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1. 发明申请

US20180138068A1 SEALED SUBSTRATE CARRIERS AND SYSTEMS AND METHODS FOR TRANSPORTING SUBSTRATES 审中-公开
公开(公告)号：US20180138068A1
公开(公告)日：2018-05-17
申请号：US15871855
申请日：2018-01-15
申请人： Applied Materials, Inc.
发明人： Michael Robert Rice , Jeffrey C. Hudgens
IPC分类号： H01L21/677 , H01L21/673 , B65D85/00
CPC分类号： H01L21/67763 , B65D85/70 , H01L21/67386 , H01L21/67393 , H01L21/67775 , Y10S414/137
摘要： An electronic device manufacturing system is disclosed. The system includes a processing tool having one or more processing chambers each adapted to perform an electronic device manufacturing process on one or more substrates; a substrate carrier adapted to couple to the system and carry one or more substrates; and a component adapted to create a sealed environment relative to at least a portion of the substrate carrier and to substantially equalize the sealed environment with an environment within the substrate carrier. Methods of the invention are described as are numerous other aspects.

2. 发明申请

US20160107317A1 ROBOT HAVING END EFFECTOR AND METHOD OF OPERATING THE SAME 审中-公开
标题翻译：具有最终效果的机器人及其操作方法
公开(公告)号：US20160107317A1
公开(公告)日：2016-04-21
申请号：US14984008
申请日：2015-12-30
申请人： KAWASAKI JUKOGYO KABUSHIKI KAISHA
发明人： Yasuhiko Hashimoto , Tetsuya Yoshida
IPC分类号： B25J15/00 , H01L21/687 , B25J11/00 , B25J9/04 , B25J15/06
CPC分类号： B25J15/0014 , B25J9/042 , B25J9/10 , B25J11/0095 , B25J15/0052 , B25J15/0616 , H01L21/67742 , H01L21/68707 , Y10S414/137 , Y10S414/141 , Y10T74/20305
摘要： The present invention relates to an end effector including: blade members for holding substrates, each configured to hold the substrate, and configured such that each interval between the blade members can be changed; a blade support unit configured to support the blade members, the blade support unit being configured to be driven integrally with the blade members by the robot; and blade drive means configured to change the interval between the blade members by moving at least one of the blade members relative to another blade member.
摘要翻译：本发明涉及一种端部执行器，其包括：用于保持基板的叶片构件，每个构件用于保持基板，并且构造成可以改变叶片构件之间的每个间隔; 构造成支撑叶片构件的叶片支撑单元，叶片支撑单元构造成由机器人与叶片构件一体地驱动; 以及叶片驱动装置，其构造成通过相对于另一个叶片构件移动至少一个叶片构件来改变叶片构件之间的间隔。

3. 发明授权

US09293355B2 Substrate transfer system and substrate processing system 有权
标题翻译：基板转印系统和基板处理系统
公开(公告)号：US09293355B2
公开(公告)日：2016-03-22
申请号：US14073871
申请日：2013-11-07
申请人： KABUSHIKI KAISHA YASKAWA DENKI
发明人： Masatoshi Furuichi , Yoshiki Kimura
IPC分类号： H01L21/677
CPC分类号： H01L21/68707 , H01L21/677 , H01L21/67706 , H01L21/67715 , H01L21/67766 , Y10S414/137
摘要： A substrate transfer system includes a substrate transfer robot disposed in a robot installment area defined between a first apparatus and a second apparatus comprising an opening. The substrate transfer robot includes a hand and an arm. The hand is configured to support a substrate. The arm is configured to move the hand. The arm and the hand supporting the substrate are configured to rotate on a horizontal surface within a minimal rotation area of the substrate transfer robot such that an outer periphery of the minimal rotation area overlaps an inside of the second apparatus through the opening so as to transfer the substrate from a first position in the first apparatus to a second position in the second apparatus through the opening.
摘要翻译：衬底传送系统包括设置在包括开口的第一设备和第二设备之间限定的机器人安装区域中的衬底传送机器人。基板传送机器人包括手和臂。手被配置成支撑衬底。手臂配置为移动手。支撑基板的手臂和手被构造成在基板传送机器人的最小旋转区域内的水平表面上旋转，使得最小旋转区域的外周边通过开口与第二装置的内部重叠，以便转印所述基板通过所述开口从所述第一装置中的第一位置到所述第二装置中的第二位置。

4. 发明授权

US09254566B2 Robot having end effector and method of operating the same 有权
标题翻译：具有末端执行器的机器人及其操作方法
公开(公告)号：US09254566B2
公开(公告)日：2016-02-09
申请号：US12656358
申请日：2010-01-27
申请人： Yasuhiko Hashimoto , Tetsuya Yoshida
发明人： Yasuhiko Hashimoto , Tetsuya Yoshida
IPC分类号： B25J15/00 , B25J9/04 , B25J9/10 , H01L21/677
CPC分类号： B25J15/0014 , B25J9/042 , B25J9/10 , B25J11/0095 , B25J15/0052 , B25J15/0616 , H01L21/67742 , H01L21/68707 , Y10S414/137 , Y10S414/141 , Y10T74/20305
摘要： The present invention relates to an end effector including: blade members for holding substrates, each configured to hold the substrate, and configured such that each interval between the blade members can be changed; a blade support unit configured to support the blade members, the blade support unit being configured to be driven integrally with the blade members by the robot; and blade drive means configured to change the interval between the blade members by moving at least one of the blade members relative to another blade member.
摘要翻译：本发明涉及一种端部执行器，其包括：用于保持基板的叶片构件，每个构件用于保持基板，并且构造成可以改变叶片构件之间的每个间隔; 构造成支撑叶片构件的叶片支撑单元，叶片支撑单元构造成由机器人与叶片构件一体地驱动; 以及叶片驱动装置，其构造成通过相对于另一个叶片构件移动至少一个叶片构件来改变叶片构件之间的间隔。

5. 发明授权

US09252035B2 Substrate transfer system, substrate processing system, and substrate transfer robot 有权
标题翻译：基板传输系统，基板处理系统和基板传送机器人
公开(公告)号：US09252035B2
公开(公告)日：2016-02-02
申请号：US14810406
申请日：2015-07-27
申请人： KABUSHIKI KAISHA YASKAWA DENKI
发明人： Masatoshi Furuichi , Yoshiki Kimura
IPC分类号： H01L21/677
CPC分类号： H01L21/68707 , H01L21/677 , H01L21/67706 , H01L21/67715 , H01L21/67766 , Y10S414/137
摘要： A substrate transfer system includes a substrate transfer robot disposed in a robot installment area defined between a first apparatus and a second apparatus. The first apparatus includes cassettes. The cassettes are each configured to accommodate at least one substrate. The second apparatus includes a second wall opposite to a first wall. The substrate transfer robot transfers the at least one substrate from each of the cassettes to the second apparatus. The substrate transfer robot includes a base stationary, a hand, and arms. A first arm includes a first end and a second end. The first end is rotatably coupled to the base. A second arm includes a third end and a fourth end. The third end is rotatably coupled to the second end. The second end of the first arm moves beyond the second wall when the substrate transfer robot takes out the substrate from the first apparatus.
摘要翻译：衬底传送系统包括设置在第一装置和第二装置之间限定的机器人安装区域中的衬底传送机器人。第一装置包括盒。盒被配置为容纳至少一个基板。第二装置包括与第一壁相对的第二壁。基板传送机构将至少一个基板从每个盒传送到第二装置。基板传送机器人包括基座固定件，手和臂。第一臂包括第一端和第二端。第一端可旋转地联接到基座。第二臂包括第三端和第四端。第三端可旋转地联接到第二端。当基板传送机器人从第一装置取出基板时，第一臂的第二端移动超过第二壁。

6. 再颁专利

USRE45772E1 Wafer transfer apparatus and substrate transfer apparatus 有权
标题翻译：晶片传送装置和基板传送装置
公开(公告)号：USRE45772E1
公开(公告)日：2015-10-20
申请号：US13750625
申请日：2013-01-25
申请人： KAWASAKI JUKOGYO KABUSHIKI KAISHA
发明人： Yasuhiko Hashimoto
IPC分类号： H01L21/677
CPC分类号： H01L21/67766 , Y10S414/135 , Y10S414/137 , Y10S414/139
摘要： A wafer transfer apparatus is provided. In a minimum transformed state where a robot arm is transformed such that a distance defined from a pivot axis to an arm portion, which is farthest in a radial direction relative to the pivot axis, is minimum, a minimum rotation radius R, is set to exceed ½ of a length B in the forward and backward directions of an interface space, the length B corresponding to a length between the front wall and the rear wall of the interface space forming portion, and is further set to be equal to or less than a subtracted value obtained by subtracting a distance L0 in the forward and backward directions from the rear wall of the interface space forming portion to the pivot axis, from the length B in the forward and backward directions of the interface space (i.e., B/2
摘要翻译：提供晶片传送装置。在最小变形状态下，机器人臂被变形为使得从枢转轴线到相对于枢转轴线的径向方向上最远的臂部分限定的距离最小，将最小旋转半径R设定为在接口空间的前后方向上超过长度B的1/2，长度B对应于界面空间形成部分的前壁和后壁之间的长度，并且进一步设定为等于或小于从界面空间形成部分的后壁到枢转轴线的前后方向上的距离L0从接口空间的前后方向（即B / 2）中减去的减法值

7. 发明申请

US20150219486A1 APPARATUS, SYSTEM, AND METHODS FOR WEIGHING AND POSITIONING WAFERS 有权
标题翻译：装置，系统和称重和定位波形的方法
公开(公告)号：US20150219486A1
公开(公告)日：2015-08-06
申请号：US14684504
申请日：2015-04-13
申请人： Microtronic, Inc.
发明人： Reiner G. FENSKE , David S. DENU
IPC分类号： G01G19/00 , H01L21/67 , H01L21/677 , G01G21/23 , G01G21/22
CPC分类号： G01G19/00 , G01G21/00 , G01G21/22 , G01G21/23 , H01L21/67288 , H01L21/67778 , Y10S414/136 , Y10S414/137 , Y10S901/46
摘要： An apparatus for characterizing a wafer comprising an aligner comprising a chuck for receiving and rotating the wafer, a sensor for detecting the position of the wafer as it is rotated, a first actuator for lowering and raising the wafer vertically, and a second actuator for moving the chuck horizontally; and a weighing scale comprising a weight sensor disposed proximate to the aligner, and a cantilevered arm extending laterally from the weight sensor over the chuck of the aligner, the cantilevered arm having a through hole surrounding the chuck. The chuck is vertically movable relative to the weighing scale from a first position in which the wafer is supported by the chuck to a second position in which the wafer is supported by the cantilevered arm of the weighing scale. A method for characterizing a wafer using the instant apparatus is also disclosed.
摘要翻译：一种用于表征晶片的装置，包括对准器，其包括用于接收和旋转晶片的卡盘，用于检测晶片在其旋转时的位置的传感器，用于垂直地降低和升高晶片的第一致动器，以及用于移动的第二致动器卡盘水平; 以及称重秤，包括靠近所述对准器设置的重量传感器，以及从所述重物传感器横向延伸到所述对准器的卡盘上的悬臂，所述悬臂具有围绕所述卡盘的通孔。卡盘相对于称重秤可从第一位置垂直移动，在第一位置，晶片由卡盘支撑到第二位置，在第二位置，晶片由称重秤的悬臂支撑。还公开了使用本装置表征晶片的方法。

8. 发明授权

US08992746B2 Anodizing apparatus 有权
标题翻译：阳极氧化装置
公开(公告)号：US08992746B2
公开(公告)日：2015-03-31
申请号：US13310083
申请日：2011-12-02
申请人： Yasuyoshi Miyaji , Noriyuki Hayashi , Takamitsu Inahara , Takao Yonehara , Karl-Josef Kramer , Subramanian Tamilmani
发明人： Yasuyoshi Miyaji , Noriyuki Hayashi , Takamitsu Inahara , Takao Yonehara , Karl-Josef Kramer , Subramanian Tamilmani
IPC分类号： C25B9/00 , C25B9/02 , C25B9/18 , C25C7/00 , C25C7/06 , C25C3/10 , C25D11/00
CPC分类号： C25D11/005 , C25D17/002 , C25D17/005 , C25D17/02 , Y10S414/135 , Y10S414/136 , Y10S414/137 , Y10S414/138 , Y10S414/139 , Y10S414/14 , Y10S414/141
摘要： An apparatus for anodizing substrates immersed in an electrolyte solution. A substrate holder mounted in a storage tank includes a first support unit having first support elements for supporting, in a liquid-tight condition, only lower circumferential portions of the substrates, and a second support unit attachable to and detachable from the first support unit and having second support elements for supporting, in a liquid-tight condition, remaining circumferential portions of the substrates. A drive mechanism separates the first support unit and the second support unit when loading and unloading the substrates, and for connecting the first support unit and the second support unit after the substrates are placed in the substrate holder.
摘要翻译：用于阳极氧化沉积在电解质溶液中的基底的装置。安装在储罐中的基板支架包括第一支撑单元，该第一支撑单元具有第一支撑元件，该第一支撑元件用于在液密状态下仅支撑基板的下周边部分;以及第二支撑单元，其可附接到第一支撑单元并且可从第一支撑单元拆卸; 具有用于在液密条件下支撑基板的剩余周向部分的第二支撑元件。驱动机构在装载和卸载基板时分离第一支撑单元和第二支撑单元，并且在将基板放置在基板支架中之后连接第一支撑单元和第二支撑单元。

9. 发明授权

US08944738B2 Stacked process modules for a semiconductor handling system 有权
标题翻译：用于半导体处理系统的堆叠过程模块
公开(公告)号：US08944738B2
公开(公告)日：2015-02-03
申请号：US13248600
申请日：2011-09-29
申请人： Peter van der Meulen
发明人： Peter van der Meulen
IPC分类号： H01L21/677 , H01L21/67 , B25J9/04 , H01L21/68 , H01L21/687
CPC分类号： H01L21/67167 , B25J9/042 , H01L21/67126 , H01L21/67161 , H01L21/67173 , H01L21/67178 , H01L21/67184 , H01L21/6719 , H01L21/67196 , H01L21/67201 , H01L21/67207 , H01L21/67253 , H01L21/67259 , H01L21/67706 , H01L21/67727 , H01L21/67733 , H01L21/67736 , H01L21/67742 , H01L21/67745 , H01L21/67748 , H01L21/67754 , H01L21/67757 , H01L21/67781 , H01L21/68 , H01L21/68707 , H01L21/68735 , Y10S414/135 , Y10S414/137 , Y10S414/139 , Y10T74/20305
摘要： Methods and systems are provided for a vacuum-based semiconductor handling system. The system may be a linear system with a four-link robotic SCARA arm for moving materials in the system. The system may include one or more vertically stacked load locks or vertically stacked process modules.
摘要翻译：为基于真空的半导体处理系统提供了方法和系统。该系统可以是具有用于在系统中移动材料的四链接机器人SCARA臂的线性系统。该系统可以包括一个或多个垂直堆叠的加载锁或垂直堆叠的过程模块。

10. 发明授权

US08905700B2 Transfer and inspection devices of object to be inspected 有权
标题翻译：检验对象的检测装置
公开(公告)号：US08905700B2
公开(公告)日：2014-12-09
申请号：US12049717
申请日：2008-03-17
申请人： Tadashi Obikane
发明人： Tadashi Obikane
IPC分类号： H01L21/677 , H01L21/687
CPC分类号： H01L21/68707 , H01L21/67778 , Y10S414/137
摘要： An inspection apparatus includes an inspection chamber in which low-temperature inspection of an inspection object is performed; and a transfer chamber including therein a transfer device. The transfer device includes a transfer arm for transferring the inspection object to the inspection chamber; an arm-receiving compartment having a gateway via which the transfer arm is moved into or out of the arm-receiving compartment; and a gas supply means having a first and a second supply part for supplying a low-dew-point gas to the arm-receiving compartment from different locations. Herein, the first supply part is configured to supply the low-dew-point gas toward the inspection object introduced into the arm-receiving compartment by the transfer arm.
摘要翻译：检查装置包括：检查室，其中执行检查对象的低温检查; 以及包括转印装置的转印室。传送装置包括用于将检查对象传送到检查室的传送臂; 具有通道的手臂接收室，通过所述网关将所述传送臂移入或移出所述臂接纳室; 以及气体供给装置，具有第一供给部和第二供给部，用于从不同的位置向臂收容室供给低露点气体。这里，第一供给部被配置为通过传送臂向被引入臂接收室的检查对象供给低露点气体。

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