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    • 6. 发明授权
    • Radiation-curing or heat-curing organosiloxane compositions containing
(methyl) styrene groups
    • 含有(甲基)苯乙烯基团的辐射固化或热固化有机硅氧烷组合物
    • US6068929A
    • 2000-05-30
    • US72211
    • 1998-05-04
    • Jochen DauthJosef WolfersederBernward Deubzer
    • Jochen DauthJosef WolfersederBernward Deubzer
    • C08F299/08C08F290/14C08G77/38C08G77/46C08G77/50C08L83/07C09D155/00C09D183/07C09D183/12C09D183/14C08F283/12B32B27/00
    • C09D183/12C08G77/46C08G77/50C09D183/14
    • Novel organosiloxane compositions which contain (methyl)styrene groups and can be prepared on the basis ofA) oligomeric or polymeric organosilicon compounds comprising at least one unit of the formulaGR.sub.c SiO.sub.(4-c-1)/2 (I)or at least one unit of the formula (I) and at least one unit of the formulaO.sub.(4-c-1)/2) R.sub.c Si--G.sup.1 --R.sub.c SiO.sub.(4-c-1)/2(II)B) monomeric alkenyloxy compounds, maleates, fumarates, maleimides, (meth)acrylates, (methyl)styrenes, acrylamides, itaconic esters and/or oligomeric or polymeric organosilicon compounds containing on average more than one alkenyloxy, maleate, fumarate, maleimide or (meth)acrylate group, where R are identical or different hydrocarbon radicals which may be halogenated or unhalogenated or a radical of the formula--R.sup.1 --[OCH.sub.2 CH.sub.2 ].sub.o --[OCH(CH.sub.3)CH.sub.2 ].sub.p --[O(CH.sub.2).sub.4 ].sub.q --OR.sup.2,whereR.sup.1 is a linear or branched alkylene radical,R.sup.2 is a hydrogen atom, an alkyl radical or a radical of the formula --CO--R.sup.3, where R.sup.3 is an alkyl radical,G is a radical of the formula (IV) --R.sup.4 -(phenyl) which is substituted by [--Y.sub.(5-d) ] and (--R.sup.5.sub.d), with the proviso that at least one radical R.sup.5 is present andG.sup.1 is a radical of the formula (V) --(phenyl)-(R.sup.4).sub.d -- which is substituted by [--Y.sub.4-d ], whereR.sup.4 is a linear or branched, substituted or unsubstituted alkylene radical,R.sup.5 is a vinyl radical or isopropenyl radical,Y can be identical or different and each Y is a hydrogen atom or is as defined for R, or is a radical of the formula --OR.sup.6, whereR.sup.6 is a C.sub.1-8 alkyl radical optionally interrupted by an ether oxygen atom, andc is 0, 1 or 2, on average from 0.0 to 2.0,d is 1, 2 or 3,o is 0 or an integer from 1 to 100,p is 0 or an integer from 1 to 100, andq is 0 or an integer from 1 to 100, with the proviso that the sum o+p+q is >0.
    • 含有(甲基)苯乙烯基团的新型有机硅氧烷组合物并且可以基于A)包含至少一种式GRcO(4-c-1)/ 2(I)单元的低聚或聚合有机硅化合物或至少一个单元 (4-c-1)/ 2)RcSi-G1-RcSiO(4-c-1)/ 2(II)B)单体链烯氧基化合物,马来酸酯,富马酸酯的至少一个单元 ,马来酰亚胺,(甲基)丙烯酸酯,(甲基)苯乙烯,丙烯酰胺,衣康酸酯和/或低聚或聚合的有机硅化合物,其平均含有多于一个烯氧基,马来酸酯,富马酸酯,马来酰亚胺或(甲基)丙烯酸酯基团,其中R相同或 可以被卤化或未卤化的不同烃基或式-R1- [OCH2CH2] o- [OCH(CH3)CH2]对 - [O(CH2)4] q-OR2的基团,其中R1是直链或支链 亚烷基,R2是氢原子,烷基或式-CO-R3的基团,其中R3是烷基,G是式(IV)-R4-(苯基) h被[-Y(5-d)]和(-R5d)取代,条件是存在至少一个基团R 5,并且G 1是式(Ⅴ) - (苯基) - (R 4)d - 被[-Y4-d]取代,其中R4是直链或支链的取代或未取代的亚烷基,R5是乙烯基或异丙烯基,Y可以相同或不同,并且每个Y是氢原子或是 如R所定义,或者是式-OR 6的基团,其中R 6是任选被醚氧原子中断的C 1-8烷基,c是0,1或2,平均为0.0至2.0,d为 1,2或3,o为0或1〜100的整数,p为0或1〜100的整数,q为0或1〜100的整数,条件是+ o + p + q是> 0。