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    • 10. 发明授权
    • Deposited-film forming apparatus
    • 沉积膜形成装置
    • US06960368B2
    • 2005-11-01
    • US11049961
    • 2005-02-04
    • Takeshi NishiuchiIkuo ShimamotoFumiaki KikuiYoshimi TochishitaKazumitsu Sato
    • Takeshi NishiuchiIkuo ShimamotoFumiaki KikuiYoshimi TochishitaKazumitsu Sato
    • C23C14/50H01F1/055H01F41/02C23C16/00
    • C23C14/505H01F1/0556H01F41/026
    • With the deposited-film forming apparatus according to the first embodiment of the present invention, the distance between the tubular barrel and the evaporating section can be varied, unlike the prior art deposited-film forming apparatus and hence, the efficient formation of the deposited film on the surface of each of the work pieces accommodated in the tubular barrel and the inhibition of the softening of the formed film can be achieved simultaneously. Therefore, it is possible to inhibit the damaging of the deposited film formed on the surface of each of the work pieces and the production of projections on the deposited film, and to form a deposited film at a high quality in respect of a corrosion resistance and the like and at low cost.With the deposited-film forming apparatus according to the second embodiment of the present invention, the distance between the accommodating section defined in the tubular barrel and the evaporating section can be varied and hence, this deposited-film forming apparatus also exhibits an effect similar to that in the deposited-film forming apparatus according to the first embodiment of the present invention.
    • 利用根据本发明第一实施例的沉积膜形成装置,可以改变管状筒和蒸发部之间的距离,这与现有技术的沉积膜形成装置不同,因此有效地形成沉积膜 在容纳在管状筒体中的每个工件的表面上,可以同时实现对形成的膜的软化的抑制。 因此,可以抑制在每个工件的表面上形成的沉积膜的破坏和沉积膜上的突起的产生,并且在耐腐蚀性方面形成高质量的沉积膜, 喜欢和低成本。 利用根据本发明第二实施例的沉积膜形成装置,可以改变限定在管状筒体中的容纳部分与蒸发部分之间的距离,因此该沉积膜形成装置也具有类似于 在根据本发明的第一实施例的沉积膜形成装置中。