which is close to a corresponding one of the plural second openings and arranged not to be directly exposed to other second opening adjacent to the corresponding one of the plural second openings, to be switchably applied with first and second potentials, plural counter electrodes, each of which is facing a corresponding one of the plural control electrodes, to be applied with the second potential, and a shield film provided between the first substrate and the plural control electrodes.

9. 发明授权

US11355302B2 Multi-beam blanking device and multi-charged-particle-beam writing apparatus 有权
公开(公告)号：US11355302B2
公开(公告)日：2022-06-07
申请号：US17169782
申请日：2021-02-08
申请人： NuFlare Technology, Inc.
发明人： Hiroshi Yamashita , Yoshikuni Goshima , Hirofumi Morita , Hiroshi Matsumoto
IPC分类号： H01J37/20 , H01J37/04 , H01J37/147
摘要： In one embodiment, a multi-beam blanking device includes a semiconductor substrate, an insulating film that is disposed on the semiconductor substrate, an antistatic film that is disposed on the insulating film, a plurality of cells each of which is related to a through-hole that penetrate the semiconductor substrate and the insulating film and each of which includes a blanking electrode and a ground electrode that are disposed on the insulating film, and a ground wiring line that is disposed in the insulating film. The antistatic film and the ground wiring line are connected to each other at a joint that extends through the insulating film on the ground wiring line.

10. 发明授权

US11217428B2 Multi charged particle beam writing apparatus 有权
公开(公告)号：US11217428B2
公开(公告)日：2022-01-04
申请号：US16835369
申请日：2020-03-31
申请人： NuFlare Technology, Inc.
发明人： Mitsuhiro Okazawa , Hirofumi Morita
IPC分类号： H01J37/317 , H01J37/09 , H01J37/12 , H01J37/04
摘要： Provided is a multi charged particle beam writing apparatus including: an emission unit emitting a charged particle beam; a restriction aperture unit having a first opening having a variable opening area, the restriction aperture unit shielding a portion of the charged particle beam; a shaping aperture array substrate having a plurality of second openings, the shaping aperture array substrate forming multiple beams by allowing the shaping aperture array substrate to be irradiated with the charged particle beam passing through the first opening and allowing a portion of the charged particle beam to pass through the plurality of second openings; and a blanking aperture array substrate having a plurality of third openings, each beam of the multiple beams passing through the plurality of third openings, the blanking aperture array substrate being capable of independently deflecting each beam of the multiple beams.

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