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91. 发明授权

US09110383B2 Projection exposure method and projection exposure system therefor 有权
标题翻译：投影曝光方法和投影曝光系统
公开(公告)号：US09110383B2
公开(公告)日：2015-08-18
申请号：US13299062
申请日：2011-11-17
申请人： Aksel Goehnermeier
发明人： Aksel Goehnermeier
IPC分类号： G03B27/54 , G03B27/72 , G03F7/20
CPC分类号： G03F7/70566 , G03F7/701 , G03F7/70141 , G03F7/70425 , G03F7/70433
摘要： The disclosure provides a projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask. The mask has a first pattern area with a first subpattern, and at least one second pattern area, arranged laterally offset from the first pattern area, with a second subpattern. The first subpattern is irradiated during a first illumination time interval with a first angular distribution, adapted to the first subpattern, of the illumination radiation. Thereafter, the second subpattern is irradiated during the second illumination time interval with a second angular distribution, adapted to the second subpattern, of the illumination radiation, said second angular distribution differing from the first angular distribution.
摘要翻译：本公开提供了一种投影曝光方法，用于用掩模图案的至少一个图像曝光辐射敏感基板。掩模具有带有第一子图案的第一图案区域和与第一图案区域横向错开布置的至少一个第二图案区域，具有第二子图案。在第一照明时间间隔内照射第一子图案，其具有适于第一子图案的照明辐射的第一角度分布。此后，第二子图案在第二照明时间间隔期间以适合于第二子图案的照明辐射的第二角度分布被照射，所述第二角度分布与第一角度分布不同。

92. 发明授权

US09104111B2 Solution to optical constraint on microtruss processing 有权
标题翻译：微桁架加工光学约束的解决方案
公开(公告)号：US09104111B2
公开(公告)日：2015-08-11
申请号：US13669791
申请日：2012-11-06
申请人： GM GLOBAL TECHNOLOGY OPERATIONS, INC.
发明人： Jeffrey A. Rock
IPC分类号： G03B27/54 , G03F1/50 , G03F7/20 , G02B6/12
CPC分类号： G03F1/50 , G02B2006/1219 , G03F7/201 , G03F7/2041
摘要： A system for fabricating a radiation-cured structure is provided. The system includes a radiation-sensitive material having a first refractive index; a mask formed from a mask material having a second refractive index; and a radiation source. The mask is disposed between the radiation source and the radiation-sensitive material, and has a plurality of substantially radiation transparent apertures. The radiation source is configured to generate radiation beams for at least one of initiating, polymerizing, and crosslinking the radiation-sensitive material. The system includes at least one of a) an at least one normalizing surface disposed between the radiation source and the mask, b) a refractive fluid having a third refractive index disposed between the radiation source and the mask, and c) the refractive fluid having the third refractive index disposed between the mask and the radiation-sensitive material. A method for fabricating the radiation-cured structure is also provided.
摘要翻译：提供了一种用于制造辐射固化结构的系统。该系统包括具有第一折射率的辐射敏感材料; 由具有第二折射率的掩模材料形成的掩模; 和辐射源。掩模设置在辐射源和辐射敏感材料之间，并且具有多个基本上辐射的透明孔。辐射源被配置为产生用于使辐射敏感材料起始，聚合和交联中的至少一个的辐射束。所述系统包括以下至少一个：a）设置在所述辐射源和所述掩模之间的至少一个归一化表面，b）具有设置在所述辐射源和所述掩模之间的具有第三折射率的折射流体，以及c）所述折射流体具有设置在掩模和辐射敏感材料之间的第三折射率。还提供了一种制造辐射固化结构的方法。

93. 发明授权

US09097983B2 Scanned-spot-array EUV lithography system 有权
标题翻译：扫描点阵EUV光刻系统
公开(公告)号：US09097983B2
公开(公告)日：2015-08-04
申请号：US13801919
申请日：2013-03-13
申请人： Kenneth C. Johnson
发明人： Kenneth C. Johnson
IPC分类号： G03B27/54 , G03B27/42 , G03F7/20
CPC分类号： G03F7/702 , G03F7/70208
摘要： In an EUV scanned-spot-array lithography system, a modulated array of radiation beams diverging from object spots on an object surface and is projected onto a printing surface via a two-mirror projection system similar to a flat-image, Schwarzschild system. Each beam converges to a diffraction-limited image point on the surface, and the surface is scanned in synchronization with the beam modulation to print a synthesized, high-resolution raster image. The spot-generation optics can be configured to compensate for object field curvature, distortion, and geometric point-imaging aberrations in the projection system, enabling diffraction-limited printing without coherent proximity effects over the full image field. The spot-generation optics can use either micromirrors or transmitting microlenses, and can be diffractive (e.g., phase-Fresnel lenses) or non-diffractive. Chromatic dispersion in either refractive or diffractive elements can be substantially eliminated by configuring the micro-optics as Schupmann achromatic doublets.
摘要翻译：在EUV扫描点阵阵列光刻系统中，辐射束的调制阵列从物体表面上的物体点发散，并通过类似于平面图像Schwarzschild系统的双镜像投影系统投影到打印表面上。每个光束会聚到表面上的衍射受限图像点，并且与光束调制同步扫描表面以打印合成的高分辨率光栅图像。斑点发生光学器件可以被配置为补偿投影系统中的物场曲率，失真和几何点成像像差，使得能够在全图像场上没有相干邻近效应的衍射极限打印。斑点发生光学器件可以使用微镜或透射微透镜，并且可以是衍射的（例如，相位菲涅尔透镜）或非衍射。折射或衍射元件中的色散可以基本上通过将微光学器件配置为舒普曼消色差双峰来消除。

94. 发明授权

US09086561B2 Optical arrangement in a projection objective of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的投影物镜中的光学布置
公开(公告)号：US09086561B2
公开(公告)日：2015-07-21
申请号：US13235651
申请日：2011-09-19
申请人： Hans-Juergen Rostalski , Tilman Schwertner , Alexander Epple
发明人： Hans-Juergen Rostalski , Tilman Schwertner , Alexander Epple
IPC分类号： G03B27/68 , G03B27/52 , G03B27/60 , G03B27/70 , G02B17/06 , G02B7/182 , G03F7/20 , G03B27/54
CPC分类号： G02B17/0663 , G02B7/182 , G02B17/061 , G03F7/70233
摘要： The disclosure relates to an optical arrangement in a projection objective of a microlithographic projection exposure apparatus which is designed for operation in EUV. The optical arrangement includes first and second mirrors that are in direct succession to each other along the projection beam direction. The second mirror is rigidly connected to the first mirror.
摘要翻译：本公开涉及一种设计用于在EUV中操作的微光刻投影曝光装置的投影物镜中的光学装置。光学装置包括沿着投影光束方向彼此直接相继的第一和第二反射镜。第二个镜子刚性连接到第一个镜子。

95. 发明授权

US09069264B2 Metrology method and apparatus, and device manufacturing method 有权
标题翻译：计量方法和装置以及装置制造方法
公开(公告)号：US09069264B2
公开(公告)日：2015-06-30
申请号：US13542319
申请日：2012-07-05
申请人： Patrick Warnaar , Mark Van Schijndel , Michael Kubis
发明人： Patrick Warnaar , Mark Van Schijndel , Michael Kubis
IPC分类号： G06K9/46 , G03F1/44 , G03F7/20 , G03B27/54
CPC分类号： G03F7/70633 , G03F1/44 , G03F7/70683
摘要： A target structure including a periodic structure is formed on a substrate. An image of the target structure is detected while illuminating the target structure with a beam of radiation, the image being formed using a first part of non-zero order diffracted radiation while excluding zero order diffracted radiation. Intensity values extracted from a region of interest within the image are used to determine a property of the periodic structure. A processing unit recognizes locations of a plurality of boundary features in the image of the target structure to identify regions of interest. The number of boundary features in each direction is at least twice a number of boundaries of periodic structures within the target structure. The accuracy of locating the region is greater than by recognizing only the boundaries of the periodic structure(s).
摘要翻译：包括周期性结构的靶结构形成在基板上。在用辐射束照射目标结构的同时检测目标结构的图像，该图像使用非零次衍射辐射的第一部分形成，同时排除零级衍射辐射。使用从图像内的感兴趣区域提取的强度值来确定周期性结构的性质。处理单元识别目标结构的图像中的多个边界特征的位置以识别感兴趣的区域。每个方向上边界特征的数量至少是目标结构内周期性结构边界数量的两倍。定位区域的精度大于仅识别周期性结构的边界。

96. 发明授权

US09063432B2 Illumination optical apparatus, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US09063432B2
公开(公告)日：2015-06-23
申请号：US12250519
申请日：2008-10-13
申请人： Hiroyuki Hirota
发明人： Hiroyuki Hirota
IPC分类号： G03B27/54 , G03B27/72 , G03F7/20
摘要： An illumination optical apparatus guides exposure light emitted from an exposure light source, to an illumination target object. The illumination optical apparatus has a plurality of spatial light modulation members arranged in an array form, and each spatial light modulation member is so configured that a plurality of reflecting optical elements each including a movable reflecting surface are arranged in an array form. At least one of the spatial light modulation members is arranged in an optical path of the light emitted from the light source.

97. 发明授权

US09063277B2 Mirror, method of manufacturing the same, exposure apparatus, and device manufacturing method 有权
标题翻译：镜子，制造方法，曝光装置和装置制造方法
公开(公告)号：US09063277B2
公开(公告)日：2015-06-23
申请号：US13332582
申请日：2011-12-21
申请人： Fumitaro Masaki , Akira Miyake
发明人： Fumitaro Masaki , Akira Miyake
IPC分类号： B05D5/06 , F21V9/04 , G03B27/32 , G03B27/54 , G02B5/08 , G03F7/20 , G21K1/06 , B82Y10/00
CPC分类号： G02B5/0816 , B82Y10/00 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70958 , G21K1/062 , G21K2201/064 , G21K2201/067
摘要： A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier layer which is arranged between the first layer and the second layer, and prevents a diffusion of a material of the first layer and a material of the second layer, and a third step of bringing a shape of the reflection layer close to a target shape by changing a layer thickness profile of the shape adjusting layer after the second step, the third step including a process of partially annealing the shape adjusting layer.
摘要翻译：一种制造反射镜的方法包括：在基板上布置具有由热变化的层厚度的形状调整层的第一步骤，在形状调整层上布置包括第一层的反射层的第二步骤，第二层和布置在第一层和第二层之间的阻挡层，并且防止第一层的材料和第二层的材料的扩散，以及使反射形状的第三步骤通过在第二步骤之后改变形状调整层的层厚度轮廓，接近目标形状的层，第三步骤包括部分退火形状调节层的过程。

98. 发明授权

US09057877B2 Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method 有权
标题翻译：光学单元，照明光学设备，曝光设备和设备制造方法
公开(公告)号：US09057877B2
公开(公告)日：2015-06-16
申请号：US13449115
申请日：2012-04-17
申请人： Osamu Tanitsu
发明人： Osamu Tanitsu
IPC分类号： G03B27/54 , G03B27/72 , G02B27/09 , G03F7/20 , G02B27/28
CPC分类号： G02B27/0927 , F21V9/14 , F21V13/02 , F21V14/003 , G02B27/0938 , G02B27/1086 , G02B27/126 , G02B27/286 , G03F7/70058 , G03F7/70116 , G03F7/70566
摘要： An illumination optical apparatus has an optical unit. The optical unit has a light splitter to split an incident beam into two beams; a first spatial light modulator which can be arranged in an optical path of a first beam; a second spatial light modulator which can be arranged in an optical path of a second beam; and a light combiner which combines a beam having passed via the first spatial light modulator, with a beam having passed via the second spatial light modulator; each of the first spatial light modulator and the second spatial light modulator has a plurality of optical elements arranged two-dimensionally and controlled individually.
摘要翻译：照明光学装置具有光学单元。光学单元具有分光器，将入射光束分成两束; 可以布置在第一光束的光路中的第一空间光调制器; 可以布置在第二光束的光路中的第二空间光调制器; 以及将通过第一空间光调制器通过的光束与经过第二空间光调制器的光束组合的光合并器; 第一空间光调制器和第二空间光调制器中的每一个具有二维排列并分别控制的多个光学元件。

99. 发明授权

US09052608B2 Method and device for imaging a radiation-sensitive substrate 有权
标题翻译：用于对辐射敏感衬底成像的方法和装置
公开(公告)号：US09052608B2
公开(公告)日：2015-06-09
申请号：US13130245
申请日：2009-10-23
申请人： Roelof Wijnaendts Van Resandt , Roland Kaplan
发明人： Roelof Wijnaendts Van Resandt , Roland Kaplan
IPC分类号： G03B27/44 , G03B27/68 , G03B27/72 , G03B27/32 , G03F7/20 , G03B27/54 , G03B27/52
CPC分类号： G03F7/70291 , G03F7/70283 , G03F7/70308 , G03F7/70358 , G03F7/70466
摘要： A method and apparatus for imaging a radiation-sensitive substrate, wherein a programmable template is projected onto the radiation-sensitive substrate using coherent radiation having a wavelength at which the substrate is radiation sensitive. An overall image of the programmable template having an image grid is displaced simultaneously by an acoustic-optical or electro-optical deflection unit such that multiple projections impinge on the substrate at different positions such that a fine partial grid is created in the image grid on the substrate.
摘要翻译：一种用于对辐射敏感衬底成像的方法和装置，其中使用具有衬底辐射敏感的波长的相干辐射将可编程模板投影到辐射敏感衬底上。具有图像格栅的可编程模板的整体图像由声光学或电光偏转单元同时移位，使得多个突起在不同位置处撞击基板，使得在图像网格上产生精细的部分网格基质。

100. 发明授权

US09046786B2 Illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的照明系统
公开(公告)号：US09046786B2
公开(公告)日：2015-06-02
申请号：US13604296
申请日：2012-09-05
申请人： Michael Patra , Stig Bieling , Markus Deguenther , Frank Schlesener , Markus Schwab
发明人： Michael Patra , Stig Bieling , Markus Deguenther , Frank Schlesener , Markus Schwab
IPC分类号： G03B27/72 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70158 , G03F7/70058
摘要： An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.
摘要翻译：微光刻投影曝光装置的照明系统包括产生投射光束的光源和在光源和照明系统的光瞳面之间的第一和第二衍射光学元件。由每个衍射光学元件产生的衍射效应取决于由投射光照射的衍射光学元件的光场的位置。位移机构改变衍射光学元件的相互空间排列。在借助位移机构可以获得的相互空间布置中的至少一个中，光场在第一和第二衍射光学元件的两端延伸。这使得可以以简单的方式生产连续可变的照明设置。

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