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41. 发明申请

US20210048755A1 NON-SEALED RETICLE STORAGE DEVICE 有权
公开(公告)号：US20210048755A1
公开(公告)日：2021-02-18
申请号：US16923458
申请日：2020-07-08
申请人： Gudeng Precision Industrial Co., Ltd.
发明人： Chia-Ho Chuang , Hsing-Min Wen , Hsin-Min Hsueh , Yi-Hsuan Lee , Ming-Chien Chiu
IPC分类号： G03F7/20 , B65D85/30 , B65D81/24
摘要： A reticle storage device includes a top lid having a ceiling and a cover surrounding the ceiling, and a bottom lid having a carrier and a peripheral structure surrounding the carrier. When the top lid engages with the bottom lid, a passage is defined therebetween and therefore the reticle storage device is not sealed.

42. 发明申请

US20210013076A1 SUBSTRATE CONTAINER SYSTEM 有权
公开(公告)号：US20210013076A1
公开(公告)日：2021-01-14
申请号：US16872392
申请日：2020-05-12
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD
发明人： MING-CHIEN CHIU , CHIH-MING LIN , CHENG-EN CHUNG , NIEN-YUN YU , PO-TING LEE
IPC分类号： H01L21/673 , H01L21/67 , H01L21/677
摘要： A substrate container system comprises a container body having a bottom face, a front opening that enables passage of a substrate, and a back opening opposing the front opening, the back opening having a width smaller than that of the front opening; and a back cover that covers the back opening and establishes sealing engagement with the container body, wherein the back cover comprises a first gas inlet structure that bendingly extends under the bottom face of the container body upon assembly; wherein the first gas inlet structure comprises a downward facing gas intake port opposing the bottom face of the container body.

43. 发明授权

US10281815B2 Reticle pod 有权
公开(公告)号：US10281815B2
公开(公告)日：2019-05-07
申请号：US15651399
申请日：2017-07-17
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD
发明人： Hsin-Min Hsueh , Chia-Ho Chuang , Cheng-Ju Lee , Jeng-Jie Huang
IPC分类号： G03F1/66 , B65D25/10 , B65D85/38 , H01L21/673
摘要： A reticle pod for accommodating a reticle is provided. The reticle pod comprises a base; a cover; and at least one supporting member. When the reticle is accommodated on the reticle pod, the supporting member abuts against the reticle through a protrusion part; wherein the maximum static friction is constantly greater than a horizontal force applied to the support module from the reticle.

44. 发明申请

US20180210349A1 EUV Reticle Pod 审中-公开
公开(公告)号：US20180210349A1
公开(公告)日：2018-07-26
申请号：US15880243
申请日：2018-01-25
申请人： Gudeng Precision Industrial Co, Ltd
发明人： HSIN-MIN HSUEH , Chia-Ho Chuang , Cheng-Ju Lee , Jeng-Jie Huang
IPC分类号： G03F7/20 , H01L21/673 , G03F1/66
摘要： An EUV reticle pod is provided. The pod includes an inner and an outer box assembly. The inner box assembly contained in the outer box assembly includes a base and a cover. The base has an upper surface and a surrounding wall. The upper surface includes a carry surface, at least one trench, and a first contacting surface. The EUV reticle is carried above the carry surface. The trench has a circular loop structure and its bottom is lower than the carry surface. The carry surface, the trench, and the first contacting surface are sequentially distributed from the center of the upper surface towards the surrounding wall. The cover has a concave for accommodating the EUV reticle and a second contacting surface for cooperating with the first contacting surface to form an air-tight seal. The trench captures and traps particles to reduce the particle contamination on the reticle.

45. 发明授权

US09899246B2 Gas distributor used in wafer carriers 有权
公开(公告)号：US09899246B2
公开(公告)日：2018-02-20
申请号：US14735126
申请日：2015-06-09
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD
发明人： Chin-Ming Lin , Ming-Chien Chiu , Jui-Ken Kao , Chen-Hao Chang
IPC分类号： B65B3/04 , H01L21/673
CPC分类号： H01L21/67393 , Y10T137/86212
摘要： The present invention relates to gas distributors used in wafer carriers. The gas distributors comprise a body having an interior space, a separator configured at the front side of the body in the interior space, and an air inlet connected with the body. One edge of the separator and the front side of the body together form a passage. The configuration of the passage in the gas distributors enables the gas distributors to evenly distribute gases.

46. 发明授权

US09396980B2 Anti-electrostatic substrate cassette 有权
标题翻译：防静电衬底盒
公开(公告)号：US09396980B2
公开(公告)日：2016-07-19
申请号：US14246337
申请日：2014-04-07
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： Chien-Feng Wang , Shao-Wei Lu , Po-Tin Lee
IPC分类号： B65D85/30 , H01L21/673
CPC分类号： H01L21/67396 , B65D85/30
摘要： The present invention provides an anti-electrostatic cassette, which mainly comprises at least an electrostatic discharge (ESD) device connected electrically to the carrying frames, which are disposed in the substrate cassette and carry the substrates, and to the handles, which are disposed on the outer sides of the substrate cassette, for forming the conductive path. By means of the contact between the equipment and the two handles of the substrate cassette, the residual static charges on the substrates are conducted to the ground for reducing the residual static charges on the substrates. Consequently, the ESD phenomena in the substrates due to friction can be avoided and hence preventing the damages in the substrates caused by static charges.
摘要翻译：本发明提供了一种抗静电盒，其主要包括至少一个静电放电（ESD）装置，其电连接到承载框架上，静电放电装置设置在基板盒中并承载基板，并且被放置在手柄上用于形成导电路径的基板盒的外侧。通过设备与基板盒的两个手柄之间的接触，将基板上的残留静电电荷传导到地面，以减少基板上的残余静电。因此，可以避免由于摩擦而导致的基板中的ESD现象，并因此防止由静电引起的基板中的损坏。

47. 发明申请

US20150357218A1 GAS DISTRIBUTOR USED IN WAFER CARRIERS 有权
标题翻译：使用在WAFER载体的气体分配器
公开(公告)号：US20150357218A1
公开(公告)日：2015-12-10
申请号：US14735126
申请日：2015-06-09
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD
发明人： CHIN-MING LIN , MING-CHIEN CHIU , JUI-KEN KAO , CHEN-HAO CHANG
IPC分类号： H01L21/673
CPC分类号： H01L21/67393 , Y10T137/86212
摘要： The present invention relates to gas distributors used in wafer carriers. The gas distributors comprise a body having an interior space, a separator configured at the front side of the body in the interior space, and an air inlet connected with the body. One edge of the separator and the front side of the body together form a passage. The configuration of the passage in the gas distributors enables the gas distributors to evenly distribute gases.
摘要翻译：本发明涉及用于晶片载体的气体分配器。气体分配器包括具有内部空间的主体，构造在内部空间中的主体的前侧处的分离器和与主体连接的空气入口。分离器的一个边缘和主体的前侧一起形成通道。气体分配器中的通道的配置使得气体分配器能够均匀分布气体。

48. 发明申请

US20150340260A1 WAFER TRANSPORT SYSTEM AND METHOD FOR OPERATING THE SAME 有权
标题翻译： WAFER运输系统及其操作方法
公开(公告)号：US20150340260A1
公开(公告)日：2015-11-26
申请号：US14556233
申请日：2014-11-30
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： HUI-MING PAO , CHENG-HSIN CHEN , PO-TING LEE , MING-CHIEN CHIU , TIEN-JUI LIN
IPC分类号： H01L21/677 , H01L21/68 , H01L21/687 , H01L21/673
CPC分类号： H01L21/67748 , H01L21/67259 , H01L21/67353 , H01L21/67393 , H01L21/6773 , H01L21/67736 , H01L21/67778 , H01L21/68 , H01L21/687
摘要： The present invention relates to a wafer transport system and a method of operating the same. The wafer transport system comprises at least one semiconductor apparatus, a track, a transfer device, a positioning device, a carrier and a cleaning device. The wafer transport system transports wafers along the at least one semiconductor apparatus via the carrier riding on the track. The transfer device transfers the wafers from the carrier to the at least one semiconductor apparatus. The positioning device identifies and controls the position of the carrier on the track. The cleaning device maintains the cleanliness of the wafers. The present invention provides advantages for improving the yield rate of a wafer, shortening the fabrication time of a wafer, and offering the flexibility and the extendibility to a wafer transport system.
摘要翻译：本发明涉及晶片输送系统及其操作方法。晶片传送系统包括至少一个半导体装置，轨道，传送装置，定位装置，载体和清洁装置。晶片传送系统经由载体骑在轨道上沿着至少一个半导体装置输送晶片。传送装置将晶片从载体传送到至少一个半导体装置。定位装置识别和控制载体在轨道上的位置。清洁装置保持晶片的清洁度。本发明提供了提高晶片的成品率，缩短晶片的制造时间以及提供对晶片输送系统的灵活性和可扩展性的优点。

49. 发明申请

US20140291942A1 CHUCK STRUCTURE FOR SUBSTRATE CLEANSING EQUIPMENT 审中-公开
标题翻译：衬底清洗设备的结构
公开(公告)号：US20140291942A1
公开(公告)日：2014-10-02
申请号：US13889548
申请日：2013-05-08
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： AN-PANG WANG , YUNG-CHIN PAN , SHENG-HSIEN YU , TSUNG YI YANG
IPC分类号： H01L21/687
CPC分类号： H01L21/68785 , Y10T279/34
摘要： The present invention provides a chuck structure for substrate cleansing equipment, which comprises a base and at least a pair of clipping members. The pair of clipping members is disposed on both corresponding sides of the base, respectively. Each clipping member has a plurality of holes on a surface thereof. When the pair of clipping members moves towards the base, it clips a substrate such as a photomask, a wafer, or other semiconductor substrate. The surfaces of the clipping members having the plurality of holes are against the substrate for reducing the contact area between the clipping members and the substrate. Thereby, the static charges generated on the substrate by the friction between the clipping members and the substrate can be avoided, which can reduce the damages on the substrate due to electrostatic discharge effectively.
摘要翻译：本发明提供了一种用于基板清洁设备的卡盘结构，其包括基部和至少一对夹持构件。该对夹持件分别设置在基座的相应侧上。每个夹持构件在其表面上具有多个孔。当一对夹持构件朝向底座移动时，其夹紧诸如光掩模，晶片或其它半导体衬底的衬底。具有多个孔的夹持构件的表面抵靠基板，用于减小夹持构件和基板之间的接触面积。因此，可以避免由于夹持部件和基板之间的摩擦而在基板上产生的静电荷，这可以有效地减少由于静电放电对基板的损伤。

50. 发明申请

US20140194050A1 GAS PURIFIER FOR WAFER SUBSTRATE ACCOMMODATING UNIT 审中-公开
标题翻译：用于散热器底座调节单元的气体净化器
公开(公告)号：US20140194050A1
公开(公告)日：2014-07-10
申请号：US13834796
申请日：2013-03-15
申请人： GUDENG PRECISION INDUSTRIAL CO, LTD.
发明人： MING-MO LO , CHENG-HSIN CHEN , TIEN-JUI LIN
IPC分类号： F24F7/04
CPC分类号： F24F7/04 , H01L21/67393
摘要： A gas purifier to be applied on a wafer substrate accommodating unit with an inlet hole includes an outer tube and an inner tube. The outer tube is disposed on the wafer substrate accommodating unit and has a plurality of first gas filling apertures. One end of the inner tube is a closed end and the other end is an open end. The inner tube has a plurality of second gas filling apertures, and its open end is interconnected with the inlet hole. The inner tube is movably disposed within the outer tube between a first operating position and second operating position. The second gas filling apertures are correspondingly configured to an inner wall of the outer tube when the inner tube is at a first operating position, and interconnected with the first gas filling apertures when the inner tube is at a second operating position.
摘要翻译：要施加在具有入口孔的晶片衬底容纳单元上的气体净化器包括外管和内管。外管设置在晶片衬底容纳单元上，并具有多个第一气体填充孔。内管的一端是封闭端，另一端是开口端。内管具有多个第二气体填充孔，其开口端与入口孔相互连接。内管可移动地设置在第一操作位置和第二操作位置之间的外管内。当内管处于第一操作位置时，第二气体填充孔相应地构造成外管的内壁，并且当内管处于第二操作位置时与第一气体填充孔互连。

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