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1. 发明申请

US20220399181A1 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS 有权
公开(公告)号：US20220399181A1
公开(公告)日：2022-12-15
申请号：US17805887
申请日：2022-06-08
申请人： NuFlare Technology, Inc.
发明人： Toshiki KIMURA , Hirofumi MORITA , Takanao TOUYA , Mitsuhiro OKAZAWA
IPC分类号： H01J37/317 , H01J37/04 , H01J37/09
摘要： In one embodiment, a multi charged particle beam writing apparatus includes a blanking aperture array substrate provided with a plurality of blankers configured to respectively perform blanking deflection on a plurality of charged particle beams included in a multi-beam, and a first shield member which is disposed downstream of the blanking aperture array substrate with respect to a travel direction of the multi-beam, has a cylindrical part in which the multi-beam passes through, and is composed of a high magnetic permeability material.

2. 发明申请

US20220328278A1 CHARGED PARTICLE BEAM WRITING APPARATUS 有权
公开(公告)号：US20220328278A1
公开(公告)日：2022-10-13
申请号：US17655876
申请日：2022-03-22
申请人： NuFlare Technology, Inc.
发明人： Hirofumi MORITA , Takanao TOUYA
IPC分类号： H01J37/147 , H01J37/317 , H01J37/12
摘要： In one embodiment, a charged particle beam writing apparatus includes a positioning deflector adjusting an irradiation position of a charged particle beam radiated to a substrate which is a writing target, a fixed deflector which is disposed downstream of the positioning deflector in a traveling direction of the charged particle beam, and in which an amount of deflection is fixed, a focus correction lens performing focus correction on the charged particle beam according to a surface height of the substrate, and an object lens focusing the charged particle beam.

3. 发明申请

US20140175302A1 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS 有权
标题翻译：多重粒子光束写字装置
公开(公告)号：US20140175302A1
公开(公告)日：2014-06-26
申请号：US14108844
申请日：2013-12-17
申请人： NuFlare Technology, Inc.
发明人： Takanao TOUYA , Munehiro Ogasawara
IPC分类号： H01J37/317
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J2237/04922 , Y10S430/143
摘要： A multi charged particle beam writing apparatus includes a stage to mount a target object thereon and to be movable, an emission unit to emit a charged particle beam, an aperture member, in which a plurality of openings are formed, to produce multiple beams by letting a region including the whole of a plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of a plurality of openings, a reduction optical system to reduce the multiple beams, and a doublet lens, arranged at the subsequent stage of the reduction optical system, in which a magnification is 1 and directions of magnetic fluxes are opposite.
摘要翻译：一种多带电粒子束写入装置，包括：载置目标物体并可移动的载台，发射带电粒子束的发射单元，形成有多个开口的孔径构件，通过放电产生多个波束对包含整个多个开口的区域照射带电粒子束并使带电粒子束的部分分别穿过多个开口的对应开口，还原光学系统以减少多个光束，并且双峰透镜，布置在还原光学系统的后续阶段，其中放大率为1，磁通量的方向相反。

4. 发明申请

US20190115185A1 CHARGED PARTICLE BEAM WRITING APPARATUS, METHOD OF ADJUSTING BEAM INCIDENT ANGLE TO TARGET OBJECT SURFACE, AND CHARGED PARTICLE BEAM WRITING METHOD 审中-公开
公开(公告)号：US20190115185A1
公开(公告)日：2019-04-18
申请号：US16214603
申请日：2018-12-10
申请人： NuFlare Technology, Inc.
发明人： Takahito NAKAYAMA , Takanao TOUYA
IPC分类号： H01J37/04 , H01J37/10 , B82Y10/00 , H01J37/317 , B82Y40/00
摘要： A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.

5. 发明申请

US20180342366A1 CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRITING APPARATUS 审中-公开
公开(公告)号：US20180342366A1
公开(公告)日：2018-11-29
申请号：US15943745
申请日：2018-04-03
申请人： NuFlare Technology, Inc.
发明人： Munehiro OGASAWARA , Takanao TOUYA
IPC分类号： H01J37/141 , H01J37/24 , H01J37/20 , H01J37/153
摘要： A charged particle beam writing method includes forming an aperture image by making a charged particle beam pass through an aperture substrate, changing, in the state where a plurality of crossover positions of the charged particle beam and positions of all of one or more intermediate images of the aperture image are adjusted to matching positions with respect to the aperture image with the first magnification, magnification of the aperture image from the first magnification to the second magnification by using a plurality of lenses while maintaining the last crossover position of the charged particle beam and the position of the last intermediate image of the aperture image to be fixed, and forming, using an objective lens, the aperture image whose magnification has been changed to the second magnification on the surface of the target object, and writing the aperture image.

6. 发明申请

US20160071682A1 CHARGED PARTICLE BEAM WRITING APPARATUS, METHOD OF ADJUSTING BEAM INCIDENT ANGLE TO TARGET OBJECT SURFACE, AND CHARGED PARTICLE BEAM WRITING METHOD 审中-公开
标题翻译：充电颗粒光束写入装置，将光束发射角调整到目标物体表面的方法和带电颗粒光束写入方法
公开(公告)号：US20160071682A1
公开(公告)日：2016-03-10
申请号：US14943243
申请日：2015-11-17
申请人： NuFlare Technology, Inc.
发明人： Takahito NAKAYAMA , Takanao TOUYA
IPC分类号： H01J37/04 , H01J37/10 , H01J37/317
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/10 , H01J37/3174 , H01J2237/30461 , H01J2237/31776
摘要： A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.
摘要翻译：根据本发明的一个方面的带电粒子束写入装置包括发射带电粒子束的发射单元，使带电粒子束会聚的电子透镜，相对于方向布置在电子透镜的后方的消隐偏转器的光轴，以便在执行在射束和射束之间切换的消隐控制的情况下使带电粒子束偏转;消隐孔径构件，相对于光轴的方向布置在消隐偏转器的后方以阻挡被偏转成为光束断开状态的带电粒子束，以及布置在消隐偏转器的中心高度位置的磁体线圈，以偏转带电粒子束。

7. 发明申请

US20140175303A1 CHARGED PARTICLE BEAM WRITING APPARATUS 有权
标题翻译：充电颗粒光束书写装置
公开(公告)号：US20140175303A1
公开(公告)日：2014-06-26
申请号：US14108936
申请日：2013-12-17
申请人： NuFlare Technology, Inc.
发明人： Takanao TOUYA , Munehiro OGASAWARA
IPC分类号： H01J37/317
CPC分类号： H01J37/3177 , H01J37/141 , H01J37/145 , H01J37/1474 , H01J37/3026 , H01J37/3174 , H01J2237/1508
摘要： A multi charged particle beam writing apparatus includes a stage to mount a target object thereon, an emission unit to emit a charged particle beam, an aperture member, in which a plurality of openings are formed, to form a multibeam by letting a region including a whole of the plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of the plurality of openings, a plurality of electromagnetic lenses, directions of whose magnetic fields are opposite, and three or more electrostatic lenses, at least one of which is arranged in each of the magnetic fields of a plurality of electromagnetic lenses and one or more of which also serve as deflectors for collectively deflecting the multibeam onto the target object.
摘要翻译：一种多带电粒子束写入装置，包括：在其上安装目标物体的台，发射带电粒子束的发射单元，其中形成有多个开口的孔径构件，以形成多波束，整个多个开口被照射带电粒子束并使带电粒子束的部分分别穿过多个开口的对应开口，多个电磁透镜，其磁场相反的方向，以及三个或更多的静电透镜，其中至少一个布置在多个电磁透镜的每个磁场中，并且其中一个或多个也用作用于将多光束共同偏转到目标物体上的偏转器。

8. 发明申请

US20230055778A1 MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS 有权
公开(公告)号：US20230055778A1
公开(公告)日：2023-02-23
申请号：US17819048
申请日：2022-08-11
申请人： NuFlare Technology, Inc.
发明人： Hirofumi MORITA , Takanao TOUYA
IPC分类号： H01J37/317 , H01J37/147
摘要： In one embodiment, a multi charged particle beam writing method includes forming a multi charged particle beam with which a substrate serving as a writing target is irradiated, deflecting the multi charged particle beam to a position with a predetermined deflection offset added so that deflection voltages respectively applied to a plurality of electrodes of an electrostatic positioning deflector does not include a state where all the deflection voltages are zero, and irradiating the substrate with the multi charged particle beam. A positive common voltage is added to the deflection voltages which are applied to the respective electrodes of the electrostatic positioning deflector.

9. 发明申请

US20170345612A1 BLANKING DEVICE FOR MULTI CHARGED PARTICLE BEAMS, AND MULTI CHARGED PARTICLE BEAM IRRADIATION APPARATUS 审中-公开
公开(公告)号：US20170345612A1
公开(公告)日：2017-11-30
申请号：US15591767
申请日：2017-05-10
申请人： NuFlare Technology, Inc.
发明人： Takanao TOUYA , Hiroshi Matsumoto , Munehiro Ogasawara , Hirofumi Morita
IPC分类号： H01J37/04 , H01J37/317
CPC分类号： H01J37/045 , H01J37/3177 , H01J2237/0435 , H01J2237/31774
摘要： A blanking device for multi charged particle beams includes a first substrate, in which plural first openings are formed in an array, to form multi-beams, a second substrate in which plural second openings are formed in an array, where a corresponding beam of the multi-beams passes through each of the plural second openings, plural control electrodes, which are on the second substrate and each of which is close to a corresponding one of the plural second openings and arranged not to be directly exposed to other second opening adjacent to the corresponding one of the plural second openings, to be switchably applied with first and second potentials, plural counter electrodes, each of which is facing a corresponding one of the plural control electrodes, to be applied with the second potential, and a shield film provided between the first substrate and the plural control electrodes.

10. 发明申请

US20150193918A1 INSPECTION SYSTEM AND METHOD FOR INSPECTING LINE WIDTH AND/OR POSITIONAL ERRORS OF A PATTERN 有权
标题翻译：用于检查图案的线宽和/或位置错误的检查系统和方法
公开(公告)号：US20150193918A1
公开(公告)日：2015-07-09
申请号：US14665880
申请日：2015-03-23
申请人： NuFlare Technology, Inc. , KABUSHIKI KAISHA TOSHIBA
发明人： Takanao TOUYA , Shuichi Tamamushi , Hidenori Sato , Hiroyuki Tanizaki , Takeshi Fujiwara , Eiji Sawa , Kentaro Okuda , Hiroyuki Ikeda , Hiromu Inoue , Hiroshi Tsukada
IPC分类号： G06T7/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/9503 , G01N21/956 , G06T7/0004 , G06T7/0006 , G06T7/70 , G06T7/74 , G06T2207/10004 , G06T2207/30141 , G06T2207/30148
摘要： A method and system for imaging an object to be inspected and obtaining an optical image; creating a reference image from design pattern data; preparing an inspection recipe including one or more templates and parameter settings necessary for the inspection; checking the pattern and the template against each other, and selecting the reference image which corresponds to the template; detecting first and second edges in the selected reference image in accordance with the parameter setting using determined coordinates as a reference; detecting first and second edges in the optical image, this optical image corresponds to the selected reference image; and determining an inspection value by acquiring the difference between the line width of the optical image and the reference image using the first edge and second edge of the reference image and the first edge and second edges of the optical image.
摘要翻译：一种用于对待检查对象进行成像并获得光学图像的方法和系统; 从设计模式数据创建参考图像; 准备包括一个或多个模板和检查所需的参数设置的检查配方; 检查图案和模板，并选择与模板对应的参考图像; 根据使用确定的坐标作为参考的参数设置来检测所选参考图像中的第一和第二边缘; 检测光学图像中的第一和第二边缘，该光学图像对应于所选择的参考图像; 以及通过使用参考图像的第一边缘和第二边缘以及光学图像的第一边缘和第二边缘获取光学图像的线宽和参考图像之间的差来确定检查值。

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