专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07955112B2 Card-edge connector having latches interlocked with printed circuit board 失效
标题翻译：卡边连接器具有与印刷电路板互锁的闩锁
公开(公告)号：US07955112B2
公开(公告)日：2011-06-07
申请号：US12648312
申请日：2009-12-29
申请人： Sheng-Ho Yang , Chia-Shih Lin
发明人： Sheng-Ho Yang , Chia-Shih Lin
IPC分类号： H01R13/62
CPC分类号： H01R12/721 , H01R4/185 , H01R12/7023
摘要： An electrical connector includes an insulative housing and at least one terminal, the insulative housing having a front face, at least one cavity and at least one receiving slot formed in the front face for receiving a printed circuit board and communicating with the cavity. The terminal retained in the respective cavity has a base portion, a contact portion extending into the receiving slot for resiliently abutting against the printed circuit board and a tail portion extending rearward from the base portion. The insulative housing has at least one lock arm formed integral therewith to fasten the printed circuit board.
摘要翻译：电连接器包括绝缘壳体和至少一个端子，绝缘壳体具有前表面，至少一个空腔和形成在前表面中的至少一个接收槽，用于接收印刷电路板并与空腔连通。保持在相应空腔中的端子具有基部，延伸到接收槽中的接触部分，用于弹性地抵靠印刷电路板，以及从基部向后延伸的尾部。绝缘壳体具有与其一体形成的至少一个锁定臂，用于固定印刷电路板。

2. 发明申请

US20090279149A1 Scanner with Simplified Document Feeding Path 失效
标题翻译：具有简化文档馈送路径的扫描仪
公开(公告)号：US20090279149A1
公开(公告)日：2009-11-12
申请号：US12463362
申请日：2009-05-08
申请人： Yen-Cheng Chen , Ting-Kuo Chu , Chia-Shih Lin , Chun-Chieh Liao
发明人： Yen-Cheng Chen , Ting-Kuo Chu , Chia-Shih Lin , Chun-Chieh Liao
IPC分类号： H04N1/04
CPC分类号： H04N1/00572 , H04N1/0058 , H04N1/00596 , H04N1/00602 , H04N1/0464 , H04N1/121 , H04N1/193 , H04N2201/0446
摘要： A scanner with a simplified document feeding path is provided for scanning a document. The scanner includes a paper path, a conveying mechanism, an optical module and a scan window. The conveying mechanism conveys the document along the paper path. The optical module, rotatably disposed, captures an image of the document conveyed to a first position and a second position in the paper path, wherein the optical module captures a front-side image of the document at the first position and a back-side image of the document at the second position. The scan window, mounted on the optical module, is turned toward the first position and the second position as the optical module rotates, and the optical module captures the image of the document through the scan window.
摘要翻译：提供具有简化文件馈送路径的扫描仪用于扫描文档。扫描器包括纸路径，传送机构，光学模块和扫描窗口。输送机构沿着纸张路径传送文件。可旋转地设置的光学模块捕获传送到纸通道中的第一位置和第二位置的原稿的图像，其中光学模块在第一位置处捕获原稿的正面图像和背面图像的文件在第二个位置。当光学模块旋转时，安装在光学模块上的扫描窗口朝向第一位置和第二位置转动，并且光学模块通过扫描窗口捕获文档的图像。

3. 发明授权

US08233202B2 Scanner with simplified document feeding path 失效
标题翻译：扫描仪具有简化的文件馈送路径
公开(公告)号：US08233202B2
公开(公告)日：2012-07-31
申请号：US12463362
申请日：2009-05-08
申请人： Yen-Cheng Chen , Ting-Kuo Chu , Chia-Shih Lin , Chun-Chieh Liao
发明人： Yen-Cheng Chen , Ting-Kuo Chu , Chia-Shih Lin , Chun-Chieh Liao
IPC分类号： H04N1/04 , H04N1/40 , H04N1/46 , G01N21/00
CPC分类号： H04N1/00572 , H04N1/0058 , H04N1/00596 , H04N1/00602 , H04N1/0464 , H04N1/121 , H04N1/193 , H04N2201/0446
摘要： A scanner with a simplified document feeding path is provided for scanning a document. The scanner includes a paper path, a conveying mechanism, an optical module and a scan window. The conveying mechanism conveys the document along the paper path. The optical module, rotatably disposed, captures an image of the document conveyed to a first position and a second position in the paper path, wherein the optical module captures a front-side image of the document at the first position and a back-side image of the document at the second position. The scan window, mounted on the optical module, is turned toward the first position and the second position as the optical module rotates, and the optical module captures the image of the document through the scan window.
摘要翻译：提供具有简化文件馈送路径的扫描仪用于扫描文档。扫描器包括纸路径，传送机构，光学模块和扫描窗口。输送机构沿着纸张路径传送文件。可旋转地设置的光学模块捕获传送到纸通道中的第一位置和第二位置的原稿的图像，其中光学模块在第一位置处捕获原稿的正面图像和背面图像的文件在第二个位置。当光学模块旋转时，安装在光学模块上的扫描窗口朝向第一位置和第二位置转动，并且光学模块通过扫描窗口捕获文档的图像。

4. 发明申请

US20120051621A1 RENDERED DATABASE IMAGE-TO-INSPECTION IMAGE OPTIMIZATION FOR INSPECTION 有权
标题翻译：用于检查的渲染数据库图像到检查图像优化
公开(公告)号：US20120051621A1
公开(公告)日：2012-03-01
申请号：US12868483
申请日：2010-08-25
申请人： Biow-Hiem Ong , Rick Lai , Chih-Chiang Tu , Chia-Shih Lin , Jong-Yuh Chang
发明人： Biow-Hiem Ong , Rick Lai , Chih-Chiang Tu , Chia-Shih Lin , Jong-Yuh Chang
IPC分类号： G06K9/00
CPC分类号： G03F1/84 , G06T7/001 , G06T2207/30148
摘要： The present disclosure provides a method of inspecting a photolithographic mask wherein a design database is received, and a feature of the design database is adjusted by a bias factor to produce a biased database. Image rendering is performed on the biased database to produce a biased image. A mask is also created using the design database, and the mask is imaged to produce a mask image. The biased image is compared to the mask image, and a new value for the bias factor may be determined based on the comparison.
摘要翻译：本公开提供了一种检查其中接收到设计数据库的光刻掩模的方法，并且通过偏置因子来调整设计数据库的特征以产生偏置的数据库。在偏置数据库上执行图像渲染以产生偏置图像。还使用设计数据库创建掩模，并对掩模进行成像以产生掩模图像。将偏置图像与掩模图像进行比较，并且可以基于比较来确定偏置因子的新值。

5. 发明授权

US08818072B2 Rendered database image-to-inspection image optimization for inspection 有权
标题翻译：渲染数据库图像到检查图像优化进行检查
公开(公告)号：US08818072B2
公开(公告)日：2014-08-26
申请号：US12868483
申请日：2010-08-25
申请人： Biow-Hiem Ong , Rick Lai , Chih-Chiang Tu , Chia-Shih Lin , Jong-Yuh Chang
发明人： Biow-Hiem Ong , Rick Lai , Chih-Chiang Tu , Chia-Shih Lin , Jong-Yuh Chang
IPC分类号： G06K9/00
CPC分类号： G03F1/84 , G06T7/001 , G06T2207/30148
摘要： The present disclosure provides a method of inspecting a photolithographic mask wherein a design database is received, and a feature of the design database is adjusted by a bias factor to produce a biased database. Image rendering is performed on the biased database to produce a biased image. A mask is also created using the design database, and the mask is imaged to produce a mask image. The biased image is compared to the mask image, and a new value for the bias factor may be determined based on the comparison.
摘要翻译：本公开提供了一种检查其中接收到设计数据库的光刻掩模的方法，并且通过偏置因子来调整设计数据库的特征以产生偏置的数据库。在偏置数据库上执行图像渲染以产生偏置图像。还使用设计数据库创建掩模，并对掩模进行成像以产生掩模图像。将偏置图像与掩模图像进行比较，并且可以基于比较来确定偏置因子的新值。

6. 发明授权

US07611362B2 Electrical connector 失效
标题翻译：电连接器
公开(公告)号：US07611362B2
公开(公告)日：2009-11-03
申请号：US12215212
申请日：2008-06-25
申请人： Chia-Shih Lin
发明人： Chia-Shih Lin
IPC分类号： H01R12/00
CPC分类号： H01R12/7047 , H01R12/7029 , H01R12/712
摘要： An electrical connector comprises a dielectric housing comprising a mating face, a rear face opposed to said mating face, and a plurality of first passages extending from said rear face to said mating face, a plurality of first conductive contacts respectively secured in said dielectric housing, wherein said first conductive contacts are manufactured according to the same specification, each first conductive contact comprises a retaining portion, a contacting portion extending from a end of said retaining portion, and a mounting portion extending from the end opposite to said contacting portion, wherein said retaining portions and contacting portions of said first conductive contacts are respectively inserted into corresponding said first passages at different depths, said retaining portion secured in corresponding said first passage, said contacting portion exposed in corresponding first passage, said mounting portion extending out from said rear face.
摘要翻译：电连接器包括绝缘壳体，其包括配合面，与所述配合面相对的后表面以及从所述后表面延伸到所述配合面的多个第一通道，分别固定在所述介电壳体中的多个第一导电触头，其中所述第一导电触点根据相同的说明书制造，每个第一导电触头包括保持部分，从所述保持部分的端部延伸的接触部分和从与所述接触部分相对的端部延伸的安装部分，其中所述所述第一导电触头的保持部分和接触部分分别以不同的深度插入对应的所述第一通道中，所述保持部分固定在对应的所述第一通道中，所述接触部分暴露在相应的第一通道中，所述安装部分从所述后表面。

7. 发明申请

US20080318452A1 Electrical connector 失效
标题翻译：电连接器
公开(公告)号：US20080318452A1
公开(公告)日：2008-12-25
申请号：US12215212
申请日：2008-06-25
申请人： Chia-Shih Lin
发明人： Chia-Shih Lin
IPC分类号： H01R12/00
CPC分类号： H01R12/7047 , H01R12/7029 , H01R12/712
摘要： An electrical connector comprises a dielectric housing comprising a mating face, a rear face opposed to said mating face, and a plurality of first passages extending from said rear face to said mating face, a plurality of first conductive contacts respectively secured in said dielectric housing, wherein said first conductive contacts are manufactured according to the same specification, each first conductive contact comprises a retaining portion, a contacting portion extending from a end of said retaining portion, and a mounting portion extending from the end opposite to said contacting portion, wherein said retaining portions and contacting portions of said first conductive contacts are respectively inserted into corresponding said first passages at different depths, said retaining portion secured in corresponding said first passage, said contacting portion exposed in corresponding first passage, said mounting portion extending out from said rear face.
摘要翻译：电连接器包括绝缘壳体，其包括配合面，与所述配合面相对的后表面以及从所述后表面延伸到所述配合面的多个第一通道，分别固定在所述介电壳体中的多个第一导电触头，其中所述第一导电触点根据相同的说明书制造，每个第一导电触头包括保持部分，从所述保持部分的端部延伸的接触部分和从与所述接触部分相对的端部延伸的安装部分，其中所述所述第一导电触头的保持部分和接触部分分别以不同的深度插入对应的所述第一通道中，所述保持部分固定在对应的所述第一通道中，所述接触部分暴露在相应的第一通道中，所述安装部分从所述后表面。

8. 发明申请

US20120261563A1 CONTAMINATION INSPECTION 有权
标题翻译：污染检查
公开(公告)号：US20120261563A1
公开(公告)日：2012-10-18
申请号：US13085731
申请日：2011-04-13
申请人： Chien-Hung Lai , Biow-Hiem Ong , Chia-Shih Lin , Jong-Yuh Chang , Chih-Chiang Tu
发明人： Chien-Hung Lai , Biow-Hiem Ong , Chia-Shih Lin , Jong-Yuh Chang , Chih-Chiang Tu
IPC分类号： G01D18/00 , B05C13/02 , H01L21/66
CPC分类号： H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method of forming a standard mask for an inspection system is provided, the method comprising providing a substrate within a chamber, and providing a tetraethylorthosilicate (TEOS) precursor within the chamber. The method further includes reacting the TEOS precursor with an electron beam to form silicon oxide particles of controlled size at one or more controlled locations on the substrate, the silicon oxide particles disposed as simulated contamination defects.
摘要翻译：提供了一种形成用于检查系统的标准掩模的方法，所述方法包括在室内提供衬底，并在室内提供原硅酸四乙酯（TEOS）前体。该方法还包括使TEOS前体与电子束反应，以在衬底上的一个或多个受控位置处形成受控尺寸的氧化硅颗粒，氧化硅颗粒被设置为模拟的污染缺陷。

9. 发明授权

US08629407B2 Contamination inspection 有权
标题翻译：污染检查
公开(公告)号：US08629407B2
公开(公告)日：2014-01-14
申请号：US13085731
申请日：2011-04-13
申请人： Chien-Hung Lai , Biow-Hiem Ong , Chia-Shih Lin , Jong-Yuh Chang , Chih-Chiang Tu
发明人： Chien-Hung Lai , Biow-Hiem Ong , Chia-Shih Lin , Jong-Yuh Chang , Chih-Chiang Tu
IPC分类号： G01J1/42 , C08J7/04 , G01N21/00 , G01J1/10
CPC分类号： H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method of forming a standard mask for an inspection system is provided, the method comprising providing a substrate within a chamber, and providing a tetraethylorthosilicate (TEOS) precursor within the chamber. The method further includes reacting the TEOS precursor with an electron beam to form silicon oxide particles of controlled size at one or more controlled locations on the substrate, the silicon oxide particles disposed as simulated contamination defects.
摘要翻译：提供了一种形成用于检查系统的标准掩模的方法，所述方法包括在室内提供衬底，并在室内提供原硅酸四乙酯（TEOS）前体。该方法还包括使TEOS前体与电子束反应，以在衬底上的一个或多个受控位置处形成受控尺寸的氧化硅颗粒，氧化硅颗粒被设置为模拟的污染缺陷。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式