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1. 发明申请

US20040263808A1 Immersion photolithography system and method using inverted wafer-projection optics interface 失效
标题翻译：浸入式光刻系统及方法采用倒置晶片投影光学接口
公开(公告)号：US20040263808A1
公开(公告)日：2004-12-30
申请号：US10831300
申请日：2004-04-26
申请人： ASML Holding N.V.
发明人： Harry Sewell
IPC分类号： G03B027/52 , G03B027/42
CPC分类号： G03F7/70341 , G03F7/70233
摘要： A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation, and also includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides a liquid between the projection optical system and the substrate. The projection optical system is positioned below the substrate.

2. 发明申请

US20040246454A1 Projecting exposure apparatus 审中-公开
标题翻译：投影曝光装置
公开(公告)号：US20040246454A1
公开(公告)日：2004-12-09
申请号：US10835421
申请日：2004-04-30
申请人： FUJI PHOTO FILM CO., LTD.
发明人： Hiromi Ishikawa , Sumihiro Nishihata
IPC分类号： G03B027/42
CPC分类号： G03F7/7005 , G03F7/70283 , G03F7/70291
摘要： A spatial light modulator performs spatial light modulation of light produced by a light source. An image-side telecentric image forming optical system forms an image of a two-dimensional pattern of the light, which has been obtained from the spatial light modulation performed by the spatial light modulator, on a photosensitive material. At least either one of two pupil-adjacent lenses, which are adjacent to each other with an entrance pupil position in the image forming optical system intervening between the two pupil-adjacent lenses, is constituted such that at least either one of lens surfaces of the pupil-adjacent lens is an aspherical surface.
摘要翻译：空间光调制器执行由光源产生的光的空间光调制。图像侧远心成像光学系统形成由空间光调制器执行的空间光调制获得的光的二维图案的图像在感光材料上。两个瞳孔相邻透镜中的至少两个相邻的透镜在入射光瞳位置之间插入在两个瞳孔相邻的透镜之间的图像形成光学系统中，被构造成使得至少一个透镜表面瞳孔相邻透镜是非球面。

3. 发明申请

US20040239904A1 Exposure apparatus and exposure method capable of controlling illumination distribution 失效
标题翻译：能够控制照明分布的曝光装置和曝光方法
公开(公告)号：US20040239904A1
公开(公告)日：2004-12-02
申请号：US10876712
申请日：2004-06-28
申请人： NIKON CORPORATION
发明人： Hisashi Nishinaga
IPC分类号： G03B027/42
CPC分类号： G03F7/70083 , G03B27/42 , G03F7/701 , G03F7/70191
摘要： An exposure apparatus radiates an exposure light beam from an exposure light source onto a reticle via an illumination optical system including a first fly's eye lens, a second fly's eye lens, a lens system, a blind, and a condenser lens system, and it projects an image of a pattern on the reticle onto a wafer via a projection optical system. An illumination characteristic is measured by using an evaluation mark plate on a reticle stage and a spatial image-measuring system provided for a wafer stage. The states of the second fly's eye lens and the lens system are adjusted by the aid of a driving unit on the basis of the measured value. A concentration filter plate, which is formed with a pattern of a predetermined transmittance distribution, is rotatably arranged in the vicinity of a conjugate plane with respect to an image plane between the second lens system and the blind. The angle of rotation of the concentration filter plate 51 is controlled so that the uneven illuminance is corrected. The illumination optical system can be adjusted correctly for a short period of time. It is possible to improve the uniformity of the exposure amount distribution.
摘要翻译：曝光装置经由包括第一蝇眼透镜，第二蝇眼透镜，透镜系统，盲人和聚光透镜系统的照明光学系统将曝光光源从曝光光源照射到掩模版上，并且投影通过投影光学系统将掩模版上的图案的图像转印到晶片上。照明特性通过使用标线片台上的评价标记板和设置在晶片台上的空间图像测量系统来测量。基于测量值，借助于驱动单元来调整第二蝇眼透镜和透镜系统的状态。形成有预定透射率分布图案的浓度滤光片相对于第二透镜系统和遮光板之间的图像平面可旋转地布置在共轭平面附近。控制集中滤光板51的旋转角度，校正不均匀照度。照明光学系统可以在短时间内正确调节。可以提高曝光量分布的均匀性。

4. 发明申请

US20040234869A1 Image focus monitor for alternating phase shift masks 失效
标题翻译：用于交替相移掩模的图像聚焦监视器
公开(公告)号：US20040234869A1
公开(公告)日：2004-11-25
申请号：US10442432
申请日：2003-05-20
发明人： Edita Tejnil
IPC分类号： G03B027/42 , G21K005/00 , G03F009/00 , G03C005/00
CPC分类号： G03F1/30 , G03F7/70641
摘要： A focus monitor on an alternating phase shift mask may include sub-wavelength features which have a depth corresponding to an etch depth of primary features on the mask (e.g., a 180null etch depth), but which produce an effective phase shift of about 60null to 120null.
摘要翻译：交替相移掩模上的聚焦监视器可以包括具有对应于掩模上主要特征（例如，180°蚀刻深度）的蚀刻深度的深度的亚波长特征，但是产生约60°的有效相移 °至120°。

5. 发明申请

US20040229129A1 Reducing charging effects in photolithography reticle manufacturing 审中-公开
标题翻译：降低光刻掩模版制造中的充电效果
公开(公告)号：US20040229129A1
公开(公告)日：2004-11-18
申请号：US10437587
申请日：2003-05-14
发明人： Gary Allen , Richard Schenker , Wen-Hao Cheng
IPC分类号： G03F009/00 , G03C005/00 , G03B027/42
CPC分类号： G03F1/40
摘要： Reticle charging effects during the manufacturing process may be reduced. A reticle, including a peripheral outer region and a central inner conductive region separated by an intervening non-conductive region, may be electrically coupled to reduce differential charge effects in one embodiment. For example, a conductive bridge may be formed between the inner and outer regions to electrically neutralize any charge distribution.
摘要翻译：可以减少制造过程中的掩模版充电效果。在一个实施例中，包括周边外部区域和由中间非导电区域分隔的中心内部导电区域的掩模版可以电耦合以减小差分电荷效应。例如，可以在内部和外部区域之间形成导电桥，以电中和任何电荷分布。

6. 发明申请

US20040227107A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20040227107A1
公开(公告)日：2004-11-18
申请号：US10806344
申请日：2004-03-23
申请人： ASML Netherlands B.V.
发明人： Henrikus Herman Marie Cox , Dominicus Jacobus Petrus Adrianus Franken , Nicolaas Rudolf Kemper , Engelbertus Antonius Fransiscus Van Der Pasch , Martijn Johannes Verbunt , Lambertus Adrianus Van Den Wildenberg
IPC分类号： G01B011/00 , G01N021/86 , G03B027/42
CPC分类号： G03F7/70141 , G03F7/70233 , G03F7/70258 , G03F7/709
摘要： In a projection system for EUV, the positions of mirrors are measured and controlled relative to each other, rather than to a reference frame. Relative position measurements may be made by interferometers or capacitive sensors mounted on rigid extensions of the mirrors.
摘要翻译：在用于EUV的投影系统中，反射镜的位置相对于彼此而不是参考帧被测量和控制。可以通过安装在反射镜的刚性延伸部上的干涉仪或电容式传感器进行相对位置测量。

7. 发明申请

US20040184020A1 Positioning device 失效
标题翻译：定位装置
公开(公告)号：US20040184020A1
公开(公告)日：2004-09-23
申请号：US10394839
申请日：2003-03-21
发明人： David Trost
IPC分类号： G03B027/42
CPC分类号： F16C29/025 , F16C32/0603 , F16C32/0666 , F16C33/748 , F16C2300/62 , G03F7/70758 , G03F7/70816 , G03F7/70941 , H01J2237/20 , H01L21/68
摘要： This invention is directed to precision positioning devices which are well suited to manufacturing and inspection of semiconductor devices. A pair of coil assembles are attached to a base plate. The base plate forms a static portion of a gas bearing assembly. A carriage assembly, forming a movable portion of the gas bearing assembly, is capable of in-plane motion over the coil assembly. The carriage assembly contains permanent magnets and a soft magnetic bridge. A metrology component, such as a mirror, is attached to the carriage kinematically. Three in-plane constraints consist of substantially straight line connections between the metrology component and the carriage in a plane substantially parallel to the plane of motion of the gas bearings. Three out-of-plane constraints on the metrology component comprise substantially straight line connections between it and the gas bearings. The positioning device is operable in vacuum by directing the flow of gas out of the bearings to a vacuum pump. The positioning device is further capable of creating an area of low stray magnetic fields through the use of moving magnetic shielding material.
摘要翻译：本发明涉及非常适合半导体器件的制造和检验的精密定位装置。一对线圈组件连接到基板。基板形成气体轴承组件的静止部分。形成气体轴承组件的可移动部分的托架组件能够在线圈组件上面内运动。托架组件包含永磁体和软磁桥。计量部件，如反射镜，以运动方式连接到滑架。三个面内约束由基本上平行于气体轴承的运动平面的平面中的测量部件和滑架之间的大致直线连接构成。对测量部件的三个面外约束包括其与气体轴承之间的大致直线连接。定位装置通过将气流从轴承引导到真空泵在真空中可操作。定位装置还能够通过使用移动磁屏蔽材料产生低杂散磁场的面积。

8. 发明申请

US20040180271A1 Electrostatic pellicle system for a mask 失效
标题翻译：用于面罩的静电防护薄膜系统
公开(公告)号：US20040180271A1
公开(公告)日：2004-09-16
申请号：US10806726
申请日：2004-03-22
发明人： Dan Enloe
IPC分类号： G03F009/00 , G03B027/42 , A47G001/12 , B44F001/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/62
摘要： The present invention describes an apparatus comprising a mask; a pellicle spacer, the pellicle spacer attached to the mask; and an electrostatic pellicle system, the electrostatic pellicle system attached to the pellicle spacer. The present invention further describes a method of keeping contaminants away from a vicinity of a mask during exposure, the contaminants including an uncharged or neutral particle, a positively-charged particle, or a negatively-charged particle, comprising: inducing a positive or negative charge on the uncharged or neutral particle; attracting the positively-charged particle with a negatively-charged electric field; and attracting the negatively-charged particle with a positively-charged electric field.
摘要翻译：本发明描述了一种包括掩模的装置; 防护膜隔离物，附着在掩模上的防护膜隔片; 和静电防护薄膜系统，静电防护薄膜系统附着在防护薄膜组件上。本发明还描述了一种在暴露期间将污染物远离掩模附近的污染物，污染物包括不带电荷或中性颗粒，带正电荷的颗粒或带负电荷的颗粒，包括：诱导正电荷或负电荷在不带电或中性粒子上; 用带负电荷的电场吸引带正电的粒子; 并用带正电荷的电场吸引带负电荷的粒子。

9. 发明申请

US20040165168A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20040165168A1
公开(公告)日：2004-08-26
申请号：US10734639
申请日：2003-12-15
申请人： ASML NETHERLANDS B.V.
发明人： Hako Botma
IPC分类号： G03B027/54 , G03B027/42
CPC分类号： G03F7/70108 , G03F7/70158
摘要： A projection beam PB is projected onto a substrate W via a mask MA. The direction dependence of the intensity of the beam at the substrate W is controlled by passing the beam through a series of optical elements 120a-b in front of a pupil plane 14. The intensity distribution as a function of position in the pupil plane 14 determines the angle dependence at the substrate W. The optical elements 120a-b, which are preferably arrays of microlenses (or more particularly DOE's: Diffractive Optical Elements) each define an angle dependence of the intensity of the beam PB. The optical elements 120a-b are each arranged to pass a major part of the beam PB substantially without deflection and a minor part with a deflection angle dependent intensity. The major part of the beam is blocked out of the beam behind the series of optical elements 120a-b. As a result an addition of the effects of upon the intensity in the pupil plane 14 is realized.
摘要翻译：通过掩模MA将投影光束PB投影到基板W上。通过使光束通过光瞳面14前面的一系列光学元件120a-b来控制光束在衬底W处的强度的方向依赖性。作为瞳孔平面14中的位置的函数的强度分布确定基板W的角度依赖性。优选地，微透镜阵列（或更特别是DOE的衍射光学元件）的光学元件120a-b分别限定了光束PB的强度的角度依赖性。光学元件120a-b各自被布置成基本上不偏转地使光束PB的主要部分和具有偏转角依赖强度的次要部分通过。光束的主要部分被阻挡在一系列光学元件120a-b后面的光束之外。结果，实现了对瞳孔平面14中的强度的影响。

10. 发明申请

US20040165164A1 Method and system for improving exposure uniformity in a step and repeat process 有权
标题翻译：改善步骤和重复过程中曝光均匀性的方法和系统
公开(公告)号：US20040165164A1
公开(公告)日：2004-08-26
申请号：US10625451
申请日：2003-07-23
发明人： Jan Raebiger , Heiko Wagner , Uwe Schulze , Rolf Seltmann
IPC分类号： G03B027/42
CPC分类号： G03F7/70533 , G03F7/70625
摘要： An advanced control system for a photolithography tool that receives measurement data relating to inline parameters varying with position on a substrate surface. The position sensitive measurement data is used to establish a position dependent target offset for an exposure map, thereby effectively compensating for substrate non-uniformities. Since the inline measurement data is available significantly earlier in comparison to electrical measurement data of a completed circuit element, a more accurate exposure map may be obtained taking into account the process history of the substrates.
摘要翻译：一种用于光刻工具的先进控制系统，其接收与基板表面上的位置变化的在线参数相关的测量数据。位置敏感测量数据用于建立曝光图的位置相关目标偏移量，从而有效补偿衬底不均匀性。由于与完成的电路元件的电气测量数据相比，在线测量数据显着更早地可用，所以可以考虑衬底的工艺历史来获得更准确的曝光图。

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