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1. 发明申请

US20170352563A1 SYSTEMS AND METHODS FOR WAFER ALIGNMENT 审中-公开
公开(公告)号：US20170352563A1
公开(公告)日：2017-12-07
申请号：US15657298
申请日：2017-07-24
申请人： Micron Technology, Inc.
发明人： Yang Chao , Keith E. Ypma , Steve J. Strauch
IPC分类号： H01L21/68 , G03F7/20 , G01B11/14 , G03F9/00
CPC分类号： H01L21/681 , B65G2203/0233 , B65G2203/041 , B65G2811/0626 , G01B11/14 , G03F7/70633 , G03F7/70775 , G03F9/7003 , G03F9/7007 , G03F9/7015 , G03F9/7088
摘要： Various embodiments of aligning wafers are described herein. In one embodiment, a photolithography system aligns a wafer by averaging individual via locations. In particular, some embodiments of the present technology determine the center locations of individual vias on a wafer and average them together to obtain an average center location of the set of vias. Based on a comparison of the average center location to a desired center location, the present technology adjusts the wafer position. Additionally, in some embodiments, the present technology compares wafer via patterns to a template and adjusts the position of the wafer based on the comparison.

2. 发明授权

US09748128B1 Systems and methods for wafer alignment 有权
公开(公告)号：US09748128B1
公开(公告)日：2017-08-29
申请号：US15170517
申请日：2016-06-01
申请人： Micron Technology, Inc.
发明人： Yang Chao , Keith E. Ypma , Steve J. Strauch
IPC分类号： H01L21/68 , G03F9/00 , G03F7/20 , G01B11/14
CPC分类号： H01L21/681 , B65G2203/0233 , B65G2203/041 , B65G2811/0626 , G01B11/14 , G03F7/70633 , G03F7/70775 , G03F9/7003 , G03F9/7007 , G03F9/7015 , G03F9/7088
摘要： Various embodiments of aligning wafers are described herein. In one embodiment, a photolithography system aligns a wafer by averaging individual via locations. In particular, some embodiments of the present technology determine the center locations of individual vias on a wafer and average them together to obtain an average center location of the set of vias. Based on a comparison of the average center location to a desired center location, the present technology adjusts the wafer position. Additionally, in some embodiments, the present technology compares wafer via patterns to a template and adjusts the position of the wafer based on the comparison.

3. 发明授权

US09304392B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US09304392B2
公开(公告)日：2016-04-05
申请号：US14283865
申请日：2014-05-21
申请人： NIKON CORPORATION
发明人： Naoyuki Kobayashi , Akikazu Tanimoto
IPC分类号： G03B27/52 , G03B27/42 , G03F7/00 , G03F7/20
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： A liquid immersion exposure apparatus comprising: a projection system, a stage system having a holder that holds a substrate, a supply port that is arranged such that an upper surface of the substrate faces the supply port, and a recovery port that is arranged to surround the supply port and collects an immersion liquid from the upper surface of the substrate such that only a portion of the upper surface of the substrate is covered with the immersion liquid. The apparatus also comprises an alignment system which detects an alignment mark of the substrate not through the immersion liquid. The substrate held on the holder is positioned based on a detection result of the alignment system to align the substrate with an exposure light projected through the immersion liquid by the projection system.
摘要翻译：一种液浸曝光装置，包括：投影系统，具有保持基板的台架系统，配置为使得所述基板的上表面朝向所述供给口的供给口，以及回收口，供给口并从基板的上表面收集浸渍液体，使得只有基板的上表面的一部分被浸渍液体覆盖。该装置还包括一个对准系统，其不通过浸没液体来检测衬底的对准标记。基于对准系统的检测结果，保持在保持器上的基板被定位，以使基板与通过投影系统投射通过浸没液体的曝光光线对准。

4. 发明申请

US20140146299A1 ALIGNMENT CORRECTION METHOD FOR SUBSTRATE TO BE EXPOSED, AND EXPOSURE APPARATUS 有权
标题翻译：用于基材曝光的对准校正方法和曝光装置
公开(公告)号：US20140146299A1
公开(公告)日：2014-05-29
申请号：US14168212
申请日：2014-01-30
申请人： V TECHNOLOGY CO., LTD.
发明人： Yoshiaki NOMURA , Toshinari ARAI
IPC分类号： G03F9/00
CPC分类号： G03F9/7015 , G03F7/70791 , G03F9/00 , G03F9/7019 , H01L21/682
摘要： An alignment correction method includes: the step of detecting coordinates of a first observation point 14 and a second observation point 15 set in advance on a substrate to be exposed 1 that is being scanned in a scanning direction A, in order to observe an alignment deviation of the substrate to be exposed 1; the step of computing a correction amount based on a deviation between the detected coordinates and a reference line set in advance according to the first observation point 14 and the second observation point 15; and the step of correcting alignment of a subsequent substrate to be exposed 1 based on the computed correction amount.
摘要翻译：对准校正方法包括：检测在扫描方向A上被扫描的待曝光基板1上预先设定的第一观察点14和第二观察点15的坐标的步骤，以观察取向偏差要暴露的基材1; 基于检测到的坐标与根据第一观察点14和第二观察点15预先设定的参考线之间的偏差来计算校正量的步骤; 以及基于所计算的校正量来校正待曝光的衬底1的对准的步骤。

5. 发明授权

US08472009B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08472009B2
公开(公告)日：2013-06-25
申请号：US12872972
申请日：2010-08-31
申请人： Tsutomu Takenaka
发明人： Tsutomu Takenaka
IPC分类号： G01B11/00 , G03B27/32 , G03B27/42 , G03B27/54 , G03B27/62 , G03B27/72
CPC分类号： G03F9/7015 , G03F9/7011 , G03F9/7088
摘要： An exposure apparatus which projects a pattern of an original onto a substrate by a projection optical system, comprises a measurement device configured to measure a relative position between an original stage and a substrate stage via the projection optical system using an original-side fiducial plate and a substrate-side fiducial plate, and a controller, the original-side fiducial plate including first and second original-side marks, and the substrate-side fiducial plate including first and second substrate-side marks, wherein the controller is configured to control imaging characteristics of the projection optical system so that measurement of the relative position between the original stage and the substrate stage using the first original-side mark and the first substrate-side mark and measurement of the relative position between the original stage and the substrate stage using the second original-side mark and the second substrate-side mark can be performed simultaneously.
摘要翻译：一种通过投影光学系统将原稿的图案投影到基板上的曝光装置，包括：测量装置，被配置为经由投影光学系统使用原始侧基准面测量原始台和基板台之间的相对位置;以及基板侧基准板，以及包括第一和第二原始标记的原始侧基准面和包括第一和第二基板侧标记的基板侧基准面的控制器，其中，所述控制器构造成控制成像投影光学系统的特性，使得使用第一原始标记和第一基板侧标记来测量原始台和基板台之间的相对位置，并且使用原始台和基板侧标记之间的相对位置的测量可以同时执行第二原稿侧标记和第二基板侧标记。

6. 发明申请

US20130050674A1 LITHOGRAPHIC APPARATUS, SUBSTRATE TABLE AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：光刻设备，基板和器件制造方法
公开(公告)号：US20130050674A1
公开(公告)日：2013-02-28
申请号：US13315912
申请日：2011-12-09
申请人： Vitaliy Prosyentsov , Johannes Maria Van Benten
发明人： Vitaliy Prosyentsov , Johannes Maria Van Benten
IPC分类号： G03B27/58
CPC分类号： G03F7/70575 , G03F7/7085 , G03F9/7015 , G03F9/7088
摘要： A substrate table with a sensor that includes a block of material provided with a layer of material opaque to radiation. The layer of material has at least one window configured to allow the transmission of the radiation. The sensor includes a wavelength conversion material located at the window, and a waveguide positioned to receive radiation emitted by the wavelength conversion material. The waveguide is embedded in the block of material and configured to guide radiation emitted by the wavelength conversion material through the block of material and towards a detector.
摘要翻译：具有传感器的衬底台，该传感器包括具有不透射辐射的材料层的材料块。材料层具有至少一个被配置为允许辐射传输的窗口。该传感器包括位于窗口处的波长转换材料和定位成接收由波长转换材料发射的辐射的波导。波导嵌入在材料块中并且被配置为引导由波长转换材料发射的辐射通过材料块并朝向检测器。

7. 发明授权

US08384877B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US08384877B2
公开(公告)日：2013-02-26
申请号：US11808230
申请日：2007-06-07
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
摘要翻译：提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板投影光学系统的像平面附近。

8. 发明授权

US08169592B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US08169592B2
公开(公告)日：2012-05-01
申请号：US12153354
申请日：2008-05-16
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a surface and movable to a position at which the surface of the member faces the optical element. The apparatus also includes a cleaning system which cleans the surface of the member.
摘要翻译：曝光装置包括光学元件，通过该光学元件，图案化的光束通过填充在光学元件和基板之间的空间中的曝光液体投影到基板上。该装置还包括具有表面并可移动到构件的表面面向光学元件的位置的构件。该装置还包括清洁构件表面的清洁系统。

9. 发明申请

US20100208229A1 Maskless exposure method 有权
标题翻译：无掩膜曝光方法
公开(公告)号：US20100208229A1
公开(公告)日：2010-08-19
申请号：US12452565
申请日：2008-06-25
申请人： Young Hoon Shin , Won Ho Seo , Myung Ju Park , Hyung Jin Lee , Sang Hwan Cha , Tae Ho Lee , Chang Ju Rhee
发明人： Young Hoon Shin , Won Ho Seo , Myung Ju Park , Hyung Jin Lee , Sang Hwan Cha , Tae Ho Lee , Chang Ju Rhee
IPC分类号： G03B27/32
CPC分类号： G03F7/70291 , G03F7/70275 , G03F9/7015 , G03F9/7088
摘要： Disclosed is a maskless exposure method, where it is possible to perform a more precise optical alignment using a first pattern of a maskless exposure part and a second pattern of a main reference unit, and it is also possible to reduce generation of a blur in an exposed pattern.
摘要翻译：公开了一种无掩模曝光方法，其中可以使用无掩模曝光部分的第一图案和主参考单元的第二图案执行更精确的光学对准，并且还可以减少暴露模式。

10. 发明授权

US07474410B2 Nanometer-precision tip-to-substrate control and pattern registration for scanning-probe lithography 失效
标题翻译：用于扫描探针光刻的纳米精度尖端到基板控制和图案配准
公开(公告)号：US07474410B2
公开(公告)日：2009-01-06
申请号：US11733851
申请日：2007-04-11
申请人： Euclid E. Moon
发明人： Euclid E. Moon
IPC分类号： G01B11/02
CPC分类号： G01Q20/02 , G01Q30/02 , G01Q70/04 , G01Q80/00 , G03F7/0002 , G03F9/7003 , G03F9/7015 , G03F9/7038 , G03F9/7042 , G03F9/7049 , G03F9/7061 , G03F9/7076
摘要： An interferometric-spatial-phase imaging (ISPI) system includes an alignment mechanism for obtaining continuous six-axis control of a scanning probe tip with respect to a coordinate system attached to a substrate. A gap detection mechanism measures tip height above a substrate and controls tip approach toward the substrate of one or more tips, as well as measures tip deflection during surface contact of the one or more tips. A plurality of complementary marks is provided for attachment to the one or more tips. A plurality of grating marks is provided to backdiffract a reflected beam from a flexible cantilever to detect high-frequency tip deflection in a compact configuration of a light source and a light detector.
摘要翻译：干涉空间相位成像（ISPI）系统包括对准机构，用于相对于连接到基板的坐标系获得扫描探针尖端的连续六轴控制。间隙检测机构测量衬底上方的尖端高度并且控制针对一个或多个尖端的衬底的尖端接近，以及测量一个或多个尖端的表面接触期间的尖端偏转。提供多个互补标记用于附接到一个或多个尖端。提供多个光栅标记以从柔性悬臂反向衍射反射光束以检测光源和光检测器的紧凑配置中的高频尖端偏转。

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