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1. 发明授权

US11598627B2 Methods, systems and apparatus of interferometry for imaging and sensing 有权
公开(公告)号：US11598627B2
公开(公告)日：2023-03-07
申请号：US16075174
申请日：2017-02-03
申请人： VIRGINIA TECH INTELLECTUAL PROPERTIES, INC.
发明人： Yizheng Zhu
IPC分类号： G01B9/02001 , G01B9/02004 , G01B9/02002 , G01B9/04 , G02B27/52 , G01B9/02098
摘要： Various methods, systems and apparatus are provided for imaging and sensing using interferometry. In one example, a system includes an interferometer; a light source that can provide light to the interferometer at multiple wavelengths (λi); and optical path delay (OPD) modifying optics that can enhance contrast in an interferometer output associated with a sample. The light can be directed to the sample by optics of the interferometer. The interferometer output can be captured by a detector (e.g., a camera) at each of the multiple wavelengths (λi). In another example, an apparatus includes an add-on unit containing OPD that can enhance contrast in an interferometer output associated with a sample illuminated by light at a defined wavelength (λi). A detector can be attached to the add-on unit to record the interferometer output at the defined wavelength (λi).

2. 发明授权

US10078275B2 Measurement apparatus, lithography apparatus, and method of manufacturing article 有权
公开(公告)号：US10078275B2
公开(公告)日：2018-09-18
申请号：US13954031
申请日：2013-07-30
申请人： CANON KABUSHIKI KAISHA
发明人： Yoshiyuki Okada
IPC分类号： G02B27/52 , G03F7/20 , G01B7/00 , G01B21/04 , G01B11/02
CPC分类号： G03F7/70775 , G01B7/003 , G01B11/026 , G01B21/045 , G03F7/70725
摘要： A measurement apparatus is configured to measure a position of an object based on a first phase signal and a second phase signal whose phases are different from each other and includes a compensator configured to compensate for a fluctuation in a phase difference between the first phase signal and the second phase signal based on a frequency of at least one of the first phase signal and the second phase signal.

3. 发明授权

US09041938B2 Surface wave assisted structures and systems 有权
标题翻译：表面波辅助结构和系统
公开(公告)号：US09041938B2
公开(公告)日：2015-05-26
申请号：US13344550
申请日：2012-01-05
申请人： Guoan Zheng , Xiquan Cui , Xin Heng , Changhuei Yang , Axel Scherer
发明人： Guoan Zheng , Xiquan Cui , Xin Heng , Changhuei Yang , Axel Scherer
IPC分类号： G01B9/02 , G02B6/122 , B82Y20/00 , G01N21/552 , G02B5/00 , G02B21/00 , G02B21/14 , G02B27/52
CPC分类号： G02B6/1226 , B82Y20/00 , G01N21/554 , G02B5/008 , G02B21/0032 , G02B21/004 , G02B21/0056 , G02B21/0068 , G02B21/14 , G02B27/52
摘要： A surface wave assisted system having an aperture layer with a surface and an aperture, and a plurality of grooves around the aperture. The plurality of grooves is configured to generate an optical transfer function at the aperture by inducing a surface wave for interfering with transmission of light of a range of spatial frequency.
摘要翻译：表面波辅助系统，具有具有表面和孔径的孔层，以及围绕孔的多个凹槽。多个槽被配置为通过诱导表面波来干扰空间频率范围的光的透射来在孔处产生光学传递函数。

4. 发明授权

US5066119A Optical device for phase detection testing optical systems, especially ophthalmic lenses 失效
标题翻译：用于相位检测光学系统的光学装置，尤其是眼镜
公开(公告)号：US5066119A
公开(公告)日：1991-11-19
申请号：US527435
申请日：1990-05-23
申请人： Patrick Bertrand
发明人： Patrick Bertrand
IPC分类号： G01M11/00 , G01B11/255 , G01M11/02 , G02B27/44 , G02B27/52
CPC分类号： G01M11/0257 , G01B11/255 , G02B27/52 , G02B27/4211
摘要： A device for phase detection testing any kind of optical system, in particular an ophthalmic lens, comprises, along an optical path, an emission device which constitutes a light source, a holding station which receives the optical system under test, an array, a receiving device which receives the image observable downstream of the array, and a data processing device which exploits this image by phase detection. Between the light source and the holding station is a separator element which constitutes on the axis of the optical path a semi-reflecting surface. The receiving device is disposed to the side, in line with the separator element. The data processing device includes a ray plotting program and a calibration system allowing for theoretical and manufacturing aberrations due to the separator element.
摘要翻译：用于相位检测测试任何种类的光学系统，特别是眼科镜片的装置包括沿着光路的构成光源的发射装置，接收被测光学系统的保持站，阵列，接收接收在阵列下游可观察到的图像的装置，以及通过相位检测利用该图像的数据处理装置。在光源和保持站之间是在光路的轴线上构成半反射面的分离元件。接收装置设置在与分离器元件一致的一侧。数据处理装置包括射线绘制程序和校准系统，其允许理论和制造由分离器元件引起的像差。

5. 发明授权

US4861975A Variable focus optical system and method using electro-optic material 失效
标题翻译：可变焦光学系统和使用电光材料的方法
公开(公告)号：US4861975A
公开(公告)日：1989-08-29
申请号：US310027
申请日：1989-02-08
申请人： Gordon S. Kino , Timothy R. Corle
发明人： Gordon S. Kino , Timothy R. Corle
IPC分类号： G01B11/02 , G02B7/32 , G02B27/52
CPC分类号： G02B7/32 , G01B11/026 , G02B27/52
摘要： Variable focus optical system in which a light beam is projected through a transparent flat cell of electro-optic material coated on both sides with a layer of transparent conductive material. The layer on one side of the cell is divided into a central disc region and a ring shaped region which surrounds the central region. A lens focuses the light transmitted through the cell at a predetermined distance from the lens. An AC voltage is applied between one of the regions and the layer on the opposite side of the cell to vary the phase of the light passing through that region and focus that portion of the light at a distance which varies periodically with the AC voltage. A reflective surface is positioned at the distance from the lens where the unshifted light is focused, and a detector receives the light reflected from the reflective surface and provides an output signal indicative of the position of the surface.
摘要翻译：可变焦光学系统，其中光束通过透明的电光材料扁平单元投影，两侧均涂覆有一层透明导电材料。单元一侧的层分为中心圆盘区域和围绕中心区域的环形区域。透镜将透过单元的光聚焦在与透镜预定距离处。在区域之一和单元的相对侧上的层之间施加AC电压以改变通过该区域的光的相位，并将光的该部分聚焦在与AC电压周期性变化的距离处。反射表面定位在与未被移动的光聚焦的透镜的距离处，并且检测器接收从反射表面反射的光并且提供表示表面位置的输出信号。

6. 发明授权

US4730900A Projection optical apparatus 失效
标题翻译：投影光学仪器
公开(公告)号：US4730900A
公开(公告)日：1988-03-15
申请号：US696085
申请日：1985-01-29
申请人： Makoto Uehara , Hideo Mizutani , Kiyoyuki Muramatsu , Takeshi Asami , Akikazu Tanimoto
发明人： Makoto Uehara , Hideo Mizutani , Kiyoyuki Muramatsu , Takeshi Asami , Akikazu Tanimoto
IPC分类号： G03B27/34 , G02B7/02 , G02B7/09 , G02B7/28 , G02B21/24 , G03F7/20 , G03F7/207 , H01L21/027 , H01L21/30 , G01J5/00 , G02B27/52
CPC分类号： G03F7/70241 , G02B21/241 , G02B7/028 , G03F7/70825 , G03F7/70883 , G03F7/70891
摘要： A projection optical apparatus comprises illuminating means providing for an illuminating light beam, a projection optical system including optical elements disposed across the illuminating light beam and having an imaging plane, and detecting mean including temperature sensor means provided on at least one of the optical elements and producing an output corresponding to the temperature of the one optical element.
摘要翻译：投影光学装置包括提供照明光束的照明装置，包括设置在照明光束两侧并具有成像平面的光学元件的投影光学系统，以及包括设置在至少一个光学元件上的温度传感器装置的检测装置，产生对应于一个光学元件的温度的输出。

7. 发明授权

US11047790B2 Method and system for enhanced single particle reflectance imaging 有权
公开(公告)号：US11047790B2
公开(公告)日：2021-06-29
申请号：US16300356
申请日：2017-05-09
申请人： TRUSTEES OF BOSTON UNIVERSITY
发明人： Selim M. Unlu , Oguzhan Avci , Derin Sevenler
IPC分类号： G01B11/02 , G01N15/14 , G02B21/14 , G02B26/06 , H05H3/02 , G02B27/52 , G02B21/08 , G02B21/36
摘要： An enhanced single particle interferometric reflectance imaging system includes an illumination source configured to produce illumination light along an illumination path toward a target substrate. The target substrate can be configured to reflect the illuminating light along one or more collection paths toward one or more imaging sensors. The target substrate includes a base substrate having a first reflecting surface and a transparent spacer layer having a first surface in contact with the first reflecting surface and a second reflecting surface on a side opposite to the first surface. The transparent spacer layer has a predefined thickness that is determined as a function of a wavelength of the illuminating light and produces a predefined radiation pattern of optical scattering when nanoparticles are positioned on or near the second reflective surface. In addition, one or more of the collection paths can also include an amplitude mask selected to match the radiation pattern.

8. 发明授权

US09881710B2 Achromatic phase-contrast imaging 有权
公开(公告)号：US09881710B2
公开(公告)日：2018-01-30
申请号：US13260424
申请日：2010-03-19
申请人： Ewald Roessl , Thomas Koehler
发明人： Ewald Roessl , Thomas Koehler
IPC分类号： G21K1/06 , G02B27/52
CPC分类号： G21K1/06 , G02B27/52 , G21K2207/005
摘要： An achromatic phase-contrast imaging apparatus for examining an object of interest is provided which comprises two different phase gratings which have different pitches. Thus, the imaging apparatus yields phase-contrast information for two different energies. Thus, phase-information over a wider energy band can be used.

9. 发明授权

US08687168B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08687168B2
公开(公告)日：2014-04-01
申请号：US13083966
申请日：2011-04-11
申请人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
发明人： Roelof Frederik De Graaf , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
IPC分类号： G02B27/42 , G02B27/52 , G03F7/20
CPC分类号： G03F7/70341
摘要： A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.
摘要翻译：公开了一种光刻投影装置，其中采取措施来防止或减少投影光束通过其喷射的液体中气泡的存在。这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。

10. 发明申请

US20090310206A1 LIGHT BEAM GENERATION 有权
标题翻译：光束生成
公开(公告)号：US20090310206A1
公开(公告)日：2009-12-17
申请号：US12305264
申请日：2007-06-18
申请人： Jesper Gluckstad
发明人： Jesper Gluckstad
IPC分类号： G02B27/52
CPC分类号： G02B27/52 , G02B21/32 , G06E3/00 , Y10S359/90
摘要： A method and system for synthesizing controllable light beams includes a spatially modulated light source that generates electromagnetic radiation with a set of replicas of a predetermined symbol, s, positioned at desired positions (xs, ys) in an object plane o(x, y) intersecting, preferably perpendicular to, the direction of propagation of the electromagnetic radiation, and having spatial amplitudes a(x-xs, y-ys), spatial phases φ(x-xs, y-ys), and spatial polarisation vectors p(x-xs, y-ys), a Fourier transforming lens for Fourier transforming the electromagnetic radiation, a first spatial light modulator for phase shifting the transformed electromagnetic radiation with the phase −Φ(u, v) of S*, S* the complex conjugate of the transformed symbol, a Fourier transforming lens for Inverse Fourier transforming the spatially modulated radiation, a set of light beams are formed propagating through the inverse Fourier plane (x′, y′) at desired positions (x′s, y′s), and a controller for controlling the position of a replica of the symbol, for movement of the light beam.
摘要翻译：用于合成可控光束的方法和系统包括空间调制的光源，其产生电磁辐射，其具有定位在物平面o（x，y）中的期望位置（xs，y）处的预定符号s的一组副本，相交，优选垂直于电磁辐射的传播方向，并且具有空间振幅a（x-xs，y-ys），空间相位phi（x-xs，y-ys）和空间极化矢量p（x -xs，y-ys），用于对电磁辐射进行傅里叶变换的傅立叶变换透镜，用S *，S *的相位-Phi（u，v）将复合电磁辐射相移的第一空间光调制器的变换符号的傅立叶变换透镜，用于对空间调制的辐射进行逆傅立叶变换，形成一组光束，其在期望的位置（x，y）处通过傅立叶逆傅立叶平面（x'，y'）传播，并且控制器为公司控制符号的副本的位置，用于光束的移动。

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