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1. 发明授权

US11370939B2 Polishing slurry, method for polishing glass, and method for manufacturing glass 有权
公开(公告)号：US11370939B2
公开(公告)日：2022-06-28
申请号：US17006236
申请日：2020-08-28
申请人： AGC Inc.
发明人： Tomohiro Shibuya
IPC分类号： C09G1/04 , C03C15/02 , C09G1/14 , H01L21/306 , C09K3/14 , H01L21/321 , C09G1/00 , C09K13/06 , C09G1/06 , B82Y30/00
摘要： Smoothness of glass is improved. A polishing slurry (A) contains amorphous carbon and water, and a total amount of the amorphous carbon and the water is equal to or more than 90% of the whole polishing slurry in terms of mass ratio.

2. 发明授权

US11312882B2 CMP slurry solution for hardened fluid material 有权
公开(公告)号：US11312882B2
公开(公告)日：2022-04-26
申请号：US17020411
申请日：2020-09-14
申请人： Taiwan Semiconductor Manufacturing Company, Ltd.
发明人： Kuo-Yin Lin , Wen-Kuei Liu , Teng-Chun Tsai , Shen-Nan Lee , Kuo-Cheng Lien , Chang-Sheng Lin , Yu-Wei Chou
IPC分类号： C09G1/14 , C09G1/18 , C09G1/02 , C09G1/04 , H01L21/027 , H01L21/3105 , H01L21/311
摘要： A slurry solution for a Chemical Mechanical Polishing (CMP) process includes a wetting agent, a stripper additive that comprises at least one of: N-methyl-2-pyrrolidone (NMP), dimethyl sulfoxide (DMSO), sulfolane, and dimethylformamide (DMF), and an oxidizer additive comprising at least one of: hydrogen peroxide (H2O2), ammonium persulfate ((NH4)2S2O8), peroxymonosulfuric acid (H2SO5), ozone (O3) in de-ionized water, and sulfuric acid (H2SO4).

3. 发明授权

US09139504B2 Lanolin substitute, production method thereof and applications of same 有权
标题翻译：羊毛脂替代品，其生产方法及应用
公开(公告)号：US09139504B2
公开(公告)日：2015-09-22
申请号：US13755598
申请日：2013-01-31
申请人： ALDIVIA SA
发明人： Pierre Charlier De Chily , Mikaele Raynard
IPC分类号： C07C51/00 , A61K8/00 , A61K8/18 , A61K8/02 , A61K31/20 , A23D9/00 , A61Q1/04 , C07C57/02 , A61K8/31 , A61K8/92 , A61K9/00 , A61K9/107 , A61K47/44 , A61Q1/06 , A61Q19/00 , C09D11/00 , C09G1/14 , C10M159/12 , C11C3/00 , C11C3/02 , C14C9/02
CPC分类号： C07C57/02 , A61K8/31 , A61K8/922 , A61K9/0014 , A61K9/107 , A61K47/44 , A61Q1/06 , A61Q19/00 , C09D11/00 , C09G1/14 , C10M159/12 , C11C3/00 , C11C3/003 , C11C3/02 , C14C9/02
摘要： This invention proposes a lanolin substitute, capable of absorbing up to at least twice its weight of water or aqueous solution or aqueous suspension. It forms true emulsions, stable over time with a capacity for water absorption superior to that of lanolin.It also possesses the known emollient, moisturizing and occlusive properties of lanolin.This substitute is usable in all the present and future areas of application of lanolin: in the cosmetics industry, dermatology, and in industrial applications (polishes, lubricants . . . ).It is obtained by hemi-synthesis from a mixture of unsaturated fatty acids, esters of unsaturated fatty acids, unsaturated hydrocarbons or unsaturated derivatives of the latter and compounds comprising or generating hydroxyl functions, such as glycerol, preferably without a catalyst and in an atmosphere devoid of oxygen.Classical thermal treatment or preferably treatment by dielectric heating.
摘要翻译：本发明提出一种羊毛脂替代物，其能够吸收至多两倍于其重量的水或水溶液或水悬浮液。它形成真正的乳液，随着时间的推移具有稳定的吸水能力，优于羊毛脂。它还具有羊毛脂已知的润肤剂，保湿和闭塞性质。该替代物可用于羊毛脂的所有当前和未来应用领域：化妆品工业，皮肤病学和工业应用（抛光剂，润滑剂...）。它是通过从不饱和脂肪酸，不饱和脂肪酸的酯，不饱和烃或后者的不饱和衍生物的混合物和包含或产生羟基官能团的化合物如甘油，优选不含催化剂和在无空气中的混合物中进行半合成而获得的的氧气。经典热处理或优选通过介电加热处理。

4. 发明申请

US20090197413A1 Polishing Composition and Polishing Method Using The Same 有权
标题翻译：抛光组合和抛光方法使用它
公开(公告)号：US20090197413A1
公开(公告)日：2009-08-06
申请号：US12362991
申请日：2009-01-30
申请人： Mikikazu SHIMIZU , Tomohiko AKATSUKA , Kazuya SUMITA
发明人： Mikikazu SHIMIZU , Tomohiko AKATSUKA , Kazuya SUMITA
IPC分类号： C09G1/14 , C09G1/02 , H01L21/304
CPC分类号： H01L21/3212 , C09G1/02
摘要： The present invention provides a polishing composition that can be suitably used in polishing of polysilicon, and a polishing method using the polishing composition. The polishing composition contains abrasive grains and an anionic surfactant having a monooxyethylene group or a polyoxyethylene group and has a pH of 9 to 12. If the anionic surfactant contained in the polishing composition has a polyoxyethylene group, the number of repeating oxyethylene units in the polyoxyethylene group is preferably 2 to 8. The anionic surfactant contained in the polishing composition can be an anionic surfactant that has a phosphate group, a carboxy group, or a sulfo group as well as a monooxyethylene group or a polyoxyethylene group. The content of the anionic surfactant in the polishing composition is preferably 20 to 500 ppm.
摘要翻译：本发明提供了可以适用于多晶硅研磨的抛光组合物和使用该抛光组合物的研磨方法。抛光组合物含有磨粒和具有单氧乙烯基或聚氧乙烯基的阴离子表面活性剂，其pH为9〜12。如果研磨用组合物中含有的阴离子表面活性剂具有聚氧乙烯基，则聚氧乙烯基团优选为2〜8。抛光组合物中所含的阴离子表面活性剂可以是具有磷酸基，羧基或磺基以及单氧乙烯基或聚氧乙烯基的阴离子表面活性剂。抛光组合物中阴离子表面活性剂的含量优选为20〜500ppm。

5. 发明授权

US5378271A Tire polishing and protective composition 失效
标题翻译：轮胎抛光和保护组成
公开(公告)号：US5378271A
公开(公告)日：1995-01-03
申请号：US112460
申请日：1993-08-27
申请人： Kunio Arimoto , Nobuo Yoshida , Haruo Ohtani , Yasuhiko Ikkaku
发明人： Kunio Arimoto , Nobuo Yoshida , Haruo Ohtani , Yasuhiko Ikkaku
IPC分类号： B60C1/00 , B60C11/00 , B60C13/00 , C08L21/00 , C08L83/04 , C08L83/06 , C09D183/04 , C09G1/00 , C09G1/14 , C09G1/16 , C09D193/04 , C09D183/06
CPC分类号： C09G1/14 , B60C13/001 , B60C13/002 , C09D183/04
摘要： The invention provides a tire polishing and protective composition including, as dissolved or dispersed in an organic solvent, 2 to 25% by weight of a silicone varnish, 0.1 to 4% by weight of a rubber type polymer and 0.1 to 10% by weight of a tackifier.
摘要翻译：本发明提供了一种轮胎抛光和保护组合物，其包括溶解或分散在有机溶剂中的2至25重量％的硅氧烷清漆，0.1至4重量％的橡胶类聚合物和0.1至10重量％增粘剂。

6. 发明授权

US5028458A Antiseptic polish 失效
标题翻译：防腐抛光
公开(公告)号：US5028458A
公开(公告)日：1991-07-02
申请号：US466019
申请日：1990-01-16
申请人： Fred Mineck
发明人： Fred Mineck
IPC分类号： C09D5/14 , C09G1/14
CPC分类号： C09G1/14 , C09D5/14
摘要： There is disclosed an antiseptic polish for covering highly touched surfaces which contain a solution comprising Povidone-Iodine of approximately 7.5 to 10 percent by volume dispersed in a liquid polish.
摘要翻译：公开了一种用于覆盖高度接触的表面的防腐抛光剂，其含有包含分散在液体抛光剂中的约7.5至10体积％的聚维酮碘的溶液。

7. 发明授权

US2607738A Bleaching, sterilizing, disinfecting, and deterging compositions 失效
公开(公告)号：US2607738A
公开(公告)日：1952-08-19
申请号：US3529748
申请日：1948-06-25
申请人： MONSANTO CHEMICALS
发明人： HARDY EDGAR E
IPC分类号： A01N59/00 , A01N59/10 , A61K8/24 , A61K8/49 , A61Q11/02 , C07D251/36 , C09G1/00 , C09G1/14 , C11D1/00 , D06L3/06
CPC分类号： A61Q11/02 , A61K8/24 , A61K8/4966 , D06L4/27

8. 发明授权

US1894207A Detergent composition 失效
公开(公告)号：US1894207A
公开(公告)日：1933-01-10
申请号：US40230929
申请日：1929-10-24
申请人： MATHIESON ALKALI WORKS INC
发明人： CRAIG TAYLOR MAURICE
IPC分类号： C09G1/14
CPC分类号： C09G1/14

9. 发明授权

US07628848B2 Water-based composition for renewing plastic surfaces 失效
标题翻译：用于更新塑料表面的水性组合物
公开(公告)号：US07628848B2
公开(公告)日：2009-12-08
申请号：US11736095
申请日：2007-04-17
申请人： Rodrigo F. Saldarriaga
发明人： Rodrigo F. Saldarriaga
IPC分类号： C09G1/00 , C09G1/04 , C09G1/14 , C14C9/00 , C14C11/00
CPC分类号： C11D11/0035 , C11D3/3765 , C11D7/263 , C11D7/5022
摘要： A water-based, non-oily, scented, liquid composition, with an ultraviolet filter, to be applied manually by brush or sponge, or by using an air gun, to surfaces of a synthetic nature. When impregnated, such surfaces recover their shine to an extent according to the number of layers applied, and are renewed in appearance.
摘要翻译：具有紫外线过滤器的水性，非油性，有香味的液体组合物，通过刷子或海绵手动或通过使用气枪来施用于合成性质的表面。当浸渍时，这些表面根据施加的层数将光泽恢复到一定程度，并在外观上更新。

10. 发明申请

US20050159088A1 Method for polishing hard surfaces 审中-公开
标题翻译：抛光硬表面的方法
公开(公告)号：US20050159088A1
公开(公告)日：2005-07-21
申请号：US10758688
申请日：2004-01-15
申请人： Kim Smith
发明人： Kim Smith
IPC分类号： B24B1/00 , C09G1/14
CPC分类号： C09G1/14
摘要： The present invention relates to a method for polishing hard surfaces. The method includes applying a composition including an alkoxylate to a hard surface to be polished.
摘要翻译：本发明涉及一种抛光硬表面的方法。该方法包括将包含烷氧基化物的组合物施加到待抛光的硬表面上。

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