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1. 发明申请

US20180024437A1 EDGE EXPOSURE APPARATUS 审中-公开
公开(公告)号：US20180024437A1
公开(公告)日：2018-01-25
申请号：US15541636
申请日：2015-01-28
申请人： Mitsubishi Electric Corporation
发明人： Naoyuki TAKEDA , Shoichi KUGA
IPC分类号： G03F7/20 , H01L21/67
CPC分类号： G03F7/70825 , G03F7/2028 , G03F7/7015 , G03F7/70266 , G03F7/70308 , G03F7/70433 , G03F7/708 , G03F7/70808 , H01L21/67259
摘要： An edge exposure apparatus for exposure of an outer circumferential portion of a semiconductor substrate to light includes a light source provided to be able to emit light to the outer circumferential portion and a mirror having a reflection surface arranged to extend in a direction intersecting with an optical axis of light emitted from the light source. The mirror is provided between the outer circumferential portion and a center of the semiconductor substrate in a radial direction of the semiconductor substrate in exposure of the outer circumferential portion of the semiconductor substrate to light.

2. 发明申请

US20170307986A1 Patterning Device Support, Lithographic Apparatus, And Method Of Controlling Patterning Device Temperature 有权
公开(公告)号：US20170307986A1
公开(公告)日：2017-10-26
申请号：US15649161
申请日：2017-07-13
申请人： ASML Holding N.V. , ASML Netherlands B.V.
发明人： Earl William EBERT , Johannes ONVLEE , Samir A. NAYFEH , Mark Josef SCHUSTER , Peter A. DELMASTRO , Christopher Charles WARD , Frank Johannes Jacobus VAN BOXTEL , Abdullah ALIKHAN , Daniel Nathan BURBANK , Daniel Nicholas GALBURT , Justin Matthew VERDIRAME
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
摘要： A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.

3. 发明申请

US20170219938A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A LIQUID CONFINEMENT STRUCTURE 有权
公开(公告)号：US20170219938A1
公开(公告)日：2017-08-03
申请号：US15488191
申请日：2017-04-14
申请人： ASML NETHERLANDS B.V.
发明人： Jacobus Johannus Leonardus Hendricus VERSPAY , Hans JANSEN , Marco Koert STAVENGA
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70608 , G03F7/70808 , G03F7/70858
摘要： In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.

4. 发明授权

US09645507B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US09645507B2
公开(公告)日：2017-05-09
申请号：US14993810
申请日：2016-01-12
申请人： ASML NETHERLANDS B.V.
发明人： Jacobus Johannus Leonardus Hendricus Verspay , Hans Jansen , Marco Koert Stavenga
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70608 , G03F7/70808 , G03F7/70858
摘要： In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.

5. 发明授权

US09632433B2 Patterning device support, lithographic apparatus, and method of controlling patterning device temperature 有权
公开(公告)号：US09632433B2
公开(公告)日：2017-04-25
申请号：US14439359
申请日：2013-10-21
申请人： ASML Holding N.V. , ASML Netherlands B.V.
发明人： Earl William Ebert, Jr. , Johannes Onvlee , Samir A. Nayfeh , Mark Josef Schuster , Peter A. Delmastro , Christopher Charles Ward , Frank Johannes Jacobus Van Boxtel , Abdullah Alikhan , Daniel Nathan Burbank , Daniel Nicholas Galburt , Justin Matthew Verdirame
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
摘要： A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.

6. 发明授权

US09588444B2 Balance mass system shared by workpiece table and mask table, and lithography machine 有权
标题翻译：平衡质量系统由工件台和掩模台共用，以及平版印刷机
公开(公告)号：US09588444B2
公开(公告)日：2017-03-07
申请号：US14437775
申请日：2013-09-23
申请人： SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.
发明人： Tianming Wang
IPC分类号： G03F7/20 , F16F7/10 , F16F15/00
CPC分类号： G03F7/709 , F16F7/10 , F16F7/1005 , F16F15/002 , G03F7/70716 , G03F7/70766 , G03F7/70808 , G03F7/70816 , G03F7/70833
摘要： A balance mass system shared by a workpiece stage and a mask stage includes a balance mass and an anti-drift and compensation apparatus (16). The balance mass includes a first part (11) for mounting thereon a workpiece stage system, a second part (20) for mounting thereon a mask stage system, and a third part (14) for interconnecting the first part (11) and the second part (20). The first part (11) of the balance mass is floatingly supported on a base frame (1) of a lithography machine, and the third part (14) of the balance mass is in connection with the base frame (1) via the anti-drift and compensation apparatus (16). The anti-drift and compensation apparatus (16) is disposed in proximity to the center of gravity of the balance mass as a whole. This balance mass system can eliminate the need for using an additional support for the mask stage system and allow the construction of a lithography machine with a higher structural compactness, reduced size and weight, and reduced total mass of used balance masses.
摘要翻译：由工件台和掩模台共用的平衡质量系统包括平衡块和防漂移补偿装置（16）。平衡块包括用于安装工件台系统的第一部分（11），用于在其上安装掩模台系统的第二部分（20）和用于将第一部分（11）和第二部分第（20）部分。平衡块的第一部分（11）浮动地支撑在平版印刷机的基架（1）上，平衡块的第三部分（14）通过防反射板与基架（1）连接，漂移和补偿装置（16）。防漂移补偿装置（16）整体上配置在平衡块的重心附近。该平衡质量系统可以消除对掩模台系统使用额外的支撑的需要，并允许构造具有更高结构紧凑性，减小尺寸和重量的平版印刷机，并减少使用的平衡质量的总质量。

7. 发明授权

US09575421B2 Apparatus for protecting extreme ultra violet mask and extreme ultra violet exposure apparatus including the same 有权
标题翻译：用于保护极紫外线掩膜和包括其的极紫外曝光设备的装置
公开(公告)号：US09575421B2
公开(公告)日：2017-02-21
申请号：US14692919
申请日：2015-04-22
申请人： SAMSUNG ELECTRONICS CO., LTD.
发明人： Myung-soo Hwang , Joo-on Park , Chang-min Park
IPC分类号： G03F7/20 , G03F1/00 , G03F1/62 , G03F1/66
CPC分类号： G03F7/70983 , G03F1/14 , G03F1/142 , G03F1/62 , G03F1/66 , G03F7/70733 , G03F7/708 , G03F7/70808 , G03F7/70908
摘要： An apparatus for protecting an extreme ultra violet (EUV) mask includes an EUV pellicle that allows EUV light to be radiated through the EUV pellicle onto the EUV mask, the EUV pellicle having a size corresponding to a size of a slit limiting the EUV light to a predetermined portion of the EUV mask, a flexible blocking film at opposite sides of the EUV pellicle in a first direction, the first direction being a scan direction of an exposure apparatus, and a roller unit including a first roller and a second roller, a first portion of the flexible blocking film being wound around the first roller at a first side of the EUV pellicle, and a second portion of the flexible blocking film being wound around the second roller at a second side of the EUV pellicle.
摘要翻译：用于保护极端紫外线（EUV）掩模的装置包括EUV防护薄膜，其允许EUV光通过EUV防护薄膜辐射到EUV掩模上，EUV防护薄膜的尺寸对应于限制EUV光的狭缝的尺寸 EUV掩模的预定部分，在第一方向上的EUV防护薄膜的相对侧处的柔性阻挡膜，第一方向是曝光装置的扫描方向，以及包括第一辊和第二辊的辊单元，所述柔性阻挡膜的第一部分在所述EUV防护薄膜组件的第一侧围绕所述第一辊缠绕，并且所述柔性阻挡膜的第二部分围绕所述第二辊缠绕在所述EUV防护薄膜的第二侧。

8. 发明申请

US20160370713A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
公开(公告)号：US20160370713A1
公开(公告)日：2016-12-22
申请号：US15250658
申请日：2016-08-29
申请人： ASML NETHERLANDS B.V.
发明人： Marcel BECKERS , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70808
摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

9. 发明申请

US20150309420A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20150309420A1
公开(公告)日：2015-10-29
申请号：US14664360
申请日：2015-03-20
申请人： ASML NETHERLANDS B.V.
发明人： Marcel BECKERS , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70808
摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
摘要翻译：用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。控制系统使溢出的机会最小化，并且提取器包括被配置为使振动最小化的出口阵列。

10. 发明申请

US20150301458A1 MOVABLE BODY APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：可移动身体装置，曝光装置和装置制造方法
公开(公告)号：US20150301458A1
公开(公告)日：2015-10-22
申请号：US14432513
申请日：2013-10-02
申请人： NIKON CORPORATION
发明人： Yuichi SHIBAZAKI
IPC分类号： G03F7/20 , H02K41/03 , H02K7/08
CPC分类号： G03F7/70716 , G03F7/70758 , G03F7/70808 , G03F7/70816 , H02K7/08 , H02K41/03 , H02K41/031 , H02K2201/18
摘要： A stage device is equipped with a surface plate and a wafer stage which is mounted on the surface plate and has an exhausting port formed on a surface facing the surface plate. In a state where the wafer stage lands on the surface plate, an air chamber is formed in between the surface plate and the wafer stage. Pressurized gas blows out from the exhausting port provided at a stage main section into the air chamber, and self-weight of the wafer stage is cancelled by an inner pressure of the air chamber. This allows to the wafer stage which has stopped on the surface plate to be moved manually.
摘要翻译：舞台装置配备有表面板和晶片台，其安装在表面板上并且具有形成在面向表面板的表面上的排气口。在晶片台落在表面板上的状态下，在表面板和晶片台之间形成空气室。加压气体从设置在台主部的排气口吹入空气室，并且通过空气室的内部压力来抵消晶片台的自重。这允许在表面板上停止的晶片台手动移动。

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