专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20100112248A1 HIGHLY ABRASION-RESISTANT GRAFTED POLYOLEFIN PIPE 审中-公开
标题翻译：耐高温耐磨聚四氟乙烯管
公开(公告)号：US20100112248A1
公开(公告)日：2010-05-06
申请号：US12263161
申请日：2008-10-31
申请人： Richard Allen Hayes , Qin Lin
发明人： Richard Allen Hayes , Qin Lin
IPC分类号： B32B1/08
CPC分类号： C08F255/00 , C08F255/02 , C08L51/06 , C09D151/06 , Y10T137/0318 , Y10T428/1314 , Y10T428/1352 , Y10T428/1355 , Y10T428/1362 , Y10T428/1366 , Y10T428/1372 , Y10T428/1386 , Y10T428/1393 , Y10T442/102 , Y10T442/172 , Y10T442/184 , Y10T442/198 , C08L2666/02
摘要： A pipe or tube article comprising an innermost comprising a grafted polyolefin composition made from a grafted polyolefin composition is disclosed which can provide long lifetime, highly abrasion-resistant pipes for mining and other transportation uses. Methods for preparing the article and transporting abrasive materials through the article are also described.
摘要翻译：公开了包含由接枝聚烯烃组合物制成的接枝聚烯烃组合物的最内层的管或管制品，其可以为采矿和其它运输用途提供长寿命，高耐磨性的管道。还描述了制备物品并通过制品运送磨料的方法。

2. 发明授权

US08497005B1 Highly abrasion-resistant grafted polyolefin pipe 有权
标题翻译：高耐磨接枝聚烯烃管
公开(公告)号：US08497005B1
公开(公告)日：2013-07-30
申请号：US13534058
申请日：2012-06-27
申请人： Richard Allen Hayes , Qin Lin
发明人： Richard Allen Hayes , Qin Lin
IPC分类号： B32B1/08 , B32B15/085 , B32B15/18 , B32B15/20 , B67D99/00 , F16L9/14 , F17D1/00
CPC分类号： C08F255/00 , C08F255/02 , C08L51/06 , C09D151/06 , Y10T137/0318 , Y10T428/1314 , Y10T428/1352 , Y10T428/1355 , Y10T428/1362 , Y10T428/1366 , Y10T428/1372 , Y10T428/1386 , Y10T428/1393 , Y10T442/102 , Y10T442/172 , Y10T442/184 , Y10T442/198 , C08L2666/02
摘要： A pipe or tube article comprising an innermost comprising a grafted polyolefin composition made from a grafted polyolefin composition is disclosed which can provide long lifetime, highly abrasion-resistant pipes for mining and other transportation uses. Methods for preparing the article and transporting abrasive materials through the article are also described.
摘要翻译：公开了包含由接枝聚烯烃组合物制成的接枝聚烯烃组合物的最内层的管或管制品，其可以为采矿和其它运输用途提供长寿命，高耐磨性的管道。还描述了制备物品并通过制品运送磨料的方法。

3. 发明授权

US09097574B2 Method for calibrating large fixed electronic scale 有权
标题翻译：校准大型固定电子秤的方法
公开(公告)号：US09097574B2
公开(公告)日：2015-08-04
申请号：US13704667
申请日：2011-05-30
申请人： Jinhui Yao , Qin Lin , Jianhui Lin , Hui Chi
发明人： Jinhui Yao , Qin Lin , Jianhui Lin , Hui Chi
IPC分类号： G01G19/02 , G01G23/01
CPC分类号： G01G23/01 , G01G19/02
摘要： A method for calibrating large fixed electronic scale is provided. The method applies an auxiliary verification device to calibrate the large fixed electronic scale without using a weight and includes following steps of: loading and unloading every supporting point on the scale table board of the scale by at least one self-locating loading and unloading mechanism; measuring and displaying a load that each loading and unloading mechanisms applies to the scale table board by at least one high accuracy load gauge; controlling a size of the load that each loading and unloading mechanisms applies to the scale table board by a constant load control device; and comparing a precise load displayed by the high accuracy load gauge with a gauge weighing display value of the scale to obtain a calibration error of the scale. The present method greatly improves working efficiency and safety and reduces costs.
摘要翻译：提供了一种用于校准大型固定电子秤的方法。该方法采用辅助验证装置，不使用重量校准大型固定电子秤，包括以下步骤：通过至少一个自定位装卸机构对秤上秤台上的每个支撑点进行装卸; 测量和显示每个装载和卸载机构通过至少一个高精度负载表适用于秤台板的负载; 通过恒定负载控制装置控制每个装载和卸载机构应用于秤台的负载尺寸; 并将由高精度负载表显示的精确负载与秤的称重显示值进行比较，以获得刻度的校准误差。本方法大大提高了工作效率和安全性，降低了成本。

4. 发明授权

US08808969B2 Method of making radiation-sensitive sol-gel materials 有权
标题翻译：制造辐射敏感溶胶凝胶材料的方法
公开(公告)号：US08808969B2
公开(公告)日：2014-08-19
申请号：US13443533
申请日：2012-04-10
申请人： Qin Lin , Yubao Wang , Tony D. Flaim
发明人： Qin Lin , Yubao Wang , Tony D. Flaim
IPC分类号： G03F7/26 , G03F7/075 , G03F7/20
CPC分类号： G03F7/075 , G03F7/0045 , G03F7/038 , G03F7/0757 , G03F7/11 , G03F7/20
摘要： Radiation-sensitive sol-gel compositions are provided, along with methods of forming microelectronic structures and the structures thus formed. The compositions comprise a sol-gel compound and a base generator dispersed or dissolved in a solvent system. The sol-gel compound comprises recurring monomeric units comprising silicon with crosslinkable moieties bonded to the silicon. Upon exposure to radiation, the base generator generates a strong base, which crosslinks the sol-gel compound in the compositions to yield a crosslinked layer that is insoluble in developers or solvents. The unexposed portions of the layer can be removed to yield a patterned sol-gel layer. The invention can be used to form patterns from sol-gel materials comprising features having feature sizes of less than about 1 μm.
摘要翻译：提供了辐射敏感的溶胶 - 凝胶组合物，以及形成微电子结构和如此形成的结构的方法。组合物包含分散或溶解在溶剂体系中的溶胶 - 凝胶化合物和碱产生剂。溶胶 - 凝胶化合物包括具有与硅结合的可交联部分的包含硅的重复单体单元。暴露于辐射后，基底发生器产生强碱，其使组合物中的溶胶 - 凝胶化合物交联，得到不溶于显影剂或溶剂的交联层。可以除去该层的未曝光部分以产生图案化的溶胶 - 凝胶层。本发明可用于形成包含特征尺寸小于约1μm的特征的溶胶 - 凝胶材料的图案。

5. 发明授权

US08192843B2 Polymers and polymer coatings 有权
标题翻译：聚合物和聚合物涂料
公开(公告)号：US08192843B2
公开(公告)日：2012-06-05
申请号：US13026615
申请日：2011-02-14
申请人： Christopher K. Ober , Sitaraman Krishnan , Qin Lin
发明人： Christopher K. Ober , Sitaraman Krishnan , Qin Lin
IPC分类号： B32B27/30 , C08F293/00 , C09D5/16
CPC分类号： A01N37/12 , A01N37/16 , A01N37/36 , C08F8/00 , C08F8/02 , C08F8/04 , C08F8/08 , C08F8/10 , C08F8/12 , C08F8/18 , C08F8/24 , C08F8/32 , C08F287/00 , C08F297/04 , C08L51/006 , C08L53/02 , C09D5/1637 , C09D5/1668 , C09D151/006 , C09D153/02 , Y10T428/3154 , C08L2666/02 , C08F297/026 , C08F8/14 , C08F8/30 , C08F297/046 , C08F297/02
摘要： The invention provides polymers, methods of preparing polymers, and compositions that include polymers, wherein said polymers include a plurality of two-carbon repeating units in a polymer chain, wherein one or more of the two-carbon repeating units of the polymer chain have a substituent that is covalently bonded to a semifluorinated alkyl ethoxy moiety, and the semifluorinated alkyl ethoxy moiety is attached to the polymer chain substituent through an ester, amide, ketone, carbamate, amine, or other suitable linking group. The polymers can be used to provide antifouling coatings.
摘要翻译：本发明提供聚合物，制备聚合物的方法和包括聚合物的组合物，其中所述聚合物包括聚合物链中的多个二碳重复单元，其中聚合物链的两个碳重复单元中的一个或多个具有共价键合到半氟代烷基乙氧基部分上的取代基，半氟代烷基乙氧基部分通过酯，酰胺，酮，氨基甲酸酯，胺或其它合适的连接基团连接到聚合物链取代基上。聚合物可用于提供防污涂料。

6. 发明授权

US08191598B2 Heat sealing jaw apparatus 有权
标题翻译：热封钳装置
公开(公告)号：US08191598B2
公开(公告)日：2012-06-05
申请号：US12220606
申请日：2008-07-25
申请人： James William Sadler , Qin Lin , Gordon Charles Bird , Victor Wayne McCarron
发明人： James William Sadler , Qin Lin , Gordon Charles Bird , Victor Wayne McCarron
IPC分类号： B32B37/00 , B29C65/00
CPC分类号： B65B51/146 , B29C59/007 , B29C65/18 , B29C65/224 , B29C65/226 , B29C65/74 , B29C65/76 , B29C66/0044 , B29C66/1122 , B29C66/346 , B29C66/3472 , B29C66/43 , B29C66/4312 , B29C66/71 , B29C66/7234 , B29C66/73921 , B29C66/80 , B29C66/8122 , B29C66/81422 , B29C66/81427 , B29C66/81457 , B29C66/8181 , B29C66/81811 , B29C66/81821 , B29C66/81871 , B29C66/83221 , B29C66/849 , B29C2793/009 , B29K2023/083 , B29K2023/086 , B29K2067/00 , B29K2077/00 , B29K2101/12 , B29K2995/0039 , B29L2031/712 , B31B70/00 , B31B70/14 , B31B70/20 , B31B70/64 , B31B70/642 , B31B70/81 , B31B2155/00 , B31B2155/002 , B31B2160/10 , B29K2827/18 , B29K2909/08 , B29K2067/003
摘要： A heat sealing jaw for use in cooperation with an opposing backing jaw for sealing layers of film together is described. The heat sealing jaw may be suitable for forming an easy-open feature on a packaging pouch used to contain flowable material. In certain embodiments the heat sealing jaw comprises a jaw body, a heat sealing element secured to the jaw body, a support surface for clamping the layers of film together against the opposing backing jaw, and, a heat sink coupled to the heat sealing element for inducing a temperature gradient along a sealing face of the heat sealing element. The sealing face may have a protrusion for forming a notch within the layers of film. Related apparatuses and methods are also described.
摘要翻译：描述了用于与相对的背衬颚配合使用以将薄膜层一起密封的热封颚。热封颚可适用于在用于容纳可流动材料的包装袋上形成容易开启的特征。在某些实施例中，热封钳口包括钳口体，固定到钳口本体的热封元件，用于将膜层夹在一起抵靠相对的背衬钳口的支撑表面，以及联接到热封元件的散热器沿着热封元件的密封面引起温度梯度。密封面可以具有用于在膜的层内形成切口的突起。还描述了相关的装置和方法。

7. 发明申请

US20090049800A1 Heat sealing jaw, apparatus and method 有权
标题翻译：热封颚，装置和方法
公开(公告)号：US20090049800A1
公开(公告)日：2009-02-26
申请号：US12220606
申请日：2008-07-25
申请人： James William Sadler , Qin Lin , Gordon Charles Bird , Victor Wayne McCarron
发明人： James William Sadler , Qin Lin , Gordon Charles Bird , Victor Wayne McCarron
IPC分类号： B65B51/10 , B31B1/64 , B65B7/02
CPC分类号： B65B51/146 , B29C59/007 , B29C65/18 , B29C65/224 , B29C65/226 , B29C65/74 , B29C65/76 , B29C66/0044 , B29C66/1122 , B29C66/346 , B29C66/3472 , B29C66/43 , B29C66/4312 , B29C66/71 , B29C66/7234 , B29C66/73921 , B29C66/80 , B29C66/8122 , B29C66/81422 , B29C66/81427 , B29C66/81457 , B29C66/8181 , B29C66/81811 , B29C66/81821 , B29C66/81871 , B29C66/83221 , B29C66/849 , B29C2793/009 , B29K2023/083 , B29K2023/086 , B29K2067/00 , B29K2077/00 , B29K2101/12 , B29K2995/0039 , B29L2031/712 , B31B70/00 , B31B70/14 , B31B70/20 , B31B70/64 , B31B70/642 , B31B70/81 , B31B2155/00 , B31B2155/002 , B31B2160/10 , B29K2827/18 , B29K2909/08 , B29K2067/003
摘要： A heat sealing jaw for use in cooperation with an opposing backing jaw for sealing layers of film together is described. The heat sealing jaw may be suitable for forming an easy-open feature on a packaging pouch used to contain flowable material. In certain embodiments the heat sealing jaw comprises a jaw body, a heat sealing element secured to the jaw body, a support surface for clamping the layers of film together against the opposing backing jaw, and, a heat sink coupled to the heat sealing element for inducing a temperature gradient along a sealing face of the heat sealing element. The sealing face may have a protrusion for forming a notch within the layers of film. Related apparatuses and methods are also described.
摘要翻译：描述了用于与相对的背衬颚配合使用以将薄膜层一起密封的热封颚。热封颚可适用于在用于容纳可流动材料的包装袋上形成容易开启的特征。在某些实施例中，热封钳口包括钳口体，固定到钳口本体的热封元件，用于将膜层夹在一起抵靠相对的背衬钳口的支撑表面，以及联接到热封元件的散热器沿着热封元件的密封面引起温度梯度。密封面可以具有用于在膜的层内形成切口的突起。还描述了相关的装置和方法。

8. 发明申请

US20070272233A1 Method and apparatus for solar collector with integral stagnation temperature control 有权
标题翻译：具有整体停滞温度控制的太阳能集热器的方法和装置
公开(公告)号：US20070272233A1
公开(公告)日：2007-11-29
申请号：US11511493
申请日：2006-08-29
申请人： Stephen Harrison , Qin Lin , Lucio Mesquita , David Valletta
发明人： Stephen Harrison , Qin Lin , Lucio Mesquita , David Valletta
IPC分类号： F24J2/40
CPC分类号： F24S10/50 , F24S40/53 , F24S50/40 , Y02E10/44
摘要： This invention relates to a method and apparatus for a solar collector having intergral control of the maximum temperature that it can reach, thereby avoiding excessive stagnation temperatures in the collector. In one embodiment, a solar collector comprises a top portion comprising glazing, a bottom portion; an absorber disposed between said top portion and said bottom portion for absorbing solar energy received through said glazing, said absorber in a spaced relationship above said bottom portion such that a channel is defined between a lower surface of said absorber and an upper surface of said bottom portion; an inlet and an outlet associated with and at substantially opposite ends of said channel between said absorber and said bottom portion, for ventilating said channel; and a damper for opening said outlet at a temperature equal to or above a first selected temperature and for closing said outlet at a temperature equal to or below a second selected temperature; wherein said first and second selected temperatures are below a stagnation temperature of the solar collector.
摘要翻译：本发明涉及一种用于太阳能集热器的方法和装置，其具有可达到的最高温度的整体控制，从而避免了集电器中的过度停滞温度。在一个实施例中，太阳能收集器包括顶部，其包括玻璃窗，底部; 吸收器，设置在所述顶部和所述底部之间，用于吸收通过所述窗玻璃收到的太阳能，所述吸收体在所述底部部分之上以间隔开的关系形成，使得通道限定在所述吸收体的下表面和所述底部的上表面之间一部分; 与所述吸收器和所述底部之间的所述通道相关联的入口和出口，用于使所述通道通风; 以及用于在等于或高于第一选定温度的温度下打开所述出口并在等于或低于第二选定温度的温度下关闭所述出口的阻尼器; 其中所述第一和第二选定温度低于所述太阳能收集器的停滞温度。

9. 发明授权

US09640396B2 Spin-on spacer materials for double- and triple-patterning lithography 有权
公开(公告)号：US09640396B2
公开(公告)日：2017-05-02
申请号：US12652464
申请日：2010-01-05
申请人： Qin Lin , Rama Puligadda , James Claypool , Douglas J. Guerrero , Brian Smith
发明人： Qin Lin , Rama Puligadda , James Claypool , Douglas J. Guerrero , Brian Smith
IPC分类号： H01L21/308 , B31D3/00 , H01L21/311 , H01L21/033 , C08G77/20 , G03F7/40 , H01L21/312
CPC分类号： H01L21/0337 , C08G77/20 , G03F7/40 , H01L21/0338 , H01L21/3121
摘要： Novel double- and triple-patterning methods are provided. The methods involve applying a shrinkable composition to a patterned template structure (e.g., a structure having lines) and heating the composition. The shrinkable composition is selected to possess properties that will cause it to shrink during heating, thus forming a conformal layer over the patterned template structure. The layer is then etched to leave behind pre-spacer structures, which comprise the features from the pattern with remnants of the shrinkable composition adjacent the feature sidewalls. The features are removed, leaving behind a doubled pattern. In an alternative embodiment, an extra etch step can be carried out prior to formation of the features on the template structure, thus allowing the pattern to be tripled rather than doubled.

10. 发明授权

US08836082B2 Reversal lithography approach by selective deposition of nanoparticles 有权
标题翻译：通过选择性沉积纳米粒子的反转光刻方法
公开(公告)号：US08836082B2
公开(公告)日：2014-09-16
申请号：US13017903
申请日：2011-01-31
申请人： Qin Lin , Daniel M. Sullivan , Hao Xu , Tony D. Flaim
发明人： Qin Lin , Daniel M. Sullivan , Hao Xu , Tony D. Flaim
IPC分类号： H01L29/02 , B82Y10/00 , B82Y30/00
CPC分类号： B82Y30/00 , B82Y10/00
摘要： A novel reversal lithography process without etch back is described. The reversal material comprises nanoparticles that are selectively deposited into the gaps between features without overcoating the tops of the features. As a result, a patterned imaging layer can be removed using solvent, blanket exposure followed by developer washing, or dry etching directly, without an etch-back process, and the original bright field lithography pattern can be reversed into dark field features, and transferred into subsequent layers using the nanoparticle reversal material as an etch mask.
摘要翻译：描述了没有回蚀的新型反转光刻工艺。反转材料包括纳米颗粒，其被选择性地沉积到特征之间的间隙中，而不覆盖特征的顶部。结果，可以使用溶剂，毯式曝光，显影剂洗涤或直接干法蚀刻，而不用蚀刻工艺去除图案化成像层，并且原始的明视野光刻图案可以反转成暗场特征，并转移使用纳米颗粒反转材料作为蚀刻掩模进入后续层。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式