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1. 发明申请

US20090098483A1 POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 有权
标题翻译：积极抗性组合物和形成耐药模式的方法
公开(公告)号：US20090098483A1
公开(公告)日：2009-04-16
申请号：US11913308
申请日：2006-04-07
申请人： Yohei Kinoshita , Makiko Irie , Waki Ohkubo , Yusuke Nakagawa , Shinichi Hidesaka
发明人： Yohei Kinoshita , Makiko Irie , Waki Ohkubo , Yusuke Nakagawa , Shinichi Hidesaka
IPC分类号： G03F7/028 , G03F7/20
CPC分类号： G03F7/0397 , C08F220/28 , G03F7/0046 , Y10S430/111 , Y10S430/12 , Y10S430/121 , Y10S430/122 , Y10S430/123 , Y10S430/126
摘要： A positive resist composition and method for forming a resist pattern are provided which enable a resist pattern with excellent shape to be obtained. The resist composition includes a resin component (A) which exhibits increased alkali solubility under action of acid, an acid-generator component (B) which generates acid upon irradiation and an organic solvent (S) in which the components (A) and (B) are dissolved, the resin component (A) including a copolymer (A1) containing: a structural unit (a1) having an acetal-type protected group, a structural unit (a2) derived from an acrylate ester having a lactone-containing polycyclic group, which is represented by general formula (a2-1) shown below; and a structural unit (a3) derived from an acrylate ester having a polar group-containing aliphatic hydrocarbon group: wherein R represents a hydrogen atom, a fluorine atom, a lower alkyl group or a fluorinated lower alkyl group; R′ represents a hydrogen atom, a lower alkyl group or an alkoxy group of 1 to 5 carbon atoms; and m represents 0 or 1.
摘要翻译：提供了一种形成抗蚀剂图案的正型抗蚀剂组合物和方法，其能够获得具有优异形状的抗蚀剂图案。抗蚀剂组合物包括在酸作用下表现出增加的碱溶性的树脂组分（A），在照射时产生酸的酸产生剂组分（B）和其中组分（A）和（B）的有机溶剂）的树脂组分（A）包含共聚物（A1），其包含：具有缩醛型保护基的结构单元（a1），源自具有含内酯多环基团的丙烯酸酯的结构单元（a2），由下述通式（a2-1）表示; 和衍生自具有极性基团的脂族烃基的丙烯酸酯的结构单元（a3）：其中R表示氢原子，氟原子，低级烷基或氟化低级烷基; R'表示氢原子，低级烷基或碳原子数1〜5的烷氧基。 m表示0或1。

2. 发明授权

US07858286B2 Positive resist composition and method for forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US07858286B2
公开(公告)日：2010-12-28
申请号：US11913308
申请日：2006-04-07
申请人： Yohei Kinoshita , Makiko Irie , Waki Ohkubo , Yusuke Nakagawa , Shinichi Hidesaka
发明人： Yohei Kinoshita , Makiko Irie , Waki Ohkubo , Yusuke Nakagawa , Shinichi Hidesaka
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0397 , C08F220/28 , G03F7/0046 , Y10S430/111 , Y10S430/12 , Y10S430/121 , Y10S430/122 , Y10S430/123 , Y10S430/126
摘要： A positive resist composition and method for forming a resist pattern are provided which enable a resist pattern with excellent shape to be obtained. The resist composition includes a resin component (A) which exhibits increased alkali solubility under action of acid, an acid-generator component (B) which generates acid upon irradiation and an organic solvent (S) in which the components (A) and (B) are dissolved, the resin component (A) including a copolymer (A1) containing: a structural unit (a1) having an acetal-type protected group, a structural unit (a2) derived from an acrylate ester having a lactone-containing polycyclic group, which is represented by general formula (a2-1) shown below; and a structural unit (a3) derived from an acrylate ester having a polar group-containing aliphatic hydrocarbon group: wherein R represents a hydrogen atom, a fluorine atom, a lower alkyl group or a fluorinated lower alkyl group; R′ represents a hydrogen atom, a lower alkyl group or an alkoxy group of 1 to 5 carbon atoms; and m represents 0 or 1.
摘要翻译：提供了一种形成抗蚀剂图案的正型抗蚀剂组合物和方法，其能够获得具有优异形状的抗蚀剂图案。抗蚀剂组合物包括在酸作用下表现出增加的碱溶性的树脂组分（A），在照射时产生酸的酸产生剂组分（B）和其中组分（A）和（B）的有机溶剂）的树脂组分（A）包含共聚物（A1），其包含：具有缩醛型保护基的结构单元（a1），源自具有含内酯多环基团的丙烯酸酯的结构单元（a2），由下述通式（a2-1）表示; 和衍生自具有极性基团的脂族烃基的丙烯酸酯的结构单元（a3）：其中R表示氢原子，氟原子，低级烷基或氟化低级烷基; R'表示氢原子，低级烷基或碳原子数1〜5的烷氧基; m表示0或1。

3. 发明授权

US07781144B2 Positive resist composition and resist pattern forming method 有权
标题翻译：正抗蚀剂组合物和抗蚀剂图案形成方法
公开(公告)号：US07781144B2
公开(公告)日：2010-08-24
申请号：US11914509
申请日：2006-04-18
申请人： Yohei Kinoshita , Waki Ohkubo , Yusuke Nakagawa , Shinichi Hidesaka , Makiko Irie
发明人： Yohei Kinoshita , Waki Ohkubo , Yusuke Nakagawa , Shinichi Hidesaka , Makiko Irie
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0397 , C08F220/28 , G03F7/0045 , Y10S430/111 , Y10S430/12 , Y10S430/121 , Y10S430/122 , Y10S430/123 , Y10S430/126
摘要： The present invention is a positive resist composition and a resist pattern forming method including a resin component (A) which has a polymer compound (A1) having a structural units (a1) including an acetal type acid dissociable, dissolution inhibiting group, a structural unit (a2) derived from an acrylate ester having a lactone-containing polycyclic group, and a structural unit (a3) derived from an acrylate ester having a polar group-containing aliphatic hydrocarbon group, and an acid generator component (B) having an onium salt-based acid generator (B1) having a cation portion represented by a general formula (b-1) shown below [wherein, R11 represents an alkyl group, an alkoxy group, a halogen atom or a hydroxyl group; R12 to R13 each represents, independently, an aryl group or the alkyl group that may have substituent group; n′ represents either 0 or an integer from 1 to 3].
摘要翻译：本发明是一种正型抗蚀剂组合物和抗蚀剂图案形成方法，其包括具有包含缩醛型酸解离，溶解抑制基团，结构单元（a1）的结构单元（a1）的高分子化合物（A1）的树脂组分（A）衍生自具有含内酯多环基团的丙烯酸酯的衍生物（a2）和衍生自具有极性基团的脂族烃基的丙烯酸酯的结构单元（a3）和具有鎓盐的酸产生剂组分（B）的具有由下述通式（b-1）表示的阳离子部分的酸产生剂（B1）[其中，R 11表示烷基，烷氧基，卤素原子或羟基; R 12〜R 13各自独立地表示可以具有取代基的芳基或烷基; n'表示0或1〜3的整数]。

4. 发明申请

US20090035698A1 POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD 有权
标题翻译：积极抵抗组合和阻力图形成方法
公开(公告)号：US20090035698A1
公开(公告)日：2009-02-05
申请号：US11914509
申请日：2006-04-18
申请人： Yohei Kinoshita , Waki Ohkubo , Yusuke Nakagawa , Shinichi Hidesaka , Makiko Irie
发明人： Yohei Kinoshita , Waki Ohkubo , Yusuke Nakagawa , Shinichi Hidesaka , Makiko Irie
IPC分类号： G03F7/027 , G03F7/20
CPC分类号： G03F7/0397 , C08F220/28 , G03F7/0045 , Y10S430/111 , Y10S430/12 , Y10S430/121 , Y10S430/122 , Y10S430/123 , Y10S430/126
摘要： The present invention is a positive resist composition and a resist pattern forming method including a resin component (A) which has a polymer compound (A1) having a structural units (a1) including an acetal type acid dissociable, dissolution inhibiting group, a structural unit (a2) derived from an acrylate ester having a lactone-containing polycyclic group, and a structural unit (a3) derived from an acrylate ester having a polar group-containing aliphatic hydrocarbon group, and an acid generator component (B) having an onium salt-based acid generator (B1) having a cation portion represented by a general formula (b-1) shown below [wherein, R11 represents an alkyl group, an alkoxy group, a halogen atom or a hydroxyl group; R12 to R13 each represents, independently, an aryl group or the alkyl group that may have substituent group; n′ represents either 0 or an integer from 1 to 3].
摘要翻译：本发明是一种正型抗蚀剂组合物和抗蚀剂图案形成方法，其包括具有包含缩醛型酸解离，溶解抑制基团，结构单元（a1）的结构单元（a1）的高分子化合物（A1）的树脂组分（A）衍生自具有含内酯多环基团的丙烯酸酯的衍生物（a2）和衍生自具有极性基团的脂族烃基的丙烯酸酯的结构单元（a3）和具有鎓盐的酸产生剂组分（B）的具有由下述通式（b-1）表示的阳离子部分的酸产生剂（B1）[其中，R 11表示烷基，烷氧基，卤素原子或羟基; R 12〜R 13各自独立地表示可以具有取代基的芳基或烷基; n'表示0或1〜3的整数]。

5. 发明授权

US08394569B2 Resist composition for immersion lithography and method for forming resist pattern 有权
标题翻译：浸渍光刻用抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US08394569B2
公开(公告)日：2013-03-12
申请号：US12278376
申请日：2007-02-05
申请人： Makiko Irie , Takeshi Iwai
发明人： Makiko Irie , Takeshi Iwai
IPC分类号： G03F7/028 , G03F7/033 , G03F7/038 , G03F7/26
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/2041
摘要： A resist composition for immersion lithography of the present invention includes a resin component (A) which exhibits changed alkali solubility under the action of acid; and an acid generator component (B) which generates acid on exposure, wherein the resin component (A) includes a resin (A1) containing a fluorine atom and no acid-dissociable group, and a resin (A2) containing a structural unit (a′) derived from an acrylic acid and no fluorine atom.
摘要翻译：本发明的浸渍光刻用抗蚀剂组合物包括在酸作用下表现出碱溶性变化的树脂成分（A）以及在曝光时产生酸的酸发生剂成分（B），其中，所述树脂成分（A）含有含有氟原子且不具有酸解离性基团的树脂（A1）和含有结构单元（a）的树脂（A2） '）衍生自丙烯酸而不是氟原子。

6. 发明申请

US20110165512A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：耐蚀组合物和形成耐力图案的方法
公开(公告)号：US20110165512A1
公开(公告)日：2011-07-07
申请号：US12940793
申请日：2010-11-05
申请人： Yoshiyuki Utsumi , Makiko Irie
发明人： Yoshiyuki Utsumi , Makiko Irie
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： A resist composition including a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, an acid-generator component (B) that generates acid upon exposure, and a nitrogen-containing organic compound (D), wherein the acid generator component (B) includes an acid generator (B1) consisting of a compound represented by general formula (b0), and the nitrogen-containing organic compound (D) includes a compound represented by general formula (d1) or general formula (d2) [wherein each of R1 and R2 represents an aryl group which may have a substituent, or an alkyl group which may have a substituent, Rf represents a fluorinated alkyl group which may have a substituent, X− represents a counter anion, each of R3 and R4 represents an aliphatic hydrocarbon group, R5 represents a hydrocarbon group having 5 or more carbon atoms, and each of R6 and R7 independently represents a hydrogen atom, an aliphatic hydrocarbon group which may have a substituent, or —C(═O)—O—R5].
摘要翻译：一种抗蚀剂组合物，其包含在酸作用下在碱显影液中溶解度变化的碱成分（A），曝光时产生酸的酸发生剂成分（B）和含氮有机化合物（D），其中，所述酸产生剂成分（B）含有由通式（b0）表示的化合物构成的酸发生剂（B1），所述含氮有机化合物（D）含有通式（d1）表示的化合物或通式（d2）[其中R 1和R 2各自表示可以具有取代基的芳基或可以具有取代基的烷基，Rf表示可以具有取代基的氟化烷基，X表示抗衡阴离子， R 3和R 4表示脂肪族烃基，R 5表示碳原子数5以上的烃基，R 6和R 7各自独立地表示氢原子，可以具有取代基的脂肪族烃基或-C（= O）-O-R 5]。

7. 发明申请

US20090269700A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：正电阻组合物和形成电阻图案的方法
公开(公告)号：US20090269700A1
公开(公告)日：2009-10-29
申请号：US12428133
申请日：2009-04-22
申请人： Koji Yonemura , Makiko Irie , Hideo Hada
发明人： Koji Yonemura , Makiko Irie , Hideo Hada
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： A positive resist composition, including a resin component (A) which exhibits increased solubility in an alkali developing solution under action of an acid, and an acid generator component (B) which generates an acid upon exposure, wherein the component (A) includes a structural unit (a1) derived from a hydroxystyrene, and a structural unit (a2) containing an acid dissociable, dissolution inhibiting group; and the component (B) includes an acid generator (B1) composed of a compound represented by the general formula (b1) shown below:[Chemical Formula 1] X-Q1-Y1—SO3− A+ (b1) (in the formula, Q1 represents a bivalent linking group containing an oxygen atom; Y1 represents an alkylene group of 1 to 4 carbon atoms which may contain a substituent or a fluorinated alkylene group of 1 to 4 carbon atoms which may contain a substituent; X represents a hydrocarbon group of 3 to 30 carbon atoms which may contain a substituent; and A+ represents an organic cation).
摘要翻译：一种正型抗蚀剂组合物，包括在酸作用下在碱性显影液中显示出增加的溶解性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），其中组分（A）包括由羟基苯乙烯衍生的结构单元（a1）和含有酸解离的溶解抑制基团的结构单元（a2）组分（B）包括由以下通式（b1）表示的化合物组成的酸产生剂（B1）：[化学式1] X-Q1-Y1-SO3-A +（b1）（式中， Q1表示含有氧原子的二价连接基团; Y1表示可以含有取代基的1〜4个碳原子的亚烷基或可含有取代基的1〜4个碳原子的氟化亚烷基; X表示 3〜30个可含有取代基的碳原子; A +表示有机阳离子）。

8. 发明申请

US20090117490A1 POSITIVE RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY AND METHOD FOR FORMING RESIST PATTERN 有权
标题翻译：用于浸润光刻的正极性组合物和形成耐蚀图案的方法
公开(公告)号：US20090117490A1
公开(公告)日：2009-05-07
申请号：US12300760
申请日：2007-04-23
申请人： Kotaro Endo , Makiko Irie , Takeshi Iwai , Yoshiyuki Utsumi , Yasuhiro Yoshii , Tsuyoshi Nakamura
发明人： Kotaro Endo , Makiko Irie , Takeshi Iwai , Yoshiyuki Utsumi , Yasuhiro Yoshii , Tsuyoshi Nakamura
IPC分类号： G03F7/027 , G03F7/26
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A positive resist composition for immersion lithography of the present invention includes a resin component (A) which exhibits increased alkali solubility under the action of acid; and an acid generator component (B) which generates acid on exposure, wherein the resin component (A) includes a cyclic main chain resin (A1) containing a fluorine atom and no acid-dissociable group, and a resin (A2) containing a structural unit (a) derived from an acrylic acid and no fluorine atom.
摘要翻译：本发明的浸渍光刻用正型抗蚀剂组合物包括在酸作用下表现出增加的碱溶性的树脂组分（A）以及在曝光时产生酸的酸发生剂成分（B），其中，所述树脂成分（A）含有含有氟原子且不具有酸解离性基团的环状主链状树脂（A1）和含有结构式单元（a）衍生自丙烯酸而不含氟原子。

9. 发明申请

US20120264052A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND 有权
标题翻译：耐蚀组合物，形成耐火图案的方法和聚合物
公开(公告)号：US20120264052A1
公开(公告)日：2012-10-18
申请号：US13441200
申请日：2012-04-06
申请人： Makiko Irie , Tomoyuki Hirano , Daichi Takaki
发明人： Makiko Irie , Tomoyuki Hirano , Daichi Takaki
IPC分类号： G03F7/20 , C08F224/00 , C08F228/06 , G03F7/004
CPC分类号： G03F7/0397 , C08F224/00 , C08F228/06 , G03F7/2041
摘要： A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a resin component (A1) including a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms).
摘要翻译：一种抗蚀剂组合物，其包含在酸的作用下在显影液中显示改变的溶解度的碱成分（A）和曝光时产生酸的酸发生剂成分（B），含有树脂成分（A1 ）包括由下述通式（a0-1）表示的结构单元（a0）和衍生自可以具有与被取代基取代的被取代基取代的在α-位上的碳原子键合的丙烯酸酯的结构单元，并且含有通过酸（其中R表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的卤代烷基）的作用而显示出极性增加的酸可分解基团。

10. 发明授权

US08187789B2 Positive resist composition and method of forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US08187789B2
公开(公告)日：2012-05-29
申请号：US12428133
申请日：2009-04-22
申请人： Koji Yonemura , Makiko Irie , Hideo Hada
发明人： Koji Yonemura , Makiko Irie , Hideo Hada
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： A positive resist composition, including a resin component (A) which exhibits increased solubility in an alkali developing solution under action of an acid, and an acid generator component (B) which generates an acid upon exposure, wherein the component (A) includes a structural unit (a1) derived from a hydroxystyrene, and a structural unit (a2) containing an acid dissociable, dissolution inhibiting group; and the component (B) includes an acid generator (B1) composed of a compound represented by the general formula (b1) shown below: [Chemical Formula 1] X-Q1-Y1—SO3−A+ (b1) (in the formula, Q1 represents a bivalent linking group containing an oxygen atom; Y1 represents an alkylene group of 1 to 4 carbon atoms which may contain a substituent or a fluorinated alkylene group of 1 to 4 carbon atoms which may contain a substituent; X represents a hydrocarbon group of 3 to 30 carbon atoms which may contain a substituent; and A+ represents an organic cation).
摘要翻译：一种正型抗蚀剂组合物，包括在酸作用下在碱性显影液中显示出增加的溶解性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），其中组分（A）包括由羟基苯乙烯衍生的结构单元（a1）和含有酸解离的溶解抑制基团的结构单元（a2）组分（B）包括由以下通式（b1）表示的化合物构成的酸产生剂（B1）：[化学式1] X-Q1-Y1-SO3-A +（b1）（式中， Q1表示含有氧原子的二价连接基团; Y1表示可以含有取代基的1〜4个碳原子的亚烷基或可含有取代基的1〜4个碳原子的氟化亚烷基; X表示 3〜30个可含有取代基的碳原子; A +表示有机阳离子）。

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