会员体验
专利管家（专利管理）
工作空间（专利管理）
风险监控（情报监控）
数据分析（专利分析）
侵权分析（诉讼无效）
联系我们
交流群
官方交流：
QQ群： 891211   
微信请扫码    >>>
现在联系顾问~
下载
著录项
PDF全文
热词
    • 3. 发明授权
      US10316114B2 End-functionalized polymers 有权
    • End-functionalized polymers
    • US10316114B2
    • 2019-06-11
    • US13638191
    • 2011-03-29
    • Huiguang Kou , Andreas Moeck , Clemens Auschra , Peter Nesvadba , Frank Oliver Heinrich Pirrung , Andreas Gernandt
    • Huiguang Kou , Andreas Moeck , Clemens Auschra , Peter Nesvadba , Frank Oliver Heinrich Pirrung , Andreas Gernandt
    • C08F16/12 , C08F12/08 , C08F20/12 , C08F293/00 , C08F8/44 , C08F8/00 , C08F8/30 , C08F8/42 , C08F2/00 , C08F20/54 , C08F26/10 , C08F36/06 , C08F36/08
    • This invention relates to end-functionalized living polymers or copolymers having a structure represented by the general formula 1 or 2, wherein R1 is a hydrogen atom, a methyl group, or a radically non-polymerizable organic group containing 1 to 20 carbon atoms. R2 is a functional end group of a vinyl hetero monomer selected from the group consisting of hydroxy, epoxy, silyl, NH2, NH(C1-C6alkyl), N(C1-C6alkyl)2, —CH═CH2, —C≡CH, —C(CH3)═CH2, —O—CH═CH2, (—O—CH2—CH2)1-10—OH, —OR20, —COOR20, —CONHR20, —OCONHR20, —OCOR20 and —NH—CO—R20, wherein R20 is linear or branched C1-C20 alkyl or linear or branched C1-C20 alkyl substituted with hydroxy, epoxy, silyl, NH2 or N(C1-C6alkyl)2; or R20 is phenyl, benzyl, —CH═CH2, —C≡CH or —C(CH3)═CH2, or R2 is a residue of an acrylic acid (CH2═CH—COO—*), methacrylic acid, (CH2═C(CH3)—COO—*) or CH(CH3)═CH—COO—* or R2 is a residue of a dicarboxylic acid HOOC—Rc—COO—* or C1-C6alkyl-OOC—Rc—COO—* wherein Rc is C1-C20 alkylene, C1-C20alkenylene or phenylene; or R2 is a residue derived from the reaction of an isocyanate Ra—NCO with the hydroxy group or with the amine group of the vinyl hetero monomer, said residue being Ra—NHCOO—* or Ra—NHCO—NH—* wherein Ra is unsubstituted C1-C20alkyl, C1-C20cycloalkyl or C1-C20alkyl substituted with hydroxy, epoxy, silyl, NH2, NH(C1-C6alkyl) or N(C1-C6alkyl)2; or R2 is a residue derived from the reaction of a diisocyanate residue OCN—Rb—NCO with the hydroxy group or with the amine group of the vinyl hetero monomer, said residue being *—OOC—NH—Rb—NCO or *—HNOC—NH—Rb—NCO or *—OOC—NH—Rb—NHCOR30 wherein Rb is C1-C20 alkylene or C1-C20cycloalkylene or phenylene and R30 is a residue of hydroxyethylacrylate (CH2═CH—COO—(CH2)2—O*), hydroxyethylmethacrylate (CH2═C(CH3)—COO—(CH2)2—O*), hydroxybutylacrylate (CH2═CH—COO—(CH2)4—O*) or hydroxybutylmethacrylate (CH2═C(CH3)—COO—(CH2)4—O*), A is the hetero atom of the vinyl hetero monomer selected from the group consisting of oxygen, nitrogen, sulfur and silicon; and if R2 is silyl and M is a direct bond, A is a direct bond; M is a bond or a divalent group linking the heteroatom of the vinyl hetero monomer and the functional end group of the vinyl hetero monomer said M being selected from the group consisting of C1-50 alkylene, C1-50 (hetero)alkylene, arylene and heteroarylene; X is a halogen atom, a nitroxide group or a sulphide group, Zn is a polymer or copolymer segment of random-, gradient- or block-type structure, which is built up from vinylic monomers selected from the group consisting of isoprene, 1,3-butadiene, α-C5-18alkene, 4-vinyl-pyridine, 2-vinyl-pyridine, vinyl-imidazole, N-vinylpyrrolidone, dimethylacrylamide, 3-dimethylamino-propylmethacrylamide, styrene, substituted styrene and a compound of formula CH2═C(R3)—C(═R4)—R5, wherein R3 is a hydrogen atom or a methyl group, R4 is oxygen atom or sulfur atom; R5 is NH2, hydroxy, unsubstituted C1-18 alkoxy, C2-100alkoxy interrupted by at least one N and/or O atom, hydroxy-substituted C1-18alkoxy, unsubstituted C1-18alkylamino, di(C1-18alkyl)amino, hydroxy-substituted C1-18alkylamino, hydroxy-substituted di(C1-18alkyl)amino or —O—CH2—CH2—N(CH3)2; Y is the chain terminus of the polymer/copolymer Zn and Y represents the fragment of a polymerization initiator capable of initiating polymerization; Y1 represents a di-, tri- or polyvalent fragment of a di-, tri-, or polyfunctional NMP initiator; m is 2, 3 or 4, preferably 2; n is the number of monomer units Z and is between 10 and 5000.
    • 基本信息 添加关注 加入工作空间 PDF全文 PDF下载 全文下载 相似专利 双屏查看 权利要求书 说明书全文 Espacenet 法律信息 同族专利 专利引用
每页展示10个专利
每页展示10个专利
每页展示20个专利
每页展示50个专利
每页展示100个专利

IPRDB

最新中国发明专利 最新美国发明专利 技术领域 专利库 专利分类库 国际专利分类库

热门服务

会员版试用 API 数据接口 找代理 知嘟嘟专利交易 排行榜 大学排行榜 专利百科

关于我们

平台介绍 战略合作 网站地图

友情链接

知嘟嘟专利交易 国家知识产权局 中国商标网

联系方式


©2019-2023 上海吉码数字技术有限公司 版权所有，并保留所有权利 沪ICP备20016256号-6 沪公网安备31011702005475号