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1. 发明授权

US11837486B2 Reticle transportation container 有权
公开(公告)号：US11837486B2
公开(公告)日：2023-12-05
申请号：US17232326
申请日：2021-04-16
申请人： Taiwan Semiconductor Manufacturing Co., Ltd.
发明人： Yu-Ching Lee , Yu-Piao Fang
IPC分类号： H01L21/677 , G03F7/00 , G03F1/22 , H01L21/673 , G03F1/66
CPC分类号： H01L21/6773 , G03F1/22 , G03F1/66 , G03F7/7015 , G03F7/70741 , H01L21/67353 , H01L21/67359 , H01L21/67373 , H01L21/67379 , H01L21/67383 , H01L21/67386 , H01L21/67733 , H01L21/67769 , H01L21/67772 , H01L21/67721 , H01L21/67724
摘要： A transportation container is provided with a container body constructed of a top wall, a bottom wall, a rear wall, and two sidewalls forming a front opening for loading or unloading a reticle pod into or out of the container body; a lid for opening and closing the front opening; and a lift plate above the container body configured to connect to a carrier of an overhead hoist transfer (OHT) system.

2. 发明公开

US20230163005A1 WAFER HOLDER 审中-公开
公开(公告)号：US20230163005A1
公开(公告)日：2023-05-25
申请号：US18053082
申请日：2022-11-07
申请人： Yoshihiro OMURO
发明人： Yoshihiro OMURO
IPC分类号： H01L21/673
CPC分类号： H01L21/67376 , H01L21/67353 , H01L21/67386
摘要： A wafer holder includes a holding base having a circular holding surface, including, on a side of the holding surface, an annular first groove and an annular second groove that is surrounded by the first groove, and internally including a plurality of first suction holes opening in a region located between the first groove and the second groove on the holding surface, a plurality of second suction holes opening in a region surrounded by the second groove on the holding surface, and a suction channel communicating to the first suction holes and the second suction holes and opening in a back surface on a side opposite to the holding surface. The first suction holes and the second section holes are configured in such a manner that the first suction holes each have a pressure loss greater than that at each of the second suction holes.

3. 发明公开

US20230148124A1 Apparatus for the Temperature Control of a Substrate and Corresponding Production Method 审中-公开
公开(公告)号：US20230148124A1
公开(公告)日：2023-05-11
申请号：US18149755
申请日：2023-01-04
申请人： ERS Electronic GmbH
发明人： Klaus Reitinger
IPC分类号： H01L21/67 , G01R1/04 , H01L21/08 , H01L21/673 , C23C16/458 , C23C14/54 , H01J37/32 , C23C16/46
CPC分类号： H01L21/67098 , G01R1/0458 , H01L21/08 , H01L21/67353 , H01L21/67242 , H01L21/67383 , H01L21/67248 , H01L21/67103 , H01L21/67109 , C23C16/4586 , C23C14/541 , H01J37/32724 , C23C16/463 , C23C14/50
摘要： An apparatus for controlling the temperature of a substrate is equipped with a plate-type main body having a substrate placement area, a first temperature-control device for controlling the temperature of the main body using a first temperature-control fluid, having a first plurality of separate annular channels inside the main body, a second temperature-control device for controlling the temperature of the main body using a second temperature-control fluid, having a second plurality of separate annular channels inside the main body, wherein the first temperature-control fluid is supplied to the first plurality of annular channels through a first tube and removed therefrom through a second tube, wherein the second temperature-control fluid is supplied to the second plurality of annular channels through a third tube and removed therefrom through a fourth tube, wherein the main body has a first to fourth hole that communicate with the first plurality of separate annular channels and the second plurality of separate annular channels, wherein the first to fourth tubes are placed in the first to fourth holes of the main body.

4. 发明授权

US09799543B2 Process box, arrangements and methods for processing coated substrates 有权
公开(公告)号：US09799543B2
公开(公告)日：2017-10-24
申请号：US14350801
申请日：2013-02-08
申请人： SAINT-GOBAIN GLASS FRANCE
发明人： Martin Fuerfanger , Dang Cuong Phan , Stefan Jost
IPC分类号： H01L21/673 , H01L21/67 , H01L31/18
CPC分类号： H01L21/67346 , H01L21/67115 , H01L21/67353 , H01L21/67383 , H01L31/1864
摘要： A transportable process box for processing substrates coated on one side is described. The box has a base for the placement of a first substrate in a manner such that the latter is supported over the full area, a frame, a cover which is placed onto the frame, and an intermediate element which is arranged between the base and the cover and is intended for the placement of a second substrate in a manner such that the latter is supported over the full area. Arrangements and methods for processing substrates are also described.

5. 发明申请

US20170170045A1 LOAD PORT DEVICE AND CLEANING GAS INTRODUCING METHOD INTO A CONTAINER ON A LOAD PORT 审中-公开
公开(公告)号：US20170170045A1
公开(公告)日：2017-06-15
申请号：US15372883
申请日：2016-12-08
申请人： TDK Corporation
发明人： Tsutomu OKABE , Koichiro OIKAWA
IPC分类号： H01L21/677 , H01L21/673 , H01L21/02
CPC分类号： H01L21/67766 , B65G2201/0297 , H01L21/02046 , H01L21/67017 , H01L21/67353 , H01L21/67393 , H01L21/67772 , H01L21/67775
摘要： A load port device includes an installation stand, an opening and closing part, a gas introduction part, and a gas discharge part. The installation stand installs a container whose side surface has a main opening for taking in and out a wafer. The opening and closing part opens and closes the main opening. The gas introduction part introduces a cleaning gas from the main opening into the container. The gas discharge part has a bottom nozzle capable of communicating with a bottom hole formed at a position distant from the main opening more than a bottom surface middle on a bottom surface of the container. The gas discharge part is capable of discharging a gas in the container to an outside of the container.

6. 发明申请

US20170032992A1 SUBSTRATE CARRIER, A METHOD AND A PROCESSING DEVICE 审中-公开
标题翻译：基板载体，方法和处理装置
公开(公告)号：US20170032992A1
公开(公告)日：2017-02-02
申请号：US14814559
申请日：2015-07-31
申请人： Infineon Technologies AG
发明人： Tobias Hoechbauer
IPC分类号： H01L21/673 , C23C16/458 , C23C16/46 , H01L21/677 , C23C16/455
CPC分类号： H01L21/67383 , C23C16/455 , C23C16/458 , C23C16/4584 , C23C16/46 , H01L21/67353 , H01L21/67739 , H01L21/68735 , H01L21/6875 , H01L21/68771
摘要： A substrate carrier may include: a carrier plate including a plurality of substrate receiving regions; each substrate receiving region may include at least one first recess portion having a first depth and at least one second recess portion having a second depth, the second depth being greater than the first depth; and a carrier plate mounting structure configured to support the carrier plate.
摘要翻译：衬底载体可以包括：载体板，包括多个衬底接收区域; 每个衬底接收区域可以包括具有第一深度的至少一个第一凹部和具有第二深度的至少一个第二凹部，第二深度大于第一深度; 以及构造成支撑所述承载板的承载板安装结构。

7. 发明申请

US20150217339A1 SUBSTRATE CASE CLEANING APPARATUS 有权
标题翻译：底座箱清洁装置
公开(公告)号：US20150217339A1
公开(公告)日：2015-08-06
申请号：US14420056
申请日：2013-09-13
申请人： HUGLE ELECTRONICS INC.
发明人： Toshiya Sakashita
IPC分类号： B08B3/10
CPC分类号： B08B3/10 , B08B3/02 , B08B3/04 , B08B3/08 , B08B9/0861 , H01L21/02041 , H01L21/304 , H01L21/67051 , H01L21/67057 , H01L21/67173 , H01L21/67353 , H01L21/67703 , H01L21/6773
摘要： Parts of a substrate case can be separated and cleaned inside a tank body while making the cleaning solution evenly reach it. A substrate case C which is provided with a base Mb and shell Ms and holds a substrate inside is cleaned in a state with no substrate. Provision is made of a cleaning tank 40 which holds and cleans the parts of the base Mb and shell Ms of the substrate case C in a separated stated, provision is made of a conveyance mechanism which conveys the parts of the substrate case with the cleaning tank 40, and the cleaning tank 40 is provided with a tank body 42 and a lid 43 which can be opened and closed and is provided with a rotating plate 44 which is provided at a bottom part of the tank body 42 to be able to rotate about an axis in the vertical direction, a plurality of base support rods 46 which are provided standing up at the rotating plate 44 and which support parts of the outer edge of the base Mb at a predetermined height position, and a plurality of shell support rods 47 which are provided standing up at the rotating plate 44 and which support parts of the outer edge of the shall Ms at a predetermined height position different from the base support rods 46.
摘要翻译：在使清洁溶液均匀地到达之前，可以在罐体内分离和清洁基板壳体的一部分。在没有基板的状态下清洁设置有基部Mb和壳体Ms并将内部保持基板的基板壳体C。设置有清洁槽40，其以分开的方式保持和清洁基板壳体C的基部Mb和壳体Ms的部分，设置有输送机构，该输送机构将基板壳体的部分与清洗槽 40，清洗槽40设置有可以打开和关闭的罐主体42和盖43，并且设有旋转板44，旋转板44设置在罐主体42的底部以能够围绕在垂直方向上的轴线，多个基座支撑杆46，其设置在旋转板44处，并且在预定高度位置处支撑在基座Mb的外边缘的支撑部分，以及多个壳体支撑杆47 它们被设置在旋转板44处，并且在与基座支撑杆46不同的预定高度位置处的Ms的外边缘的支撑部分将被设置。

8. 发明申请

US20140374307A1 SYSTEM AND METHOD FOR CONTROLLING TRANSPORTATION OF SUBSTRATE OF LIQUID CRYSTAL PANEL 审中-公开
标题翻译：用于控制液晶板基板运输的系统和方法
公开(公告)号：US20140374307A1
公开(公告)日：2014-12-25
申请号：US13502746
申请日：2012-03-15
申请人： Minghu Qi , Chun-hao Wu , Kun-hsien Lin , Yongqiang Wang , Zhenghong Chen , Weibing Yang , Erqing Zhu , Zhenhua Guo
发明人： Minghu Qi , Chun-hao Wu , Kun-hsien Lin , Yongqiang Wang , Zhenghong Chen , Weibing Yang , Erqing Zhu , Zhenhua Guo
IPC分类号： H01L21/673 , B65G49/00
CPC分类号： H01L21/67396 , B65G49/00 , H01L21/67353 , H01L21/67393 , H01L21/6776
摘要： A system and method for controlling transportation of a substrate of a liquid crystal panel is disclosed. Said method comprises: putting the substrate of the liquid crystal panel into a transport apparatus; humidifying the transport apparatus having the substrate of the liquid crystal panel placed thereinto by utilizing a humidifying apparatus to form a mist in the transport apparatus; and transporting the substrate of the liquid crystal panel by utilizing the humidified transport apparatus. The present invention prevents the substrate of the liquid crystal panel from being damaged by electrostatic charges and ensures product percent of pass.
摘要翻译：公开了一种用于控制液晶面板的基板的输送的系统和方法。所述方法包括：将液晶面板的基板放入输送装置中; 通过利用加湿装置对具有液晶面板的基板的输送装置进行加湿，以在输送装置中形成雾气; 以及利用加湿输送装置输送液晶面板的基板。本发明防止了液晶面板的基板被静电电荷损坏，并且确保了通过的产品百分比。

9. 发明申请

US20140363916A1 PROCESS BOX, ARRANGEMENTS AND METHODS FOR PROCESSING COATED SUBSTRATES 有权
标题翻译：工艺框，安装和加工涂层基板的方法
公开(公告)号：US20140363916A1
公开(公告)日：2014-12-11
申请号：US14350801
申请日：2013-02-08
申请人： SAINT-GOBAIN GLASS FRANCE
发明人： Martin Fuerfanger , Dang Cuong Phan , Stefan Jost
IPC分类号： H01L21/673 , H01L21/67 , H01L31/18
CPC分类号： H01L21/67346 , H01L21/67115 , H01L21/67353 , H01L21/67383 , H01L31/1864
摘要： A transportable process box for processing substrates coated on one side is described. The box has a base for the placement of a first substrate in a manner such that the latter is supported over the full area, a frame, a cover which is placed onto the frame, and an intermediate element which is arranged between the base and the cover and is intended for the placement of a second substrate in a manner such that the latter is supported over the full area. Arrangements and methods for processing substrates are also described.
摘要翻译：描述了用于处理一面上涂覆的基板的可移动处理盒。该盒具有用于以使得后者被支撑在整个区域上的方式放置第一基板的基座，框架，放置在框架上的盖子以及布置在基座和基座之间的中间元件并且旨在用于以使得后者被支撑在整个区域上的方式放置第二基板。还描述了处理衬底的布置和方法。

10. 发明授权

US08813964B2 Wafer container with recessed latch 有权
标题翻译：带凹槽的晶片容器
公开(公告)号：US08813964B2
公开(公告)日：2014-08-26
申请号：US12606921
申请日：2009-10-27
申请人： James D Pylant , Alan L Waber
发明人： James D Pylant , Alan L Waber
IPC分类号： B65D85/00
CPC分类号： H01L21/67353 , H01L21/67373 , H01L21/67379 , H01L21/67386
摘要： Improvements in a semiconductor wafer container including improvements in side protection to the wafers, improved cover design to minimize rotation, a simplified top cover orientation mechanism and an improved bottom holding mechanism for automation. The side protection to the wafers is with multiple staggered inner and outer walls. The improved cover design improves alignment of the top and bottom housings and minimizes rotation of the housings in transit or motion. The housings have a recessed tab ramp feature with bi-directional locking that also increases the rigidity of the containment device when the two housings are assembled. The latching mechanism is located in a protective latch well that minimizes accidental opening of the latch(s). The improved bottom holding mechanism for automation is an integrated feature that is molded into the bottom housing and not assembled in a secondary operation.
摘要翻译：半导体晶片容器的改进，包括对晶片的侧面保护的改进，改进的盖设计以使旋转最小化，简化的顶盖定向机构和用于自动化的改进的底部保持机构。对晶片的侧面保护是具有多个交错的内壁和外壁。改进的盖设计改善了顶部和底部壳体的对准，并最大限度地减少了运输或运动中壳体的旋转。这些外壳具有带双向锁定的凹陷突出部斜面特征，当两个壳体组装时，这也增加了容纳装置的刚度。闩锁机构位于保护闩锁孔中，以最小化闩锁的意外打开。用于自动化的改进的底部保持机构是模制到底部壳体中并且未组装在二次操作中的集成特征。

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