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1. 发明申请

US20190170671A1 METHOD AND SYSTEM FOR INSPECTING AN EUV MASK 审中-公开
公开(公告)号：US20190170671A1
公开(公告)日：2019-06-06
申请号：US16147277
申请日：2018-09-28
申请人： Hermes Microvision, Inc.
发明人： Guochong WENG , Youjin WANG , Chiyan KUAN , Chung-Shih PAN
IPC分类号： G01N23/2251 , H05F3/02 , H01J37/28 , H01J37/02 , H01J37/20
CPC分类号： G01N23/2251 , H01J37/026 , H01J37/20 , H01J37/28 , H01J2237/004 , H01J2237/0041 , H01J2237/0044 , H01J2237/2007 , H01J2237/2008 , H01J2237/202 , H01J2237/2448 , H01J2237/2602 , H01J2237/2811 , H01J2237/2813 , H05F3/02
摘要： A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.

2. 发明申请

US20170207063A1 METHOD FOR IMPLANTATION OF SEMICONDUCTOR WAFERS HAVING HIGH BULK RESISTIVITY 有权
公开(公告)号：US20170207063A1
公开(公告)日：2017-07-20
申请号：US15131520
申请日：2016-04-18
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Michael W. Osborne , David E. Suuronen , Julian G. Blake
IPC分类号： H01J37/304 , H01L21/66 , H01J37/317 , H01L21/265
CPC分类号： H01J37/304 , H01J37/026 , H01J37/20 , H01J37/3171 , H01J2237/2007 , H01J2237/30405 , H01J2237/31703 , H01L21/265 , H01L22/14 , H01L22/20
摘要： An ion implanter may include an electrostatic clamp to hold a substrate; a plasma flood gun generating a flux of electrons impinging upon the substrate; and a controller coupled to the plasma flood gun and including a component generating a control signal responsive to a measurement signal, the control signal to adjust operation of the plasma flood gun to a target operating level. At the target operating level the flux of electrons may comprise a stabilizing dose of electrons, the stabilizing concentration of electrons, the stabilizing concentration reducing a clamp current variation in the electrostatic clamp to a target value, the target value being less than a second value of clamp current variation when the plasma flood gun is not operating.

3. 发明授权

US09484180B2 Plasma processing method and plasma processing apparatus 有权
标题翻译：等离子体处理方法和等离子体处理装置
公开(公告)号：US09484180B2
公开(公告)日：2016-11-01
申请号：US14475905
申请日：2014-09-03
申请人： Tokyo Electron Limited
发明人： Manabu Iwata , Yasuharu Sasaki
IPC分类号： H01J37/32 , H01J37/02
CPC分类号： H01J37/026 , H01J37/32091 , H01J37/32697
摘要： A plasma processing apparatus includes a processing chamber; a conductive base within the processing chamber; an electrostatic chuck, having an electrode, provided on the base; a high frequency power supply that applies a high frequency power to the base; a first DC power supply that applies a DC voltage to the electrostatic chuck; and a plasma generation unit that generates plasma of a processing gas within the processing chamber. A plasma processing method performed in the plasma processing apparatus includes connecting the first DC power supply to the electrode of the electrostatic chuck; cutting off connection between the first DC power supply and the electrode of the electrostatic chuck; and generating the plasma within the processing chamber by applying the high frequency power to the base in a state that the connection between the first DC power supply and the electrode of the electrostatic chuck is cut off.
摘要翻译：等离子体处理装置包括处理室; 处理室内的导电基底; 具有设置在基座上的电极的静电卡盘; 将高频电源施加到基座的高频电源; 向所述静电卡盘施加直流电压的第一直流电源; 以及等离子体产生单元，其产生处理室内的处理气体的等离子体。在等离子体处理装置中执行的等离子体处理方法包括将第一DC电源连接到静电卡盘的电极; 切断第一直流电源与静电卡盘的电极之间的连接; 以及在所述第一DC电源和所述静电卡盘的电极之间的连接被切断的状态下，通过向所述基座施加所述高频电力，在所述处理室内产生所述等离子体。

4. 发明申请

US20160307733A1 HIGH TEMPERATURE ELECTROLYSIS GLOW DISCHARGE METHOD 审中-公开
标题翻译：高温电解玻璃放电方法
公开(公告)号：US20160307733A1
公开(公告)日：2016-10-20
申请号：US15193317
申请日：2016-06-27
申请人： Foret Plasma Labs, LLC
发明人： Todd Foret
IPC分类号： H01J37/32 , H05H1/30 , F22B1/28 , H01J37/02
CPC分类号： H01J37/32027 , F22B1/281 , H01J37/026 , H01J37/32018 , H01J37/32513 , H01J37/32541 , H01J37/32568 , H05H1/30 , H05H1/3405 , H05H1/42 , H05H1/48 , H05H2001/3489
摘要： The present invention provides a glow discharge assembly that includes an electrically conductive cylindrical screen, a flange assembly, an electrode, an insulator and a non-conductive granular material. The electrically conductive cylindrical screen has an open end and a closed end. The flange assembly is attached to and electrically connected to the open end of the electrically conductive cylindrical screen. The flange assembly has a hole with a first diameter aligned with a longitudinal axis of the electrically conductive cylindrical screen. The electrode is aligned with the longitudinal axis of the electrically conductive cylindrical screen and extends through the hole of the flange assembly into the electrically conductive cylindrical screen. The insulator seals the hole of the flange assembly around the electrode and maintains a substantially equidistant gap between the electrically conductive cylindrical screen and the electrode. The non-conductive granular material is disposed within the substantially equidistant gap.
摘要翻译：本发明提供了一种辉光放电组件，其包括导电圆柱形屏幕，凸缘组件，电极，绝缘体和非导电颗粒材料。导电圆柱形屏幕具有开口端和封闭端。凸缘组件附接到导电圆柱形屏幕的开口端并电连接到导电圆柱形屏幕的开口端。凸缘组件具有孔，其第一直径与导电圆柱形筛网的纵向轴线对准。电极与导电圆柱形屏幕的纵向轴线对准，并延伸穿过凸缘组件的孔进入导电圆柱形屏幕。绝缘体围绕电极密封凸缘组件的孔，并且在导电圆柱形屏幕和电极之间保持基本上等距的间隙。非导电颗粒材料设置在基本上等距离的间隙内。

5. 发明申请

US20160260574A1 METHODS AND DEVICES FOR CHARGE COMPENSATION 审中-公开
标题翻译：电荷补偿的方法和装置
公开(公告)号：US20160260574A1
公开(公告)日：2016-09-08
申请号：US15059712
申请日：2016-03-03
申请人： Carl Zeiss Microscopy GmbH
发明人： Andreas Schmaunz , Markus Esseling , Dirk Zeidler
IPC分类号： H01J37/02 , H01J37/22 , H01J37/28
CPC分类号： H01J37/026 , H01J37/222 , H01J37/28 , H01J2237/0044 , H01J2237/0047 , H01J2237/006 , H01J2237/2801
摘要： Methods are provided for operating a particle-optical device, wherein electrical charging of a sample to be examined is reduced. The particle-optical device includes a vacuum chamber for receiving a sample, a particle source for generating a primary particle beam directed to the sample, a scan generator for directed guidance of the primary particle beam over the sample surface, and at least one detector for detecting interaction products created during the interaction between the primary particle beam and the sample.
摘要翻译：提供了用于操作粒子光学器件的方法，其中减少了待检样品的电荷。颗粒光学装置包括用于接收样品的真空室，用于产生指向样品的一次粒子束的粒子源，用于在样品表面上引导初级粒子束的扫描发生器，以及至少一个用于检测在初级粒子束和样品之间的相互作用期间产生的相互作用产物。

6. 发明授权

US09355751B2 Multi-electrode stack arrangement 有权
标题翻译：多电极堆叠布置
公开(公告)号：US09355751B2
公开(公告)日：2016-05-31
申请号：US14541238
申请日：2014-11-14
申请人： MAPPER LITHOGRAPHY IP B.V.
发明人： Willem Henk Urbanus , Marco Jan-Jaco Wieland
IPC分类号： G21K1/02 , G21K5/04 , H01J37/24 , H01J37/30 , H01J37/317 , H01J37/02 , H01J37/16 , H01J37/065 , H01J37/12
CPC分类号： G21K1/02 , G21K5/04 , H01J37/026 , H01J37/065 , H01J37/12 , H01J37/16 , H01J37/24 , H01J37/3002 , H01J37/3007 , H01J37/3174 , H01J37/3175 , H01J37/3177 , H01J2237/002 , H01J2237/0216 , H01J2237/024 , H01J2237/032 , H01J2237/04 , H01J2237/1215 , H01J2237/16 , H01J2237/1825 , H01J2237/303 , H01J2237/30472
摘要： The invention relates to an electrode stack (70) comprising stacked electrodes (71-80) for manipulating a charged particle beam along an optical axis (A). Each electrode comprises an electrode body with an aperture for the charged particle beam. The electrode bodies are mutually spaced and the electrode apertures are coaxially aligned along the optical axis. The electrode stack comprises electrically insulating spacing structures (89) between each pair of adjacent electrodes for positioning the electrodes (71-80) at predetermined mutual distances along the axial direction (Z). A first electrode and a second electrode each comprise an electrode body with one or more support portions (86), wherein each support portion is configured to accommodate at least one spacing structure (89). The electrode stack has at least one clamping member (91-91c) configured to hold the support portions (86) of the first and second electrodes, as well as the intermediate spacing structure (89) together.
摘要翻译：本发明涉及一种电极堆叠（70），其包括用于沿光轴（A）操纵带电粒子束的堆叠电极（71-80）。每个电极包括具有用于带电粒子束的孔的电极体。电极体相互间隔开，并且电极孔沿光轴同轴对准。电极堆叠包括在每对相邻电极之间的电绝缘间隔结构（89），用于将电极（71-80）沿着轴向方向（Z）定位在预定的相互距离处。第一电极和第二电极各自包括具有一个或多个支撑部分（86）的电极主体，其中每个支撑部分构造成容纳至少一个间隔结构（89）。电极堆叠具有至少一个构造成将第一和第二电极的支撑部分（86）以及中间间隔结构（89）保持在一起的夹紧构件（91-91c）。

7. 发明申请

US20160035537A1 CHARGED PARTICLE BEAM SPECIMEN INSPECTION SYSTEM AND METHOD FOR OPERATION THEREOF 审中-公开
标题翻译：充电颗粒光束样本检查系统及其操作方法
公开(公告)号：US20160035537A1
公开(公告)日：2016-02-04
申请号：US14446146
申请日：2014-07-29
申请人： Applied Materials Israel, Ltd.
发明人： Gilad Erel , Michal Avinun-Kalish , Stefan Lanio
IPC分类号： H01J37/26 , H01J37/147 , H01J37/08
CPC分类号： H01J37/28 , H01J37/026 , H01J2237/0044 , H01J2237/0048
摘要： A charged particle beam specimen inspection system is described. The system includes an emitter for emitting at least one charged particle beam, a specimen support table configured for supporting the specimen, an objective lens for focusing the at least one charged particle beam, a charge control electrode provided between the objective lens and the specimen support table, wherein the charge control electrode has at least one aperture opening for the at least one charged particle beam, and a flood gun configured to emit further charged particles for charging of the specimen, wherein the charge control electrode has a flood gun aperture opening.
摘要翻译：描述带电粒子束样品检查系统。该系统包括用于发射至少一个带电粒子束的发射器，被配置为支撑样本的样本支撑台，用于聚焦至少一个带电粒子束的物镜，设置在物镜和样本支架之间的充电控制电极其中所述充电控制电极具有用于所述至少一个带电粒子束的至少一个开口开口，以及配置为发射用于对所述样本进行充电的另外的带电粒子的泛喷枪，其中所述充电控制电极具有喷枪孔开口。

8. 发明授权

US09113538B2 Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask 有权
标题翻译：结构电子束检查系统，用于检查极紫外线掩膜和结构，用于放电极紫外线掩膜
公开(公告)号：US09113538B2
公开(公告)日：2015-08-18
申请号：US14039939
申请日：2013-09-27
申请人： HERMES MICROVISION, INC.
发明人： You-Jin Wang , Chiyan Kuan , Chung-Shih Pan
IPC分类号： A61N5/00 , H05F3/02 , H01J37/02 , H01J37/20 , G01N23/225
CPC分类号： H05F3/02 , G01N23/2251 , H01J37/026 , H01J37/20 , H01J2237/0041 , H01J2237/0044 , H01J2237/2008 , H01J2237/2811
摘要： A structure for discharging an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for discharging an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and bottom. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUU mask is grounded.
摘要翻译：提供一种用于放电极紫外线掩模（EUV掩模）的结构，用于通过电子束检查工具在检查期间对EUV掩模进行放电。用于放电EUV掩模的结构包括至少一个接触引脚以接触EUV掩模上的导电区域，其中EUV掩模可以在侧壁或/或底部上具有另外的导电层。通过使用电子束检查系统来增强EUV掩模的检查质量，因为EUU掩模上的累积充电是接地的。

9. 发明申请

US20150179387A1 CHARGED PARTICLE BEAM GENERATING APPARATUS, CHARGED PARTICLE BEAM APPARATUS, HIGH VOLTAGE GENERATING APPARATUS, AND HIGH POTENTIAL APPARATUS 有权
标题翻译：充电颗粒光束发生装置，充电颗粒光束装置，高电压发生装置和高电位装置
公开(公告)号：US20150179387A1
公开(公告)日：2015-06-25
申请号：US14406909
申请日：2013-05-08
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Takashi Onishi , Shunichi Watanabe , Minoru Kaneda
IPC分类号： H01J29/48 , H01J27/02
CPC分类号： H01J37/04 , H01J27/024 , H01J29/485 , H01J37/026 , H01J37/067 , H01J37/073 , H01J37/16 , H01J37/241 , H01J37/248 , H01J2237/16
摘要： An instrument producing a charged particle beam according to the present invention is provided with: a charged particle source; a plurality of first electrodes disposed along a direction of irradiation of charged particles from the charged particle source; a plurality of insulation members disposed between the first electrodes; and a housing mounted around the plurality of first electrodes. The housing is formed from an insulating solid material, and includes a plurality of second electrodes disposed at positions in proximity to the plurality of first electrodes. At least one of the plurality of second electrodes is electrically connected to at least one of the plurality of first electrodes, each of the plurality of second electrodes having the same potential as the potential of the proximate one of the first electrodes.
摘要翻译：根据本发明的产生带电粒子束的仪器具有：带电粒子源; 多个第一电极，其沿带电粒子源的带电粒子的照射方向设置; 设置在所述第一电极之间的多个绝缘构件; 以及围绕所述多个第一电极安装的壳体。壳体由绝缘固体材料形成，并且包括设置在靠近多个第一电极的位置处的多个第二电极。所述多个第二电极中的至少一个电连接到所述多个第一电极中的至少一个，所述多个第二电极中的每一个具有与所述第一电极中的所述第一电极的电位相同的电位。

10. 发明申请

US20150097123A1 CHARGED PARTICLE BEAM APPARATUS 有权
标题翻译：充电颗粒光束装置
公开(公告)号：US20150097123A1
公开(公告)日：2015-04-09
申请号：US14376901
申请日：2013-01-28
申请人： Hitachi High-Technologies Corporation
发明人： Yasushi Ebizuka , Seiichiro Kanno , Makoto Nishihara , Masashi Fujita
IPC分类号： H01J37/22 , H01J37/28 , H01J37/20 , H02N13/00
CPC分类号： H01J37/226 , H01J37/026 , H01J37/20 , H01J37/28 , H01J2237/0047 , H01J2237/06 , H01J2237/2007 , H01J2237/2801 , H02N13/00
摘要： An object of the present invention is to provide a charged particle beam apparatus that effectively removes electrical charges from an electrostatic chuck.In order to achieve the above object, the charged particle beam apparatus of the present invention includes a sample chamber that maintains a space containing an electrostatic chuck mechanism (5) in a vacuum state; and in which the charged particle beam apparatus includes an ultraviolet light source (6) to irradiate ultraviolet light within the sample chamber, and a irradiation target member irradiated by the ultraviolet light; and the irradiation target member is placed perpendicular to the adsorption surface of the electrostatic chuck.
摘要翻译：本发明的目的是提供一种有效地从静电卡盘去除电荷的带电粒子束装置。为了实现上述目的，本发明的带电粒子束装置包括在真空状态下保持包含静电卡盘机构（5）的空间的样本室; 并且其中带电粒子束装置包括用于照射样品室内的紫外光的紫外光源和照射由紫外光照射的照射目标构件; 并且照射目标构件垂直于静电吸盘的吸附表面放置。

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