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    • 5. 发明授权
    • Alignment film printing device
    • 对准膜印刷装置
    • US09242266B2
    • 2016-01-26
    • US14360155
    • 2013-06-28
    • BOE TECHNOLOGY GROUP CO., LTD.BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    • Yongshan ZhouChengtan ZhaoJingpeng LiHaiyun Lin
    • B05C11/10G02F1/13G02F1/1337B05C11/115B05C9/04B05C9/00
    • B05C11/10B05C9/00B05C9/04B05C11/115G02F1/1303G02F1/1337
    • An alignment film printing device, configured to improve coating quality of an alignment film, includes at least one printing unit, and the printing unit each includes: a cylinder body with an opening at a bottom and an extract opening on a top; a vacuum extractor connected with the extract opening; a plunger provided inside the cylinder body, and configured to draw the alignment fluid from the opening to the cylinder body; a vacuum tester provided at the extract opening and configured to monitor a vacuum degree inside the cylinder body and above the plunger; a range finder provided inside the cylinder body and configured to monitor a distance from the plunger to a top of the cylinder body; and a control device in signal communication with the vacuum extractor, the vacuum tester and the range finder respectively and configured to control a volume of the alignment fluid drawn into the cylinder body according to test values of the vacuum tester and the range finder.
    • 配置为提高取向膜的涂布质量的取向膜印刷装置包括至少一个印刷单元,并且印刷单元各自包括:在底部具有开口的柱体和顶部的提取开口; 与提取开口连接的真空抽吸器; 柱塞,其设置在所述缸体内部,并且构造成将所述对准流体从所述开口抽吸到所述缸体; 设置在所述提取开口处并且构造成用于监测所述缸体内部和所述柱塞上方的真空度的真空测试器; 测距仪,其设置在所述气缸体内并且被构造成监测从所述柱塞到所述气缸体的顶部的距离; 以及与真空抽吸器,真空测试器和测距仪分别信号连通的控制装置,其被配置成根据真空测试仪和测距仪的测试值来控制吸入气缸体中的取向流体的体积。
    • 10. 发明申请
    • HYBRID PLASMA PROCESSING SYSTEMS
    • 混合等离子体处理系统
    • US20130220975A1
    • 2013-08-29
    • US13405465
    • 2012-02-27
    • Rajinder Dhindsa
    • Rajinder Dhindsa
    • B44C1/22B05C9/00
    • H01J37/3255H01J37/321H01J37/32568
    • A hybrid plasma processing system and methods for manufacturing and operating same are disclosed. The hybrid plasma processing system includes an RF-powered lower electrode for supporting the substrate during processing and a hybrid upper electrode disposed in a spaced-apart relationship above the lower electrode. The hybrid upper electrode may be thermally controlled and includes a first plate formed of a first material having a first electrical resistivity, a conductive grounded plate having therein a plurality of radial slots and disposed above the first plate. The conductive plate is formed of a second material having a second electrical resistivity different from the first electrical resistivity. The hybrid upper electrode also includes an RF-powered inductive coil disposed above the conductive ground plate.
    • 公开了一种混合等离子体处理系统及其制造和操作方法。 混合等离子体处理系统包括用于在处理期间支撑衬底的RF供电下电极和在下电极上方以间隔关系设置的混合上电极。 混合上电极可以是热控制的,并且包括由具有第一电阻率的第一材料形成的第一板,其中具有多个径向槽并且设置在第一板上方的导电接地板。 导电板由具有不同于第一电阻率的第二电阻率的第二材料形成。 混合上电极还包括设置在导电接地板上方的RF供电感应线圈。