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1. 发明申请

US20130155569A1 High Conductivity Electrostatic Chuck 有权
标题翻译：高电导率静电卡盘
公开(公告)号：US20130155569A1
公开(公告)日：2013-06-20
申请号：US13818339
申请日：2011-09-08
申请人： David Suuronen , Lyudmila Stone , Julian Blake , Dale K. Stone , Richard A. Cooke , Steven Donnell , Chandra Venkatraman
发明人： David Suuronen , Lyudmila Stone , Julian Blake , Dale K. Stone , Richard A. Cooke , Steven Donnell , Chandra Venkatraman
IPC分类号： H02N13/00
CPC分类号： H02N13/00 , B23Q3/152 , H01L21/6831 , H01L21/6833
摘要： In accordance with an embodiment of the invention, there is provided an electrostatic chuck comprising a conductive path covering at least a portion of a workpiece-contacting surface of a gas seal ring of the electrostatic chuck, the conductive path comprising at least a portion of an electrical path to ground; and a main field area of a workpiece-contacting surface of the electrostatic chuck comprising a surface resistivity in the range of from about 108 to about 1012 ohms per square.
摘要翻译：根据本发明的实施例，提供了一种静电卡盘，其包括覆盖静电卡盘的气体密封环的工件接触表面的至少一部分的导电路径，该导电路径包括至少一部分电路到地面; 以及静电卡盘的工件接触表面的主场区域，其表面电阻率范围为约108至约1012欧姆/平方。

2. 发明申请

US20120200980A1 TRIBOELECTRIC CHARGE CONTROLLED ELECTROSTATIC CLAMP 有权
标题翻译： TRIBOELECTRIC CHARGE控制静电夹
公开(公告)号：US20120200980A1
公开(公告)日：2012-08-09
申请号：US13021838
申请日：2011-02-07
申请人： Julian Blake , Dale K. Stone , Lyudmila Stone , David Suuronen , Shigeo Oshiro
发明人： Julian Blake , Dale K. Stone , Lyudmila Stone , David Suuronen , Shigeo Oshiro
IPC分类号： H05F3/02
CPC分类号： H01L21/6831
摘要： An electrostatic clamp which more effectively removes built up charge from a substrate prior to removal is disclosed. Currently, the lift pins and the ground pins are the only mechanism used to remove charge from the substrate after implantation. The present discloses describes an electrostatic chuck in which the top dielectric surface has an embedded conductive region, such as a ring shaped conductive region in the sealing ring. Thus, regardless of the orientation of the substrate during release, at least a portion of the substrate will contain the conductive region on the dielectric layer of the workpiece support. This conductive region may be connected to ground through the use of conductive vias in the dielectric layer. In some embodiments, these conductive vias are the fluid conduits used to supply gas to the back side of the substrate.
摘要翻译：公开了一种在去除之前更有效地从衬底去除积聚电荷的静电夹。目前，升降针和接地引脚是用于在植入后从衬底去除电荷的唯一机制。本公开描述了一种静电卡盘，其中顶部电介质表面具有嵌入的导电区域，例如密封环中的环形导电区域。因此，无论衬底在释放过程中的取向如何，衬底的至少一部分将包含工件支撑体的电介质层上的导电区域。该导电区域可以通过使用电介质层中的导电通孔而连接到地。在一些实施例中，这些导电通孔是用于向衬底的背侧供应气体的流体导管。

3. 发明授权

US09082804B2 Triboelectric charge controlled electrostatic clamp 有权
标题翻译：摩擦电荷控制静电夹
公开(公告)号：US09082804B2
公开(公告)日：2015-07-14
申请号：US13021838
申请日：2011-02-07
申请人： Julian Blake , Dale K. Stone , Lyudmila Stone , David Suuronen , Shigeo Oshiro
发明人： Julian Blake , Dale K. Stone , Lyudmila Stone , David Suuronen , Shigeo Oshiro
IPC分类号： H01L21/683
CPC分类号： H01L21/6831
摘要： An electrostatic clamp which more effectively removes built up charge from a substrate prior to removal is disclosed. Currently, the lift pins and the ground pins are the only mechanism used to remove charge from the substrate after implantation. The present discloses describes an electrostatic chuck in which the top dielectric surface has an embedded conductive region, such as a ring shaped conductive region in the sealing ring. Thus, regardless of the orientation of the substrate during release, at least a portion of the substrate will contain the conductive region on the dielectric layer of the workpiece support. This conductive region may be connected to ground through the use of conductive vias in the dielectric layer. In some embodiments, these conductive vias are the fluid conduits used to supply gas to the back side of the substrate.
摘要翻译：公开了一种在去除之前更有效地从衬底去除积聚电荷的静电夹。目前，升降针和接地引脚是用于在植入后从衬底去除电荷的唯一机制。本公开描述了一种静电卡盘，其中顶部电介质表面具有嵌入的导电区域，例如密封环中的环形导电区域。因此，无论衬底在释放过程中的取向如何，衬底的至少一部分将在工件支撑体的电介质层上包含导电区域。该导电区域可以通过使用电介质层中的导电通孔而连接到地。在一些实施例中，这些导电通孔是用于向衬底的背侧供应气体的流体导管。

4. 发明申请

US20130070384A1 High Surface Resistivity Electrostatic Chuck 有权
标题翻译：高表面电阻静电卡盘
公开(公告)号：US20130070384A1
公开(公告)日：2013-03-21
申请号：US13699279
申请日：2011-05-24
申请人： Richard A. Cooke , Dale K. Stone , Lyudmila Stone , Julian Blake , David Suuronen
发明人： Richard A. Cooke , Dale K. Stone , Lyudmila Stone , Julian Blake , David Suuronen
IPC分类号： H02N13/00 , C23F1/00 , B05D5/12
CPC分类号： H02N13/00 , B05D5/12 , B23Q3/152 , C04B37/005 , C04B37/008 , C04B2237/06 , C04B2237/062 , C04B2237/08 , C04B2237/083 , C04B2237/086 , C04B2237/341 , C04B2237/343 , C04B2237/365 , C04B2237/368 , C23F1/00 , H01L21/6833
摘要： In accordance with an embodiment of the invention, there is provided an electrostatic chuck. The electrostatic chuck comprises an electrode, and a surface layer activated by a voltage in the electrode to form an electric charge to electrostatically clamp a substrate to the electrostatic chuck, the surface layer including a charge control layer comprising a surface resistivity of greater than about 1011 ohms per square.
摘要翻译：根据本发明的实施例，提供了一种静电卡盘。静电卡盘包括电极和由电极中的电压激活的表面层以形成电荷以将基板静电夹持到静电卡盘，该表面层包括电荷控制层，该电荷控制层包括大于约1011的表面电阻率欧姆每平方

5. 发明授权

US09025305B2 High surface resistivity electrostatic chuck 有权
标题翻译：高表面电阻率静电卡盘
公开(公告)号：US09025305B2
公开(公告)日：2015-05-05
申请号：US13699279
申请日：2011-05-24
申请人： Richard A. Cooke , Dale K. Stone , Lyudmila Stone , Julian Blake , David Suuronen
发明人： Richard A. Cooke , Dale K. Stone , Lyudmila Stone , Julian Blake , David Suuronen
IPC分类号： H01T23/00 , H02N13/00 , B23Q3/152 , C04B37/00 , H01L21/683 , B05D5/12 , C23F1/00
CPC分类号： H02N13/00 , B05D5/12 , B23Q3/152 , C04B37/005 , C04B37/008 , C04B2237/06 , C04B2237/062 , C04B2237/08 , C04B2237/083 , C04B2237/086 , C04B2237/341 , C04B2237/343 , C04B2237/365 , C04B2237/368 , C23F1/00 , H01L21/6833
摘要： In accordance with an embodiment of the invention, there is provided an electrostatic chuck. The electrostatic chuck comprises an electrode, and a surface layer activated by a voltage in the electrode to form an electric charge to electrostatically clamp a substrate to the electrostatic chuck, the surface layer including a charge control layer comprising a surface resistivity of greater than about 1011 ohms per square.
摘要翻译：根据本发明的实施例，提供了一种静电卡盘。静电卡盘包括电极和由电极中的电压激活的表面层以形成电荷以将基板静电夹持到静电卡盘，该表面层包括电荷控制层，该电荷控制层包括大于约1011的表面电阻率欧姆每平方

6. 发明申请

US20110036990A1 PLATEN TO CONTROL CHARGE ACCUMULATION 审中-公开
标题翻译：控制电荷累积的方法
公开(公告)号：US20110036990A1
公开(公告)日：2011-02-17
申请号：US12540225
申请日：2009-08-12
申请人： Dale K. Stone , Lyudmila Stone , Julian G. Blake , Frederick B. Ammon , David E. Suuronen
发明人： Dale K. Stone , Lyudmila Stone , Julian G. Blake , Frederick B. Ammon , David E. Suuronen
IPC分类号： H05F1/00 , G21G5/00 , H01J27/00
CPC分类号： H01J37/20 , H01J37/32412 , H01J2237/2007 , H01J2237/31701 , H01L21/6833 , H01L21/6875
摘要： An embossed platen to control charge accumulation includes a dielectric layer, a plurality of embossments on a surface of the dielectric layer to support a workpiece, each of a first plurality of the plurality of embossments having a conductive portion to contact a backside of the workpiece when the workpiece is in a clamped position, and a conductor to electrically couple the conductive portion of the first plurality of embossments to ground. An ion implanter having such an embossed platen is also provided.
摘要翻译：用于控制电荷累积的浮雕压板包括电介质层，在电介质层的表面上的多个压花以支撑工件，第一多个多个压花中的每一个具有导电部分以接触工件的后侧，当工件处于夹紧位置，以及将第一多个压花的导电部分电耦合到地的导体。还提供了具有这种压花压板的离子注入机。

7. 发明申请

US20100083980A1 Platen Cleaning Method 有权
标题翻译：压板清洁方法
公开(公告)号：US20100083980A1
公开(公告)日：2010-04-08
申请号：US12243980
申请日：2008-10-02
申请人： David Suuronen , Frederick B. Ammon , David Burgdorf , Lyudmila Stone
发明人： David Suuronen , Frederick B. Ammon , David Burgdorf , Lyudmila Stone
IPC分类号： B08B6/00
CPC分类号： B08B7/0028 , C23C14/48 , C23C14/564 , H01J37/20 , H01J37/32412 , H01J2237/022 , H01J2237/31701
摘要： A method for cleaning a workpiece support that includes using a workpiece that has been coated on its bottom surface with a suitable material is disclosed. This specially coated workpiece is placed on the support, and some time later, it is removed, taking with it particles from the support. In certain embodiments, the workpiece undergoes an ion implantation process to increase its temperature, and to increase the tackiness of the coating on the bottom surface. The material used to coat the bottom can be of variable types, including photoresists, oxides and deposited glasses.
摘要翻译：公开了一种用于清洁工件支撑件的方法，其包括使用已经涂覆在其底部表面上的合适材料的工件。将这种特殊涂层的工件放置在支架上，一段时间后，将其从支架上取下来。在某些实施例中，工件经历离子注入工艺以增加其温度，并增加涂层在底面上的粘性。用于涂覆底部的材料可以是可变的类型，包括光致抗蚀剂，氧化物和沉积的玻璃。

8. 发明申请

US20090122458A1 EMBOSSED ELECTROSTATIC CHUCK 审中-公开
标题翻译：嵌入式静电切割机
公开(公告)号：US20090122458A1
公开(公告)日：2009-05-14
申请号：US12269394
申请日：2008-11-12
申请人： D. Jeffrey Lischer , Dale K. Stone , Lyudmila Stone , David Suuronen , Julian G. Blake
发明人： D. Jeffrey Lischer , Dale K. Stone , Lyudmila Stone , David Suuronen , Julian G. Blake
IPC分类号： H01L21/683
CPC分类号： H01L21/6831
摘要： An electrostatic chuck includes a layer having a plurality of protrusions to support a workpiece, wherein at least a portion of the layer has a first plurality of the plurality of protrusions. The first plurality of protrusions is spaced to geometrically form a pattern of hexagons. The first plurality of protrusions may be spaced an equal distance from adjacent protrusions and the equal distance may be about 4.0 millimeters from a center of one protrusion to a center of another protrusion. The present disclosure reduces peak mechanical stress levels conventionally present along an edge of each protrusion. Reducing such mechanical stress levels helps reduce backside damage to a supported workpiece, which in turn can reduce the generation of unwanted particles caused by such damage.
摘要翻译：静电卡盘包括具有多个突起以支撑工件的层，其中该层的至少一部分具有第一多个多个突起。第一多个突起间隔几何形成六边形图案。第一多个突起可以与相邻的突起间隔开相等的距离，并且等距离可以是距离一个突起的中心到另一个突起的中心的约4.0毫米。本公开减少了沿着每个突起的边缘常规存在的峰值机械应力水平。降低这种机械应力水平有助于减少支撑的工件的背面损坏，这又可以减少由这种损坏引起的不想要的颗粒的产生。

9. 发明授权

US07381969B2 Load lock control 有权
标题翻译：加载锁定控制
公开(公告)号：US07381969B2
公开(公告)日：2008-06-03
申请号：US11409759
申请日：2006-04-24
申请人： Tariq Fasheh , James Carroll , Klaus Petry , Dale Stone , Lyudmila Stone , Dave Wiederspahn
发明人： Tariq Fasheh , James Carroll , Klaus Petry , Dale Stone , Lyudmila Stone , Dave Wiederspahn
IPC分类号： H01J37/18
CPC分类号： H01L21/67201 , Y10S414/139
摘要： A control for pressurizing a load lock. The control initiates pressurization of the loadlock interior by coupling a source of gas to the loadlock interior. A representative load lock includes a pressure sensor and multiple valves to atmosphere where at least one such valves is a passthrough valve for removal of and insertion of workpieces from and into a load lock interior. A second fast acting valve also opens to atmosphere. A pressure rise inside the loadlock interior is monitored and when the pressure reaches a threshold pressure above atmosphere the fast acting valve is opened to atmosphere. This second fast acting valve is configured to relieve overpressure from the passthrough valve prior to opening of said passthrough valve. Workpiece movement is accomplished with the aid of a robot which reaches into the loadlock interior as it is either depositing workpieces or retrieving them. This system and process minimizes particle contamination of the load lock interior as well as contamination in the region outside the loadlock near the passthrough valve and any scheduled workpieces.
摘要翻译：用于对加载锁加压的控制。该控制通过将气源连接到负载锁内部来启动负载锁内部的加压。代表性的加载锁包括压力传感器和多个阀，其中至少一个这样的阀是用于从工作装置锁定内部移除和插入工件的直通阀。第二个快动作阀也向大气敞开。监控负载锁内部的压力上升，当压力达到高于大气压的阈值压力时，快速作用阀向大气开放。该第二快动阀构造成在打开所述通气阀之前减轻通气阀的过压。工件运动是借助于一个机器人来实现的，该机器人可以通过放置工件或检索它们而进入到装载锁内部。该系统和过程最大限度地减少了负载锁内部的颗粒污染以及穿通阀附近的负载锁定区域和任何预定工件的污染。

10. 发明授权

US07205556B2 Bellows liner for an ion beam implanter 失效
标题翻译：用于离子束注入机的波纹管衬垫
公开(公告)号：US07205556B2
公开(公告)日：2007-04-17
申请号：US10956817
申请日：2004-10-01
申请人： Lyudmila Stone , Scott T. Barusso , Dale K. Stone , Alexander S. Perel
发明人： Lyudmila Stone , Scott T. Barusso , Dale K. Stone , Alexander S. Perel
IPC分类号： H01J37/317
CPC分类号： H01J37/3171
摘要： An ion beam implanter includes ion beam forming and directing apparatus and an implantation station where workpieces are implanted with ions from an ion beam. The beam travels along an evacuated path from an ion source to the implantation station. A flexible bellows couples the implantation station to the beam forming and directing apparatus permitting the implantation station to be pivoted with respect to the beam forming and directing apparatus and thereby change an implantation orientation of the workpieces with respect to the ion beam. A replaceable, flexible bellows liner is disposed within an interior region of the bellows to reduce the volume of implantation byproducts deposited on an interior surface of the bellows.
摘要翻译：离子束注入机包括离子束形成和引导装置以及其中用离子束注入离子的工件的注入站。光束沿着从离子源到注入站的抽真空路径行进。柔性波纹管将植入站耦合到波束形成和引导装置，允许植入站相对于波束形成和引导装置枢转，从而改变相对于离子束的工件的注入取向。可替换的柔性波纹管衬套设置在波纹管的内部区域内，以减小沉积在波纹管内表面上的植入副产物的体积。

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