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1. 发明申请

US20180129141A1 TRANSFERRING APPARATUS 审中-公开
公开(公告)号：US20180129141A1
公开(公告)日：2018-05-10
申请号：US15610802
申请日：2017-06-01
申请人： Samsung Electronics Co., Ltd.
发明人： Jong-In LEE , Sang-lk CHA
IPC分类号： G03F7/20
CPC分类号： G03F7/70733 , G03F7/70741 , H01L21/67733
摘要： A transferring apparatus for transferring an object in a ceiling of a manufacturing line includes a travelling part configured to transfer the object along a desired travelling path provided in the ceiling, and an auxiliary support part configured to prevent the object from falling down while the traveling part travels. The auxiliary support part includes a linkage portion in a lower end portion of a frame which extends downwardly from the travelling part and including a horizontally spreadable link structure toward a bottom surface of the object, and a driving portion provided in the frame to provide a driving force for driving the linkage portion.

2. 发明申请

US20170285484A1 MASK PROTECTION DEVICE, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE 审中-公开
公开(公告)号：US20170285484A1
公开(公告)日：2017-10-05
申请号：US15626475
申请日：2017-06-19
申请人： NIKON CORPORATION
发明人： Kazuya OTA
IPC分类号： G02B27/00 , G03F1/66 , G03F7/20
CPC分类号： G03F7/70058 , G02B27/0006 , G03F1/66 , G03F7/70741 , G03F7/7075 , G03F7/70916 , H01L21/6773
摘要： A reticle protection device capable of keeping a reticle therein is provided with an inner pod capable of keeping the reticle therein; an outer pod capable of keeping the inner pod therein; an electroconductive movable contact portion provided on at least one of the inner pod and the outer pod and being capable of coining into contact with an electroconductive film of the reticle; and a leaf spring for achieving electric conduction of the contact portion to at least one of the inner pod and the outer pod. The reticle is kept in the inner pod and the inner pod is kept in the outer pod, thereby enabling stable grounding of the reticle.

3. 发明授权

US09772563B2 Method and structure for automated inert gas charging in a reticle stocker 有权
公开(公告)号：US09772563B2
公开(公告)日：2017-09-26
申请号：US13928414
申请日：2013-06-27
申请人： Taiwan Semiconductor Manufacturing Co., Ltd.
发明人： Yung-Ho Chen , Wen-Chieh Tsou , Chih-Wei Huang , Wei-Cheng Wang
IPC分类号： H01L21/677 , G03F7/20 , G05B19/418
CPC分类号： G03F7/70741 , G05B19/4189 , G05B2219/45031 , G05B2219/45057 , Y02P90/28
摘要： At least a first reticle is stored in a housing of a stocker. A first gas is delivered to the housing. At least one reticle pod having an additional reticle is delivered into a enclosure within the housing of the stocker. A second gas different from the first gas is delivered to the enclosure. The reticle pod is automatically retrieved from the enclosure. The delivery and retrieval of the reticle pod and delivery of the first gas and the second gas are automatically controlled.

4. 发明授权

US09164399B2 Reticle operation system 有权
标题翻译：光栅操作系统
公开(公告)号：US09164399B2
公开(公告)日：2015-10-20
申请号：US13737065
申请日：2013-01-09
申请人： Hermes-Microvision, Inc.
发明人： Youjin Wang , Chiyan Kuan , Chung-Shih Pan
IPC分类号： G03B27/62 , G03F7/20 , G03F1/66 , G03B27/32
CPC分类号： G03F7/70741 , G03F1/66 , G03F7/70733
摘要： A system for operating EUV mask stored in reticle SMIF pod and/or dual pod is provided, wherein the reticle SMIF pod and Dual pod are for storing EUV mask. The system can be a sorter for EUV mask transferred from reticle SMIF pod into dual pod, and vice versa, or an operating system for tools relating to EUV mask, wherein the tools may be EUV lithography, or inspection tool for inspecting EUV mask.
摘要翻译：提供了一种用于操作存储在掩模版SMIF盒和/或双盒中的EUV掩模的系统，其中标线片SMIF盒和双盒用于存储EUV掩模。该系统可以是EUV掩模的分拣机，从掩模版SMIF荚转移到双荚，反之亦然，或与EUV掩模相关的工具的操作系统，其中工具可以是EUV光刻，或用于检查EUV掩模的检查工具。

5. 发明申请

US20150015860A1 Reticles, And Methods Of Mitigating Asymmetric Lens Heating In Photolithography 审中-公开
标题翻译：网格和减轻光刻中不对称透镜加热的方法
公开(公告)号：US20150015860A1
公开(公告)日：2015-01-15
申请号：US14500625
申请日：2014-09-29
申请人： Micron Technology, Inc.
发明人： Scott L. Light , Dan Millward , Yuan He , Kaveri Jain , Lijing Gou , Zishu Zhang , Anton J. deVilliers , Michael D. Hyatt , Jianming Zhou
IPC分类号： G03F7/20
CPC分类号： G03F7/70741 , G03F1/38 , G03F7/70433 , G03F7/70891
摘要： A method of mitigating asymmetric lens heating in photolithographically patterning a photo-imageable material using a reticle includes determining where first hot spot locations are expected to occur on a lens when using a reticle to pattern a photo-imageable material. The reticle is then fabricated to include non-printing features within a non-printing region of the reticle which generate additional hot spot locations on the lens when using the reticle to pattern the photo-imageable material. Other implementations are contemplated, including reticles which may be independent of method of use or fabrication.
摘要翻译：使用光掩模光刻地图案化可光成像材料的方法来减轻不对称透镜加热的方法包括当使用掩模版图案可光成像材料时，确定预期在透镜上将出现第一热点位置的位置。然后制造掩模版以在掩模版的非印刷区域内包括非印刷特征，当使用掩模版对可光成像材料进行图案化时，其在透镜上产生额外的热点位置。考虑了其他实施方式，包括可以独立于使用或制造方法的标线。

6. 发明授权

US08921812B2 Reticle protection member, reticle carrying device, exposure device and method for carrying reticle 有权
标题翻译：掩模版保护构件，掩模版承载装置，曝光装置和承载掩模版的方法
公开(公告)号：US08921812B2
公开(公告)日：2014-12-30
申请号：US13446436
申请日：2012-04-13
申请人： Motoko Suzuki , Yukiharu Okubo
发明人： Motoko Suzuki , Yukiharu Okubo
IPC分类号： H01L21/027 , G03F7/20 , G03F1/66 , G03F9/00 , H01L21/673
CPC分类号： H01L21/027 , G03F1/66 , G03F7/70741 , G03F9/7084 , H01L21/67353 , H01L21/67359
摘要： A position measurement device measures the position of a position measurement mark formed on the lower surface of a reticle, thereby measuring the position of the reticle. A position measurement device measures the position of the position measurement mark formed on the lower surface of a lower lid, thereby measuring the position of the lower lid. The relative displacement of the reticle and lower lid is known when the position of the reticle and the position of the lower lid are known. Therefore, when the lower lid having the reticle loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid is determined by taking this displacement into account. As a result, the reticle can be correctly set in the exposure device.
摘要翻译：位置测量装置测量形成在掩模版的下表面上的位置测量标记的位置，从而测量掩模版的位置。位置测量装置测量形成在下盖的下表面上的位置测量标记的位置，从而测量下盖的位置。当掩模版的位置和下盖的位置是已知的时，标线片和下盖的相对位移是已知的。因此，当将装载有掩模版的下盖带有承载装置并设置在曝光装置中时，通过考虑该位移来确定下盖的停止位置。结果，可以将掩模版正确地设置在曝光装置中。

7. 发明授权

US08868229B2 Buffer station for stocker system 有权
标题翻译：储存器系统缓冲站
公开(公告)号：US08868229B2
公开(公告)日：2014-10-21
申请号：US11881093
申请日：2007-07-25
申请人： Lutz Rebstock
发明人： Lutz Rebstock
IPC分类号： G06F7/00 , H01L21/677 , G03F7/20
CPC分类号： H01L21/67769 , G03F7/70741 , G03F7/7075
摘要： A buffer station provides potential improvement for the operation of a facility. By storing to-be-accessed workpieces in the buffer stations of an equipment, the operation of the facility is not interrupted when the equipment is down. The workpieces can be retrieved through emergency access port of the buffer station, thus ensure the continuous supply of workpieces for the workpiece flow of the facility. Algorithm for getting the needed workpieces to the buffer station is also provided through a controller or a computer mechanism. The buffer station can be incorporated in a stocker, such as wafer stocker or reticle stocker.
摘要翻译：缓冲站为设施的运行提供了潜在的改进。通过在设备的缓冲站中存储待访问的工件，当设备关闭时，设备的操作不会中断。可以通过缓冲站的紧急出入口检索工件，从而确保连续供应设备工件流动的工件。通过控制器或计算机机构也提供了将所需工件送到缓冲站的算法。缓冲站可以结合在储存器中，例如晶片储片器或掩模版储存器。

8. 发明授权

US08425172B2 Reticle manipulation device 有权
标题翻译：光罩操纵装置
公开(公告)号：US08425172B2
公开(公告)日：2013-04-23
申请号：US12761499
申请日：2010-04-16
申请人： Jakob Blattner , Rudy Federici , William Fosnight , Clint Harris
发明人： Jakob Blattner , Rudy Federici , William Fosnight , Clint Harris
IPC分类号： H01L21/677
CPC分类号： G03F7/70925 , G03F7/70741 , H01L21/67359 , H01L21/67742 , H01L21/67769 , H01L21/68707 , Y10S414/139
摘要： A reticle manipulating device comprising a housing capable of having a controlled environment wherein at least one processing module is connected to the housing and capable of processing a reticle. A transport apparatus is connected to the housing for transporting the reticle between the at least one module to another portion of the housing. At least one module is removably connectable to the housing and at least one module has an interface adapted for removably coupling the module to the housing. One module being selectable for connection to the housing from a number of different interchangeable module each having a different predetermined characteristic and being capable of connection to the housing.
摘要翻译：一种掩模版操纵装置，其包括能够具有受控环境的壳体，其中至少一个处理模块连接到所述壳体并且能够加工掩模版。传送装置连接到壳体，用于将光罩在至少一个模块之间传送到壳体的另一部分。至少一个模块可拆卸地连接到壳体，并且至少一个模块具有适于将模块可移除地耦合到壳体的接口。一个模块可选择用于从多个不同的可互换模块连接到壳体，每个模块具有不同的预定特性并且能够连接到壳体。

9. 发明授权

US08235212B2 Mask transport system configured to transport a mask into and out of a lithographic apparatus 有权
标题翻译：掩模传送系统被配置为将掩模传送到光刻设备中和从光刻设备传出
公开(公告)号：US08235212B2
公开(公告)日：2012-08-07
申请号：US12483940
申请日：2009-06-12
申请人： Gert-Jan Heerens
发明人： Gert-Jan Heerens
IPC分类号： B65D85/00 , B65D85/48
CPC分类号： G03F1/66 , G03F7/707 , G03F7/70741 , G03F7/70808 , G03F7/70916 , G03F7/70983
摘要： A mask transport system is configured to transport a mask into and out of a lithographic apparatus. The mask transport system includes a first container configured to shield a top side and a bottom side of the mask. At least a portion of the container is at least partially translucent for radiation having a predetermined wavelength used to detect contamination on the top side or the bottom side of the mask when the mask is shielded by the first container. The mask transport system also includes a second container configured to enclose the first container. The second container includes a first part defining a first opening and an openable cover that covers the first opening. The cover is configured to open and release the first container within the lithographic apparatus or at an interface with the lithographic apparatus.
摘要翻译：掩模传送系统被配置为将掩模传送到光刻设备中和从光刻设备传出。掩模传送系统包括被配置为屏蔽掩模的顶侧和底侧的第一容器。当掩模被第一容器遮蔽时，用于具有预定波长的辐射的至少一部分至少部分是半透明的，用于检测掩模的顶侧或底侧上的污染物。掩模传送系统还包括构造成封闭第一容器的第二容器。第二容器包括限定第一开口的第一部分和覆盖第一开口的可打开盖。盖被配置为打开和释放光刻设备内的第一容器或与光刻设备的界面处。

10. 发明授权

US08215510B2 Photomask storage apparatus 有权
标题翻译：光掩模存储设备
公开(公告)号：US08215510B2
公开(公告)日：2012-07-10
申请号：US12053859
申请日：2008-03-24
申请人： Hsin-Yuan Chen , Chih-Fu Li , Chi-Chung Hsu , Hsing-Fu Lee
发明人： Hsin-Yuan Chen , Chih-Fu Li , Chi-Chung Hsu , Hsing-Fu Lee
IPC分类号： B65D85/30 , B65D51/16
CPC分类号： G03F7/70741 , G03F1/66 , Y10T428/1352
摘要： A photomask storage apparatus including a bottom plate and top lid is provided. The photomask storage apparatus includes poly-ether ketone (PEEK). A fastening element is configured to couple the lid to the bottom plate. A retaining element is secured to the lid to prevent vibrations of a photomask. A vent structure is also provided. The vent structure is configured such that airflow through the vent is purged in approximately 360 degrees into a chamber including the photomask. The vent structure may include a particulate filter. A seal liner is disposed on the bottom component.
摘要翻译：提供一种包括底板和顶盖的光掩模存储装置。光掩模存储装置包括聚醚酮（PEEK）。紧固元件构造成将盖连接到底板。保持元件固定到盖子上以防止光掩模的振动。还提供排气结构。排气结构被配置成使得通过排气口的气流以大约360度吹扫到包括光掩模的室中。排气结构可以包括颗粒过滤器。密封衬套设置在底部部件上。

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