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    • 5. 发明授权
    • Method and apparatus for aligning patterns on a substrate
    • 用于对准衬底上的图案的方法和装置
    • US08043652B2
    • 2011-10-25
    • US11852978
    • 2007-09-10
    • Raymond K. EbyMichael NelsonIgor Touzov
    • Raymond K. EbyMichael NelsonIgor Touzov
    • C23C16/52B05D5/00
    • G01Q40/00Y10S977/854
    • A system and method for aligning prior patterning positions formed by a first SPM tip with a second SPM tip in combination with an SPM system includes identifying first location information that includes a location of the first SPM tip and a sample reference location on an SPM sample and storing the first location information in a storage area. After replacing the first SPM tip with the second SPM tip, second location information, which includes a location of the second SPM tip and the sample reference location on the SPM sample, is identified. Displacement is calculated between the location of the second SPM tip and the first SPM tip based on the first and second location information, and either the second SPM tip or a stage supporting the SPM sample is translated to align the second SPM tip with the location of the first SPM tip in accordance with the calculated displacement.
    • 用于将由第一SPM尖端形成的先前图案形成位置与第二SPM尖端对准的系统和方法与SPM系统组合包括识别包括第一SPM尖端的位置和SPM样本上的样本参考位置的第一位置信息,以及 将第一位置信息存储在存储区域中。 在用第二SPM尖端替换第一SPM尖端之后,识别包括第二SPM尖端的位置和SPM样本上的样本参考位置的第二位置信息。 基于第一和第二位置信息在第二SPM尖端的位置和第一SPM尖端之间计算位移,并且平移第二SPM尖端或支撑SPM样本的平台以使第二SPM尖端与 第一个SPM尖端按照计算出的位移。
    • 8. 发明申请
    • COMPACT NANOFABRICATION APPARATUS
    • 紧凑的纳米装置
    • US20090023607A1
    • 2009-01-22
    • US12116908
    • 2008-05-07
    • Sergey V. RozhokMichael NelsonNabil A. AmroJoseph S. FragalaRaymond Roger ShileJohn Edward BussanDirk N. vanMerkestyn
    • Sergey V. RozhokMichael NelsonNabil A. AmroJoseph S. FragalaRaymond Roger ShileJohn Edward BussanDirk N. vanMerkestyn
    • C40B50/14C40B60/14
    • G03F7/0002G01Q80/00G03F7/70383G03F9/00
    • An apparatus for use in fabricating structures and depositing materials from tips to surfaces for patterning in direct-write mode, providing ability to travel macroscopic distances and yet provide for nanoscale patterning. Useful in small scale fabrication and nanolithography. The instrument can be compact and used on a laboratory bench or desktop. An apparatus comprising: at least one multi-axis assembly comprising a plurality of nanopositioning stages, at least one pen assembly, wherein the pen assembly and the multi-axis assembly are adapted for delivery of material from the pen assembly to a substrate which is positioned by the multi-axis assembly, at least one viewing assembly, at least one controller. Nanopositioning by piezoelectric methods and devices and motors is particularly useful. The apparatus can include integrated environmental chambers and housings, as well as ink reservoirs for materials to be delivered. The viewing assembly can be a microscope with a long working distance. Particularly useful for fabrication of bioarrays or microarrays. The multi-axis assembly can be a five-axis assembly. Software can facilitate efficient usage.
    • 一种用于制造结构并从尖端到表面沉积材料的装置,用于以直写式模式进行图案化,提供行进宏观距离并提供纳米尺度图案化的能力。 适用于小规模制造和纳米光刻。 该仪器可以紧凑,并在实验台或台式机上使用。 一种装置,包括:至少一个多轴组件,其包括多个纳米定位阶段,至少一个笔组件,其中所述笔组件和所述多轴组件适于将材料从所述笔组件传送到定位的衬底 通过多轴组件,至少一个观察组件,至少一个控制器。 通过压电方法和装置和电动机的定位是特别有用的。 该设备可以包括集成的环境室和壳体,以及用于要输送的材料的油墨储存器。 观察组件可以是具有长工作距离的显微镜。 特别适用于制造生物芯片或微阵列。 多轴组件可以是五轴组件。 软件可以促进有效的使用。