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    • 4. 发明申请
    • ELECTROLYTIC COPPER FOIL AND PRODUCTION METHOD OF ELECTROLYTIC COPPER FOIL
    • 电解铜箔和电解铜箔的生产方法
    • US20140318973A1
    • 2014-10-30
    • US14009056
    • 2012-03-28
    • Michiya Kohiki
    • Michiya Kohiki
    • H01M4/66
    • H01M4/661C25D1/04C25D5/48C25D7/06C25D11/38
    • The present invention provides an electrolytic copper foil that has a high normal tensile strength, a low decrease in tensile strength after a thermal history, and a low concentration of impurities in the copper foil and a method for producing the copper foil. Specifically, the electrolytic copper foil in which a sulfur concentration of the copper foil is not less than 10 ppm by mass but no more than 50 ppm by mass, wherein when lattices with a spacing of 10 nm in a STEM image observed with a scanning transmission electron microscope at a magnification of 1 million times are formed and intersections of each lattice are used as a measurement point for determining a sulfur concentration, there is a measurement point at which the sulfur concentration is higher as compared to the sulfur concentration of the copper foil.
    • 本发明提供一种电解铜箔,其具有高的正常拉伸强度,热历史后的拉伸强度的低降低和铜箔中的杂质浓度低,以及铜箔的制造方法。 具体而言,铜箔的硫浓度为10质量ppm以上且50质量ppm以下的电解铜箔,其中,在扫描透射中观察到STEM图像中间隔为10nm的晶格 形成1万倍的倍率的电子显微镜,使用各格子的交点作为测定硫浓度的测定点,与铜箔的硫浓度相比,存在硫浓度高的测定点 。
    • 9. 发明申请
    • Copper Foil and Method of Manufacturing the Same
    • 铜箔及其制造方法
    • US20080280159A1
    • 2008-11-13
    • US11547517
    • 2005-03-31
    • Kenichiro IwakiriSeiji Nagatani
    • Kenichiro IwakiriSeiji Nagatani
    • B23P9/00C25F3/00
    • C25D7/06H05K3/382H05K2201/0355Y10T428/12438Y10T428/12569Y10T428/1291Y10T428/12993
    • The object is to provide copper foil of high adhesion even when the roughness Rz of a nodular surface of the copper foil is low, and a method of manufacturing the copper foil. To achieve this object, there is adopted a copper foil which is characterized in that an area coefficient C(S), which is defined by A(S)/B(S) from a three-dimensional surface area A(S), which is obtained by performing three-dimensional measurement of a surface area of a nodular surface of a copper foil sample S under a laser microscope, and from a measuring region area B(S), which is an area of a measuring region of the three-dimensional surface area A(S), and a roughness Rz(S) of a nodular surface of the copper foil sample S, which is measured by a stylus-type roughness meter, have a relationship of equation (1) below, and in that the roughness Rz(S) is 1.0 μm to 3.0 μm, 0.5×Rz(S)+0.5≦C(S)   (1) where Rz(S) is a numerical value represented by μm.
    • 本发明的目的是为了提供铜箔的高粘合性,即使铜箔的结节面的粗糙度R z较低,也可以提供铜箔的制造方法。 为了实现该目的,采用铜箔,其特征在于,由三维表面积A(S)由A(S)/ B(S)定义的面积系数C(S),其中 通过在激光显微镜下对铜箔样品S的结节面的表面积进行三维测量,并且从作为三维测量区域的测量区域的面积的测量区域B(S)获得, 通过针式粗糙度计测量的铜箔样品S的结节表面的尺寸表面积A(S)和粗糙度R z(S)具有等式 (1),并且粗糙度R z(S)为1.0μm〜3.0μm,<?在线式描述=“In-line Formulas”end =“lead”? > 0.5xR z(S)+0.5 <= C(S)(1)<?在线公式描述=“在线公式”end =“tail”?>其中R < (S)是由mum表示的数值。