会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 6. 发明申请
    • OPTICALLY ACTIVE MULTILAYER SYSTEM FOR SOLAR ABSORPTION
    • 光学高效多层太阳能吸收系统
    • WO2011057972A3
    • 2012-02-09
    • PCT/EP2010066958
    • 2010-11-05
    • ALMECO TINOX GMBHDASBACH REINHARD
    • DASBACH REINHARD
    • F24J2/48
    • F24J2/487B23K26/009B23K26/18B23K26/242B23K26/32B23K26/323B23K26/324B23K2203/05B23K2203/08B23K2203/10B23K2203/12B23K2203/14B23K2203/172B23K2203/26B23K2203/52F24J2/4652F28F2275/067Y02E10/40
    • Composite material for use as a selective solar absorber, comprising a carrier layer (1), wherein at least the following layers are located on side (B) of the carrier layer: a reflective layer (3), an absorber layer (5), and a dielectric and/or oxidic antireflective layer (7), wherein a layer (4) made of a nitride, a carbide, or a carbonitride of a metal or a mixture of at least two metals from subgroups IV, V, or VI is located between the absorber layer and the reflective layer, and an optically active layer (6) made of a metal compound having a stoichiometric composition is located between the absorber layer and the antireflective layer. An optically active layer (8) is located on side (A) of the carrier layer, reducing the reflection of the uncoated carrier material for irradiation at a specific angle of incidence by at least 5% at a specific wavelength ? in the wavelength range of 200 to 2500 nm, and reducing the reflection of the uncoated carrier material by no more than 5% in the wavelength range of 2.5 µm to 50 µm.
    • 复合材料用作选择性太阳能吸收器与载体层(1),其特征在于,在所述载体层的一侧(B)至少以下层:反射层(3),吸收体层(5)和一个介电层和/或氧化物抗反射层(7 ),吸收层和反射层之间,其中,是由氮化物,碳化物或金属碳氮化或IV,V。和VI中的两种或更多种金属的混合物的层(4)。 亚组位于吸收层和抗反射层之间并且是由具有化学计量组成的金属化合物制成的光学活性层(6)。 在载体层的一侧(A)上是光学活性层(8),其反射未涂覆载体材料在特定波长λ下的反射。 至少5%的照射在200到2500nm之间的波长范围减小在特定的入射角和在2.5微米和50微米之间的波长范围内的未涂覆基材的反射率不超过5%,降低的。
    • 9. 发明申请
    • THERMALLY INDUCED REFLECTIVITY SWITCH FOR LASER THERMAL PROCESSING
    • 用于激光热处理的热诱导反射开关
    • WO2003079423A1
    • 2003-09-25
    • PCT/US2002/041091
    • 2002-12-19
    • ULTRATECH STEPPER, INC.
    • HAWRYLUK, Andrew, M.TALWAR, SomitWANG, YunTHOMPSON, Michael, O.
    • H01L21/26
    • H01L21/02686B23K26/009B23K26/18H01L21/02691H01L21/2026H01L21/268H01L21/324
    • A method, apparatus and system for controlling the amount of heat transferred to a process region (30) of a workpiece (W) from exposure with laser radiation (10) using a thermally induced reflectivity switch layer (60). The apparatus of the invention is a film stack (6) having an absorber layer (50) deposited atop the workpiece, such as silicon wafer. A portion of the absorber layer covers the process region. The absorber layer absorbs laser radiation and converts the absorbed radiation into heat. A reflective switch layer (60) is deposited atop the absorber layer. The reflective switch layer may comprise one or more thin film layers, and preferably includes a thermal insulator layer and a transition layer. The portion of the reflective switch layer covering the process region has a temperature that corresponds to the temperature of the process region. The reflectivity of the reflectivity switch layer changes from a low reflectivity state to a high reflectivity state at a critical temperature so as to limit the amount of radiation absorbed by the absorber layer by reflecting the incident radiation. This, in turn, limits the amount of heat transferred to the process region from the absorber layer.
    • 一种用于通过使用热诱导反射率开关层(60)从激光辐射(10)曝光来控制传送到工件(W)的处理区域(30)的热量的方法,装置和系统。 本发明的装置是具有沉积在诸如硅晶片的工件上方的吸收层(50)的薄膜叠层(6)。 吸收层的一部分覆盖工艺区域。 吸收层吸收激光辐射并将吸收的辐射转化成热。 反射开关层(60)沉积在吸收层顶部。 反射开关层可以包括一个或多个薄膜层,并且优选地包括热绝缘体层和过渡层。 覆盖处理区域的反射开关层的部分具有对应于处理区域的温度的温度。 反射率开关层的反射率在临界温度从低反射率状态变为高反射率状态,以通过反射入射辐射来限制吸收层吸收的辐射量。 这反过来限制了从吸收层传递到处理区域的热量。