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1. 发明申请

WO2013090123A1 THERMAL PLATE FOR ENVIRONMENT AND TEMPERATURE CONTROL OF MOTORS USED TO MOVE STAGES IN LITHOGRAPHY TOOLS 审中-公开
标题翻译：电动工具用于移动电机的环境温度控制和温度控制
公开(公告)号：WO2013090123A1
公开(公告)日：2013-06-20
申请号：PCT/US2012/068294
申请日：2012-12-06
申请人： NIKON CORPORATION , BINNARD, Michael B. , PHARAND, Michel , MORIMOTO, Shigeru , POON, Alex Ka Tim , COON, Derek , KHO, Leonard Wai Fung , KESWANI, Gaurav
发明人： BINNARD, Michael B. , PHARAND, Michel , MORIMOTO, Shigeru , POON, Alex Ka Tim , COON, Derek , KHO, Leonard Wai Fung , KESWANI, Gaurav
IPC分类号： H02K9/22
CPC分类号： H02K9/22 , G03F7/70758 , G03F7/70858 , H02K41/031
摘要： A lithography tool having a stage for supporting and positioning a substrate, an array configured to move the stage, and a cover plate positioned between the stage and the array. In various embodiments, the array may be either a magnet or coil array. The cover plate acts as a thermal insulator that helps even out temperature variations across the array. Consequently, thermal disturbances to the array or other parts of the lithography tool are reduced, resulting in a minimization of positioning errors. In addition, the cover plate also protects the array and provides a smooth surface in the event of a "crash" of the substrate stage.
摘要翻译：一种光刻工具，具有用于支撑和定位基板的台架，配置成移动台架的阵列以及位于台架和阵列之间的盖板。在各种实施例中，阵列可以是磁体或线圈阵列。盖板用作有助于均匀排列阵列温度变化的绝热材料。因此，光刻工具的阵列或其他部分的热干扰减少，导致定位误差的最小化。此外，盖板还保护阵列，并且在衬底台的“碰撞”的情况下提供光滑的表面。

2. 发明申请

WO2008115372A1 APPARATUS AND METHODS FOR KEEPING IMMERSION FLUID ADJACENT TO AN OPTICAL ASSEMBLY DURING WAFER EXCHANGE IN AN IMMERSION LITHOGRAPHY MACHINE 审中-公开
标题翻译：用于在浸没式切割机中的波形交换期间保持与光学组件相关的流体流体的装置和方法
公开(公告)号：WO2008115372A1
公开(公告)日：2008-09-25
申请号：PCT/US2008003224
申请日：2008-03-12
申请人： NIPPON KOGAKU KK , POON ALEX KA TIM , KHO LEONARD WAI FUNG , KESWANI GAURAV , COON DEREK
发明人： POON ALEX KA TIM , KHO LEONARD WAI FUNG , KESWANI GAURAV , COON DEREK
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70733
摘要： Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.
摘要翻译：装置和方法将浸没液体保持在与光学组件相邻的空间中。光学组件通过衬底台将图像投影到靠近光学组件支撑的衬底上。可插入到光学组件和衬底之间的空间，衬底台或两者中的插入构件将浸没液体分成第一部分和第二部分，第一部分设置在光学组件和插入构件之间，第二部分设置在插入构件和衬底之间，衬底台或两者。当基板移动远离邻近光学组件时，插入构件保持光学组件与第一部分接触。

3. 发明申请

WO2008004646A1 EXPOSURE APPARATUS THAT INCLUDES A PHASE CHANGE CIRCULATION SYSTEM FOR MOVERS 审中-公开
标题翻译：包括用于移动器的相变循环系统的曝光装置
公开(公告)号：WO2008004646A1
公开(公告)日：2008-01-10
申请号：PCT/JP2007/063532
申请日：2007-06-29
申请人： NIKON CORPORATION , NOVAK, Thomas, W. , BINNARD, Michale, B. , POON, Alex Ka Tim , TOTSU, Masahiro , KHO, Leonard Wai Fung , KESWANI, Gaurav
发明人： NOVAK, Thomas, W. , BINNARD, Michale, B. , POON, Alex Ka Tim , TOTSU, Masahiro , KHO, Leonard Wai Fung , KESWANI, Gaurav
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70758 , H01L21/67248 , H01L21/68 , H02K9/20 , H02K41/02
摘要： A mover combination (226) for moving and positioning a device (34) includes a mover (328) that defines a fluid passageway (370) and a circulation system (330) having a passageway inlet (374) and a passageway outlet (376). The circulation system (330) directs a circulation fluid (378) into the fluid passageway (370). The circulation system (330) can include a liquid/gas separator (384) that is in fluid communication with the fluid passageway (370). With this design, the plumbing for the liquid (378A) and the gas (378B) can each be optimized. Additionally, the circulation system (330) can include a pressure control device (388) that controls the pressure of the circulation fluid (378) in at least a portion of the fluid passageway (370). With this design, the pressure control device (388) controls the pressure of the circulation fluid (378) near the fluid passageway (370) so that the temperature of the circulation fluid (378) at the passageway outlet (376) is approximately equal to the temperature of the circulation fluid (378) at the passageway inlet (374). Moreover, the circulation system (930) can include a pump assembly (980) that directs the circulation fluid (978) into the passageway inlet (974), and a pressure control device (996) that precisely controls a state of the circulation fluid (978) near the passageway inlet (974). With this design, the phase of the circulation fluid (978) at the passageway inlet (974) can be precisely controlled without restricting the flow of the circulation fluid (978).
摘要翻译：用于移动和定位装置（34）的移动器组合（226）包括限定流体通道（370）的移动器（328）和具有通道入口（374）和通道出口（376）的循环系统（330）。循环系统（330）将循环流体（378）引导到流体通道（370）中。循环系统（330）可以包括与流体通道（370）流体连通的液体/气体分离器（384）。通过这种设计，可以优化液体（378A）和气体（378B）的管道。另外，循环系统（330）可以包括控制流体通道（370）的至少一部分中的循环流体（378）的压力的压力控制装置（388）。通过该设计，压力控制装置（388）控制流体通道（370）附近的循环流体（378）的压力，使得通道出口（376）处的循环流体（378）的温度近似等于在通道入口（374）处的循环流体（378）的温度。此外，循环系统（930）可以包括引导循环流体（978）进入通道入口（974）的泵组件（980）和精确地控制循环流体状态的压力控制装置（996） 978）在通道入口附近（974）。通过这种设计，可以精确地控制在通道入口（974）处的循环流体（978）的相位，而不限制循环流体（978）的流动。

4. 发明申请

WO2012029998A2 MICROCHANNEL-COOLED COILS OF ELECTROMAGNETIC ACTUATORS EXHIBITING REDUCED EDDY-CURRENT DRAG 审中-公开
标题翻译：电磁驱动器的微通道冷却线圈显示降低的涡流电流
公开(公告)号：WO2012029998A2
公开(公告)日：2012-03-08
申请号：PCT/JP2011070669
申请日：2011-09-05
申请人： NIPPON KOGAKU KK , BINNARD MICHAEL B , COAKLEY SCOTT , POON ALEX , TOTSU MASAHIRO , COON DEREK , KHO LEONARD , KESWANI GAURAV , COOPER ALEXANDER , PHARAND MICHEL , BJORK MATT
发明人： BINNARD MICHAEL B , COAKLEY SCOTT , POON ALEX , TOTSU MASAHIRO , COON DEREK , KHO LEONARD , KESWANI GAURAV , COOPER ALEXANDER , PHARAND MICHEL , BJORK MATT
IPC分类号： H02K3/24
CPC分类号： H02K9/22 , G03F7/70758 , G03F7/70875 , H02K9/19 , H02K41/031 , H02K2201/18
摘要： Linear and planar motors, as exemplary electromagnetic actuators, are disclosed that have at least one actively cooled coil assembly. An exemplary assembly includes a coil having first and second main surfaces. Also included is a respective thermally conductive cooling plate in thermal contact with at least one main surface of the coil. A coolant passageway is defined in or on each cooling plate, and a liquid coolant passes through the coolant passageway. The coolant passageway has a primary pattern that is coextensive with at least part of the main surface of the coil. The primary pattern can include a secondary pattern producing coolant flow through the coolant passageway in a manner that reduces eddy-current losses in the cooling plate. The coolant passageway desirably includes. An exemplary secondary pattern is serpentine. An exemplary primary pattern is radial or has a radial aspect, such as an X-shaped pattern. The devices provide more effective cooling, with better reliability and ease of maintenance, and reduced eddy-current drag than conventional actuators.
摘要翻译：作为示例性电磁致动器，公开了线性和平面电机，其具有至少一个主动冷却的线圈组件。示例性组件包括具有第一和第二主表面的线圈。还包括与线圈的至少一个主表面热接触的相应导热冷却板。冷却剂通路限定在每个冷却板中或上，并且液体冷却剂穿过冷却剂通路。冷却剂通道具有与线圈的主表面的至少一部分共同延伸的主要图案。主要模式可以包括次要模式，以减少冷却板中的涡流损失的方式产生通过冷却剂通道的冷却剂流。冷却剂通道理想地包括。示例性的次级模式是蛇形。示例性主要图案是径向或具有径向方面，诸如X形图案。该设备提供更有效的冷却，具有更好的可靠性和易于维护，并且比传统执行器减少了涡流阻力。

5. 发明申请

WO2007145725A2 IMMERSION LITHOGRAPHY SYSTEM AND METHOD HAVING AN IMMERSION FLUID CONFINEMENT PLATE FOR SUBMERGING THE SUBSTRATE TO BE IMAGED IN IMMERSION FLUID 审中-公开
标题翻译：具有渗透流体限制板的渗透层析系统和方法，用于将浸没流体中形成的基底
公开(公告)号：WO2007145725A2
公开(公告)日：2007-12-21
申请号：PCT/US2007/010791
申请日：2007-05-04
申请人： NIKON CORPORATION , POON, Alex, Ka, Tim , KHO, Leonard, Wai, Fung , KESWANI, Gaurav , COON, Derek
发明人： POON, Alex, Ka, Tim , KHO, Leonard, Wai, Fung , KESWANI, Gaurav , COON, Derek
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A lithography apparatus having a fluid confinement plate, which completely submerges the imaging surface of a substrate, is disclosed. The apparatus includes an imaging element defining an image and a stage configured to support the substrate. A projection optical system is provided to project the image defined by the imaging element onto the imaging surface of the substrate. A gap, filled with immersion fluid, is provided between the imaging surface of the substrate and the last optical element of the projection optical system. The fluid confinement plate, which is positioned within the gap between the last optical element and the substrate, is sufficiently sized so that the imaging surface is completely submerged in the immersion fluid. The fluid confinement plate includes a first surface facing the gap and opposing the imaging surface of the substrate. The first surface includes a droplet control element to control the formation of droplets forming on the first surface. In one embodiment, the droplet control element is a porous surface formed on the first surface. A vacuum is used to pull any excess immersion fluid through the porous region to prevent the formation of droplets. In a second embodiment, the droplet control element is a sloped surface that causes any immersion fluid on the first surface to flow toward to main body of immersion fluid in the gap.
摘要翻译：公开了一种具有完全浸没衬底的成像表面的流体限制板的光刻设备。该装置包括限定图像的成像元件和被配置为支撑基板的台。提供投影光学系统以将由成像元件限定的图像投影到基板的成像表面上。在基板的成像表面和投影光学系统的最后一个光学元件之间提供填充有浸没流体的间隙。定位在最后一个光学元件和基底之间的间隙内的流体限制板的尺寸足够大，使得成像表面完全浸没在浸没流体中。流体限制板包括面对间隙的第一表面并与基底的成像表面相对。第一表面包括用于控制形成在第一表面上的液滴的液滴控制元件。在一个实施例中，液滴控制元件是形成在第一表面上的多孔表面。使用真空来吸引多余的浸渍流体通过多孔区域以防止形成液滴。在第二实施例中，液滴控制元件是使第一表面上的任何浸没流体朝着间隙中的浸没流体的主体流动的倾斜表面。

6. 发明申请

WO2012029998A3 MICROCHANNEL-COOLED COILS OF ELECTROMAGNETIC ACTUATORS EXHIBITING REDUCED EDDY-CURRENT DRAG 审中-公开
公开(公告)号：WO2012029998A3
公开(公告)日：2012-03-08
申请号：PCT/JP2011/070669
申请日：2011-09-05
申请人： NIKON CORPORATION , BINNARD Michael B. , COAKLEY Scott , POON Alex , TOTSU Masahiro , COON Derek , KHO Leonard , KESWANI Gaurav , COOPER Alexander , PHARAND Michel , BJORK Matt
发明人： BINNARD Michael B. , COAKLEY Scott , POON Alex , TOTSU Masahiro , COON Derek , KHO Leonard , KESWANI Gaurav , COOPER Alexander , PHARAND Michel , BJORK Matt
IPC分类号： H02K3/24
摘要： Linear and planar motors, as exemplary electromagnetic actuators, are disclosed that have at least one actively cooled coil assembly. An exemplary assembly includes a coil having first and second main surfaces. Also included is a respective thermally conductive cooling plate in thermal contact with at least one main surface of the coil. A coolant passageway is defined in or on each cooling plate, and a liquid coolant passes through the coolant passageway. The coolant passageway has a primary pattern that is coextensive with at least part of the main surface of the coil. The primary pattern can include a secondary pattern producing coolant flow through the coolant passageway in a manner that reduces eddy-current losses in the cooling plate. The coolant passageway desirably includes. An exemplary secondary pattern is serpentine. An exemplary primary pattern is radial or has a radial aspect, such as an X-shaped pattern. The devices provide more effective cooling, with better reliability and ease of maintenance, and reduced eddy-current drag than conventional actuators.

7. 发明申请

WO2008115372A8 APPARATUS AND METHODS FOR KEEPING IMMERSION FLUID ADJACENT TO AN OPTICAL ASSEMBLY DURING WAFER EXCHANGE IN AN IMMERSION LITHOGRAPHY MACHINE 审中-公开
公开(公告)号：WO2008115372A8
公开(公告)日：2008-09-25
申请号：PCT/US2008/003224
申请日：2008-03-12
申请人： NIKON CORPORATION , POON, Alex, Ka, Tim , KHO, Leonard, Wai, Fung , KESWANI, Gaurav , COON, Derek
发明人： POON, Alex, Ka, Tim , KHO, Leonard, Wai, Fung , KESWANI, Gaurav , COON, Derek
IPC分类号： G03F7/20
摘要： Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.

8. 发明申请

WO2007145725A3 IMMERSION LITHOGRAPHY SYSTEM AND METHOD HAVING AN IMMERSION FLUID CONFINEMENT PLATE FOR SUBMERGING THE SUBSTRATE 审中-公开
标题翻译：具有用于浸取基材的浸没流体限制板的渗透层析系统和方法
公开(公告)号：WO2007145725A3
公开(公告)日：2008-02-21
申请号：PCT/US2007010791
申请日：2007-05-04
申请人： NIPPON KOGAKU KK , POON ALEX KA TIM , KHO LEONARD WAI FUNG , KESWANI GAURAV , COON DEREK
发明人： POON ALEX KA TIM , KHO LEONARD WAI FUNG , KESWANI GAURAV , COON DEREK
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F7/70341
摘要： A lithography apparatus (10) having a fluid confinement plate (24), which completely submerges the imaging surface of a substrate (16) is disclosed A gap, filled with immersion fluid, is provided between the imaging surface of the substrate (16) and the last optical element (20) of the projection optical system (18) The fluid confinement plate (24), which is positioned within the gap is sufficiently sized so that the imaging surface is completely submerged in the immersion fluid The fluid confinement plate (24) includes a first surface (24a) The first surface (24a) includes a droplet control element (40) to control the formation of droplets forming on the first surface (24a) In one embodiment, the droplet control element is a porous surface formed on the first surface (24a) In a second embodiment, the droplet control element is a sloped surface (44) that causes any immersion fluid on the first surface (24a) to flow toward to main body of immersion fluid in the gap.
摘要翻译：公开了一种具有完全浸没衬底（16）的成像表面的流体限制板（24）的光刻设备（10）。在衬底（16）的成像表面和投影光学系统（18）的最后一个光学元件（20）位于间隙内的流体限制板（24）具有足够的尺寸，使得成像表面完全浸没在浸没流体中。流体限制板（24））包括第一表面（24a）第一表面（24a）包括用于控制形成在第一表面（24a）上的液滴的形成的液滴控制元件（40）。在一个实施例中，液滴控制元件是形成在第一表面（24a）在第二实施例中，液滴控制元件是使第一表面（24a）上的任何浸没流体朝着间隙中的浸没流体的主体流动的倾斜表面（44）。

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