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JP2011149086A Sputtering apparatus and method of manufacturing electronic device 有权
标题翻译：溅射装置及制造电子装置的方法
公开(公告)号：JP2011149086A
公开(公告)日：2011-08-04
申请号：JP2010127300
申请日：2010-06-02
申请人： Canon Anelva Corp , キヤノンアネルバ株式会社
发明人： OISHI TETSUYA , FUJIMOTO TAKESHI
IPC分类号： C23C14/34
CPC分类号： C23C14/02 , C23C14/34 , C23C14/564 , H01J37/34 , H01J37/3447
摘要： PROBLEM TO BE SOLVED: To provide a compact sputtering apparatus having a small space to allow a screening mechanism to retract.
SOLUTION: A sputtering apparatus comprises a substrate holder, and a screening member configured to screen a substrate mount surface to be mounted with a substrate 18 in a surface of the substrate holder. The substrate mount surface comprises a first area and a second area. The screening member includes a first screening member 14 configured to screen at least the first area, a second screening member 15 configured to screen at least the second area and a rotating mechanism 30 configured to rotate the first screening member 14 and the second screening member 15. In the first screening member 14 and the second screening member 15, the first screening member 14 at least screens the first area by the rotation by the rotating mechanism 30, and also, the second screening member 15 is configured to be rotated to move between a screening position at which the first screening member 14 screens at least the first area and the second screening member 15 screens at least the second area and a retreat position at which the first screening member 14 and the second screening member 15 retract from an area above the substrate mount surface and overlap each other.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有小的空间以允许筛选机构缩回的紧凑型溅射装置。解决方案：溅射装置包括衬底保持器和被配置为将衬底18安装在衬底保持器的表面上的衬底安装表面的屏蔽构件。衬底安装表面包括第一区域和第二区域。遮蔽构件包括构造成至少筛选第一区域的第一遮蔽构件14，被配置为至少筛选第二区域的第二遮蔽构件15和被构造成使第一遮蔽构件14和第二遮蔽构件15旋转的旋转机构30 在第一遮蔽构件14和第二遮蔽构件15中，第一遮蔽构件14至少通过旋转机构30的旋转来筛分第一区域，并且第二遮蔽构件15被构造成旋转以在第一遮蔽构件14和第二遮蔽构件15之间移动第一遮蔽构件14至少筛选第一区域并且第二遮蔽构件15筛选至少第二区域的遮蔽位置和第一遮蔽构件14和第二遮蔽构件15从该区域上方缩回的退避位置衬底安装表面并彼此重叠。版权所有（C）2011，JPO＆INPIT

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