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    • 3. 发明授权
    • Focused ion beam etching apparatus
    • 聚焦离子束蚀刻装置
    • US5518595A
    • 1996-05-21
    • US385638
    • 1995-02-08
    • Yasuhiro Yamakage
    • Yasuhiro Yamakage
    • H05H5/00H01J37/305H01L21/302H01L21/3065C23C14/46B23K15/00
    • H01J37/3056H01J2237/04756H01J2237/0807
    • An apparatus for effecting micro fabrication of wafer surfaces by emitting a focused ion beam thereto, in which a gas is jetted through a gas introducing pipe to an ion emitter whereby the gas is adsorbed to an emitter surface. A potential difference is applied between the emitter and an extraction electrode to extract ions. The ions are then accelerated and focused into a focused ion beam having an etching function. The focused ion beam is deflected by a deflecting electrode to form a predetermined pattern. The focused ion beam is decelerated by action of a decelerating electrode prior to impingement on a wafer under treatment. Consequently, a wafer surface is etched to define the predetermined pattern without damage to the wafer surface.
    • 通过向其发射聚焦离子束来实现晶片表面微制造的装置,其中气体通过气体导入管被喷射到离子发射器,由此气体被吸附到发射体表面。 在发射极和提取电极之间施加电位差以提取离子。 然后离子被加速并聚焦成具有蚀刻功能的聚焦离子束。 聚焦离子束被偏转电极偏转以形成预定图案。 聚焦离子束通过减速电极的作用在撞击处理之前的晶片上减速。 因此,蚀刻晶片表面以限定预定图案而不损坏晶片表面。
    • 7. 发明授权
    • Shock excited pulse transformer
    • 冲击脉冲变压器
    • US4409492A
    • 1983-10-11
    • US336351
    • 1982-01-04
    • Evgeny A. Abramian
    • Evgeny A. Abramian
    • H05H5/00H02M9/02H02M9/04H03K3/53H03K3/537H05H5/02
    • H03K3/537H03K3/53H05H5/02
    • The shock excited pulse transformer comprises at least two stages, each having a primary winding equipped with a capacitor and a switch device and a secondary winding. The second windings are connected in series and in all stages except the last one are coiled with two parallel conductors insulated from each other. In the first stage one conductor is connected to the output of the charging device and the other is grounded, whereas in all other stages capacitors 7 of the circuits of the primary windings 2 are inserted between these conductors in parallel.The shock excited pulse transformer is basically designed for supply of acceleration tubes.
    • PCT No.PCT / SU80 / 00074 Sec。 371日期1982年1月4日 102(e)日期1982年1月4日PCT申请日1980年5月5日PCT公布。 公开号WO81 / 03254 日期:1981年11月12日。冲击激励脉冲变压器包括至少两个级,每级具有装备有电容器的初级绕组和开关装置和次级绕组。 第二绕组串联连接,除了最后一个绕组彼此绝缘的两个平行导体为一体。 在第一阶段中,一个导体连接到充电装置的输出,另一个导体接地,而在所有其它阶段,初级绕组2的电路的电容器7被并入这些导体之间。 冲击激励脉冲变压器基本上设计用于加速管的供应。
    • 8. 发明授权
    • High voltage particle accelerator utilizing polycrystalline
ferroelectric ceramic material
    • 使用多晶铁电陶瓷材料的高电压粒子加速器
    • US4004175A
    • 1977-01-18
    • US639023
    • 1975-12-09
    • Philip S. Brody
    • Philip S. Brody
    • G21H1/12H05H5/04H05H5/00
    • H05H5/04G21H1/12
    • An apparatus is disclosed which utilizes the high voltage generated by thempingement of illumination upon a polarized polycrystalline ferroelectric ceramic material as the source of a high voltage electric field through which charged particles are accelerated. The application of such device to a D.C. particle accelerator with capabilities similar to accelerators of the Van de Graaf type is shown, a uniform DC electric field being provided not through linking resistors as is the case in the Van de Graaf machine, but rather directly through the intrinsic properties of the ferroelectric ceramic material, the uniformity and magnitude of such field being further improved in at least one preferred embodiment through the utilization of parallel spaced-apart electrodes disposed through the ferroelectric ceramic material and terminating in hoops or other electrodes creating equipotential planes through which a beam of charged particles is accelerated. In yet another embodiment of the instant invention, the provision of such electrodes are dispensed with and advantage is taken of a uniform electric field within the ferroelectric ceramic material disposed parallel to the surface and also existing outside such surface. When two substrates of ferroelectric ceramic material are disposed in a parallel spaced-apart relationship with the spacing in relation to the total length being small and thereafter illuminated, a nearly uniform field exists in the space between such parallel substrates and the beam of charged particles is accelerated through such field between the substrates.
    • 公开了一种利用由偏光照射产生的高电压作为高电压电场的来源加速带电粒子的装置。 示出了将这种装置应用于具有与Van de Graaf类型的加速器类似的能力的DC粒子加速器,均匀的DC电场不是通过连接电阻器而提供的,如Van de Graaf机器的情况,而是直接通过 在至少一个优选实施例中,铁电陶瓷材料的固有性质,均匀性和幅度进一步得到改善,通过利用通过铁电陶瓷材料设置的平行隔开的电极并终止于环或其它电极,从而产生等电位面 通过其加速带电粒子束。 在本发明的另一个实施例中,省略了提供这样的电极,并且有利于平行于表面设置的铁电陶瓷材料内的均匀电场,并且还存在于这种表面之外。 当铁电陶瓷材料的两个基板以平行的间隔关系设置时,相对于总长度的间隔小并随后被照亮,在这些平行基板之间的空间中存在几乎均匀的磁场,带电粒子束 通过衬底之间的这种场加速。