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1. 发明申请

US20150262606A1 TEMPLATES FOR PATTERNED MEDIA 有权
标题翻译：模式媒体模式
公开(公告)号：US20150262606A1
公开(公告)日：2015-09-17
申请号：US14728908
申请日：2015-06-02
申请人： Seagate Technology LLC
发明人： Shuaigang Xiao , XiaoMin Yang , ZhaoNing Yu , Yautzong Hsu
IPC分类号： G11B5/855 , G11B5/74
CPC分类号： G11B5/855 , G03F7/0002 , G11B5/746 , H01L21/00 , H01L21/302 , Y10T428/24802 , Y10T428/24926
摘要： Provided herein are apparatuses and methods, including patterning a first set of features in a servo zone to form a patterned servo zone while a first mask protects a data zone from the patterning. The first mask may be removed from the data zone. The apparatuses and methods may further include patterning a second set of features in the data zone to form a patterned data zone while a second mask protects the patterned servo zone from the patterning.
摘要翻译：本文提供了装置和方法，包括在伺服区中图形化第一组特征以形成图案化的伺服区，而第一掩模保护数据区免受图案化。可以从数据区域中删除第一个掩码。装置和方法还可以包括在数据区中图形化第二组特征以形成图案化数据区，而第二掩模保护图案化的伺服区免受图案化。

2. 发明申请

US20150116690A1 BIT PATTERNED MEDIA TEMPLATE INCLUDING ALIGNMENT MARK AND METHOD OF USING SAME 有权
标题翻译：位图形媒体模板，包括对齐标记及其使用方法
公开(公告)号：US20150116690A1
公开(公告)日：2015-04-30
申请号：US14068050
申请日：2013-10-31
申请人： SEAGATE TECHNOLOGY LLC
发明人： HongYing Wang , Kim Y Lee , Yautzong Hsu , Nobuo Kurataka , Gennady Gauzner , Shuaigang Xiao
IPC分类号： G03F7/20 , G11B27/24
CPC分类号： G03F7/70141 , G03F7/0002 , G03F9/7042 , G03F9/7076 , G11B5/855
摘要： A method is disclosed that includes forming at least one substrate alignment mark and at least one lithography alignment mark in a substrate; forming a seed layer on the substrate; and forming a guide pattern and at least one guide pattern alignment mark in the seed layer, where the at least one guide pattern alignment mark is formed over the at least one substrate alignment mark. The method further includes determining an alignment error of the at least one guide pattern alignment mark relative to the at least one substrate alignment mark; and patterning features on at least one region of the substrate, where the features are positioned on the substrate based on the at least one lithography alignment mark and the alignment error.
摘要翻译：公开了一种方法，其包括在衬底中形成至少一个衬底对准标记和至少一个光刻对准标记; 在所述基板上形成种子层; 以及在所述种子层中形成引导图案和至少一个引导图案对准标记，其中所述至少一个引导图案对准标记形成在所述至少一个基板对准标记上。所述方法还包括确定所述至少一个引导图案对准标记相对于所述至少一个基板对准标记的对准误差; 以及在所述基板的至少一个区域上构图特征，其中所述特征基于所述至少一个光刻对准标记和所述对准误差位于所述基板上。

3. 发明申请

US20170125049A1 APPARATUS FOR METHODS FOR ALIGNED SERVO-RELATED FEATURES 有权
公开(公告)号：US20170125049A1
公开(公告)日：2017-05-04
申请号：US15403040
申请日：2017-01-10
申请人： Seagate Technology LLC
发明人： Shuaigang Xiao , David S. Kuo , XiaoMin Yang , Kim Y. Lee , Yautzong Hsu , Koichi Wago
IPC分类号： G11B5/596 , G11B20/12
CPC分类号： G11B5/59638 , G11B5/59655 , G11B5/746 , G11B5/84 , G11B5/855 , G11B20/1217 , G11B2020/1281
摘要： Provided herein is a method, including creating a first pattern in a data region of a substrate, and creating a second pattern in a servo region of a substrate. A circumferential line pattern is created overlapping the first pattern to create rectangle-shaped protrusions in the data region of the substrate. A chevron pattern is created overlapping the second pattern to create chevron-derived protrusions in the servo region of the substrate.

4. 发明授权

US09620161B2 Apparatus and methods for aligned servo-related features 有权
公开(公告)号：US09620161B2
公开(公告)日：2017-04-11
申请号：US14824995
申请日：2015-04-16
申请人： Seagate Technology LLC
发明人： Shuaigang Xiao , David S. Kuo , XiaoMin Yang , Kim Y. Lee , Yautzong Hsu , Koichi Wago
IPC分类号： G11B5/74 , G11B5/596 , G11B5/84
CPC分类号： G11B5/59638 , G11B5/59655 , G11B5/746 , G11B5/84 , G11B5/855 , G11B20/1217 , G11B2020/1281
摘要： Provided herein is an apparatus, including a first region of a substrate corresponding to a data region in a patterned recording medium; a first set of protrusions etched out of the first region of the substrate, wherein the protrusions of the first set of protrusions are rectangle shaped; a second region of the substrate corresponding to a servo region in a patterned recording medium; and a second set of protrusions etched out of the second region of the substrate, wherein the second set of protrusions includes radial lines etched into the substrate across chevrons etched out of the substrate.

5. 发明申请

US20160181102A1 HARD-MASK DEFINED BIT PATTERN SUBSTRATE 有权
公开(公告)号：US20160181102A1
公开(公告)日：2016-06-23
申请号：US15055303
申请日：2016-02-26
申请人： Seagate Technology LLC
发明人： XiaoMin Yang , Shuaigang Xiao , Yautzong Hsu , Zhaoning Yu , Kim Y. Lee , David S. Kuo
IPC分类号： H01L21/033
CPC分类号： H01L21/0338 , G03F7/0002 , G11B5/746 , H01L21/0332 , H01L21/0335 , H01L21/0337
摘要： Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.

6. 发明申请

US20160069929A1 CALIBRATION STANDARD WITH PRE-DETERMINED FEATURES 审中-公开
标题翻译：具有预先确定的特征的校准标准
公开(公告)号：US20160069929A1
公开(公告)日：2016-03-10
申请号：US14783403
申请日：2013-04-17
申请人： SEAGATE TECHNOLOGY LLC
发明人： Gennady Gauzner , Zhaoning Yu , Nobuo Kurataka , David S. Kuo , Kim Y. Lee , Yautzong Hsu , Hong Ying Wang
IPC分类号： G01Q40/02 , G01N21/01 , H01J37/26
CPC分类号： G01Q40/02 , G01N21/01 , G01N2201/13 , G01Q40/00 , G03F7/0002 , H01J37/261 , H01J37/263 , H01J2237/2602 , H01J2237/2826
摘要： Provided herein in an apparatus, including a substrate; a functional layer, wherein the functional layer has a composition characteristic of a workpiece of an analytical apparatus; and pre-determined features configured to calibrate the analytical apparatus. Also provided herein is an apparatus, including a functional layer overlying a substrate; and pre-determined features for calibration of an analytical apparatus configured to measure the surface of a workpiece, wherein the functional layer has a composition similar to the workpiece. Also provided herein is a method, including providing a lithographic calibration standard having a functional layer to an analytical apparatus, wherein the functional layer has a composition characteristic of a workpiece of the analytical apparatus; providing calibration standard specifications to a computer interfaced with the analytical apparatus; and calibrating the analytical apparatus in accordance with calibration standard readings and the calibration standard specifications.
摘要翻译：本文提供的装置包括基板; 功能层，其中所述功能层具有分析装置的工件的成分特征; 以及配置成校准分析装置的预定特征。本文还提供了一种装置，包括覆盖衬底的功能层; 以及用于校准配置成测量工件表面的分析装置的预定特征，其中所述功能层具有类似于所述工件的组成。本文还提供了一种方法，包括向分析装置提供具有功能层的光刻校准标准，其中功能层具有分析装置的工件的成分特征; 向与分析仪器连接的计算机提供校准标准规格; 并根据校准标准读数和校准标准规格校准分析仪器。

7. 发明授权

US08964515B2 Method and system for optical calibration 有权
标题翻译：光学校准的方法和系统
公开(公告)号：US08964515B2
公开(公告)日：2015-02-24
申请号：US14141834
申请日：2013-12-27
申请人： Seagate Technology LLC
发明人： Hamid Ghazvini , David Kuo , Minh Huong Le , Kim Yang Lee , HongYing Wang , Nobuo Kurataka , Yautzong Hsu , Henry Hung Yang
IPC分类号： G11B20/00 , G06K5/00 , G11B27/36 , G11B5/84 , G11B5/855 , G11B20/18 , G11B5/74
CPC分类号： G06K5/00 , G11B5/746 , G11B5/82 , G11B5/84 , G11B5/855 , G11B20/182 , G11B27/36 , G11B2220/2516
摘要： A system and method of calibrating optical measuring equipment includes optically measuring discrete objects of a first known predictable pattern from a calibration apparatus, wherein the first known predictable pattern is a bit pattern. A recording surface optical reader is calibrated based on the optically measuring. Using the first known predictable pattern, contamination is filtered from the results of the optically measuring.
摘要翻译：校准光学测量设备的系统和方法包括从校准装置光学测量第一已知可预测图案的离散物体，其中第一已知可预测图案是位图案。基于光学测量校准记录表面光学读取器。使用第一已知的可预测模式，从光学测量的结果中滤去污染物。

8. 发明申请

US20210245109A1 HIGH-FLUX EFFICIENCY FILTER FABRICATION USING A FLIP BOND PROCESS WITH SUPPORTIVE STRUCTURE 有权
公开(公告)号：US20210245109A1
公开(公告)日：2021-08-12
申请号：US16924839
申请日：2020-07-09
申请人： Seagate Technology LLC
发明人： Thomas Young Chang , Kim Yang Lee , Tan G. Liu , Yautzong Hsu , Shuaigang Xiao
IPC分类号： B01D67/00 , B01D61/14 , B01D69/06 , B01D71/02 , B01D69/02
摘要： A first wafer has a first stop layer deposited on a substrate, the substrate used to form a base support structure. A second wafer has a second stop layer deposited on a sacrificial substrate, and a filter layer deposited on the second stop layer. A rib layer is deposited on one of: the first stop layer of the first layer; or a third stop layer that is deposited over the filter layer. A rib pattern is formed in the rib layer. The first and second wafers are flip bonded such that the rib pattern is joined between the filter layer and the first stop layer. Elongated voids are formed within the filter layer. The base support structure is formed within the substrate of the first wafer such that there is a fluid flow path between the base support structure, the rib layer, and the elongated voids of the filter layer.

9. 发明授权

US09964855B2 Bit patterned media template including alignment mark and method of using same 有权
公开(公告)号：US09964855B2
公开(公告)日：2018-05-08
申请号：US15289505
申请日：2016-10-10
申请人： SEAGATE TECHNOLOGY LLC
发明人： HongYing Wang , Kim Y. Lee , Yautzong Hsu , Nobuo Kurataka , Gennady Gauzner , Shuaigang Xiao
IPC分类号： G11B5/855 , G03F7/20 , G03F9/00 , G03F7/00
CPC分类号： G03F7/70141 , G03F7/0002 , G03F9/7042 , G03F9/7076 , G11B5/855
摘要： A method is disclosed that includes forming at least one substrate alignment mark and at least one lithography alignment mark in a substrate; forming a seed layer on the substrate; and forming a guide pattern and at least one guide pattern alignment mark in the seed layer, where the at least one guide pattern alignment mark is formed over the at least one substrate alignment mark. The method further includes determining an alignment error of the at least one guide pattern alignment mark relative to the at least one substrate alignment mark; and patterning features on at least one region of the substrate, where the features are positioned on the substrate based on the at least one lithography alignment mark and the alignment error.

10. 发明授权

US09928867B2 Templates for patterned media 有权
公开(公告)号：US09928867B2
公开(公告)日：2018-03-27
申请号：US14728908
申请日：2015-06-02
申请人： Seagate Technology LLC
发明人： Shuaigang Xiao , XiaoMin Yang , ZhaoNing Yu , Yautzong Hsu
IPC分类号： G11B5/855 , G11B5/74 , H01L21/00 , H01L21/302 , G03F7/00
CPC分类号： G11B5/855 , G03F7/0002 , G11B5/746 , H01L21/00 , H01L21/302 , Y10T428/24802 , Y10T428/24926
摘要： Provided herein are apparatuses and methods, including patterning a first set of features in a servo zone to form a patterned servo zone while a first mask protects a data zone from the patterning. The first mask may be removed from the data zone. The apparatuses and methods may further include patterning a second set of features in the data zone to form a patterned data zone while a second mask protects the patterned servo zone from the patterning.

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