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    • 10. 发明授权
    • Photosensitive resin composition, resist laminate, and articles obtained by curing same (7)
    • 感光树脂组合物,抗蚀剂层压体和通过固化获得的制品(7)
    • US09448479B2
    • 2016-09-20
    • US14443679
    • 2013-11-21
    • Nippon Kayaku Kabushiki Kaisha
    • Naoko ImaizumiShinya InagakiNao Honda
    • G03F7/075C08G59/24C08G59/32C08G59/62G03F7/038
    • G03F7/0755C08G59/063C08G59/24C08G59/245C08G59/32C08G59/3218C08G59/38C08G59/62C08G59/621C08K5/109C08K5/13C08K5/5419C08L33/068C08L63/00G03F7/038G03F7/0751
    • The purpose of the present invention is to provide the following: a photosensitive epoxy resin composition that, via photolithography, can form a high-resolution, low-stress image that has vertical side walls and resists moisture and heat, and/or a resist laminate using said photosensitive epoxy resin composition; and an article or articles obtained by curing said photosensitive epoxy resin composition and/or resist laminate. The present invention is a photosensitive resin composition containing the following: an epoxy resin (A), a polyhydric phenol compound (B) having a specific structure, a cationic-polymerization photoinitiator (C), a silane compound (D) containing an epoxy group, and a reactive epoxy monomer (E) having a specific structure. The epoxy resin (A) contains the phenol derivative represented by formula (1), an epoxy resin (a) obtained via a reaction with epihalohydrin, and an epoxy resin (b) that can be represented by formula (2). The reactive epoxy monomer (E) is a bisphenol epoxy resin.
    • 本发明的目的是提供以下:通过光刻法可以形成具有垂直侧壁并抵抗水分和热量的高分辨率,低应力图像的光敏环氧树脂组合物和/或抗蚀剂层压体 使用所述感光性环氧树脂组合物; 以及通过固化所述感光性环氧树脂组合物和/或抗蚀剂层压体而获得的制品或制品。 本发明是含有以下的感光性树脂组合物:环氧树脂(A),具有特定结构的多元酚化合物(B),阳离子聚合光引发剂(C),含有环氧基的硅烷化合物(D) ,和具有特定结构的反应性环氧单体(E)。 环氧树脂(A)含有由式(1)表示的苯酚衍生物,通过与表卤代醇反应获得的环氧树脂(a)和可由式(2)表示的环氧树脂(b)。 反应性环氧单体(E)是双酚环氧树脂。