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1. 发明申请

WO2013090123A1 THERMAL PLATE FOR ENVIRONMENT AND TEMPERATURE CONTROL OF MOTORS USED TO MOVE STAGES IN LITHOGRAPHY TOOLS 审中-公开
标题翻译：电动工具用于移动电机的环境温度控制和温度控制
公开(公告)号：WO2013090123A1
公开(公告)日：2013-06-20
申请号：PCT/US2012/068294
申请日：2012-12-06
申请人： NIKON CORPORATION , BINNARD, Michael B. , PHARAND, Michel , MORIMOTO, Shigeru , POON, Alex Ka Tim , COON, Derek , KHO, Leonard Wai Fung , KESWANI, Gaurav
发明人： BINNARD, Michael B. , PHARAND, Michel , MORIMOTO, Shigeru , POON, Alex Ka Tim , COON, Derek , KHO, Leonard Wai Fung , KESWANI, Gaurav
IPC分类号： H02K9/22
CPC分类号： H02K9/22 , G03F7/70758 , G03F7/70858 , H02K41/031
摘要： A lithography tool having a stage for supporting and positioning a substrate, an array configured to move the stage, and a cover plate positioned between the stage and the array. In various embodiments, the array may be either a magnet or coil array. The cover plate acts as a thermal insulator that helps even out temperature variations across the array. Consequently, thermal disturbances to the array or other parts of the lithography tool are reduced, resulting in a minimization of positioning errors. In addition, the cover plate also protects the array and provides a smooth surface in the event of a "crash" of the substrate stage.
摘要翻译：一种光刻工具，具有用于支撑和定位基板的台架，配置成移动台架的阵列以及位于台架和阵列之间的盖板。在各种实施例中，阵列可以是磁体或线圈阵列。盖板用作有助于均匀排列阵列温度变化的绝热材料。因此，光刻工具的阵列或其他部分的热干扰减少，导致定位误差的最小化。此外，盖板还保护阵列，并且在衬底台的“碰撞”的情况下提供光滑的表面。

2. 发明申请

WO2008004646A1 EXPOSURE APPARATUS THAT INCLUDES A PHASE CHANGE CIRCULATION SYSTEM FOR MOVERS 审中-公开
标题翻译：包括用于移动器的相变循环系统的曝光装置
公开(公告)号：WO2008004646A1
公开(公告)日：2008-01-10
申请号：PCT/JP2007/063532
申请日：2007-06-29
申请人： NIKON CORPORATION , NOVAK, Thomas, W. , BINNARD, Michale, B. , POON, Alex Ka Tim , TOTSU, Masahiro , KHO, Leonard Wai Fung , KESWANI, Gaurav
发明人： NOVAK, Thomas, W. , BINNARD, Michale, B. , POON, Alex Ka Tim , TOTSU, Masahiro , KHO, Leonard Wai Fung , KESWANI, Gaurav
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70758 , H01L21/67248 , H01L21/68 , H02K9/20 , H02K41/02
摘要： A mover combination (226) for moving and positioning a device (34) includes a mover (328) that defines a fluid passageway (370) and a circulation system (330) having a passageway inlet (374) and a passageway outlet (376). The circulation system (330) directs a circulation fluid (378) into the fluid passageway (370). The circulation system (330) can include a liquid/gas separator (384) that is in fluid communication with the fluid passageway (370). With this design, the plumbing for the liquid (378A) and the gas (378B) can each be optimized. Additionally, the circulation system (330) can include a pressure control device (388) that controls the pressure of the circulation fluid (378) in at least a portion of the fluid passageway (370). With this design, the pressure control device (388) controls the pressure of the circulation fluid (378) near the fluid passageway (370) so that the temperature of the circulation fluid (378) at the passageway outlet (376) is approximately equal to the temperature of the circulation fluid (378) at the passageway inlet (374). Moreover, the circulation system (930) can include a pump assembly (980) that directs the circulation fluid (978) into the passageway inlet (974), and a pressure control device (996) that precisely controls a state of the circulation fluid (978) near the passageway inlet (974). With this design, the phase of the circulation fluid (978) at the passageway inlet (974) can be precisely controlled without restricting the flow of the circulation fluid (978).
摘要翻译：用于移动和定位装置（34）的移动器组合（226）包括限定流体通道（370）的移动器（328）和具有通道入口（374）和通道出口（376）的循环系统（330）。循环系统（330）将循环流体（378）引导到流体通道（370）中。循环系统（330）可以包括与流体通道（370）流体连通的液体/气体分离器（384）。通过这种设计，可以优化液体（378A）和气体（378B）的管道。另外，循环系统（330）可以包括控制流体通道（370）的至少一部分中的循环流体（378）的压力的压力控制装置（388）。通过该设计，压力控制装置（388）控制流体通道（370）附近的循环流体（378）的压力，使得通道出口（376）处的循环流体（378）的温度近似等于在通道入口（374）处的循环流体（378）的温度。此外，循环系统（930）可以包括引导循环流体（978）进入通道入口（974）的泵组件（980）和精确地控制循环流体状态的压力控制装置（996） 978）在通道入口附近（974）。通过这种设计，可以精确地控制在通道入口（974）处的循环流体（978）的相位，而不限制循环流体（978）的流动。

3. 发明申请

WO2005024517A3 APPARATUS AND METHOD FOR PROVIDING FLUID FOR IMMERSION LITHOGRAPHY 审中-公开
公开(公告)号：WO2005024517A3
公开(公告)日：2005-03-17
申请号：PCT/US2004/022915
申请日：2004-07-16
申请人： NIKON RESEARCH CORPORATION OF AMERICA , POON, Alex Ka Tim , KHO, Leonard Wai Fung
发明人： POON, Alex Ka Tim , KHO, Leonard Wai Fung
IPC分类号： G02B21/00
摘要： Embodiments of the present invention are directed to a system and a method of controlling the fluid flow and pressure to provide stable conditions for immersion lithography. A fluid is provided in a space (34) between the lens (22) and the substrate (16) during the immersion lithography process. Fluid is supplied to the space and is recovered from the space through a porous member (51) in fluidic communication with the space. Maintaining the pressure in the porous member under the bubble point of the porous member can eliminate noise created by mixing air with the fluid during fluid recovery. In one embodiment, the method comprises drawing the fluid from the space via a recovery flow line through a porous member; and maintaining a pressure of the fluid in the porous member below a bubble point of the porous member during drawing of the fluid from the space.

4. 发明授权

EP1660925B1 APPARATUS AND METHOD FOR PROVIDING FLUID FOR IMMERSION LITHOGRAPHY 有权
标题翻译：装置和方法用于提供流体的浸液光刻
公开(公告)号：EP1660925B1
公开(公告)日：2015-04-29
申请号：EP04778426.9
申请日：2004-07-16
申请人： NIKON CORPORATION
发明人： POON, Alex Ka Tim , KHO, Leonard Wai Fung
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70358 , G03F7/708 , G03F7/70858
摘要： Embodiments of the present invention are directed to a system and a method of controlling the flow and pressure of immersion fluid to provide stable conditions for immersion lithography. An immersion fluid is provided in a space (34) between a last optical element of an optical projection system and a workpiece during the immersion lithography process. For this purpose,a nozzle (20) is provided configured to supply immersion fluid in the gap between the last optical element and the workpiece, wherein the nozzle includes an inner cavity (34) to retain the immersion fluid in the gap and an outer cavity (53) to recover immersion fluid that exits the inner cavity.

5. 发明公开

EP2035896A1 EXPOSURE APPARATUS THAT INCLUDES A PHASE CHANGE CIRCULATION SYSTEM FOR MOVERS 审中-公开
标题翻译：有相变循环系统功率器件的曝光装置
公开(公告)号：EP2035896A1
公开(公告)日：2009-03-18
申请号：EP07745572.3
申请日：2007-06-29
申请人： Nikon Corporation
发明人： NOVAK, Thomas, W. , BINNARD, Michale, B. , POON, Alex Ka Tim , TOTSU, Masahiro , KHO, Leonard Wai Fung , KESWANI, Gaurav
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70758 , H01L21/67248 , H01L21/68 , H02K9/20 , H02K41/02
摘要： A mover combination ( 226 ) for moving and positioning a device ( 34 ) includes a mover ( 328 ) that defines a fluid passageway ( 370 ) and a circulation system ( 330 ) having a passageway inlet ( 374 ) and a passageway outlet ( 376 ). The circulation system ( 330 ) directs a circulation fluid ( 378 ) into the fluid passageway ( 370 ). The circulation system ( 330 ) can include a liquid/gas separator ( 384 ) that is in fluid communication with the fluid passageway ( 370 ). With this design, the plumbing for the liquid ( 378 A) and the gas ( 378 B) can each be optimized. Additionally, the circulation system ( 330 ) can include a pressure control device ( 388 ) that controls the pressure of the circulation fluid ( 378 ) in at least a portion of the fluid passageway ( 370 ). With this design, the pressure control device ( 388 ) controls the pressure of the circulation fluid ( 378 ) near the fluid passageway ( 370 ) so that the temperature of the circulation fluid ( 378 ) at the passageway outlet ( 376 ) is approximately equal to the temperature of the circulation fluid ( 378 ) at the passageway inlet ( 374 ). Moreover, the circulation system ( 930 ) can include a pump assembly ( 980 ) that directs the circulation fluid ( 978 ) into the passageway inlet ( 974 ), and a pressure control device ( 996 ) that precisely controls a state of the circulation fluid ( 978 ) near the passageway inlet ( 974 ). With this design, the phase of the circulation fluid ( 978 ) at the passageway inlet ( 974 ) can be precisely controlled without restricting the flow of the circulation fluid ( 978 ).

6. 发明公开

EP1660925A2 APPARATUS AND METHOD FOR PROVIDING FLUID FOR IMMERSION LITHOGRAPHY 有权
标题翻译：装置和方法用于提供流体的浸液光刻
公开(公告)号：EP1660925A2
公开(公告)日：2006-05-31
申请号：EP04778426.9
申请日：2004-07-16
申请人： NIKON CORPORATION
发明人： POON, Alex Ka Tim , KHO, Leonard Wai Fung
IPC分类号： G02B21/00
CPC分类号： G03F7/70341 , G03F7/70358 , G03F7/708 , G03F7/70858
摘要： Embodiments of the present invention are directed to a system and a method of controlling the flow and pressure of immersion fluid to provide stable conditions for immersion lithography. An immersion fluid is provided in a space (34) between a last optical element of an optical projection system and a workpiece during the immersion lithography process. For this purpose,a nozzle (20) is provided configured to supply immersion fluid in the gap between the last optical element and the workpiece, wherein the nozzle includes an inner cavity (34) to retain the immersion fluid in the gap and an outer cavity (53) to recover immersion fluid that exits the inner cavity.

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