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91. 发明授权

US08632940B2 Aluminum substrates and lithographic printing plate precursors 失效
标题翻译：铝基板和平版印刷版前体
公开(公告)号：US08632940B2
公开(公告)日：2014-01-21
申请号：US13089399
申请日：2011-04-19
申请人： Gerhard Hauck , Celin Savariar-Hauck , Oliver R. Blum , Michael Nielinger
发明人： Gerhard Hauck , Celin Savariar-Hauck , Oliver R. Blum , Michael Nielinger
IPC分类号： B41N1/00 , G03F7/00 , G03F7/26 , G03C1/00 , G03C1/77
CPC分类号： B41N3/036 , B41C1/1008 , B41C2201/02 , B41C2201/14 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/10 , B41C2210/12 , B41C2210/14 , B41C2210/24 , B41C2210/262
摘要： Electrochemically grained and anodized aluminum supports are treated with a post-treatment coating solution containing a polymer derived at least in part from vinyl phosphonic acid and phosphoric acid. This post-treated support is useful as substrates in the preparation of lithographic printing plate precursors. The post-treatment substrate treatment enables wide latitude in manufacturing and compatibility with silicate-free developers to achieve negligible background staining and oxide attack.
摘要翻译：用含有至少部分由乙烯基膦酸和磷酸衍生的聚合物的后处理涂层溶液处理电化学和阳极氧化的铝载体。该后处理支持物可用作制备平版印刷版前体的底物。后处理底物处理使得制造中的宽范围和与无硅酸盐的显影剂的相容性可以实现可忽略的背景染色和氧化物侵蚀。

92. 发明授权

US08617801B2 Film with blue dye 有权
标题翻译：电影与蓝色染料
公开(公告)号：US08617801B2
公开(公告)日：2013-12-31
申请号：US12897232
申请日：2010-10-04
申请人： Robert E. Dickerson
发明人： Robert E. Dickerson
IPC分类号： G03C1/06 , G03C1/08 , G03C1/815 , G03C1/825 , G03C1/76
CPC分类号： G03C1/83 , G03C1/0051 , G03C1/035 , G03C1/46 , G03C1/7954 , G03C5/16 , G03C2001/0055 , G03C2001/03541 , G03C2001/03564 , G03C2001/7425 , G03C2005/168
摘要： A radiographic X-ray film comprising a polymer support. One or more silver halide emulsion layers are coated on each side of the support. A blue dye is contained within at least one of the polymer support or in an adjacent hydrophilic layer in a sufficient amount to result in a CIELAB measurement of L* less than or equal to 80 and b* less than or equal to −25. This configuration provides, after imaging and development, radiographic images having desirable visual contrast, image tone, b*, and image quality.
摘要翻译：一种包含聚合物载体的放射X射线胶片。一个或多个卤化银乳剂层涂覆在载体的每一侧上。蓝色染料以足够的量包含在至少一种聚合物载体内或相邻的亲水层中，导致L *小于或等于80且b *小于或等于-25的CIELAB测量。该配置在成像和显影之后提供具有期望的视觉对比度，图像色调，b *和图像质量的放射照相图像。

93. 发明授权

US08597549B2 Two-photon or higher-order absorbing optical materials for generation of reactive species 有权
公开(公告)号：US08597549B2
公开(公告)日：2013-12-03
申请号：US11768898
申请日：2007-06-26
申请人： Brian Cumpston , Matthew Lipson , Seth R. Marder , Joseph W. Perry
发明人： Brian Cumpston , Matthew Lipson , Seth R. Marder , Joseph W. Perry
IPC分类号： F21V9/00 , G02B5/02 , G02C7/10 , G02F1/361 , G03B11/00 , G03C1/00 , G03G5/00
CPC分类号： F21V9/00 , B33Y70/00 , B82Y10/00 , C07C215/70 , C07C217/76 , C07C219/32 , C07C225/22 , C07C2603/18 , G11B7/245 , G11B7/247 , G11B7/25
摘要： Disclosed are highly efficient multiphoton absorbing compounds and methods of their use. The compounds generally include a bridge of pi-conjugated bonds connecting electron donating groups or electron accepting groups. The bridge may be substituted with a variety of substituents as well. Solubility, lipophilicity, absorption maxima and other characteristics of the compounds may be tailored by changing the electron donating groups or electron accepting groups, the substituents attached to or the length of the pi-conjugated bridge. Numerous photophysical and photochemical methods are enabled by converting these compounds to electronically excited states upon simultaneous absorption of at least two photons of radiation. The compounds have large two-photon or higher-order absorptivities such that upon absorption, one or more Lewis acidic species, Lewis basic species, radical species or ionic species are formed.

94. 发明授权

US08568963B2 Method of manufacturing mask for depositing thin film 失效
标题翻译：制造薄膜掩模的方法
公开(公告)号：US08568963B2
公开(公告)日：2013-10-29
申请号：US13015465
申请日：2011-01-27
申请人： Sang-Shin Lee , Jung-Woo Ko
发明人： Sang-Shin Lee , Jung-Woo Ko
IPC分类号： G03C5/04
CPC分类号： B26F3/16 , B23K26/38 , C23C14/042 , C23C14/12 , G03F7/12 , Y10T83/04
摘要： A method of manufacturing a mask for depositing a thin film is disclosed. In one embodiment, the method includes i) providing a raw material substrate for a deposition mask; ii) removing a portion of the raw material substrate to form a pattern, wherein a plurality of openings are defined in the pattern; and iii) irradiating at least a laser beam onto the openings of the pattern at an inclination angle with respect to the raw material substrate such that inclined portions are formed at the side surfaces of each of the openings of the pattern.
摘要翻译：公开了一种制造用于沉积薄膜的掩模的方法。在一个实施例中，该方法包括：i）提供用于沉积掩模的原材料基板; ii）去除原料基板的一部分以形成图案，其中以图案限定多个开口; 以及iii）至少将激光束以相对于所述原材料基板倾斜的角度照射到所述图案的所述开口上，使得在所述图案的每个所述开口的侧表面处形成倾斜部分。

95. 发明授权

US08563224B1 Data process for E-beam lithography 有权
标题翻译：电子束光刻数据处理
公开(公告)号：US08563224B1
公开(公告)日：2013-10-22
申请号：US13487850
申请日：2012-06-04
申请人： Cheng-Hung Chen , Pei-Shiang Chen , Shih-Chi Wang , Jeng-Horng Chen
发明人： Cheng-Hung Chen , Pei-Shiang Chen , Shih-Chi Wang , Jeng-Horng Chen
IPC分类号： G03C5/00 , G03F1/20
CPC分类号： G06F17/50 , G03C5/00 , G03F1/20 , H01J2237/31762 , H01J2237/31764 , H01J2237/31769 , Y10S430/143
摘要： The present disclosure provides a dithering method of increasing wafer throughput by an electron beam lithography system. The dithering method generates an edge map from a vertex map. The vertex map is generated from an integrated circuit design layout (such as an original pattern bitmap). A gray map (also referred to as a pattern gray map) is also generated from the integrated circuit design layout. By combining the edge map with the gray map, a modified integrated circuit design layout (modified pattern bitmap) is generated for use by the electron beam lithography system.
摘要翻译：本公开提供了通过电子束光刻系统增加晶片生产量的抖动方法。抖动方法从顶点图生成边缘图。顶点图是从集成电路设计布局（如原始图案位图）生成的。也从集成电路设计布局生成灰色地图（也称为图案灰度图）。通过将边缘图与灰度图组合，生成修改后的集成电路设计布局（修改图案位图），供电子束光刻系统使用。

96. 发明授权

US08563202B2 Single field zero mask for increased alignment accuracy in field stitching 有权
标题翻译：单场零掩模，用于提高场拼接中的对准精度
公开(公告)号：US08563202B2
公开(公告)日：2013-10-22
申请号：US13864895
申请日：2013-04-17
申请人： Micrel, Inc.
发明人： Arthur Lam
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F7/2022 , G03F1/42 , G03F1/50 , G03F7/70475 , G03F9/708
摘要： A method for stitching a first field mask to a second field mask on a wafer includes providing a photomask with a first set of targets and a second set of targets, printing images of the first set of targets and the second set of targets onto the wafer where the photomask is applied to the wafer having no previous alignment marks formed thereon for the photomask to align to. A first set of alignment marks is formed from the first set of targets and a second set of alignment marks is formed from the second set of targets. The method includes aligning a first field mask to the first set of alignment marks and aligning a second field mask to the second set of alignment marks. The images of the first field mask and the second field mask are thereby stitched together on the wafer.
摘要翻译：用于将第一场掩模拼接到晶片上的第二场掩模的方法包括：提供具有第一组靶和第二组靶的光掩模，将第一组靶和第二组靶的图像打印到晶片上其中将光掩模应用于其上没有形成其上的先前对准标记的晶片，以使光掩模对准。从第一组目标形成第一组对准标记，并且从第二组目标形成第二组对准标记。该方法包括将第一场掩模与第一组对准标记对准，并将第二场掩模与第二组对准标记对准。因此，第一场掩模和第二场掩模的图像在晶片上被缝合在一起。

97. 发明授权

US08557510B2 Colour forming composition 有权
标题翻译：成色组合物
公开(公告)号：US08557510B2
公开(公告)日：2013-10-15
申请号：US13060598
申请日：2009-08-26
申请人： Martin Walker , Anthony Jarvis
发明人： Martin Walker , Anthony Jarvis
IPC分类号： G03C1/00
CPC分类号： B41M5/3333 , B41M5/28 , B41M5/284 , B41M5/285 , C09D11/50 , G03C1/73 , G03C1/732 , G03C2200/39
摘要： A composition comprising i) a color forming component which is susceptible to changing color when irradiated; ii) an amine neutralised alkylaromatic sulphonic acid; and iii) a binder. Methods of marking a substrate comprising incorporating within or applying to a substrate the composition of this invention, and substrates coated with the composition, are also provided.
摘要翻译：一种组合物，其包含i）当照射时易于变色的成色组分; ii）胺中和的烷基芳族磺酸; 和iii）粘合剂。还提供了标记衬底的方法，其包括在衬底内施加或施加到衬底上，本发明的组合物和涂覆有组合物的衬底。

98. 发明授权

US08553198B2 Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure 有权
标题翻译：掩模图案校正装置，掩模图案的校正方法，曝光修正装置以及曝光校正方法
公开(公告)号：US08553198B2
公开(公告)日：2013-10-08
申请号：US13487388
申请日：2012-06-04
申请人： Teruyoshi Yao , Satoru Asai , Morimi Osawa , Hiromi Hoshino , Kouzou Ogino , Kazumasa Morishita
发明人： Teruyoshi Yao , Satoru Asai , Morimi Osawa , Hiromi Hoshino , Kouzou Ogino , Kazumasa Morishita
IPC分类号： G03B27/68 , G03F1/00 , G03C5/00
CPC分类号： G03F7/70941 , G03F7/70433 , G03F7/705
摘要： In view of realizing a lithographic process which makes it possible to estimate and correct flare with an extremely high accuracy, and causes only an extremely small dimensional variation in width, over the entire portion not only of a single shot region, but also of a single chip region, a mask pattern correction device of the present invention has a numerical aperture calculation unit calculating, for every single shot region, flare energy for a mask pattern corresponding to a transferred pattern, based on an exposure layout of a plurality of shot regions, or more specifically, while considering flare from a plurality of shot regions located around every single shot region.
摘要翻译：鉴于实现能够以极高的精度估计和校正火炬的平版印刷工艺，并且在整个部分上不仅在单一拍摄区域上，而且在单个区域的整个部分上仅产生非常小的尺寸变化芯片区域，本发明的掩模图案校正装置具有数值孔径计算单元，对于每个单个拍摄区域，基于多个拍摄区域的曝光布局来计算对应于被转印图案的掩模图案的闪光能量，或者更具体地，同时考虑来自位于每个单个拍摄区域周围的多个拍摄区域的闪光。

99. 发明授权

US08552405B2 Charged particle beam writing apparatus and charged particle beam writing method 有权
标题翻译：带电粒子束写入装置和带电粒子束写入方法
公开(公告)号：US08552405B2
公开(公告)日：2013-10-08
申请号：US13647665
申请日：2012-10-09
申请人： NuFlare Technology, Inc.
发明人： Yasuo Kato , Jun Yashima
IPC分类号： H01J3/14 , G21K5/10 , G03C5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/304 , H01J2237/31769
摘要： A charged particle beam writing apparatus includes a unit to calculate a gradient of a convolution amount that is calculated from a convolution operation between an area density and a distribution function, a unit to calculate a small influence radius phenomenon dose correction coefficient that corrects for dimension variation due to a phenomenon whose influence radius is on an order of microns or less, by using the convolution amount and the gradient, a unit to calculate a proximity effect dose correction coefficient that corrects for dimension variation due to a proximity effect, by using a first function depending on the small influence radius phenomenon dose correction coefficient, a unit to calculate a dose by using the proximity effect dose correction coefficient and the small influence radius phenomenon dose correction coefficient, and a unit to write a figure pattern concerned on a target object, based on the dose.
摘要翻译：带电粒子束写入装置包括：计算从区域密度和分布函数之间的卷积运算计算的卷积量的梯度的单位，计算校正尺寸变化的小影响半径现象剂量校正系数的单位由于通过使用卷积量和梯度，其影响半径在微米级以下的现象，通过使用第一方法来计算校正由于邻近效应引起的尺寸变化的邻近效应剂量校正系数的单位功能取决于小影响半径现象剂量校正系数，单位通过使用邻近效应剂量校正系数和小影响半径现象剂量校正系数计算剂量，并且单位在目标对象上写入图形模式，基于剂量。

100. 发明授权

US08546063B2 Organic solvent development or multiple development pattern-forming method using electron beams or EUV rays 有权
标题翻译：有机溶剂开发或使用电子束或EUV射线的多重显影图案形成方法
公开(公告)号：US08546063B2
公开(公告)日：2013-10-01
申请号：US13202389
申请日：2010-02-19
申请人： Hideaki Tsubaki , Koji Shirakawa , Toru Tsuchihashi
发明人： Hideaki Tsubaki , Koji Shirakawa , Toru Tsuchihashi
IPC分类号： G03C5/00
CPC分类号： G03F7/325 , G03F7/0392 , G03F7/0397 , G03F7/322
摘要： Provided is a pattern-forming method including, in the following order: (1) a process of forming a film with an actinic ray-sensitive or radiation-sensitive resin composition comprising a resin which contains an acid-decomposable repeating unit and is capable of decreasing the solubility in an organic solvent by the action of an acid; (2) a process of exposing the film with an electron beam or an EUV ray; and (4) a process of developing the film with a developer containing an organic solvent.
摘要翻译：提供了一种图案形成方法，其包括以下顺序：（1）用含有光敏性或辐射敏感性树脂组合物形成膜的方法，所述树脂组合物包含含有酸可分解重复单元的树脂，并且能够通过酸的作用降低有机溶剂中的溶解度; （2）用电子束或EUV射线曝光胶片的方法; 和（4）用含有机溶剂的显影剂显影该膜的方法。

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