专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20130038853A1 NANOMETER-PRECISION SIX-DEGREE-OF-FREEDOM MAGNETIC SUSPENSION MICRO-MOTION TABLE AND APPLICATION THEREOF 有权
标题翻译： NANOMETER-PRECISION六自由度磁悬浮微运动表及其应用
公开(公告)号：US20130038853A1
公开(公告)日：2013-02-14
申请号：US13635168
申请日：2011-03-15
申请人： Yu Zhu , Ming Zhang , Guang Li , Jinsong Wang , Jinchun Hu , Wensheng Yin , Kaiming Yang , Li Zhang , Jing Ma , Yan Xu , Yujie Li , Li Tian , Guanghong Duan
发明人： Yu Zhu , Ming Zhang , Guang Li , Jinsong Wang , Jinchun Hu , Wensheng Yin , Kaiming Yang , Li Zhang , Jing Ma , Yan Xu , Yujie Li , Li Tian , Guanghong Duan
IPC分类号： H02K41/02 , G03B27/58
CPC分类号： G03F7/70758 , G03F7/70716
摘要： A nanometer precision six-DOF magnetic suspension micro-stage and the application thereof are provided which are mainly used in semiconductor photolithography devices. The micro-stage includes a cross support and four two-DOF actuators. Each 2-DOF actuator comprises a vertically polarized permanent magnet, a horizontal force coil and a vertical force coil; the permanent magnet being mounted on an end of the cross support, the horizontal force coil and the vertical force coil being arranged on a side of and below the permanent magnet respectively and being spaced apart from the permanent magnet; the cross support and four vertically polarized permanent magnets constitute a mover of the micro-stage; the horizontal force coil and the vertical force coil being fixed by a coil framework respectively and constituting a stator of the micro-stage; and the stator being mounted on a base of the micro-stage. A dual-wafer table positioning system of a photolithography machine may be constructed by two said micro-stages in combination with a two-DOF large stroke linear motor. The present invention features simple structure, large driving force, small mass and absence of cable disturbance, and is possible to realize high precision, high acceleration six-DOF micro-motion.
摘要翻译：提供了主要用于半导体光刻设备的纳米精密六自由度磁悬浮微步及其应用。微型平台包括十字支架和四个双自由度执行器。每个2-DOF致动器包括垂直极化永磁体，水平力线圈和垂直力线圈; 所述永磁体安装在所述十字支架的一端上，所述水平力线圈和所述垂直力线圈分别设置在所述永久磁铁的一侧和下方并与所述永磁体隔开; 交叉支撑和四个垂直极化永磁体构成微型载物; 水平力线圈和垂直力线圈分别由线圈框架固定并构成微型定子; 并且定子安装在微型台的基座上。光刻机的双晶片台定位系统可以由两个微步与二自由度大行程直线电机组合构成。本发明结构简单，驱动力大，质量小，无电缆扰动，可实现高精度，高加速度六自由度微动作。

2. 发明授权

US08599361B2 Nanometer-precision six-degree-of-freedom magnetic suspension micro-motion table and application thereof 有权
标题翻译：纳米精度六自由度磁悬浮微动平台及其应用
公开(公告)号：US08599361B2
公开(公告)日：2013-12-03
申请号：US13635168
申请日：2011-03-15
申请人： Yu Zhu , Ming Zhang , Guang Li , Jinsong Wang , Jinchun Hu , Wensheng Yin , Kaiming Yang , Li Zhang , Jing Ma , Yan Xu , Yujie Li , Li Tian , Guanghong Duan
发明人： Yu Zhu , Ming Zhang , Guang Li , Jinsong Wang , Jinchun Hu , Wensheng Yin , Kaiming Yang , Li Zhang , Jing Ma , Yan Xu , Yujie Li , Li Tian , Guanghong Duan
IPC分类号： G03B27/42 , G03B27/58 , G03B27/62 , H02K41/02
CPC分类号： G03F7/70758 , G03F7/70716
摘要： A nanometer precision six-DOF magnetic suspension micro-stage and the application thereof are provided which are mainly used in semiconductor photolithography devices. The micro-stage includes a cross support and four two-DOF actuators. Each 2-DOF actuator comprises a vertically polarized permanent magnet, a horizontal force coil and a vertical force coil; the permanent magnet being mounted on an end of the cross support, the horizontal force coil and the vertical force coil being arranged on a side of and below the permanent magnet respectively and being spaced apart from the permanent magnet; the cross support and four vertically polarized permanent magnets constitute a mover of the micro-stage; the horizontal force coil and the vertical force coil being fixed by a coil framework respectively and constituting a stator of the micro-stage; and the stator being mounted on a base of the micro-stage. A dual-wafer table positioning system of a photolithography machine may be constructed by two said micro-stages in combination with a two-DOF large stroke linear motor. The present invention features simple structure, large driving force, small mass and absence of cable disturbance, and is possible to realize high precision, high acceleration six-DOF micro-motion.
摘要翻译：提供了主要用于半导体光刻设备的纳米精密六自由度磁悬浮微步及其应用。微型平台包括十字支架和四个双自由度执行器。每个2-DOF致动器包括垂直极化永磁体，水平力线圈和垂直力线圈; 所述永磁体安装在所述十字支架的一端上，所述水平力线圈和所述垂直力线圈分别设置在所述永久磁铁的一侧和下方并与所述永磁体隔开; 交叉支撑和四个垂直极化永磁体构成微型载物; 水平力线圈和垂直力线圈分别由线圈框架固定并构成微型定子; 并且定子安装在微型台的基座上。光刻机的双晶片台定位系统可以由两个微步与二自由度大行程直线电机组合构成。本发明结构简单，驱动力大，质量小，无电缆扰动，可实现高精度，高加速度六自由度微动作。

3. 发明授权

US09455650B2 Two-dimensional locating method of motion platform based on magnetic steel array 有权
标题翻译：基于磁钢阵列的运动平台二维定位方法
公开(公告)号：US09455650B2
公开(公告)日：2016-09-27
申请号：US13522788
申请日：2011-01-18
申请人： Jinchun Hu , Yu Zhu , Jinsong Wang , Ming Zhang , Kai Liao , Kaiming Yang , Dengfeng Xu , Wensheng Yin , Guanghong Duan
发明人： Jinchun Hu , Yu Zhu , Jinsong Wang , Ming Zhang , Kai Liao , Kaiming Yang , Dengfeng Xu , Wensheng Yin , Guanghong Duan
IPC分类号： G06F17/11 , H02N15/00 , G01D5/14
CPC分类号： H02N15/00 , G01D5/145
摘要： A two-dimensional locating method of a motion platform based on a magnetic steel array involves the following steps: placing more than four linear Hall sensors at any different positions within one or more polar distances of the magnetic steel array on the surface of the motion platform in a motion system; determining a magnetic flux density distribution model according to the magnetic steel array; determining the mounting positions of the above-mentioned linear Hall sensors, which are converted into phases with respect to the mass center of the motion platform; recording the magnetic flux density measured values of the linear Hall sensors as the motion proceeds; solving the phases of the mass center of the motion platform in a plane, with the measured values being served as observed quantities and the magnetic flux density distribution model being served as a computation model; and determining the position of the mass center of the motion platform with respect to an initial phase according to the phase, so as to realize the planar location of the motion platform. The present invention provides a simple, fast and robust method for computing mass center positions for a motion system containing a magnetic steel array.
摘要翻译：基于磁钢阵列的运动平台的二维定位方法包括以下步骤：将多于四个线性霍尔传感器放置在运动平台表面上的磁钢阵列的一个或多个极距离内的任何不同位置在运动系统中根据磁钢阵列确定磁通密度分布模型; 确定上述线性霍尔传感器的安装位置，其相对于运动平台的质心转换成相位; 在运动过程中记录线性霍尔传感器的磁通密度测量值; 解决平面中运动平台质心的相位，测量值作为观测量，磁通密度分布模型用作计算模型; 并根据相位确定运动平台的质量中心相对于初始相位的位置，以便实现运动平台的平面位置。本发明提供了一种用于计算包含磁钢阵列的运动系统的质心位置的简单，快速和鲁棒的方法。

4. 发明申请

US20130024157A1 TWO-DIMENSIONAL LOCATING METHOD OF MOTION PLATFORM BASED ON MAGNETIC STEEL ARRAY 有权
标题翻译：基于磁钢阵列的运动平台二维定位方法
公开(公告)号：US20130024157A1
公开(公告)日：2013-01-24
申请号：US13522788
申请日：2011-01-18
申请人： Jinchun Hu , Yu Zhu , Jinsong Wang , Ming Zhang , Kai Liao , Kaiming Yang , Dengfeng Xu , Wensheng Yin , Guanghong Duan
发明人： Jinchun Hu , Yu Zhu , Jinsong Wang , Ming Zhang , Kai Liao , Kaiming Yang , Dengfeng Xu , Wensheng Yin , Guanghong Duan
IPC分类号： G06F17/11 , G01B7/14
CPC分类号： H02N15/00 , G01D5/145
摘要： A two-dimensional locating method of a motion platform based on a magnetic steel array involves the following steps: placing more than four linear Hall sensors at any different positions within one or more polar distances of the magnetic steel array on the surface of the motion platform in a motion system; determining a magnetic flux density distribution model according to the magnetic steel array; determining the mounting positions of the above-mentioned linear Hall sensors, which are converted into phases with respect to the mass center of the motion platform; recording the magnetic flux density measured values of the linear Hall sensors as the motion proceeds; solving the phases of the mass center of the motion platform in a plane, with the measured values being served as observed quantities and the magnetic flux density distribution model being served as a computation model; and determining the position of the mass center of the motion platform with respect to an initial phase according to the phase, so as to realize the planar location of the motion platform. The present invention provides a simple, fast and robust method for computing mass center positions for a motion system containing a magnetic steel array.
摘要翻译：基于磁钢阵列的运动平台的二维定位方法包括以下步骤：将多于四个线性霍尔传感器放置在运动平台表面上的磁钢阵列的一个或多个极距离内的任何不同位置在运动系统中根据磁钢阵列确定磁通密度分布模型; 确定上述线性霍尔传感器的安装位置，其相对于运动平台的质心转换成相位; 在运动过程中记录线性霍尔传感器的磁通密度测量值; 解决平面中运动平台质心的相位，测量值作为观测量，磁通密度分布模型用作计算模型; 并根据相位确定运动平台的质量中心相对于初始相位的位置，以便实现运动平台的平面位置。本发明提供了一种用于计算包含磁钢阵列的运动系统的质心位置的简单，快速和鲁棒的方法。

5. 发明授权

US09030648B2 Dual wafer stage exchanging system for lithographic device 有权
标题翻译：用于光刻设备的双晶片台交换系统
公开(公告)号：US09030648B2
公开(公告)日：2015-05-12
申请号：US13262802
申请日：2010-04-02
申请人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
发明人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
IPC分类号： G03B27/58 , G03F7/20
CPC分类号： G03F7/70733 , G03F7/70716
摘要： A dual wafer stage exchanging system for a lithographic device is disclosed, said system comprises two wafer stages running between an exposure workstation and a pre-processing workstation, and said two stages are set on a base and suspended above the upper surface of the base by air bearings. Each wafer stages is passed through by a Y-direction guide rail respectively, wherein one end of said guide rail is connected with a main driving unit and another end of said guide rail is detachably coupled with one of the two X-direction auxiliary driving units with single degree of freedom, and said two wafer stages are capable of moving in Y-direction along the guide rails and moving in X-direction under the drive of the auxiliary driving units with single degree of freedom. The position exchange of said two wafer stages can be enabled by the detachment and connection of the Y-direction guide rails and the auxiliary units with single degree of freedom.
摘要翻译：公开了一种用于光刻设备的双晶片台交换系统，所述系统包括在曝光工作站和预处理工作站之间运行的两个晶片台，并且所述两个阶段被设置在基座上并且悬挂在基座的上表面上方的上表面上方空气轴承。每个晶片台分别通过Y方向导轨穿过，其中所述导轨的一端与主驱动单元连接，并且所述导轨的另一端可拆卸地与两个X方向辅助驱动单元中的一个具有单自由度，并且所述两个晶片台能够沿着导轨在Y方向上移动，并且在辅助驱动单元的驱动下以单自由度在X方向上移动。所述两个晶片台的位置交换可以通过Y方向导轨和辅助单元以单个自由度的分离和连接来实现。

6. 发明授权

US08860927B2 Dual-stage exchange system for lithographic apparatus 有权
标题翻译：光刻设备双级交换系统
公开(公告)号：US08860927B2
公开(公告)日：2014-10-14
申请号：US13262829
申请日：2010-04-02
申请人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
发明人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
IPC分类号： G03B27/58 , G03F7/20
CPC分类号： G03F7/70733
摘要： A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (13) operating in an exposure workstation (3) and a silicon chip (14) stage operating in a pre-processing workstation (4). The two silicon chip stages (13, 14) are provided on the same base stage (1), and suspended on an upper surface (2) of the base stage by air bearings. The two silicon chip stages (13, 14) can move along guide rails (15, 16) in the Y direction. One end of each guide rail (15, 16) is connected to a main driving unit (11, 12), and the other end of each guide rail (15, 16) is butt-jointed with an X-direction single-freedom auxiliary driving unit (7, 8). The silicon chip stages (13, 14) are driven by the single-freedom auxiliary driving units (7, 8) cooperated with the main driving units (11, 12) to move along the X direction. The single-freedom auxiliary driving units (7, 8) can be separated from or precisely butt-jointed with the Y-direction guide rails (15, 16), thereby achieving the position exchange of the two silicon chip stages (13, 14).
摘要翻译：用于光刻设备的双级交换系统包括在暴露工作站（3）中操作的硅芯片级（13）和在预处理工作站（4）中操作的硅芯片（14）级。两个硅片级（13,14）设置在同一基台（1）上，并通过空气轴承悬挂在基台的上表面（2）上。两个硅芯片级（13,14）可沿Y方向的导轨（15,16）移动。每个导轨（15,16）的一端连接到主驱动单元（11,12），并且每个导轨（15,16）的另一端与X方向单自由度辅助驱动单元（7,8）。硅片级（13,14）由与主驱动单元（11,12）配合的单自由度辅助驱动单元（7,8）驱动以沿X方向移动。单向辅助驱动单元（7,8）可以与Y方向导轨（15,16）分离或精确对接，从而实现两个硅芯片级（13,14）的位置交换，。

7. 发明申请

US20120127448A1 DUAL WAFER STAGE EXCHANGING SYSTEM FOR LITHOGRAPHIC DEVICE 有权
标题翻译：用于LITHOGRAPHIC设备的双波段交换系统
公开(公告)号：US20120127448A1
公开(公告)日：2012-05-24
申请号：US13262802
申请日：2010-05-25
申请人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
发明人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
IPC分类号： G03B27/58
CPC分类号： G03F7/70733 , G03F7/70716
摘要： A dual wafer stage exchanging system for a lithographic device is disclosed, said system comprises two wafer stages running between an exposure workstation and a pre-processing workstation, and said two stages are set on a base and suspended above the upper surface of the base by air bearings. Each wafer stages is passed through by a Y-direction guide rail respectively, wherein one end of said guide rail is connected with a main driving unit and another end of said guide rail is detachably coupled with one of the two X-direction auxiliary driving units with single degree of freedom, and said two wafer stages are capable of moving in Y-direction along the guide rails and moving in X-direction under the drive of the auxiliary driving units with single degree of freedom. The position exchange of said two wafer stages can be enabled by the detachment and connection of the Y-direction guide rails and the auxiliary units with single degree of freedom.
摘要翻译：公开了一种用于光刻设备的双晶片台交换系统，所述系统包括在曝光工作站和预处理工作站之间运行的两个晶片台，并且所述两个阶段被设置在基座上并且悬挂在基座的上表面上方的上表面上方空气轴承。每个晶片台分别通过Y方向导轨穿过，其中所述导轨的一端与主驱动单元连接，并且所述导轨的另一端可拆卸地与两个X方向辅助驱动单元中的一个具有单自由度，并且所述两个晶片台能够沿着导轨在Y方向上移动，并且在辅助驱动单元的驱动下以单自由度在X方向上移动。所述两个晶片台的位置交换可以通过Y方向导轨和辅助单元以单个自由度的分离和连接来实现。

8. 发明申请

US20120099095A1 DUAL-STAGE EXCHANGE SYSTEM FOR LITHOGRAPHIC APPARATUS 有权
标题翻译：用于平面设备的双级交换系统
公开(公告)号：US20120099095A1
公开(公告)日：2012-04-26
申请号：US13262829
申请日：2010-04-02
申请人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
发明人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
IPC分类号： G03B27/58
CPC分类号： G03F7/70733
摘要： A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (13) operating in an exposure workstation (3) and a silicon chip (14) stage operating in a pre-processing workstation (4). The two silicon chip stages (13, 14) are provided on the same base stage (1), and suspended on an upper surface (2) of the base stage by air bearings. The two silicon chip stages (13, 14) can move along guide rails (15, 16) in the Y direction. One end of each guide rail (15, 16) is connected to a main driving unit (11, 12), and the other end of each guide rail (15, 16) is butt-jointed with an X-direction single-freedom auxiliary driving unit (7, 8). The silicon chip stages (13, 14) are driven by the single-freedom auxiliary driving units (7, 8) cooperated with the main driving units (11, 12) to move along the X direction. The single-freedom auxiliary driving units (7, 8) can be separated from or precisely butt-jointed with the Y-direction guide rails (15, 16), thereby achieving the position exchange of the two silicon chip stages (13, 14).
摘要翻译：用于光刻设备的双级交换系统包括在暴露工作站（3）中操作的硅芯片级（13）和在预处理工作站（4）中操作的硅芯片（14）级。两个硅片级（13,14）设置在同一基台（1）上，并通过空气轴承悬挂在基台的上表面（2）上。两个硅芯片级（13,14）可沿Y方向的导轨（15,16）移动。每个导轨（15,16）的一端连接到主驱动单元（11,12），并且每个导轨（15,16）的另一端与X方向单自由度辅助驱动单元（7,8）。硅片级（13,14）由与主驱动单元（11,12）配合的单自由度辅助驱动单元（7,8）驱动以沿X方向移动。单向辅助驱动单元（7,8）可以与Y方向导轨（15,16）分离或精确对接，从而实现两个硅芯片级（13,14）的位置交换，。

9. 发明申请

US20120099094A1 DUAL-STAGE EXCHANGE SYSTEM FOR LITHOGRAPHIC APPARATUS 有权
标题翻译：用于平面设备的双级交换系统
公开(公告)号：US20120099094A1
公开(公告)日：2012-04-26
申请号：US13262783
申请日：2010-04-02
申请人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
发明人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
IPC分类号： G03B27/58
CPC分类号： H01L21/682 , G03F7/70733 , G03F7/70758
摘要： A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (10) operating in an exposure workstation (6) and a silicon chip stage (12) operating in a pre-processing workstation (7). Each silicon chip stage (10, 12) is supported by a six-freedom micro-motion stage, respectively. The silicon chip stage (10, 12) and the six-freedom micro-motion stage form a silicon chip stage group. The two silicon chip stage groups are provided on the same rectangular base stage (1) and suspended on an upper surface (2) of the base sage by air bearings. A double-freedom driving unit (21a, 21b, 22a, 22b) is provided on each edge of the base stage (1), respectively. The six-freedom micro-motion stage of the silicon chip stage group has an upper layer driver and a lower layer driver, capable of achieving six-freedom control. The double-freedom driving units (21a, 21b) on the long edges of the base stage are connected with the bases (62) of the six-freedom micro-motion stages, and the double-freedom driving units (22a, 22b) on the short edges of the base stage are connected with the stator coils (63) of the upper layer drivers of the six-freedom micro-motion stages.
摘要翻译：用于光刻设备的双级交换系统包括在暴露工作站（6）中操作的硅芯片级（10）和在预处理工作站（7）中操作的硅芯片级（12）。每个硅芯片级（10,12）分别由六自由度微动平台支撑。硅片级（10,12）和六自由度微运动级形成硅芯片级组。两个硅芯片台组设置在相同的矩形基台（1）上，并通过空气轴承悬挂在基座的上表面（2）上。分别在基台（1）的每个边缘上设置双自由度驱动单元（21a，21b，22a，22b）。硅片级组的六自由度微动阶段具有能够实现六自由度控制的上层驱动器和下层驱动器。基台的长边缘上的双重自由度驱动单元（21a，21b）与六自由度微动台的基座（62）连接，双重自由度驱动单元（22a，22b）在基台的短边缘与六自由度微动级的上层驱动器的定子线圈（63）连接。

10. 发明授权

US08836918B2 Dual-stage exchange system for lithographic apparatus 有权
标题翻译：光刻设备双级交换系统
公开(公告)号：US08836918B2
公开(公告)日：2014-09-16
申请号：US13262783
申请日：2010-04-02
申请人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
发明人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
IPC分类号： G03B27/58
CPC分类号： H01L21/682 , G03F7/70733 , G03F7/70758
摘要： A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (10) operating in an exposure workstation (6) and a silicon chip stage (12) operating in a pre-processing workstation (7). Each silicon chip stage (10, 12) is supported by a six-freedom micro-motion stage, respectively. The silicon chip stage (10, 12) and the six-freedom micro-motion stage form a silicon chip stage group. The two silicon chip stage groups are provided on the same rectangular base stage (1) and suspended on an upper surface (2) of the base sage by air bearings. A double-freedom driving unit (21a, 21b, 22a, 22b) is provided on each edge of the base stage (1), respectively. The six-freedom micro-motion stage of the silicon chip stage group has an upper layer driver and a lower layer driver, capable of achieving six-freedom control. The double-freedom driving units (21a, 21b) on the long edges of the base stage are connected with the bases (62) of the six-freedom micro-motion stages, and the double-freedom driving units (22a, 22b) on the short edges of the base stage are connected with the stator coils (63) of the upper layer drivers of the six-freedom micro-motion stages.
摘要翻译：用于光刻设备的双级交换系统包括在暴露工作站（6）中操作的硅芯片级（10）和在预处理工作站（7）中操作的硅芯片级（12）。每个硅芯片级（10,12）分别由六自由度微动平台支撑。硅片级（10,12）和六自由度微运动级形成硅芯片级组。两个硅芯片台组设置在相同的矩形基台（1）上，并通过空气轴承悬挂在基座的上表面（2）上。分别在基台（1）的每个边缘上设置双自由度驱动单元（21a，21b，22a，22b）。硅片级组的六自由度微动阶段具有能够实现六自由度控制的上层驱动器和下层驱动器。基台的长边缘上的双重自由度驱动单元（21a，21b）与六自由度微动台的基座（62）连接，双重自由度驱动单元（22a，22b）在基台的短边缘与六自由度微动级的上层驱动器的定子线圈（63）连接。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式