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    • 3. 发明授权
    • Processing method and processing apparatus for processing a plurality of files stored on storage medium
    • 用于处理存储在存储介质上的多个文件的处理方法和处理装置
    • US07239802B2
    • 2007-07-03
    • US10161216
    • 2002-05-31
    • Tessho IshidaKenji TomizawaNobuyuki KiharaShoichi AwaiIchiro SakamotoIppei Tambata
    • Tessho IshidaKenji TomizawaNobuyuki KiharaShoichi AwaiIchiro SakamotoIppei Tambata
    • H04N7/26G06F3/00
    • G06F3/0601G06F2003/0697
    • Disclosed herein are a processing method and a processing apparatus for processing a plurality of files stored on a storage medium. The processing method comprises the steps of: retrieving from the storage medium management data used to manage the files stored on the storage medium; storing the retrieved management data in association with information representing selection status, in terms of processing, of each of the files managed by use of the management data; displaying on a display device the management data and the information representing the selection status in association with the management data; giving an indication, on the display device, to one of items constituting the displayed information about the files, the indication indicating that the file denoted by the information item is an object of operation apart from the other files; and if a predetermined operation is detected, then causing the selection status of the other files to coincide with the selection status of the file indicated as the object of operation.
    • 这里公开了一种用于处理存储在存储介质上的多个文件的处理方法和处理装置。 处理方法包括以下步骤:从存储介质检索用于管理存储在存储介质上的文件的管理数据; 将检索到的管理数据与处理通过使用管理数据管理的每个文件的表示选择状态的信息相关联地存储; 在显示装置上显示与管理数据相关联的管理数据和表示选择状态的信息; 在显示装置上指示构成关于文件的显示信息的项目之一,指示由信息项表示的文件是与其他文件分开的操作对象的指示; 并且如果检测到预定的操作,则导致其他文件的选择状态与作为操作对象指示的文件的选择状态一致。
    • 10. 发明授权
    • Semiconductor manufacturing apparatus
    • 半导体制造装置
    • US5968593A
    • 1999-10-19
    • US618769
    • 1996-03-20
    • Ichiro SakamotoNaoto Nakamura
    • Ichiro SakamotoNaoto Nakamura
    • H01L21/22C30B33/00H01L21/00H01L21/31C23C16/00
    • H01L21/67109C30B33/005
    • A semiconductor manufacturing apparatus including a heating device; a reaction tube disposed within the heating device, the reaction tube having a gas inlet portion and an exhaust portion parted from each other by a predetermined distance in the longitudinal direction of the reaction tube; and a plurality of gas feed pipes extending along a side wall of the reaction tube from the exhaust portion side to the gas inlet portion, the plurality of gas feed pipes being parted from each other. The reaction gas is provided through the plurality of gas feed pipes into the reaction tube, thereby providing an improved uniform temperature distribution within the reaction tube and resulting in an improved uniform film thickness of the oxide film formed on the surface of the semiconductor wafer.
    • 一种半导体制造装置,包括加热装置; 设置在加热装置内的反应管,反应管具有在反应管的长度方向上彼此分开预定距离的气体入口部分和排气部分; 以及多个气体供给管,其从所述排气部侧向所述气体导入部沿所述反应管的侧壁延伸,所述多个供气管相互分离。 反应气体通过多个气体供给管提供到反应管中,从而在反应管内提供改进的均匀的温度分布,并且导致在半导体晶片的表面上形成的氧化物膜的均匀膜厚度的改善。