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71. 发明授权

US09737915B2 Purge devices having micronozzles and operating methods thereof 有权
公开(公告)号：US09737915B2
公开(公告)日：2017-08-22
申请号：US14740664
申请日：2015-06-16
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD
发明人： Yung-Chin Pan , Zhi-Huang Zhong , An-Pang Wang
IPC分类号： B08B5/02 , H01L21/67 , A47L9/08
CPC分类号： B08B5/02 , A47L9/08 , H01L21/67028
摘要： The present invention provides purge devices having micronozzles and operating methods thereof. The purge device having micronozzles are operated to clean pellicles used in semiconductor manufacturing. The purge devices having micronozzles comprises a base, at least one track configured on the base, a rotation platform, and a micronozzle array, in which the micronozzle array further comprises an air duct and a plurality of nozzles. Additionally, the rotation platform and the micronozzle array are able to move relatively to another along the at least one track.

72. 发明申请

US20160146246A1 LATCH GUIDE ASSEMBLY 有权
标题翻译： LATCH指导大会
公开(公告)号：US20160146246A1
公开(公告)日：2016-05-26
申请号：US14583751
申请日：2014-12-28
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： HSIAO-CHIA LO , CHIH-MING LIN
IPC分类号： F16C29/00 , H01L21/677
CPC分类号： F16C29/005 , F16C29/004 , F16C29/04 , F16C2226/74 , H01L21/67373
摘要： The present invention relates to a latch guide assembly configured on the bottom of a wafer carrier. The latch guide assembly comprises a guide module having at least one guiding groove, a latch module having at least one side plate and at least one recess on the at least one side plate, and at least one rolling unit configured between the at least one guiding groove and the at least one recess. The latch module combines with the guide module via the at least one rolling unit and moves along with the guide module. The latch guide assembly provides a precise moving mechanism to lock/unlock the wafer carrier and reduces both the failure rate and dust production.
摘要翻译：本发明涉及一种构造在晶片载体的底部上的闩锁引导组件。闩锁引导组件包括具有至少一个引导槽的引导模块，具有至少一个侧板和至少一个侧板上的至少一个凹部的闩锁模块以及至少一个引导件凹槽和所述至少一个凹部。闩锁模块通过至少一个滚动单元与引导模块组合，并与引导模块一起移动。闩锁引导组件提供精确的移动机构以锁定/解锁晶片载体并且减少故障率和灰尘产生。

73. 发明授权

US09296023B2 Air-blown cleaning system for photomasks and method thereof 有权
标题翻译：光掩模吹风清洁系统及其方法
公开(公告)号：US09296023B2
公开(公告)日：2016-03-29
申请号：US13762541
申请日：2013-02-08
申请人： GUDENG PRECISION INDUSTRIAL CO, LTD.
发明人： Yung-Chin Pan , Tsung-Yi Yang , Liang-Wei Lai
IPC分类号： G06K9/00 , B08B5/02 , B08B13/00 , G03F1/82 , B08B5/04
CPC分类号： B08B5/02 , B08B13/00 , G03F1/82
摘要： An air-blown cleaning system for cleaning a photomask includes an image capturing module, an identification and control module, and an air knife device. The image capturing module captures an image of the photomask and divided the image into a plurality of sections for the identification and control module to identify particular sections with contaminants for subsequent cleaning and to store such data into a database. The air knife device includes at least one air knife module which receives data from the database and controls the air knife module to air blow the particular sections with contaminants. The instant disclosure also includes a method of air blow cleaning for cleaning a photomask.
摘要翻译：用于清洁光掩模的吹风清洁系统包括图像捕获模块，识别和控制模块以及气刀装置。图像捕获模块捕获光掩模的图像，并将该图像划分成用于识别和控制模块的多个部分，以识别具有污染物的特定部分用于随后的清洁并将这些数据存储到数据库中。气刀装置包括至少一个气刀模块，其从数据库接收数据并控制气刀模块用特定部分对污染物进行吹气。本公开还包括用于清洁光掩模的吹气清洁的方法。

74. 发明申请

US20140291198A1 RETICLE POD HAVING GAS GUIDING APPARATUS 有权
标题翻译：具有气体导向装置的物品
公开(公告)号：US20140291198A1
公开(公告)日：2014-10-02
申请号：US13889498
申请日：2013-05-08
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： PAO-YI LU , TIEN-JUI LIN
IPC分类号： H01L21/673
CPC分类号： H01L21/67359 , H01L21/67393
摘要： The present invention relates to a reticle pod having gas guiding apparatus. The gas guiding apparatus communicates with at least an inlet of the reticle pod and comprises a first outlet corresponding to a first gas flowing space of the reticle pod and a second outlet corresponding to a second gas flowing space. When the inlet supplies a high-purity gas to the gas guiding apparatus, the high-purity gas will flows through the gas guiding apparatus, and flow to the first and second gas flowing spaces via the first and second outlets, respectively to distribute uniformly in the first and second gas flowing spaces. In addition, the cleaning efficiency on the reticle is improved; the contact between the reticle and air can be avoided for protecting the reticle. Thereby, the usage of the high-purity gas is reduced, and the filling efficiency of the high-purity gas is enhanced.
摘要翻译：本发明涉及一种具有气体引导装置的标线盒。气体引导装置与标线舱的至少一个入口连通，并且包括对应于标线舱的第一气体流动空间的第一出口和对应于第二气体流动空间的第二出口。当入口向气体引导装置供应高纯度气体时，高纯度气体将流过气体引导装置，并且经由第一和第二出口分别流到第一和第二气体流动空间，以均匀地分布在第一和第二气体流动空间。另外，掩模版的清洗效率提高; 可以避免掩模版和空气之间的接触，以保护光罩。由此，降低了高纯度气体的使用，提高了高纯度气体的填充效率。

75. 发明申请

US20140238896A1 SUBSTRATE CONTAINER HAVING LIMIT STRUCTURE 审中-公开
标题翻译：具有极限结构的基座容器
公开(公告)号：US20140238896A1
公开(公告)日：2014-08-28
申请号：US13863526
申请日：2013-04-16
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： CHI-TE HUANG , CHIEN-FENG WANG , SHAO-WEI LU , TIEN-JUI LIN
IPC分类号： H01L21/673
CPC分类号： H01L21/67383
摘要： A substrate container having a limit structure includes a box, at least one limit structure and a door. The limit structure is disposed on a side wall of the box and has a plurality of limit grooves. Each limit groove has a first inclined surface and a second inclined surface. The angle of inclination of the second inclined plane relative to a horizontal plane corresponds to a coefficient of friction between materials of the substrate and the limit structure to lower the friction between the substrate and the second inclined plane of the limit groove, so that the substrate can ascend along the second inclined plane to get into the limit groove for the door to be closed smoothly. Through the limit structure to position the substrate, the present invention can prevent the substrate from shaking in the substrate container.
摘要翻译：具有限制结构的基底容器包括一个盒子，至少一个限制结构和一个门。极限结构设置在箱体的侧壁上并且具有多个限位槽。每个限制槽具有第一倾斜表面和第二倾斜表面。第二倾斜面相对于水平面的倾斜角度对应于基板材料与极限结构之间的摩擦系数，以降低基板与限制槽的第二倾斜平面之间的摩擦，使得基板可以沿着第二倾斜平面上升，进入限位槽，使门平稳地关闭。通过定位基板的极限结构，本发明可以防止基板在基板容器中摇动。

76. 发明申请

US20140137347A1 PHOTOMASK CLEANING DEVICE 有权
标题翻译： PHOTOMASK清洁装置
公开(公告)号：US20140137347A1
公开(公告)日：2014-05-22
申请号：US13761236
申请日：2013-02-07
申请人： GUDENG PRECISION INDUSTRIAL CO, LTD.
发明人： YUNG-CHIN PAN
IPC分类号： G03F7/20
CPC分类号： G03F1/82
摘要： A photomask cleaning device includes a stage, a fluid dispenser, a scrubbing unit, a cover and a fixing unit. The fluid dispenser includes a direct dispensing unit disposed correspondingly to the scrubbing unit, and an oblique dispensing unit obliquely spraying water onto a photomask. Majority of the particles can be removed with the combined application of the oblique dispensing unit and the scrubbing unit.
摘要翻译：光掩模清洁装置包括台，流体分配器，擦洗单元，盖和定影单元。流体分配器包括对应于洗涤单元设置的直接分配单元和倾斜分配单元，其倾斜地将水喷射到光掩模上。可以通过倾斜分配单元和洗涤单元的组合应用来去除大部分颗粒。

77. 发明申请

US20230054753A1 GAS DIFFUSION DEVICE, AND WAFER CONTAINER INCLUDING THE SAME 有权
公开(公告)号：US20230054753A1
公开(公告)日：2023-02-23
申请号：US17882703
申请日：2022-08-08
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： Ming-Chien Chiu , CHIA-HO CHUANG , Kuo-Hua Lee , Shu-Hung Lin , Hao-Kang HSIA
IPC分类号： H01L21/673
摘要： The present invention provides a wafer container and a gas diffusion device applied in the wafer container. The wafer container includes a shell, and all components included and applied on the shell are made of thermal resistance materials. The gas diffusion device and the wafer container, when assembled together, utilize a coupling structure and a collar as a protection mechanism for the gas diffusion device. The gas diffusion device has a buffering chamber that provides a buffering tolerance and a communicating space for the gas before the gas enters an interior space of the wafer container.

78. 发明授权

US11511920B2 Sealed reticle storage device with soft contact 有权
公开(公告)号：US11511920B2
公开(公告)日：2022-11-29
申请号：US16929748
申请日：2020-07-15
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： Chia-Ho Chuang , Hsin-Min Hsueh , Yi-Hsuan Lee , Hsing-Min Wen , Ming-Chien Chiu
IPC分类号： B65D53/06 , B65D85/38 , G03F1/66 , H01L21/673 , B01D46/00 , B01D46/42 , B01D46/54 , F16K27/02 , B65D81/24 , B65D85/30 , G03F7/20
摘要： The invention discloses a reticle storage device including a top lid, a bottom lid and a soft contact member. The top lid has a ceiling and a cover surrounding the ceiling. The bottom lid has a carrier and a peripheral structure surrounding the carrier. The soft contact member is configured to laterally extend in between the cover and the peripheral structure when the top lid and the bottom lid engage with each other, and to extend from an inside to an outside of the device in order to buffer the contact among the two lids.

79. 发明授权

US11314176B2 Apparatus for containing a substrate and method of manufacturing the apparatus 有权
公开(公告)号：US11314176B2
公开(公告)日：2022-04-26
申请号：US17343025
申请日：2021-06-09
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： Chia-Ho Chuang , Hsin-Min Hsueh , Ming-Chien Chiu
IPC分类号： G03F7/20
摘要： An apparatus for containing a substrate and a method of manufacturing the apparatus are provided. The apparatus for containing a substrate includes: a base having a periphery and an upward-facing top horizontal planar surface with a plurality of contact elements, the contact elements being used for engaging the substrate to hold the substrate upon the upward-facing top horizontal planar surface, an upward-facing frame-like support surface extending from the upward-facing top horizontal planar surface and surrounding the contact elements at a position proximate to the periphery of the base; and a cover having a downward-facing frame-like support surface being in large-area contact with the upward-facing frame-like support surface to define a cavity for containing the substrate between the base and the cover. The downward-facing and upward-facing frame-like support surfaces in contact with each other are not at the same level as the upward-facing top horizontal planar surface.

80. 发明授权

US11306841B2 Quick release purge valve and substrate container using same 有权
公开(公告)号：US11306841B2
公开(公告)日：2022-04-19
申请号：US17102920
申请日：2020-11-24
申请人： GUDENG PRECISION INDUSTRIAL CO., LTD.
发明人： Ming-Chien Chiu , Chia-Ho Chuang , Hsin-Min Hsueh
IPC分类号： F16K24/04 , B01D46/42 , B01D46/10 , F16K27/02 , H01L21/677
摘要： A quick release purge valve and a substrate container using same are provided. The container includes a base which has a cover plate and a bottom plate. The quick release purge valve includes a snap plate, a gasket fitting, and a valve element. The snap plate detachably engages with the bottom plate and is at most evenly aligned with the bottom plate. The gasket fitting is disposed between the cover plate and the bottom plate and has an airflow conduit communicating the two plates. The valve element is disposed in the conduit for limiting a flow direction of the gas. The gasket fitting is fixed in the base when the snap plate and the bottom plate are in an engaged state and is removable from the base when the snap plate and the bottom plate are in a disengaged state.

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