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    • 1. 发明授权
    • Semi-aqueous solvent based method of cleaning rosin flux residue
    • 半水溶剂型清洗松香助焊剂残渣的方法
    • US06800141B2
    • 2004-10-05
    • US10026269
    • 2001-12-21
    • Krishna G. SachdevChon C. LeiDemian M. Riccardi
    • Krishna G. SachdevChon C. LeiDemian M. Riccardi
    • B08B300
    • C11D11/0047C09D9/00C11D3/2034C11D3/2068C11D3/43C23G5/02Y10S438/906
    • A semi-aqueous solvent based method using non-aromatic, halogen-free organic solvent compositions for the effective removal of flux residue from electronic component surfaces after high temperature solder interconnections in the presence of rosin based flux compositions. Rosin flux residue can be removed using hydrophobic, essentially water insoluble, propylene glycol alkylether solvents in conjunction with a surfactant, preferably an ionic and/or a mixture of a non-ionic and an ionic surfactant in the first step, then a second step involving immersion with agitation in a hydrophobic solvent with no added surfactant. This is followed by a third step of hydrophilic solvent immersion with agitation/spray, rinsing off the hydrophilic solvent with water, and then a drying step.
    • 在基于松香的助熔剂组合物存在下,使用非芳香族无卤素的有机溶剂组合物,用于在高温焊料互连之后有效地从电子部件表面去除焊剂残留物的半水溶剂基方法。 可以使用疏水性基本上不溶于水的丙二醇烷基醚溶剂与第一步中的表面活性剂,优选离子和/或非离子和离子表面活性剂的离子和/或混合物一起除去松香助焊剂残余物,然后涉及第二步骤 在没有添加表面活性剂的疏水性溶剂中搅拌浸泡。 然后进行亲水溶剂浸渍搅拌/喷雾的第三步骤,用水漂洗亲水性溶剂,然后干燥步骤。
    • 3. 发明授权
    • Selective netlist to test fine pitch multi-chip semiconductor
    • 选择性网表,以测试细间距多芯片半导体
    • US06448796B1
    • 2002-09-10
    • US09593557
    • 2000-06-14
    • John J. EllisonChon C. LeiJorge L. Rivera
    • John J. EllisonChon C. LeiJorge L. Rivera
    • G01R3102
    • G01R31/318513G01R31/31926
    • A system for testing every one of the signal inputs and outputs (I/O) of a fine pitch multi-chip semiconductor module utilizing a selective netlist, through the intermediary of presently available test equipment. More particularly, the system facilitates the testing of fine pitch multi-chip modules utilizing 1.0 mm ceramic column grid array (CCGA) technology in order to facilitate the use of increased system interconnect capabilities. Additionally, there is provided a method of employing a selective netlist in order to test fine pitch multi-chip semiconductor modules; especially such as, but not limited to 1.0 mm pitch ceramic column grid array (CCGA) modules by employing commercially available test equipment.
    • 一种用于通过目前可用的测试设备的中介,利用选择性网表来测试每个信号输入和输出(I / O)的细间距多芯片半导体模块的系统。 更具体地,该系统便于使用1.0mm陶瓷列网格阵列(CCGA)技术来测试精细间距多芯片模块,以便于使用增加的系统互连能力。 此外,提供了一种采用选择性网表以便测试细间距多芯片半导体模块的方法; 特别是例如但不限于采用市售测试设备的1.0mm间距陶瓷柱格栅阵列(CCGA)模块。
    • 8. 发明授权
    • Cleaning method to remove flux residue in electronic assembly
    • 清除电子组件中残留焊剂的方法
    • US06503874B2
    • 2003-01-07
    • US09760939
    • 2001-01-16
    • Krishna G. SachdevChon C. Lei
    • Krishna G. SachdevChon C. Lei
    • B08B700
    • H01L21/4864C11D7/263C11D7/266C11D7/5022C11D11/0047H01L21/4835H05K3/26H05K2203/0783
    • This invention provides a method for removing flux residue and similar other residues formed on the surfaces of micro electronic components during soldering operations using solder paste and fluxing agents in electronic module assembly component fabrication by a semi-aqueous solvent cleaning process using propylene glycol alkyl ether solvents, preferably the mono alkyl ethers, as replacements for xylene. The electronic components may contain plastic components, for example, a plastic grid array (PBGA) in addition to silicon device chip(s), C4 decaps and SMTs on a ceramic chip carrier with solder columns. Preferred solvents are dipropylene glycol mono methyl ether and tripropylene glycol mono methyl ether, which are both water soluble.
    • 本发明提供一种在使用丙二醇烷基醚溶剂的半水溶剂清洗方法制造电子模块组件部件时,使用焊膏和助熔剂在焊接操作期间除去形成在微电子部件表面上的助焊剂残留物和类似的其它残留物的方法 ,优选单烷基醚,作为二甲苯的替代物。 除了硅器件芯片之外,电子部件可以包含塑料部件,例如除了硅器件芯片之外的塑料栅格阵列(PBGA),具有焊料柱的陶瓷芯片载体上的C4折叠和SMT。 优选的溶剂是二丙二醇单甲醚和三丙二醇单甲醚,它们都是水溶性的。