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    • 7. 发明申请
    • Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography
    • 用于正型光刻的共聚物,用于制备所述共聚物的聚合引发剂和用于半导体光刻的组合物
    • US20070269741A1
    • 2007-11-22
    • US11800295
    • 2007-05-04
    • Minoru IijimaTakanori Yamagishi
    • Minoru IijimaTakanori Yamagishi
    • G03C1/00
    • G03F7/0397C08F220/28
    • A copolymer for positive type lithography, having at least a recurring unit (A) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (A) [in the formula (A), R10 is a hydrogen atom or a hydrocarbon group which may be substituted by fluorine atom; R11 is a crosslinked, alicyclic hydrocarbon group; n is an integer of 0 or 1; and R12 is an acid-dissociating, dissolution-suppressing group], and a terminal structure (B) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (B) [in the formula (B), R21 is a hydrocarbon group which may contain nitrogen atom; R22 is an acid-dissociating, dissolution-suppressing group; and p is a site of bonding with copolymer main chain].The copolymer is used in chemically amplified positive type lithography and is superior in lithography properties (e.g. dissolution contrast).
    • 一种正型平版印刷用共聚物,其至少具有具有下式(A)表示的酸溶解抑制基团的碱溶性基团保护的结构的重复单元(A)[式 (A)中,R 10是氢原子或可被氟原子取代的烃基; R 11是交联的脂环族烃基; n为0或1的整数; 并且R 12是酸解离的溶解抑制基团]和具有其中碱溶性基团被酸解离的溶解抑制基团保护的结构的末端结构(B) 由下式(B)表示[式(B)中,R 21是可以含有氮原子的烃基, R 22是酸解离的溶解抑制基团; 和p是与共聚物主链键合的位点]。 该共聚物用于化学放大正型光刻中,并且在光刻性能(例如溶出对比度)方面是优异的。
    • 9. 发明授权
    • Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography
    • 用于正型光刻的共聚物,用于制备所述共聚物的聚合引发剂和用于半导体光刻的组合物
    • US08067516B2
    • 2011-11-29
    • US11800295
    • 2007-05-04
    • Minoru IijimaTakanori Yamagishi
    • Minoru IijimaTakanori Yamagishi
    • C08F18/02
    • G03F7/0397C08F220/28
    • A copolymer for positive type lithography, having at least a recurring unit (A) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (A) [in the formula (A), R10 is a hydrogen atom or a hydrocarbon group which may be substituted by fluorine atom; R11 is a crosslinked, alicyclic hydrocarbon group; n is an integer of 0 or 1; and R12 is an acid-dissociating, dissolution-suppressing group], and a terminal structure (B) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (B) [in the formula (B), R21 is a hydrocarbon group which may contain nitrogen atom; R22 is an acid-dissociating, dissolution-suppressing group; and p is a site of bonding with copolymer main chain]. The copolymer is used in chemically amplified positive type lithography and is superior in lithography properties (e.g. dissolution contrast).
    • 一种正型平版印刷用共聚物,其至少具有具有下式(A)表示的酸溶解抑制基团的碱溶性基团保护的结构的重复单元(A)[式 (A)中,R 10为氢原子或可被氟原子取代的烃基; R11是交联的脂环烃基; n为0或1的整数; 和R 12是酸解离的溶解抑制基团]和具有下式(B)表示的具有酸解离溶解抑制基团的碱溶性基团保护的结构的末端结构(B) )[式(B)中,R 21表示可以含有氮原子的烃基, R22是酸解离,溶解抑制基团; 和p是与共聚物主链键合的位点]。 该共聚物用于化学放大正型光刻中,并且在光刻性能(例如溶出对比度)方面是优异的。
    • 10. 发明申请
    • Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography
    • 用于正型光刻的共聚物,用于制备所述共聚物的聚合引发剂和用于半导体光刻的组合物
    • US20120071638A1
    • 2012-03-22
    • US13199907
    • 2011-09-12
    • Minoru IijimaTakanori Yamagishi
    • Minoru IijimaTakanori Yamagishi
    • C07C245/04
    • G03F7/0397C08F220/28
    • A copolymer for positive type lithography, having at least a recurring unit (A) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (A) [in the formula (A), R10 is a hydrogen atom or a hydrocarbon group which may be substituted by fluorine atom; R11 is a crosslinked, alicyclic hydrocarbon group; n is an integer of 0 or 1; and R12 is an acid-dissociating, dissolution-suppressing group], and a terminal structure (B) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (B) [in the formula (B), R21 is a hydrocarbon group which may contain nitrogen atom; R22 is an acid-dissociating, dissolution-suppressing group; and p is a site of bonding with copolymer main chain].
    • 一种正型平版印刷用共聚物,其至少具有具有下式(A)表示的酸溶解抑制基团的碱溶性基团保护的结构的重复单元(A)[式 (A)中,R 10为氢原子或可被氟原子取代的烃基; R11是交联的脂环烃基; n为0或1的整数; 和R 12是酸解离的溶解抑制基团]和具有下式(B)表示的具有酸解离溶解抑制基团的碱溶性基团保护的结构的末端结构(B) )[式(B)中,R 21表示可以含有氮原子的烃基, R22是酸解离,溶解抑制基团; 和p是与共聚物主链键合的位点]。