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    • 3. 发明申请
    • Exposure apparatus and exposure method capable of controlling illumination distribution
    • 能够控制照明分布的曝光装置和曝光方法
    • US20040239904A1
    • 2004-12-02
    • US10876712
    • 2004-06-28
    • NIKON CORPORATION
    • Hisashi Nishinaga
    • G03B027/42
    • G03F7/70083G03B27/42G03F7/701G03F7/70191
    • An exposure apparatus radiates an exposure light beam from an exposure light source onto a reticle via an illumination optical system including a first fly's eye lens, a second fly's eye lens, a lens system, a blind, and a condenser lens system, and it projects an image of a pattern on the reticle onto a wafer via a projection optical system. An illumination characteristic is measured by using an evaluation mark plate on a reticle stage and a spatial image-measuring system provided for a wafer stage. The states of the second fly's eye lens and the lens system are adjusted by the aid of a driving unit on the basis of the measured value. A concentration filter plate, which is formed with a pattern of a predetermined transmittance distribution, is rotatably arranged in the vicinity of a conjugate plane with respect to an image plane between the second lens system and the blind. The angle of rotation of the concentration filter plate 51 is controlled so that the uneven illuminance is corrected. The illumination optical system can be adjusted correctly for a short period of time. It is possible to improve the uniformity of the exposure amount distribution.
    • 曝光装置经由包括第一蝇眼透镜,第二蝇眼透镜,透镜系统,盲人和聚光透镜系统的照明光学系统将曝光光源从曝光光源照射到掩模版上,并且投影 通过投影光学系统将掩模版上的图案的图像转印到晶片上。 照明特性通过使用标线片台上的评价标记板和设置在晶片台上的空间图像测量系统来测量。 基于测量值,借助于驱动单元来调整第二蝇眼透镜和透镜系统的状态。 形成有预定透射率分布图案的浓度滤光片相对于第二透镜系统和遮光板之间的图像平面可旋转地布置在共轭平面附近。 控制集中滤光板51的旋转角度,校正不均匀照度。 照明光学系统可以在短时间内正确调节。 可以提高曝光量分布的均匀性。
    • 7. 发明申请
    • Positioning device
    • 定位装置
    • US20040184020A1
    • 2004-09-23
    • US10394839
    • 2003-03-21
    • David Trost
    • G03B027/42
    • F16C29/025F16C32/0603F16C32/0666F16C33/748F16C2300/62G03F7/70758G03F7/70816G03F7/70941H01J2237/20H01L21/68
    • This invention is directed to precision positioning devices which are well suited to manufacturing and inspection of semiconductor devices. A pair of coil assembles are attached to a base plate. The base plate forms a static portion of a gas bearing assembly. A carriage assembly, forming a movable portion of the gas bearing assembly, is capable of in-plane motion over the coil assembly. The carriage assembly contains permanent magnets and a soft magnetic bridge. A metrology component, such as a mirror, is attached to the carriage kinematically. Three in-plane constraints consist of substantially straight line connections between the metrology component and the carriage in a plane substantially parallel to the plane of motion of the gas bearings. Three out-of-plane constraints on the metrology component comprise substantially straight line connections between it and the gas bearings. The positioning device is operable in vacuum by directing the flow of gas out of the bearings to a vacuum pump. The positioning device is further capable of creating an area of low stray magnetic fields through the use of moving magnetic shielding material.
    • 本发明涉及非常适合半导体器件的制造和检验的精密定位装置。 一对线圈组件连接到基板。 基板形成气体轴承组件的静止部分。 形成气体轴承组件的可移动部分的托架组件能够在线圈组件上面内运动。 托架组件包含永磁体和软磁桥。 计量部件,如反射镜,以运动方式连接到滑架。 三个面内约束由基本上平行于气体轴承的运动平面的平面中的测量部件和滑架之间的大致直线连接构成。 对测量部件的三个面外约束包括其与气体轴承之间的大致直线连接。 定位装置通过将气流从轴承引导到真空泵在真空中可操作。 定位装置还能够通过使用移动磁屏蔽材料产生低杂散磁场的面积。
    • 8. 发明申请
    • Electrostatic pellicle system for a mask
    • 用于面罩的静电防护薄膜系统
    • US20040180271A1
    • 2004-09-16
    • US10806726
    • 2004-03-22
    • Dan Enloe
    • G03F009/00G03B027/42A47G001/12B44F001/00
    • B82Y10/00B82Y40/00G03F1/24G03F1/62
    • The present invention describes an apparatus comprising a mask; a pellicle spacer, the pellicle spacer attached to the mask; and an electrostatic pellicle system, the electrostatic pellicle system attached to the pellicle spacer. The present invention further describes a method of keeping contaminants away from a vicinity of a mask during exposure, the contaminants including an uncharged or neutral particle, a positively-charged particle, or a negatively-charged particle, comprising: inducing a positive or negative charge on the uncharged or neutral particle; attracting the positively-charged particle with a negatively-charged electric field; and attracting the negatively-charged particle with a positively-charged electric field.
    • 本发明描述了一种包括掩模的装置; 防护膜隔离物,附着在掩模上的防护膜隔片; 和静电防护薄膜系统,静电防护薄膜系统附着在防护薄膜组件上。 本发明还描述了一种在暴露期间将污染物远离掩模附近的污染物,污染物包括不带电荷或中性颗粒,带正电荷的颗粒或带负电荷的颗粒,包括:诱导正电荷或负电荷 在不带电或中性粒子上; 用带负电荷的电场吸引带正电的粒子; 并用带正电荷的电场吸引带负电荷的粒子。
    • 9. 发明申请
    • Lithographic apparatus and device manufacturing method
    • 平版印刷设备和器件制造方法
    • US20040165168A1
    • 2004-08-26
    • US10734639
    • 2003-12-15
    • ASML NETHERLANDS B.V.
    • Hako Botma
    • G03B027/54G03B027/42
    • G03F7/70108G03F7/70158
    • A projection beam PB is projected onto a substrate W via a mask MA. The direction dependence of the intensity of the beam at the substrate W is controlled by passing the beam through a series of optical elements 120a-b in front of a pupil plane 14. The intensity distribution as a function of position in the pupil plane 14 determines the angle dependence at the substrate W. The optical elements 120a-b, which are preferably arrays of microlenses (or more particularly DOE's: Diffractive Optical Elements) each define an angle dependence of the intensity of the beam PB. The optical elements 120a-b are each arranged to pass a major part of the beam PB substantially without deflection and a minor part with a deflection angle dependent intensity. The major part of the beam is blocked out of the beam behind the series of optical elements 120a-b. As a result an addition of the effects of upon the intensity in the pupil plane 14 is realized.
    • 通过掩模MA将投影光束PB投影到基板W上。 通过使光束通过光瞳面14前面的一系列光学元件120a-b来控制光束在衬底W处的强度的方向依赖性。作为瞳孔平面14中的位置的函数的强度分布确定 基板W的角度依赖性。优选地,微透镜阵列(或更特别是DOE的衍射光学元件)的光学元件120a-b分别限定了光束PB的强度的角度依赖性。 光学元件120a-b各自被布置成基本上不偏转地使光束PB的主要部分和具有偏转角依赖强度的次要部分通过。 光束的主要部分被阻挡在一系列光学元件120a-b后面的光束之外。 结果,实现了对瞳孔平面14中的强度的影响。