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1. 发明申请

US20180355465A1 SUBSTRATE CLEANING APPARATUS 审中-公开
公开(公告)号：US20180355465A1
公开(公告)日：2018-12-13
申请号：US15781242
申请日：2016-10-25
申请人： TOKYO ELECTRON LIMITED
发明人： Yukimasa SAITO , Toshiki HINATA , Kazuya DOBASHI , Kyoko IKEDA , Shuji MORIYA
IPC分类号： C23C14/02 , C23C16/02 , H01L21/304 , C23C14/56 , C23C14/50 , H01L21/687 , H01L21/02
CPC分类号： C23C14/022 , C23C14/02 , C23C14/505 , C23C14/564 , C23C16/02 , H01L21/02041 , H01L21/302 , H01L21/304 , H01L21/68714
摘要： A substrate cleaning apparatus that cleans a processing target substrate by blasting the gas clusters to the processing target substrate. The apparatus includes: a chamber configured to accommodate the processing target substrate; a rotary stage configured to rotatably support the processing target substrate in the chamber; an blasting unit configured to blast the gas clusters to the processing target substrate supported by the rotary stage; a driving unit configured to scan a gas cluster-blasted position on the processing target substrate; an exhaust port configured to evacuate the chamber; and a control mechanism configured to control a scattering direction of particles by controlling a rotation direction of the processing target substrate by the rotary stage and a scanning direction of the gas cluster-blasted position, thereby suppressing re-adhesion of the particles to the processing target substrate.

2. 发明申请

US20180190984A1 SILVER NANO-METAL MESH INCLUSIVE ELECTRODE, TOUCH PANEL WITH SILVER NANO-METAL MESH INCLUSIVE ELECTRODE, AND/OR METHOD OF MAKING THE SAME 审中-公开
公开(公告)号：US20180190984A1
公开(公告)日：2018-07-05
申请号：US15855343
申请日：2017-12-27
申请人： Guardian Glass, LLC
发明人： Jason BLUSH , Patricia TUCKER
IPC分类号： H01M4/54 , G06F3/044 , G06F3/047
CPC分类号： H01M4/54 , C03C17/36 , C03C17/3644 , C03C17/3652 , C03C17/3671 , C03C2217/944 , C23C14/02 , C23C14/185 , C23C14/5806 , G06F3/0412 , G06F3/044 , G06F3/047 , G06F2203/04103 , G06F2203/04112
摘要： Certain example embodiments relate to silver nano-metal mesh inclusive electrodes, and/or methods of making the same. The techniques described herein may be used, for example, in projected capacitive touch panels, display devices, and/or the like. Purposeful de-wetting of physical vapor deposited (PVD) silver (e.g., sputter deposited silver) is used to create the mesh. The properties of the mesh can be controlled through heat treatment, changes to the base layer composition (e.g., using materials with different surface energies, or adjusting surface energies), the creation of non-Ag PVD or otherwise formed islands that act as nodes for the film to attached itself to during the de-wetting process, and/or the like.

3. 发明申请

US20180171459A1 High Strength Steel and Production Method 审中-公开
公开(公告)号：US20180171459A1
公开(公告)日：2018-06-21
申请号：US15735337
申请日：2016-06-09
申请人： ArcelorMittal
发明人： Josee Drillet , Veronique Hebert
IPC分类号： C23C2/02 , C23C14/02 , C23C2/06 , C23C2/28 , C23C2/40 , C22C38/38 , C22C38/32 , C22C38/28 , C22C38/26 , C22C38/22 , C22C38/06 , C22C38/02 , C22C38/00 , C21D8/02 , B32B15/01
CPC分类号： C23C2/02 , B32B15/013 , C21D8/0226 , C21D8/0236 , C21D8/0247 , C21D8/0273 , C21D8/0426 , C21D8/0436 , C21D8/0447 , C21D8/0473 , C21D9/46 , C21D9/48 , C21D2211/002 , C21D2211/005 , C21D2211/008 , C22C38/001 , C22C38/002 , C22C38/02 , C22C38/06 , C22C38/22 , C22C38/26 , C22C38/28 , C22C38/32 , C22C38/38 , C23C2/06 , C23C2/28 , C23C2/40 , C23C14/02
摘要： The present invention provides a cold-rolled and annealed steel sheet of thickness between 0.7 mm and 2 mm, mechanical strength ranging from 1180 MPa to 1320 MPa, wherein the hole expansion ratio Ac % is greater than 20% and the bending angle is greater than or equal to 40°. The chemical composition includes, the contents being expressed as weight percent: 0.09%≤C≤0.11%, 2.6%≤Mn≤2.8%, 0.20%≤Si≤0.55%, 0.25%≤Cr

4. 发明申请

US20170244035A1 DEPOSITION MASK, DEPOSITION DEVICE, DEPOSITION METHOD, AND DEPOSITION MASK MANUFACTURING METHOD 审中-公开
公开(公告)号：US20170244035A1
公开(公告)日：2017-08-24
申请号：US15519058
申请日：2015-10-15
申请人： SHARP KABUSHIKI KAISHA
发明人： Shinichi KAWATO , Manabu NIBOSHI , Yuhki KOBAYASHI , Kazuo TAKIZAWA
IPC分类号： H01L51/00 , H01L51/56 , H01L51/50 , C23C14/04 , C23C14/02
CPC分类号： H01L51/0011 , C23C14/02 , C23C14/04 , C23C14/042 , H01L51/50 , H01L51/5012 , H01L51/56 , H05B33/10
摘要： A magnetic material section is provided on a mask substrate so as to be interposed between Y aperture lines of the mask substrate and between X aperture line of the mask substrate. A portion of the magnetic material section which portion is interposed between the X aperture lines has a first thickness and a second thickness which is less than the first thickness, the first thickness being that of each sub-portion thereof which is positioned between mutually adjacent ones of the Y aperture lines, the second thickness being that of each sub-portion thereof which is positioned between apertures which are mutually adjacent in a Y direction.

5. 发明申请

US20160326628A1 COATING PROCESS USING GAS SCREEN 审中-公开
标题翻译：使用气体筛选的涂料工艺
公开(公告)号：US20160326628A1
公开(公告)日：2016-11-10
申请号：US15109884
申请日：2015-01-07
申请人： UNITED TECHNOLOGIES CORPORATION
发明人： Joseph A. DePalma , Mladen F. Trubelja , David A. Litton , Dmitri L. Novikov , Sergei F. Burlatsky
IPC分类号： C23C14/22 , C23C14/02 , C23C14/24 , C23C14/30
CPC分类号： C23C14/228 , C23C14/02 , C23C14/083 , C23C14/243 , C23C14/30
摘要： A method for use in a coating process includes pre-heating a substrate in the presence of a coating material and shielding the substrate during the pre-heating from premature deposition of the coating material by establishing a gas screen between the substrate and the coating material. An apparatus for use in a coating process includes a chamber, a crucible that is configured to hold a coating material in the chamber, an energy source operable to heat the interior of the chamber, a coating envelope situated with respect to the crucible, and at least one gas manifold located near the coating envelope. The at least one gas manifold is configured to provide a gas screen between the coating envelope and the crucible. A second manifold provides gas during a later coating deposition to compress a vapor plume of the coating material and focus the plume on the substrate to increase deposition rate.
摘要翻译：用于涂布方法的方法包括在涂料存在下预热基材，并且在预加热期间屏蔽基材以防止涂料过早沉积，从而在基材和涂料之间建立气体筛网。一种用于涂覆工艺的设备包括：腔室，构造成将涂层材料保持在腔室中的坩埚，可操作以加热腔室内部的能量源，相对于坩埚定位的涂层壳体，以及位于位于涂层外壳附近的至少一个气体歧管。至少一个气体歧管被配置成在涂层包封和坩埚之间提供气体筛网。第二歧管在稍后的涂层沉积期间提供气体以压缩涂层材料的蒸气羽流并将羽流聚焦在基底上以增加沉积速率。

6. 发明申请

US20160305011A1 METHOD OF METALLIC COMPONENT SURFACE MODIFICATION FOR ELECTROCHEMICAL APPLICATIONS 审中-公开
标题翻译：电化学应用金属组分表面改性方法
公开(公告)号：US20160305011A1
公开(公告)日：2016-10-20
申请号：US15130330
申请日：2016-04-15
申请人： TREADSTONE TECHNOLOGIES, INC.
发明人： Conghua WANG , Yong TAO , Lin ZHANG , Gerald A. GONTARZ
IPC分类号： C23C14/32 , C23C14/35 , C23C14/02 , C23F1/28 , C23F17/00 , C23C4/12 , C21D6/00 , C22C14/00 , C22F1/18 , H01M8/1018 , H01M8/021 , C23C14/16 , C21D9/00
CPC分类号： C23C14/325 , C21D6/002 , C21D9/0068 , C22C14/00 , C22F1/183 , C23C4/02 , C23C4/08 , C23C4/12 , C23C8/10 , C23C14/02 , C23C14/021 , C23C14/16 , C23C14/165 , C23C14/35 , C23C28/321 , C23C28/345 , C23F1/26 , C23F1/28 , C23F17/00 , C25B15/00 , H01G9/055 , H01G11/70 , H01M4/661 , H01M4/662 , H01M4/667 , H01M8/0206 , H01M8/0208 , H01M8/021 , H01M8/0228 , H01M8/1018 , H01M2008/1095 , Y02E60/13
摘要： Method for forming a metallic component surface to achieve lower electrical contact resistance. The method comprises modifying a surface chemical composition and creating a micro-textured surface structure of the metallic component that includes small peaks and/or pits. The small peaks and pits have a round or irregular cross-sectional shape with a diameter between 10 nm and 10 microns, a height/depth between 10 nm and 10 microns, and a distribution density between 0.4 million/cm2 and 5 billion cm2.
摘要翻译：用于形成金属部件表面以实现较低的电接触电阻的方法。该方法包括改变表面化学组成并产生包括小峰和/或凹坑的金属组分的微纹理表面结构。小的峰和凹坑具有直径在10nm和10微米之间的圆形或不规则的横截面形状，高度/深度在10nm和10微米之间，分布密度在40万/ cm2到50亿cm2之间。

7. 发明申请

US20160194739A1 COLD ROLLED STEEL SHEET, METHOD OF MANUFACTURING AND VEHICLE 审中-公开
标题翻译：冷轧钢板，制造方法和车辆
公开(公告)号：US20160194739A1
公开(公告)日：2016-07-07
申请号：US14901931
申请日：2014-07-03
申请人： ArcelorMittal Investigacion y Desarrollo SL
发明人： Franco Del Frate , Jean-Michel Mataigne , Jonas Stauddte , Astrid Perlade , Ian Alberto Zuazo-Rodriquez
IPC分类号： C22C38/38 , C23C2/02 , C23C14/24 , C23C14/02 , C23C14/14 , C25D3/22 , C25D5/36 , C22C38/28 , C22C38/26 , C22C38/24 , C22C38/06 , C22C38/02 , C22C38/00 , C21D9/46 , C21D8/02 , C21D6/00 , B22D11/00 , C23C2/06
CPC分类号： C22C38/38 , B22D11/001 , B32B15/013 , B32B15/04 , B32B15/043 , B32B15/18 , C21D1/74 , C21D6/002 , C21D6/005 , C21D6/008 , C21D8/0205 , C21D8/0221 , C21D8/0226 , C21D8/0236 , C21D8/0263 , C21D8/0278 , C21D9/46 , C21D9/52 , C21D2211/001 , C21D2211/004 , C21D2211/005 , C22C38/002 , C22C38/02 , C22C38/04 , C22C38/06 , C22C38/12 , C22C38/14 , C22C38/18 , C22C38/24 , C22C38/26 , C22C38/28 , C22C38/34 , C22C38/44 , C22C38/46 , C22C38/48 , C22C38/50 , C22C38/58 , C23C2/02 , C23C2/04 , C23C2/06 , C23C2/12 , C23C2/26 , C23C2/28 , C23C2/40 , C23C14/02 , C23C14/14 , C23C14/16 , C23C14/24 , C23C14/58 , C23C14/5806 , C23C28/021 , C23C28/023 , C23C28/025 , C23C28/322 , C23C28/3225 , C23C30/00 , C23C30/005 , C25D3/22 , C25D5/36 , Y10T428/1259 , Y10T428/12611 , Y10T428/12618 , Y10T428/1266 , Y10T428/12667 , Y10T428/12757 , Y10T428/12799 , Y10T428/12951 , Y10T428/12958 , Y10T428/12965 , Y10T428/12972 , Y10T428/12979 , Y10T428/2495 , Y10T428/24967 , Y10T428/263 , Y10T428/264 , Y10T428/265
摘要： A cold rolled and hot dip coated steel sheet presenting a tensile strength above 1000−50×Al MPa, a uniform elongation above 15% and a low density is provided. The steel includes, by weight percent: 0.1≦C≦0.5%, 3.5≦Mn≦10.0%, 0≦Al≦9.0%, Si≦5.0%, Ti≦0.2%, V≦0.2%, Nb≦0.2%, S≦0.004%, P≦0.025%, 0.5≦Si+Al≦9.0%, B≦0.0035, Cr≦1%, The balance being Fe and impurities and the microstructure containing 25% to 90% of ferrite, 10% to 50% of austenite, kappa precipitates lower than 5% and martensite lower than 25%. The steel is able to be coated using total oxidation.
摘要翻译：提供抗拉强度高于1000-50×Al MPa，均匀伸长率高于15％和低密度的冷轧和热浸镀钢板。该钢包括以重量百分比计：0.1％和0.1％; C＆NlE; 0.5％，3.5％和1％; Mn和nlE; 10.0％，0％和1％; Al和nlE; 9.0％Si和NlE; 5.0％Ti和NlE; 0.2％，S＆nlE; 0.004％，P＆nlE; 0.025％，0.5＆nlE; Si + Al＆nlE; 9.0％，B＆nlE; 0.0035，Cr＆nlE; 1％，余量为Fe和杂质，微结构包含25％至90％的铁素体，10％至50％的奥氏体，卡巴沉淀物低于5％，马氏体低于25％。钢可以使用全氧化涂层。

8. 发明授权

US09287112B2 Slab laser and amplifier and method of use 有权
标题翻译：平板激光和放大器及其使用方法
公开(公告)号：US09287112B2
公开(公告)日：2016-03-15
申请号：US14418500
申请日：2013-08-01
申请人： Martin A. Stuart , Stephen L. Cunningham
发明人： Martin A. Stuart , Stephen L. Cunningham
IPC分类号： H01S3/08 , H01S3/091 , H01S3/092 , H01L21/02 , H01L21/3205 , H01S3/06 , H01S3/04 , H01S3/042 , H01S3/093 , H01S3/16 , H01S3/23 , H01S3/11 , H01L31/024 , H01L31/18 , C23C16/27 , G02B6/122
CPC分类号： H01S3/0606 , C23C14/02 , C23C14/28 , C23C16/27 , G02B6/1223 , H01L21/02115 , H01L21/02181 , H01L21/02183 , H01L21/02194 , H01L21/02266 , H01L21/3205 , H01L31/024 , H01L31/18 , H01S3/0071 , H01S3/0407 , H01S3/042 , H01S3/0615 , H01S3/0621 , H01S3/08027 , H01S3/08086 , H01S3/08095 , H01S3/0915 , H01S3/092 , H01S3/093 , H01S3/11 , H01S3/1601 , H01S3/1623 , H01S3/1625 , H01S3/163 , H01S3/1633 , H01S3/1636 , H01S3/1666 , H01S3/23 , H01S3/2316 , H01S3/2333
摘要： A slab laser and its method of use for high power applications including the manufacture of semiconductors and deposition of diamond and/or diamond-like-carbon layers, among other materials. A lamp driven slab design with a face-to-face beam propagation scheme and an end reflection that redirects the amplified radiation back out the same input surface is utilized. A side-to-side amplifier configuration permitting very high average and peak powers having scalability is also disclosed. Cavity filters adjacent to pump lamps convert the normally unusable UV portion of the pump lamp spectrum into light in the absorption band of the slab laser, thereby increasing the overall pump efficiency. The angle of the end reflecting surface is changed to cause the exit beam to be at a different angle than the inlet beam, thereby eliminating the costly need to separate the beams external to the laser with the subsequent loss of power.
摘要翻译：平板激光器及其用于大功率应用的方法，包括半导体的制造和金刚石和/或类金刚石碳层的沉积等。利用具有面对面波束传播方案的灯驱动平板设计和将放大的辐射重定向到相同的输入表面的端反射。还公开了允许具有可扩展性的非常高的平均和峰值功率的侧向放大器配置。与泵浦灯相邻的腔过滤器将泵灯光谱的通常不可用的UV部分转换成板激光器的吸收带中的光，从而提高整体泵效率。改变端部反射表面的角度以使出射光束与入射光束处于不同的角度，从而消除了将激光外部的光束分离成随后的功率损耗的昂贵的需要。

9. 发明申请

US20150130064A1 METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES AND A SEMICONDUCTOR STRUCTURE 审中-公开
公开(公告)号：US20150130064A1
公开(公告)日：2015-05-14
申请号：US14601296
申请日：2015-01-21
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人： Felix P. ANDERSON , Steven P. BARKYOUMB , Edward C. COONEY, III , Thomas L. MCDEVITT , William J. MURPHY , David C. STRIPPE
IPC分类号： H01L23/532 , H01L23/522
CPC分类号： H01L23/53209 , C23C14/02 , C23C14/0641 , H01L21/2855 , H01L21/76843 , H01L23/5226 , H01L2924/0002 , H01L2924/00
摘要： Processes for improving adhesion of films to semiconductor wafers and a semiconductor structure are provided. By implementing the processes of the invention, it is possible to significantly suppress defect creation, e.g., decrease particle generation, during wafer fabrication processes. More specifically, the processes described significantly reduce flaking of a TaN film from edges or extreme edges (bevel) of the wafer by effectively increasing the adhesion properties of the TaN film on the wafer. The method increasing a mol percent of nitride with respect to a total tantalum plus nitride to 25% or greater during a barrier layer fabrication process.

10. 发明授权

US08875652B2 Liquid adhesive boundary control 有权
标题翻译：液体粘合剂边界控制
公开(公告)号：US08875652B2
公开(公告)日：2014-11-04
申请号：US13232902
申请日：2011-09-14
申请人： Casey J. Feinstein , Kuo-Hua Sung , Ralf Horstkemper
发明人： Casey J. Feinstein , Kuo-Hua Sung , Ralf Horstkemper
IPC分类号： B05C9/08 , B05C11/00 , B05C3/18 , C23C16/52 , B29C65/00 , B29C65/14 , B05C9/12 , C23C14/02 , C08J7/18 , C09J5/00 , H01L23/00 , B32B7/12 , B29C65/48 , B29L31/34 , B29C65/52
CPC分类号： B05C9/12 , B05C3/18 , B05C11/00 , B29C65/1406 , B29C65/1435 , B29C65/1448 , B29C65/1464 , B29C65/1496 , B29C65/4845 , B29C65/52 , B29C66/324 , B29C66/345 , B29C66/45 , B29C66/8322 , B29L2031/3475 , B32B7/12 , C08J7/18 , C09J5/00 , C09J2205/31 , C23C14/02 , H01L24/00 , H01L24/75 , H01L24/83 , H01L2224/75901 , H01L2224/83874 , H01L2224/83909 , H01L2224/83951
摘要： A system for controlling a boundary of spreading liquid adhesive on a surface is disclosed. The system includes one or more ultra-violet (UV) sources configurable to emit UV light onto the liquid adhesive; and a control circuit coupled to the one or more UV sources and configured to control the one or more UV sources to selectively apply the UV light at selected locations on the liquid adhesive to cure the adhesive and prevent its further spread at those locations.
摘要翻译：公开了一种用于控制表面上扩展液体粘合剂的边界的系统。该系统包括一个或多个紫外线（UV）源，可配置为将UV光发射到液体粘合剂上; 以及耦合到所述一个或多个UV源并被配置为控制所述一个或多个UV源以选择性地将UV光施加在所述液体粘合剂上的选定位置处以固化所述粘合剂并防止其在所述位置处进一步扩散的控制电路。

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