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    • 10. 发明授权
    • Thin film transistor with a current-induced channel
    • 具有电流感应通道的薄膜晶体管
    • US09515273B2
    • 2016-12-06
    • US14380726
    • 2013-06-20
    • Indian Institute of Technology Kanpur
    • Baquer MazhariAnkita Gangwar
    • H01L51/00H01L51/05
    • H01L51/0562H01L51/0046H01L51/0054H01L51/0055H01L51/0058H01L51/0068H01L51/0072H01L51/0073H01L51/0081H01L51/0091H01L51/0545
    • A thin film transistor (TFT) includes a hole transport layer having a first side and a second side and an electron transport layer having a first side and a second side. The first side of the electron transport layer is directly interfaced to the second side of the hole transport layer. The electron transport layer includes a material having greater ionization potential and greater electron affinity than the hole transport layer, thereby forming a hole barrier and an electron barrier at the junction between the electron transport layer and the hole transport layer. A channel in the TFT is created by current injected into the electron transport layer from a gate electrode rather than by an electrostatic field generated by voltage applied to the gate electrode. The accumulated charge density in the channel of the TFT can be significantly larger than what can be generated through field effect principle, therefore a much lower gate voltage is needed than in a conventional TFT.
    • 薄膜晶体管(TFT)包括具有第一侧和第二侧的空穴传输层和具有第一侧和第二侧的电子传输层。 电子传输层的第一面直接与空穴传输层的第二面相接。 电子传输层包括具有比空穴传输层更大的电离电位和更大的电子亲和力的材料,从而在电子传输层和空穴传输层之间的接合处形成空穴阻挡层和电子势垒。 TFT中的沟道通过从栅电极注入到电子传输层中的电流产生,而不是由施加到栅电极的电压产生的静电场产生。 TFT的通道中的累积电荷密度可以明显大于通过场效应原理产生的电荷密度,因此与常规TFT相比需要低得多的栅极电压。