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    • 10. 发明申请
    • ORGANIC SEMICONDUCTOR DOPING PROCESS
    • 有机半导体掺杂工艺
    • WO2014191767A1
    • 2014-12-04
    • PCT/GB2014/051664
    • 2014-05-30
    • ISIS INNOVATION LIMITED
    • SNAITH, HenryLEIJTENS, TomasABATE, AntonioSELLINGER, Alan
    • H01L51/00H01L51/42H01G9/20
    • H01L51/002H01G9/0029H01G9/2013H01G9/2027H01G9/2059H01L51/0032H01L51/0035H01L51/0036H01L51/005H01L51/0056H01L51/0059H01L51/006H01L51/4226H01L2251/305Y02E10/542Y02E10/549
    • The present invention relates to the doping of organic semiconductors and processes for producing layers of p-doped organic semiconductors. Disclosed is a process for p-doping organic semiconductors comprising treating the organic semiconductor with an oxidised salt of the organic semiconductor. A process for producing a layer of a p-doped organic semiconductor comprising producing a p-doped organic semiconductor by treating the organic semiconductor with an oxidised salt of the organic semiconductor; disposing a composition comprising a solvent and the p-doped organic semiconductor on a substrate; and removing the solvent is also described. Also disclosed is a process for producing a layer of a p-doped organic semiconductor comprising: disposing a composition comprising a solvent, the organic semiconductor and a protic ionic liquid on a substrate; and removing the solvent. A process for producing a semiconductor device comprising a process for doping an organic semiconductor according to the invention is also described. Finally, a high purity p-dopant composition is described.
    • 本发明涉及有机半导体的掺杂和用于生产p掺杂的有机半导体层的工艺。 公开了一种p掺杂有机半导体的方法,包括用有机半导体的氧化盐处理有机半导体。 一种制造p掺杂有机半导体层的方法,包括通过用有机半导体的氧化盐处理有机半导体来生产p掺杂的有机半导体; 将包含溶剂和p掺杂的有机半导体的组合物设置在基板上; 还描述了除去溶剂。 还公开了一种用于制造p掺杂有机半导体层的方法,包括:将包含溶剂,有机半导体和质子离子液体的组合物设置在基板上; 并除去溶剂。 还描述了一种用于制造包括根据本发明的用于掺杂有机半导体的工艺的半导体器件的工艺。 最后,描述了高纯度p-掺杂剂组合物。