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1. 发明申请

US20180059551A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
公开(公告)号：US20180059551A1
公开(公告)日：2018-03-01
申请号：US15803304
申请日：2017-11-03
申请人： Carl Zeiss SMT GmbH
发明人： Markus Deguenther
IPC分类号： G03F7/20
CPC分类号： G03F7/70075 , G03F7/70116 , G03F7/70191 , G03F7/702 , G03F7/70208
摘要： An illumination system of a microlithographic projection exposure apparatus includes first and second optical raster plates. An irradiance distribution of projection light on the first and second optical raster plates determines an angular light distribution of the projection light exclusively at a first portion and a second portion, respectively, of an illuminated field. The second portion is distinct from and arranged adjacent to the first portion. It is possible to produce different illumination settings in different adjacent portions on the mask. First and second Fourier optics establish a Fourier relationship between the first and second optical raster plates one the one hand and the first and second portion on the other hand. The first and second Fourier optics have a first and second focal length, respectively, that are variable in response to a focal length change command signal from a control unit.

2. 发明授权

US09891537B2 Maskless lithographic apparatus measuring accumulated amount of light 有权
公开(公告)号：US09891537B2
公开(公告)日：2018-02-13
申请号：US15348173
申请日：2016-11-10
申请人： Samsung Electronics Co., Ltd.
发明人： Ji Young Chu , Shiva Ram Krishna , Tae Hyun Kim , Song Woo Bae , Sang Don Jang , Won Don Joo
IPC分类号： G03F7/20
CPC分类号： G03F7/70391 , G03F7/7005 , G03F7/70133 , G03F7/70208 , G03F7/70275 , G03F7/70291 , G03F7/70383 , G03F7/704 , G03F7/70425 , G03F7/70558 , G03F7/7085
摘要： Maskless lithographic apparatus measuring accumulated amount of light is provided. The maskless lithographic apparatus includes a light source which emits light, a stage on which a substrate is disposed, an optical system which converts the light into a beam spot array including a plurality of columns and a plurality of rows and irradiates the beam spot array onto the stage, a slit to which the beam spot array is irradiated and which passes an nth (n is a natural number) row of the beam spot array, an optical sensor which senses the nth row of the beam spot array which has passed through the slit, and a measuring unit which measures an accumulated amount of light in the nth row of the beam spot array sensed by the optical sensor.

3. 发明授权

US09810994B2 Systems and methods for high-throughput and small-footprint scanning exposure for lithography 有权
公开(公告)号：US09810994B2
公开(公告)日：2017-11-07
申请号：US15370174
申请日：2016-12-06
申请人： Taiwan Semiconductor Manufacturing Company, Ltd.
发明人： Burn Jeng Lin , Shy-Jay Lin , Jaw-Jung Shin , Wen-Chuan Wang
IPC分类号： G03B27/32 , G03B27/44 , G03B27/54 , H02K41/02 , G03F7/20 , H01L21/68
CPC分类号： G03F7/70275 , G03F7/70008 , G03F7/7015 , G03F7/70208 , G03F7/70358 , G03F7/70716 , G03F7/70725 , H01L21/682
摘要： The present disclosure provides a lithography system comprising a radiation source and an exposure tool including a plurality of exposure columns densely packed in a first direction. Each exposure column includes an exposure area configured to pass the radiation source. The system also includes a wafer carrier configured to secure and move one or more wafers along a second direction that is perpendicular to the first direction, so that the one or more wafers are exposed by the exposure tool to form patterns along the second direction. The one or more wafers are covered with resist layer and aligned in the second direction on the wafer carrier.

4. 发明申请

US20170261862A1 MASKLESS LITHOGRAPHIC APPARATUS MEASURING ACCUMULATED AMOUNT OF LIGHT 有权
公开(公告)号：US20170261862A1
公开(公告)日：2017-09-14
申请号：US15348173
申请日：2016-11-10
申请人： Samsung Electronics Co., Ltd.
发明人： Ji Young CHU , Shiva Ram Krishna , Tae Hyun Kim , Song Woo Bae , Sang Don Jang , Won Don Joo
IPC分类号： G03F7/20
CPC分类号： G03F7/70391 , G03F7/7005 , G03F7/70133 , G03F7/70208 , G03F7/70275 , G03F7/70291 , G03F7/70383 , G03F7/704 , G03F7/70425 , G03F7/70558 , G03F7/7085
摘要： Maskless lithographic apparatus measuring accumulated amount of light is provided. The maskless lithographic apparatus includes a light source which emits light, a stage on which a substrate is disposed, an optical system which converts the light into a beam spot array including a plurality of columns and a plurality of rows and irradiates the beam spot array onto the stage, a slit to which the beam spot array is irradiated and which passes an nth (n is a natural number) row of the beam spot array, an optical sensor which senses the nth row of the beam spot array which has passed through the slit, and a measuring unit which measures an accumulated amount of light in the nth row of the beam spot array sensed by the optical sensor

5. 发明申请

US20170082929A1 ILLUMINATION APPARATUS FOR A PROJECTION EXPOSURE SYSTEM 审中-公开
公开(公告)号：US20170082929A1
公开(公告)日：2017-03-23
申请号：US15368942
申请日：2016-12-05
申请人： Carl Zeiss SMT GmbH
发明人： Michael Patra , Markus Deguenther
IPC分类号： G03F7/20
CPC分类号： G03F7/70133 , G03F7/70191 , G03F7/70208 , G03F7/70558 , G03F7/70991 , H01S3/0903
摘要： For controlling an intensity distribution of an illumination radiation impinging on an object field, an illumination apparatus for a projection exposure apparatus for microlithography includes a mechanism for spatially displacing an illumination beam relative to a first facet mirror of an illumination optical unit.

6. 发明申请

US20160209755A1 Method and Apparatuses for Optical Pupil Symmetrization 有权
标题翻译：光学瞳孔对称的方法和装置
公开(公告)号：US20160209755A1
公开(公告)日：2016-07-21
申请号：US14970247
申请日：2015-12-15
申请人： ASML Holding N.V.
发明人： Yevgeniy Konstantinovich SHMAREV , Stanislav SMIRNOV
IPC分类号： G03F7/20 , G02B27/10 , G02B5/04 , G01N21/47
CPC分类号： G03F7/70133 , G01N21/4738 , G01N2201/061 , G01N2201/06113 , G01N2201/068 , G02B5/04 , G02B27/106 , G03F7/70091 , G03F7/70191 , G03F7/70208
摘要： An inspection apparatus may determine precise OV measurements of a target on a substrate using an optical pupil symmetrizer to reduce the inspection apparatus's sensitivity to asymmetry and non-uniformity of the illumination beam in the pupil plane. The inspection apparatus includes an illumination system that forms a symmetrical illumination pupil by (1) splitting an illumination beam into sub-beams, (2) directing the sub-beams along different optical branches, (3) inverting or rotating at least one of the sub-beams in two dimensions, and recombining the sub-beams along the illumination path to symmetrize the intensity distribution. The illumination system is further configured such that the first and second sub-beams have an optical path difference that is greater than a temporal coherence length of the at least one light source and less than a depth of focus in the pupil plane of the objective optical system.
摘要翻译：检查装置可以使用光瞳对称器来确定基板上的目标物的精确的OV测量，以减小检查装置对瞳孔平面中的照明束的不对称性和不均匀性的敏感度。检查装置包括：（1）将照明光束分成子光束形成对称的照明光瞳的照明系统，（2）沿着不同的光分支引导子光束，（3）反转或旋转至少一个子光束在二维中，并且沿着照明路径重新组合子光束以使强度分布对称化。该照明系统被进一步配置成使得第一和第二子光束的光程差大于至少一个光源的时间相干长度，并且小于物镜光瞳面中的焦深系统。

7. 发明授权

US09341950B2 Method of forming patterned layer, method of forming patterned photoresist layer, and active device array substrate 有权
标题翻译：形成图案层的方法，形成图案化光致抗蚀剂层的方法和有源器件阵列衬底
公开(公告)号：US09341950B2
公开(公告)日：2016-05-17
申请号：US14722166
申请日：2015-05-27
申请人： Au Optronics Corporation
发明人： Hsiang-Chih Hsiao , Ta-Wen Liao , Tzu-Min Yang , Shan-Fang Chen , Ya-Ping Chang , Chi-Hung Yang , Chung-Yuan Liao
IPC分类号： G02F1/1343 , G03F7/20 , G03B27/58 , G03F1/00 , G02F1/1335
CPC分类号： G03F7/20 , G02F1/133526 , G02F1/134309 , G03B27/58 , G03F1/14 , G03F7/70208 , Y10T428/24802
摘要： An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.
摘要翻译：提供了一种曝光装置，其适用于在层上曝光光致抗蚀剂层以形成多个带状曝光图案。曝光装置包括光源，透镜组和掩模。透镜组设置在光致抗蚀剂层和光源之间，并且包括彼此平行的多个条状透镜，其中任何两个相邻带状透镜之间的重叠区域被定义为透镜连接区域，而除透镜之外的其它区域连接区域被定义为透镜区域。掩模设置在光致抗蚀剂层和透镜组之间，并且包括多个屏蔽图案，其中屏蔽图案的轮廓对应于带状暴露图案，每个屏蔽图案具有带状开口和条形开口的延伸方向基本上平行于屏蔽图案的延伸方向。

8. 发明申请

US20160091795A1 SYSTEMS AND METHODS FOR HIGH-THROUGHPUT AND SMALL-FOOTPRINT SCANNING EXPOSURE FOR LITHOGRAPHY 有权
公开(公告)号：US20160091795A1
公开(公告)日：2016-03-31
申请号：US14962266
申请日：2015-12-08
申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
发明人： Burn Jeng Lin , Shy-Jay Lin , Jaw-Jung Shin , Wen-Chuan Wang
IPC分类号： G03F7/20
CPC分类号： G03F7/70275 , G03F7/70008 , G03F7/7015 , G03F7/70208 , G03F7/70358 , G03F7/70716 , G03F7/70725 , H01L21/682
摘要： The present disclosure provides a lithography system comprising a radiation source and an exposure tool including a plurality of exposure columns densely packed in a first direction. Each exposure column includes an exposure area configured to pass the radiation source. The system also includes a wafer carrier configured to secure and move one or more wafers along a second direction that is perpendicular to the first direction, so that the one or more wafers are exposed by the exposure tool to form patterns along the second direction. The one or more wafers are covered with resist layer and aligned in the second direction on the wafer carrier.

9. 发明授权

US09280054B2 Illumination optical system, exposure apparatus, and method of manufacturing device 有权
标题翻译：照明光学系统，曝光装置和制造装置的方法
公开(公告)号：US09280054B2
公开(公告)日：2016-03-08
申请号：US13371637
申请日：2012-02-13
申请人： Noboru Osaka
发明人： Noboru Osaka
IPC分类号： G03B27/54 , G03F7/20
CPC分类号： G03F7/7005 , G03F7/70075 , G03F7/70208
摘要： An illumination optical system comprises plural rod integrators, a combining optical system and a light transmission unit. The rod integrators uniformize light intensity distributions of the light beams. The combining optical system combines the light beams emitted from the rod integrators, so that the light beams are adjacent to each other in cross-sections thereof. The light transmission unit has an entrance plane and an exit plane, divides the light beam combined by the combining optical system into plural light beams on the entrance plane, joins the divided light beams so that a cross-sectional shape of a joined pattern of the light beams on the exit plane is different from a cross-sectional shape of a joined pattern of the light beams on the entrance plane, and transfers each of the light beams from the entrance plane to the exit plane using plural optically coupled light pipes.
摘要翻译：照明光学系统包括多个杆状积分器，组合光学系统和光传输单元。杆状积分器使光束的光强分布均匀化。组合光学系统组合从杆状积分器发射的光束，使得光束的横截面彼此相邻。光传输单元具有入射面和出射面，将由组合光学系统组合的光束分成入射面上的多个光束，将分割的光束接合，使得接合图案的横截面形状出射面上的光束与入射面上的光束的接合图案的截面形状不同，并且使用多个光耦合光管将每个光束从入射面传送到出射面。

10. 发明授权

US09195069B2 Illumination optical apparatus, exposure apparatus, and device manufacturing method 有权
标题翻译：照明光学装置，曝光装置和装置的制造方法
公开(公告)号：US09195069B2
公开(公告)日：2015-11-24
申请号：US11783561
申请日：2007-04-10
申请人： Hirohisa Tanaka , Hideki Komatsuda
发明人： Hirohisa Tanaka , Hideki Komatsuda
IPC分类号： G03B27/54 , G03B27/44 , G03B27/72 , G03B27/32 , G02B27/09 , G03F7/20 , G03B27/68 , G03B27/42 , G03B27/52
CPC分类号： G02B27/0905 , G02B27/0961 , G02B27/0972 , G03F7/70108 , G03F7/70208 , G03F7/70275 , G03F7/70283
摘要： An illumination optical apparatus has a beam splitting member which splits an incident beam into a first light beam and a second light beam to form a first illumination region and a second illumination region, a first light-guide optical system which guides the first light beam to the first illumination region, and a second light-guide optical system which guides the second light beam to the second illumination region locate apart from the first illumination region.
摘要翻译：照明光学装置具有：分束构件，其将入射光束分成第一光束和第二光束，以形成第一照明区域和第二照明区域;第一导光光学系统，其将第一光束引导到第一照明区域和将第二光束引导到第二照明区域的第二导光光学系统与第一照明区域分离。

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