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    • 3. 发明授权
    • Nitride light emitting diode and fabrication method thereof
    • 氮化物发光二极管及其制造方法
    • US09312438B2
    • 2016-04-12
    • US14719269
    • 2015-05-21
    • XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD.
    • Wen-Yu LinMeng-Hsin YehKechuang Lin
    • H01L33/14H01L27/15H01L33/00H01L33/32H01L33/06
    • H01L33/14H01L27/156H01L33/0025H01L33/0075H01L33/06H01L33/32
    • An epitaxial structure of light emitting diode with a current modulation layer, and more specifically, a high-resistivity material is injected to change the current conduction path, and implementation of the main structure is to grow a high-resistivity material (e.g., InxAlyGa1-x-yN) over the N-type conductive layer or the P-type conductive layer till part of current conduction path is exposed through high-temperature H2 in-situ etching in the reacting furnace and to grow the N-type or the P-type conductive layer for coverage. This design for forming a current modulation layer without second epitaxial growth provides the injected current with a better spreading path in the N-type conductive layer and the P-type conductive layer, which more effectively and uniformly injects the current to the active layer and improves luminous efficiency.
    • 注入具有电流调制层的发光二极管的外延结构,更具体而言,注入高电阻率材料以改变电流传导路径,并且主要结构的实现是生长高电阻率材料(例如,In x Al y Ga 1- x-yN)在N型导电层或P型导电层之间,直到电流传导路径的一部分通过反应炉内的高温H2原位蚀刻暴露,并且生长N型或P-型导电层, 型导电层覆盖。 这种用于形成没有第二外延生长的电流调制层的设计在N型导电层和P型导电层中提供了更好的扩散路径的注入电流,其更有效地均匀地将电流注入到有源层并改善 发光效率。