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91. 发明专利

JP2006349800A POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 审中-公开
公开(公告)号：JP2006349800A
公开(公告)日：2006-12-28
申请号：JP2005173315
申请日：2005-06-14
申请人： TOKYO OHKA KOGYO CO LTD
发明人： SASAKI KAZUHITO , SHIMIZU HIROAKI , KONO SHINICHI
IPC分类号： G03F7/039 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a positive resist composition for forming a resist pattern with excellent resolution, and to provide a method for forming a resist pattern. SOLUTION: The positive resist composition contains a resin component (A) the alkali solubility of which is increased by an effect of an acid and an acid generator component (B) which generates an acid by exposure, wherein the resin component (A) is a mixture of a copolymer (A1) having a structural unit (a1) derived from an acrylic acid ester having a cyclic acid-dissociative solubility-inhibiting group and a copolymer (A1') having a structural unit (a1') derived from an acrylic acid ester having a branched chain acid-dissociative solubility-inhibiting group. COPYRIGHT: (C)2007,JPO&INPIT

92. 发明专利

JP2006133500A Method for preparing resist composition and resist composition 有权
标题翻译：制备耐蚀组合物和耐蚀组合物的方法
公开(公告)号：JP2006133500A
公开(公告)日：2006-05-25
申请号：JP2004322315
申请日：2004-11-05
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SHIMIZU HIROAKI , TAKESHITA MASARU
IPC分类号： G03F7/039 , C08F20/18 , G03F7/033 , H01L21/027
CPC分类号： G03F7/0397 , C08F220/28 , Y10S430/111
摘要： PROBLEM TO BE SOLVED: To provide a method for preparing a resist composition capable of diminishing defects and a resist composition.
SOLUTION: In the method for preparing the resist composition containing (A) a resin component whose alkali solubility is varied by the action of an acid and (B) an acid generator component which generates an acid upon exposure, the component (A) is obtained by mixing a plurality of copolymers comprising constitutional units of the same kind and different from each other in the measured value of contact angle.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种制备能够减少缺陷的抗蚀剂组合物和抗蚀剂组合物的方法。解决方案：在制备抗蚀剂组合物的方法中，所述抗蚀剂组合物含有（A）通过酸的作用使碱溶解度变化的树脂组分和（B）暴露时产生酸的酸产生剂组分的组分（A ）是通过在测量的接触角值中混合包含相同种类和不同的结构单元的多种共聚物来获得的。版权所有（C）2006，JPO＆NCIPI

93. 发明专利

JP2006003844A Positive resist composition and method for forming resist pattern 审中-公开
标题翻译：积极抗性组合物和形成耐药模式的方法
公开(公告)号：JP2006003844A
公开(公告)日：2006-01-05
申请号：JP2004183041
申请日：2004-06-21
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SHIMIZU HIROAKI
IPC分类号： G03F7/039 , G03F7/033 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To form a resist pattern having high resolution and low LER (line edge roughness). SOLUTION: A chemically amplified positive resist composition contains a copolymer (A1) having (a1) a structural unit derived from a mono(α-lower alkyl)acrylate having an acid dissociable solubility suppressing group, (a2) a structural unit derived from a mono(α-lower alkyl) acrylate having a lactone-containing monocyclic or polycyclic group, and (a4) a structural unit derived from a poly (α-lower alkyl) acrylate comprising a precursor unit derived from an (α-lower alkyl) acrylate having a polycyclic alicyclic hydrocarbon group containing a hydroxyl group or a carboxyl group, wherein a crosslinking group expressed by general formula (I) is substituted for a hydrogen atom in the hydroxyl group or the carboxyl group and forms an intramolecular or intermolecular crosslink. In formula (I), A represents a bivalent or trivalent organic group, p represents an integer 1 to 3, and each of R 1 and R 2 independently represents a hydrogen atom or a straight or branched lower alkyl group. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：形成具有高分辨率和低LER（线边缘粗糙度）的抗蚀剂图案。解决方案：化学增幅正性抗蚀剂组合物含有共聚物（A1），其具有（a1）衍生自具有酸解离溶解度抑制基团的单（α-低级烷基）丙烯酸酯的结构单元，（a2）衍生的结构单元由具有含内酯单环或多环基团的单（α-低级烷基）丙烯酸酯和（a4）衍生自聚（α-低级烷基）丙烯酸酯的结构单元，其包含衍生自（α-低级烷基））具有羟基或羧基的多环脂肪族烃基的丙烯酸酯，其中由通式（I）表示的交联基团代替羟基或羧基中的氢原子，并形成分子内或分子间的交联。在式（I）中，A表示二价或三价有机基团，p表示1〜3的整数，R SP 1，R SP 2各自独立地表示氢原子或直链或支链的低级烷基。版权所有（C）2006，JPO＆NCIPI

94. 发明专利

JP2005196095A Resist composition and method for forming resist pattern 有权
标题翻译：用于形成电阻图案的耐蚀组合物和方法
公开(公告)号：JP2005196095A
公开(公告)日：2005-07-21
申请号：JP2004057448
申请日：2004-03-02
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： HANEDA HIDEO , TAKESHITA MASARU , HAYASHI RYOTARO , MATSUMARU SHOGO , HIRAYAMA HIROSHI , SHIMIZU HIROAKI
IPC分类号： G03F7/039 , G03F7/004 , H01L21/027
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/122
摘要： PROBLEM TO BE SOLVED: To provide a resist composition for improving fine resolution, LER and depth of focus, and to provide a method for forming a resist pattern which uses the resist composition. SOLUTION: The resist composition contains (A) a resin component whose alkali solubility is changed by the action of acid, and (B) an acid generator component which generates an acid through exposure, wherein the component (A) is a resin with a mass average molecular weight of ≤8,000 which contains a constitutional unit (a) derived from a (meth)acrylate, and the component (B) contains at least one kind of sulfonium compound, represented by general formula (b-1) or (b-2). COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于提高精细分辨率，LER和聚焦深度的抗蚀剂组合物，并提供一种形成使用该抗蚀剂组合物的抗蚀剂图案的方法。解决方案：抗蚀剂组合物含有（A）通过酸的作用使碱溶解度变化的树脂成分，（B）通过曝光产生酸的酸发生剂成分，其中，成分（A）为树脂质量平均分子量≤8,000，其含有由（甲基）丙烯酸酯衍生的结构单元（a），组分（B）含有至少一种由通式（b-1）表示的锍化合物或（b-2）。版权所有（C）2005，JPO＆NCIPI

95. 发明专利

JP2014115665A Resist composition and method for forming resist pattern 有权
标题翻译：用于形成电阻图案的耐蚀组合物和方法
公开(公告)号：JP2014115665A
公开(公告)日：2014-06-26
申请号：JP2014001274
申请日：2014-01-07
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SESHIMO TAKEHIRO , UTSUMI YOSHIYUKI , KAWAKAMI AKINARI , HANEDA HIDEO , SHIMIZU HIROAKI , NAKAMURA TAKESHI
IPC分类号： G03F7/004 , C07D327/04 , C08F2/50 , C08F220/10 , C08F220/28 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , C07D327/02 , C07D327/04 , C07D497/08 , C08K5/36 , C08K5/42 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： PROBLEM TO BE SOLVED: To provide a novel compound useful as an acid generator for a resist composition, a compound useful as a precursor of the above compound, an acid generator, a resist composition, and a method for forming a resist pattern.SOLUTION: A compound expressed by a general formula (I), and a compound expressed by a general formula (b1-1) are disclosed. In the formulae, Qrepresents a divalent linkage group or a single bond; Yrepresents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group having 3 to 30 carbon atoms which may have a substituent, and has a -SO- bond in the cyclic structure thereof; Mrepresents an alkali metal ion; and Arepresents an organic cation.
摘要翻译：要解决的问题：提供可用作抗蚀剂组合物的酸发生剂的新化合物，可用作上述化合物的前体的化合物，酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法。解决方案：公开了由通式（I）表示的化合物和由通式（b1-1）表示的化合物。在该式中，Q表示二价连接基团或单键; Y表示可以具有取代基的亚烷基或可以具有取代基的氟化亚烷基; X表示可以具有取代基的具有3〜30个碳原子的环状基团，并且在其环状结构中具有-SO-键; M表示碱金属离子; 并表示有机阳离子。

96. 发明专利

JP2014006282A Resist composition and method for forming resist pattern 有权
标题翻译：用于形成电阻图案的耐蚀组合物和方法
公开(公告)号：JP2014006282A
公开(公告)日：2014-01-16
申请号：JP2012139756
申请日：2012-06-21
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： NAKAMURA TAKESHI , YOKOYA JIRO , NITO TAKEHITO , SHIMIZU HIROAKI
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027
CPC分类号： G03F7/004 , G03F7/0045 , G03F7/0382 , G03F7/0397 , G03F7/2041 , G03F7/38 , Y10S430/12 , Y10S430/121
摘要： PROBLEM TO BE SOLVED: To provide a resist composition excellent in post exposure delay stability.SOLUTION: The resist composition generates a base by exposure and exhibits an increase in the solubility with an alkali developing solution by an action of an acid. The resist composition comprises: a base material component (A) exhibiting an increase in the solubility with an alkali developing solution by an action of an acid; an acidic compound component (G1) comprising a nitrogen-containing cation having 7 or less pKa and a counter anion; and a buffer component (K) comprising a nitrogen-containing cation and a counter anion that functions as a conjugated base for an acid having 0 to 5 pKa.
摘要翻译：要解决的问题：提供后曝光延迟稳定性优异的抗蚀剂组合物。解决方案：抗蚀剂组合物通过曝光产生碱，并且通过酸的作用显示与碱性显影液的溶解度的增加。抗蚀剂组合物包括：通过酸的作用显示与碱性显影液的溶解度增加的基材成分（A）含有7个以下pKa的含氮阳离子和抗衡阴离子的酸性化合物成分（G1）和含有含氮阳离子和抗衡阴离子的缓冲成分（K），其作为0〜5pKa的酸的共轭碱。

97. 发明专利

JP2013127525A Resist composition and resist pattern formation method 有权
标题翻译：电阻组合和电阻形成方法
公开(公告)号：JP2013127525A
公开(公告)日：2013-06-27
申请号：JP2011276439
申请日：2011-12-16
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SHIMIZU HIROAKI , NITO TAKEHITO
IPC分类号： G03F7/038 , C08F212/14 , C08F220/12 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist pattern formation method useful for forming a fine pattern, and a resist composition for use in the formation.SOLUTION: There is provided a resist pattern formation method including the steps of: using a resist composition containing a base component (A) having an acidic group, a compound (C) capable of forming an association structure with the acidic group, and an acid generator composition (B) that generates an acid having a higher degree of acidity than the above acidic group by being exposed to light, so as to form a resist film 2 with an association structure of the acidic group and the compound (C) on a supporting member 1; exposing the acidic group by exposing the resist film 2 to light and forming a new association structure of the acid generated from the acid generator composition (B) and the compound (C) forming the aforementioned association structure; and developing the resist film 2 with a developing solution containing an organic solvent. Further, there is provided a resist composition for use in this formation method.
摘要翻译：要解决的问题：提供用于形成精细图案的抗蚀剂图案形成方法和用于形成的抗蚀剂组合物。解决方案：提供了一种抗蚀剂图案形成方法，包括以下步骤：使用含有具有酸性基团的基础组分（A），能够与酸性基团形成缔合结构的化合物（C）的抗蚀剂组合物，和通过曝光而产生酸度高于酸性的酸的酸产生剂组合物（B），从而形成具有酸性基团和化合物（C）的缔合结构的抗蚀剂膜2 ）在支撑构件1上; 通过使抗蚀剂膜2曝光而暴露于酸性基团，并形成由酸产生剂组合物（B）和形成上述缔合结构的化合物（C）产生的酸的新缔合结构; 并用含有机溶剂的显影液显影抗蚀膜2。此外，提供了用于该形成方法的抗蚀剂组合物。版权所有（C）2013，JPO＆INPIT

98. 发明专利

JP2012173419A Resist composition and method for forming resist pattern 有权
标题翻译：用于形成电阻图案的耐蚀组合物和方法
公开(公告)号：JP2012173419A
公开(公告)日：2012-09-10
申请号：JP2011033630
申请日：2011-02-18
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： SHIMIZU HIROAKI , ABE SHO , NITO TAKEHITO
IPC分类号： G03F7/004 , C08F220/28 , G03F7/038 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/2041 , G03F7/30 , G03F7/325 , Y10S430/12 , Y10S430/122 , Y10S430/123
摘要： PROBLEM TO BE SOLVED: To provide a resist composition excellent in lithographic characteristics and pattern features and to provide a method for forming a resist pattern using the resist composition.SOLUTION: The resist composition comprises a base component (A) showing changes in the solubility with a developing solution by an action of an acid, a basic compound component (C), and an acid generator component (B) generating an acid by exposure. The acid generator component (B) contains a compound expressed by a formula (b1); and the basic compound component (C) contains at least one compound expressed by formulae (c1) to (c3).
摘要翻译：要解决的问题：提供光刻特性和图案特征优异的抗蚀剂组合物，并提供使用该抗蚀剂组合物形成抗蚀剂图案的方法。解决方案：抗蚀剂组合物包含基本组分（A），其显示通过酸的作用显影溶液的溶解度的变化，碱性化合物组分（C）和产生酸的酸产生剂组分（B）通过曝光。酸发生剂组分（B）含有由式（b1）表示的化合物; 碱性化合物成分（C）含有至少一种式（c1）〜（c3）表示的化合物。版权所有（C）2012，JPO＆INPIT

99. 发明专利

JP2011162796A Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method 有权
标题翻译：聚合物化合物，包括聚合物化合物的光电组合物和耐蚀图案形成方法
公开(公告)号：JP2011162796A
公开(公告)日：2011-08-25
申请号：JP2011111661
申请日：2011-05-18
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： OGATA HISAYUKI , MATSUMARU SHOGO , KINOSHITA YOHEI , HANEDA HIDEO , SHIONO HIROHISA , SHIMIZU HIROAKI , KUBOTA NAOTAKA
IPC分类号： C08F220/10 , G03F7/039
摘要： PROBLEM TO BE SOLVED: To provide a polymer compound which can constitute a photoresist composition having an excellent resolution, forming a fine pattern with a good rectangularity, obtaining favorable resist characteristics even when acid strength of an acid generated from an acid generator is weak, and having favorable sensitivity, the photoresist composition using the polymer compound and a resist pattern formation method using the photoresist composition. SOLUTION: The polymer compound having alkali solubility changeable by the action of acid and contains a structural unit (a1) derived from a compound expressed by general formula (2) (in the formula, R 1 expresses a ≤20C aliphatic cyclic group, (n) expresses integers of 0 or 1-5, R 2 expresses hydrogen atom, fluorine atom or a ≤20C lower alkyl group or a ≤20C fluorinated lower alkyl group) and a structural unit (a3) derived from (meth)acrylic ester containing a lactone-containing single ring or polycyclic group. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：待解决的问题：为了提供可以构成具有优异分辨率的光致抗蚀剂组合物的高分子化合物，形成具有良好矩形性的精细图案，即使当由酸产生剂产生的酸的酸强度为弱，并且具有良好的灵敏度，使用高分子化合物的光致抗蚀剂组合物和使用光致抗蚀剂组合物的抗蚀剂图案形成方法。解决方案：具有碱溶解性的高分子化合物可以通过酸的作用而变化，并含有由通式（2）表示的化合物（式中，R 1 ）表示的结构单元（a1）表示≤20C脂族环状基团，（n）表示0或1-5的整数，R 2表示氢原子，氟原子或≤20C低级烷基或≤20C氟化低级烷基）和衍生自含有内酯单环或多环基团的（甲基）丙烯酸酯的结构单元（a3）。版权所有（C）2011，JPO＆INPIT

100. 发明专利

JP2011081046A Resist composition and method of forming resist pattern 有权
标题翻译：耐蚀组合物和形成耐力图案的方法
公开(公告)号：JP2011081046A
公开(公告)日：2011-04-21
申请号：JP2009230856
申请日：2009-10-02
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： UTSUMI YOSHIYUKI , IRIE MAKIKO , SHIMIZU HIROAKI , NITO TAKEHITO
IPC分类号： G03F7/004 , C08F220/10 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition and a method of forming a resist pattern using the resist composition. SOLUTION: The resist composition contains: base material component (A) caused to change in solubility to an alkali developing liquid by the action of acid; an acid generator component (B) caused to generate acid by exposure; and a nitrogen-containing organic compound (D). The nitrogen-containing organic compound (D) contains a compound expressed by general formula (d1). In the formula, R 1 is a hydrocarbon group of 5C or more, and R 2 and R 3 are an aliphatic hydrocarbon group or -C(=O)-O-R 1 each may have a hydrogen atom and a substituent independently. The plurality of R 1 s in the formula may be the same or different and, R 2 and R 3 may be mutually bonded to form a ring. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种抗蚀剂组合物和使用该抗蚀剂组合物形成抗蚀剂图案的方法。抗蚀剂组合物含有：通过酸的作用使碱性成分（A）对碱性显影液的溶解度发生变化; 酸产生剂组分（B）通过暴露产生酸; 和含氮有机化合物（D）。含氮有机化合物（D）含有通式（d1）表示的化合物。在该式中，R 1是5或5以上的烃基，R SP＆gt;和＆lt; SP＆gt; 3＆lt; SP＆gt; 3是脂族烃基或-C （= O）-OR 1 各自可以独立地具有氢原子和取代基。式中的多个R 1 SP 1可以相同或不同，并且可以相互键合R 2和R 3彼此结合形成环。版权所有（C）2011，JPO＆INPIT

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