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1. 发明授权

US06927350B2 Multi-substrate liquid metal high-frequency switching device 失效
标题翻译：多基板液态金属高频开关装置
公开(公告)号：US06927350B2
公开(公告)日：2005-08-09
申请号：US10738539
申请日：2003-12-16
申请人： You Kondoh , Tsutomu Takenaka
发明人： You Kondoh , Tsutomu Takenaka
IPC分类号： H01H11/02 , H01H1/00 , H01H29/02 , H01H29/28 , H01H29/30 , H01H61/01 , H01H61/02 , H01H29/00
CPC分类号： H01H29/28 , H01H1/0036 , H01H61/02 , H01H2029/008 , H01H2061/006
摘要： A device and manufacturing method are provided that comprises forming first and second substrates joined together and comprising a main channel provided in at least one of the substrates and a connecting channel provided in at least one of the substrates, the connecting channel connected to the main channel, and the main channel having spaced apart electrodes and at least partially filled with liquid metal. The method further comprises forming a heater substrate comprising a suspended heater element in fluid communication with the connecting channel, the suspended heater element operable to cause a fluid non-conductor to separate the liquid metal and selectively interconnect the electrodes, and providing a high-frequency signal loss reduction structure between the main channel and the heater substrate.
摘要翻译：提供了一种装置和制造方法，包括：形成连接在一起的第一和第二基板，并且包括设置在至少一个基板中的主通道和设置在至少一个基板中的连接通道，连接通道连接到主通道，并且主通道具有间隔开的电极并且至少部分地填充有液态金属。该方法还包括形成加热器基板，该加热器基板包括与连接通道流体连通的悬置加热器元件，该悬挂加热器元件可操作以使流体非导体分离液态金属并选择性地互连电极，并提供高频主通道和加热器基板之间的信号损失减小结构。

2. 发明申请

US20050042525A1 Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method 失效
公开(公告)号：US20050042525A1
公开(公告)日：2005-02-24
申请号：US10886767
申请日：2004-07-08
申请人： Tsutomu Takenaka , Seiya Miura
发明人： Tsutomu Takenaka , Seiya Miura
IPC分类号： G03C5/00 , G03F1/46 , G03F7/22 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70941 , G03F1/38 , G03F1/46
摘要： The invention disclosed herein concerns technology that ensures, in a projection exposure process using a transmission type reticle, exposure with an even finish size throughout the entire exposure region, without adverse influence of external disturbance light such as back-surface reflection, for example. Specifically, the invention provides a reticle, a semiconductor exposure apparatus and method, and a semiconductor device manufacturing method, wherein a reticle used there includes a pattern region in which a circuit pattern is formed, a light blocking region of a width d formed at an outside periphery of the pattern region, and an anti-reflection film formed on a surface of the reticle remote from the pattern region, wherein the width d of the light blocking film satisfies a relation d ≤ 2 ⁢ t · tan ⁢ { sin - 1 ⁡ ( n 1 n 2 ⁢ ⁢ sin ⁢ ⁢ θ ) } where n1 is a refractive index of a medium at a light entrance side of the reticle, n2 is a refractive index of the reticle, t is a thickness of the reticle, and θ is an incidence angle of light upon the reticle.

3. 发明授权

US06674934B2 Pressure-actuated bi-stable optical switching 失效
标题翻译：压力双稳态光开关
公开(公告)号：US06674934B2
公开(公告)日：2004-01-06
申请号：US09992843
申请日：2001-11-06
申请人： Kent W. Carey , Tetsuya Hidaka , You Kondoh , Mitsuchika Saito , Tsutomu Takenaka
发明人： Kent W. Carey , Tetsuya Hidaka , You Kondoh , Mitsuchika Saito , Tsutomu Takenaka
IPC分类号： G02B635
CPC分类号： G02B26/004 , G02B6/3538 , G02B6/3574 , G02B6/3576 , G02B6/358
摘要： Pressure-actuated bi-stable optical switching is provided. In this regard, a pressure-actuated bi-stable optical switch includes an optical path and a cavity intersecting the optical path. The cavity defines a first position along the optical path and a second position displaced from the optical path. An index-matching liquid, which exhibits an index of refraction closer to an index of refraction of the optical path than to that of a vacuum, is arranged within the cavity. A pressure generator generates pressure that selective moves the liquid between the first and second positions. Additionally, a potential profile maintains the liquid in the one of the first and second positions to which it was most recently moved while the pressure generator is not generating pressure. Methods, systems and other switches also are provided.
摘要翻译：提供了压力致动的双稳态光开关。在这方面，压力致动的双稳态光开关包括光路和与光路相交的空腔。空腔限定沿着光路的第一位置和从光路移位的第二位置。折射率匹配液体，其折射率比真空折射率更接近光路的折射率，设置在空腔内。压力发生器产生选择性地在第一和第二位置之间移动液体的压力。此外，当压力发生器不产生压力时，电位轮廓将液体保持在最近移动的第一和第二位置之一中的液体。还提供了方法，系统和其他开关。

4. 发明申请

US20090066927A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 失效
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20090066927A1
公开(公告)日：2009-03-12
申请号：US12203442
申请日：2008-09-03
申请人： Tsutomu Takenaka
发明人： Tsutomu Takenaka
IPC分类号： G03B27/54
CPC分类号： G03B27/54 , G03F9/7026 , G03F9/7065 , G03F9/7088
摘要： An exposure apparatus comprises an illumination optical system configured to illuminate an original with exposure light from an exposure light source, a projection optical system configured to project a pattern of the original onto a substrate, and a measuring unit configured to measure a relative position between the original and the substrate via the projection optical system using the exposure light as measurement light. The exposure apparatus exposes the substrate using the exposure light with a plurality of wavelengths or a broadband wavelength upon aligning the original and the substrate based on the measurement result obtained by the measuring unit, and the measuring unit switches a wavelength of the exposure light as the measurement light to a specific wavelength or a narrow-band wavelength in measuring the relative position between the original and the substrate.
摘要翻译：曝光装置包括照明光学系统，被配置为利用来自曝光光源的曝光光来照射原稿;投影光学系统，被配置为将原稿的图案投影到基板上;以及测量单元，被配置为测量原稿的相对位置原稿和基板通过投影光学系统使用曝光光作为测量光。曝光装置基于由测量单元获得的测量结果对准原稿和基板，利用多个波长或宽带波长的曝光光曝光基板，并且测量单元将曝光光的波长切换为在测量原始和基板之间的相对位置时测量光到特定波长或窄带波长。

5. 发明授权

US07348107B2 Reticle, semiconductor exposure apparatus and method, and semiconductor device manufacturing method 失效
公开(公告)号：US07348107B2
公开(公告)日：2008-03-25
申请号：US10886767
申请日：2004-07-08
申请人： Tsutomu Takenaka , Seiya Miura
发明人： Tsutomu Takenaka , Seiya Miura
IPC分类号： G03F1/00
CPC分类号： G03F7/70941 , G03F1/38 , G03F1/46
摘要： The invention disclosed herein concerns technology that ensures, in a projection exposure process using a transmission type reticle, exposure with an even finish size throughout the entire exposure region, without adverse influence of external disturbance light such as back-surface reflection, for example. Specifically, the invention provides a reticle, a semiconductor exposure apparatus and method, and a semiconductor device manufacturing method, wherein a reticle used there includes a pattern region in which a circuit pattern is formed, a light blocking region of a width d formed at an outside periphery of the pattern region, and an anti-reflection film formed on a surface of the reticle remote from the pattern region, wherein the width d of the light blocking film satisfies a relation d ≤ 2 ⁢ t · tan ⁢ { sin - 1 ⁡ ( n 1 n 2 ⁢ ⁢ sin ⁢ ⁢ θ ) } where n1 is a refractive index of a medium at a light entrance side of the reticle, n2 is a refractive index of the reticle, t is a thickness of the reticle, and θ is an incidence angle of light upon the reticle.

6. 发明授权

US06614214B2 Sampling element controlled by photoconductive switch-generated sampling pulses and sampling device incorporating same 失效
公开(公告)号：US06614214B2
公开(公告)日：2003-09-02
申请号：US09919629
申请日：2001-07-30
申请人： Akira Mizuhara , Tsutomu Takenaka , Yasuhisa Kaneko , Norihide Yamada
发明人： Akira Mizuhara , Tsutomu Takenaka , Yasuhisa Kaneko , Norihide Yamada
IPC分类号： G01R1314
CPC分类号： G01R13/347
摘要： The sampling element comprises a DC sampling voltage source, a threshold sampling circuit and a photoconductive switching element. The threshold sampling circuit includes a signal-under-test input, a sampling pulse input and an IF signal output, and has a sampling threshold with respect to sampling pulses received at the sampling pulse input. The photoconductive switching element is connected between the DC sampling voltage source and the sampling pulse input of the threshold sampling circuit. The sampling device comprises a DC sampling voltage source, a threshold sampling circuit, a photoconductive switching element and a light source. The threshold sampling circuit includes a signal-under-test input, a sampling pulse input and an IF signal output, and has a sampling threshold with respect to sampling pulses received at the sampling pulse input. The photoconductive switching element is connected between the DC sampling voltage source and the sampling pulse input of the threshold sampling circuit. The light source is operable to generate optical pulses and is arranged to illuminate the photoconductive switching element with the optical pulses.

7. 发明授权

US5140183A Rush current prevention circuit 失效
标题翻译： RUSH电流预防电路
公开(公告)号：US5140183A
公开(公告)日：1992-08-18
申请号：US578223
申请日：1990-09-06
申请人： Tsutomu Takenaka
发明人： Tsutomu Takenaka
IPC分类号： G06F1/26 , G06F1/28 , G06F1/30 , G11C11/405 , H03K17/22 , H03K19/003 , H03K19/0948
CPC分类号： G06F1/305
摘要： A second circuit to which back-up power is supplied, such as a RAM, is connected downstream of a first circuit to which no back-up power is supplied, such as a CPU. A gate circuit inhibits the output signal of the first circuit to the second circuit and provides a predetermined level to the second circuit when the output signal of the first circuit is at an indefinite level and prevents a penetration current from flowing through the second circuit.

8. 发明授权

US08472009B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08472009B2
公开(公告)日：2013-06-25
申请号：US12872972
申请日：2010-08-31
申请人： Tsutomu Takenaka
发明人： Tsutomu Takenaka
IPC分类号： G01B11/00 , G03B27/32 , G03B27/42 , G03B27/54 , G03B27/62 , G03B27/72
CPC分类号： G03F9/7015 , G03F9/7011 , G03F9/7088
摘要： An exposure apparatus which projects a pattern of an original onto a substrate by a projection optical system, comprises a measurement device configured to measure a relative position between an original stage and a substrate stage via the projection optical system using an original-side fiducial plate and a substrate-side fiducial plate, and a controller, the original-side fiducial plate including first and second original-side marks, and the substrate-side fiducial plate including first and second substrate-side marks, wherein the controller is configured to control imaging characteristics of the projection optical system so that measurement of the relative position between the original stage and the substrate stage using the first original-side mark and the first substrate-side mark and measurement of the relative position between the original stage and the substrate stage using the second original-side mark and the second substrate-side mark can be performed simultaneously.
摘要翻译：一种通过投影光学系统将原稿的图案投影到基板上的曝光装置，包括：测量装置，被配置为经由投影光学系统使用原始侧基准面测量原始台和基板台之间的相对位置;以及基板侧基准板，以及包括第一和第二原始标记的原始侧基准面和包括第一和第二基板侧标记的基板侧基准面的控制器，其中，所述控制器构造成控制成像投影光学系统的特性，使得使用第一原始标记和第一基板侧标记来测量原始台和基板台之间的相对位置，并且使用原始台和基板侧标记之间的相对位置的测量可以同时执行第二原稿侧标记和第二基板侧标记。

9. 发明授权

US06806431B2 Liquid metal micro-relay with suspended heaters and multilayer wiring 失效
公开(公告)号：US06806431B2
公开(公告)日：2004-10-19
申请号：US10627308
申请日：2003-07-25
申请人： You Kondoh , Tsutomu Takenaka
发明人： You Kondoh , Tsutomu Takenaka
IPC分类号： H01H2900
CPC分类号： H01H1/0036 , H01H29/28 , H01H2029/008 , H01H2061/006
摘要： A micro-relay device is provided including a fluid non-conductor. A first substrate and a second substrate are bonded together. A channel is defined in at least one of the substrates, and has a liquid metal in the channel. Electrodes are spaced along the channel and selectively interconnectable by the liquid metal. An open via is defined in one of the substrates and contains the fluid non-conductor. A heater substrate includes a suspended heater element in fluid communication with the open via. The suspended heater element is operable to cause the fluid non-conductor to separate the liquid metal.

10. 发明授权

US06317017B1 Resonator having a variable resonance frequency 失效
标题翻译：具有可变谐振频率的谐振器
公开(公告)号：US06317017B1
公开(公告)日：2001-11-13
申请号：US09425325
申请日：1999-10-21
申请人： Tsutomu Takenaka
发明人： Tsutomu Takenaka
IPC分类号： H01P700
CPC分类号： H01P7/10
摘要： A resonator having a variable resonance frequency. The resonator includes a cavity enclosed by a conducting wall. A resonating element and a conductive plate are located within the cavity. A photoconductive element is connected between two points on the conductive plate. The resonator also includes a light source for irradiating the photoconductive element with light of the predetermined wavelength. In the preferred embodiment, the conductive plate is circular and includes a gap, the photoconductive element connecting two points on the gap and the resonating element is a cylindrical dielectric resonator element having a TE01&dgr; mode electromagnetic field distribution. The circular conductive plate is preferably placed parallel to the top surface of the cylindrical dielectric resonator substantially midway between the top surface and the inner surface of the conducting wall. The diameter of the circular plate is preferably greater than that of the cylindrical dielectric resonator. In one embodiment of the present invention, the photoconductive element includes first and second photoconductive regions, the first photoconductive region connecting first and second points on the conductive plate and the second photoconductive region connecting third and fourth points on the conductive plate. In this embodiment, the light source includes first and second light emitting elements, for respectively illuminating said first and second photoconductive regions. The magnitude of the change in resonance frequency induced by illuminating the photoconductive region can be altered by adjusting the relative position of the photoconductive element and the light source.
摘要翻译：具有可变谐振频率的谐振器。谐振器包括由导电壁包围的空腔。谐振元件和导电板位于腔内。光电导元件连接在导电板上的两点之间。谐振器还包括用于用预定波长的光照射光电导元件的光源。在优选实施例中，导电板是圆形的并且包括间隙，连接间隙上的两个点的光电导元件和谐振元件是具有TE01电场模式电磁场分布的圆柱形介质谐振元件。圆形导电板优选地平行于圆柱形介质谐振器的顶表面大致在导电壁的顶表面和内表面之间的中间。圆板的直径优选大于圆柱形介质谐振器的直径。在本发明的一个实施例中，光电导元件包括第一和第二光电导区域，第一光电导区域连接导电板上的第一和第二点，以及连接导电板上的第三和第四点的第二光电导区域。在该实施例中，光源包括用于分别照亮所述第一和第二光电导区域的第一和第二发光元件。可以通过调整光电导元件和光源的相对位置来改变通过照射光电导区域而引起的共振频率的变化的大小。

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