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11. 发明授权

US08457463B2 Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device 有权
标题翻译：光束均化器，激光照射装置以及半导体装置的制造方法
公开(公告)号：US08457463B2
公开(公告)日：2013-06-04
申请号：US13116381
申请日：2011-05-26
申请人： Koichiro Tanaka , Tomoaki Moriwaka
发明人： Koichiro Tanaka , Tomoaki Moriwaka
IPC分类号： G02B6/10
CPC分类号： G02B27/0966 , G02B6/4204 , G02B27/0994 , H01S3/005
摘要： The present invention provides a beam homogenizer being able to form a rectangular beam spot having homogeneous energy distribution in a direction of its major axis without using the optical lens requiring to be manufactured with high accuracy. In addition, the present invention provides a laser irradiation apparatus being able to irradiate the laser beam having homogeneous energy distribution in a direction of its major axis. Furthermore, the present invention provides a method for manufacturing a semiconductor device being able to enhance crystallinity in the surface of the substrate and to manufacture TFT with a high operating characteristic.The beam homogenizer, one of the present invention, is to shape the beam spot on the surface to be irradiated into a rectangular spot having an aspect ratio of 10 or more, preferably 100 or more, and comprises an optical waveguide for homogenizing the energy distribution of the rectangular beam spot in the direction of its major axis.
摘要翻译：本发明提供一种光束均化器，其能够在不需要以高精度制造的光学透镜的情况下形成在其长轴方向上具有均匀能量分布的矩形束斑。此外，本发明提供一种激光照射装置，其能够照射具有在其长轴方向上具有均匀能量分布的激光束。此外，本发明提供了一种能够提高基板表面的结晶度并制造具有高工作特性的TFT的半导体器件的制造方法。本发明之一的光束均化器是将待照射的表面上的束斑成形为纵横比为10以上，优选为100以上的矩形斑点，并且包括用于使能量分布均匀化的光波导的矩形束斑在其长轴方向上。

12. 发明授权

US08409905B2 Method of forming display device that includes removing mask to form opening in insulating film 有权
标题翻译：一种形成显示装置的方法，包括去除掩模以在绝缘膜中形成开口
公开(公告)号：US08409905B2
公开(公告)日：2013-04-02
申请号：US13270271
申请日：2011-10-11
申请人： Koichiro Tanaka
发明人： Koichiro Tanaka
IPC分类号： H01L21/4763
CPC分类号： H01L27/1288 , H01L27/1214
摘要： To improve the use efficiency of materials and provide a technique of fabricating a display device by a simple process. The method includes the steps of providing a mask on a conductive layer, forming an insulating film over the conductive layer provided with the mask, removing the mask to form an insulating layer having an opening; and forming a conductive film in the opening so as to be in contact with the exposed conductive layer, whereby the conductive layer and the conductive film can be electrically connected through the insulating layer. The shape of the opening reflects the shape of the mask. A mask having a columnar shape (e.g., a prism, a cylinder, or a triangular prism), a needle shape, or the like can be used.
摘要翻译：提高材料的使用效率，提供通过简单的工艺制造显示装置的技术。该方法包括以下步骤：在导电层上提供掩模，在设置有掩模的导电层上形成绝缘膜，去除掩模以形成具有开口的绝缘层; 并且在所述开口中形成导电膜以与所述暴露的导电层接触，由此所述导电层和所述导电膜可以通过所述绝缘层电连接。开口的形状反映了掩模的形状。可以使用具有柱状形状的面罩（例如，棱镜，圆筒，或三角棱镜），针形等。

13. 发明授权

US08326102B2 Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device 有权
标题翻译：光束均化器，激光照射装置以及半导体装置的制造方法
公开(公告)号：US08326102B2
公开(公告)日：2012-12-04
申请号：US13069464
申请日：2011-03-23
申请人： Koichiro Tanaka , Hirotada Oishi
发明人： Koichiro Tanaka , Hirotada Oishi
IPC分类号： G02B6/12 , G02B6/26
CPC分类号： H01L21/02617 , G02B6/001 , G02B6/0048 , G02B6/0055 , G02B6/262 , G02B27/0927 , G02B27/095 , G02B27/0977 , G02B27/0994
摘要： The present invention is to provide a beam homogenizer, a laser irradiation apparatus, and a method for manufacturing a semiconductor device, which can suppress the loss of a laser beam and form a beam spot having homogeneous energy distribution constantly on an irradiation surface without being affected by beam parameters of a laser beam. A deflector is provided at an entrance of an optical waveguide or a light pipe used for homogenizing a laser beam emitted from a laser oscillator. A pair of reflection planes of the deflector is provided so as to have a tilt angle to an optical axis of the laser beam, whereby the entrance of the optical waveguide or the light pipe is expanded. Accordingly, the loss of the laser beam can be suppressed. Moreover, by providing an angle adjusting mechanism to the deflector, a beam spot having homogeneous energy distribution can be formed at an exit of the optical waveguide.
摘要翻译：本发明提供一种光束均化器，激光照射装置和半导体装置的制造方法，其能够抑制激光束的损失，并且在照射面上不间断地形成具有均匀的能量分布的光斑，而不受影响通过激光束的光束参数。在用于使从激光振荡器发射的激光束均匀化的光波导或光管的入口处设置偏转器。偏转器的一对反射面被设置为具有与激光束的光轴的倾斜角，从而扩大了光波导或光管的入射。因此，可以抑制激光束的损失。此外，通过向偏转器设置角度调节机构，可以在光波导的出口处形成具有均匀能量分布的束斑。

14. 发明申请

US20120285200A1 Method for Manufacturing Glass Sealed Body and Method for Manufacturing Light-Emitting Device 有权
标题翻译：制造玻璃密封体的方法及制造发光装置的方法
公开(公告)号：US20120285200A1
公开(公告)日：2012-11-15
申请号：US13468607
申请日：2012-05-10
申请人： Koichiro Tanaka
发明人： Koichiro Tanaka
IPC分类号： C03B23/20
CPC分类号： C03C27/06 , H01J9/248 , H01L51/5246
摘要： In a method for manufacturing a glass sealed body, a paste including powdered glass and a binder is discharged from an outlet whose shape is a closed curve to fowl a partition whose shape is a closed curve over a first glass substrate; the partition is heated so that the binder is volatilized and the powdered glass is fused to be a frit glass; and the frit glass and a second glass substrate are heated while disposing in close contact with each other, so that the frit glass and the second glass substrate are welded together to form a closed space by the frit glass, the first glass substrate, and the second glass substrate. A light-emitting element is sealed with the glass sealed body, so that the sealing is hardly broken even when impact or external force is applied.
摘要翻译：在玻璃密封体的制造方法中，从形状为闭合曲线的出口排出包含玻璃粉末和粘合剂的糊料，从而在第一玻璃基板上形成封闭曲线的隔壁，将隔板加热，使粘合剂挥发，将粉末状玻璃熔融成熔融玻璃; 并且，将熔结玻璃和第二玻璃基板在彼此紧密接触的同时加热，从而将熔结玻璃和第二玻璃基板焊接在一起，以通过熔结玻璃，第一玻璃基板和第二玻璃基板。发光元件用玻璃密封体密封，使得即使施加冲击或外力也不会发生密封。

15. 发明授权

US08309884B2 Laser irradiation apparatus 有权
公开(公告)号：US08309884B2
公开(公告)日：2012-11-13
申请号：US11121000
申请日：2005-05-04
申请人： Koichiro Tanaka
发明人： Koichiro Tanaka
IPC分类号： B23K26/00 , H01L21/324
摘要： The present invention is to provide a laser irradiation apparatus for forming a laser beam which has a shape required for the annealing and which has homogeneous energy distribution, by providing a slit at an image-formation position of a diffractive optical element, wherein the slit has a slit opening whose length is changeable.The laser irradiation apparatus comprises a laser oscillator, a diffractive optical element, and a slit, wherein the slit has a slit opening whose length in a major-axis direction thereof is changeable, wherein a laser beam is delivered obliquely to a substrate, and wherein the laser beam is a continuous wave solid-state, gas, or metal laser, or a pulsed laser with a repetition frequency of 10 MHz or more.

16. 发明授权

US08283238B2 Layer transfer process for semiconductor device 有权
标题翻译：半导体器件的层传输过程
公开(公告)号：US08283238B2
公开(公告)日：2012-10-09
申请号：US12213734
申请日：2008-06-24
申请人： Akihisa Shimomura , Tatsuya Mizoi , Hidekazu Miyairi , Koichiro Tanaka
发明人： Akihisa Shimomura , Tatsuya Mizoi , Hidekazu Miyairi , Koichiro Tanaka
IPC分类号： H01L21/30 , H01L21/46
CPC分类号： H01L27/1266 , H01L21/76254 , H01L27/1214 , H01L29/045 , H01L29/66772
摘要： A manufacturing method of a semiconductor device in which a space between semiconductor films transferred to a plurality of places can be made small. Transfer of a semiconductor film from a bond substrate to a base substrate is carried out a plurality of times. In the case where a semiconductor film transferred first and a semiconductor film transferred later are provided adjacently, the latter transfer is carried out using a bond substrate with its end portion partially removed. The width in a perpendicular direction to the bond substrate used for the later transfer, of the region of the bond substrate corresponding to the removed end portion is larger than the thickness of the semiconductor film which is transferred first.
摘要翻译：可以使半导体器件的制造方法变小，其中半导体膜转移到多个位置之间的空间。半导体膜从接合基板向基底基板的转印多次。在第一次转移的半导体膜和稍后转移的半导体膜相邻地设置的情况下，使用其端部被部分去除的接合基板进行后一种转印。与用于稍后转印的接合衬底的垂直方向上的宽度相对于被去除的端部的接合衬底的区域的宽度大于首先转移的半导体膜的厚度。

17. 发明申请

US20120152314A1 PHOTOELECTRIC CONVERSION DEVICE 有权
标题翻译：光电转换器件
公开(公告)号：US20120152314A1
公开(公告)日：2012-06-21
申请号：US13316631
申请日：2011-12-12
申请人： Koichiro TANAKA , Yu Arita
发明人： Koichiro TANAKA , Yu Arita
IPC分类号： H01L31/052
CPC分类号： H01L31/0549 , H01L31/0232 , H01L31/054 , H02S40/00 , H02S40/20 , H02S40/22 , Y02E10/50 , Y02E10/52
摘要： The present invention provides a photoelectric conversion device. Specifically, the photoelectric conversion device has a structure in which a substrate including a photoelectric conversion element provided at the bottom and a substrate including a photoelectric conversion element provided at the side are secured in a brace form by a light-dividing device. This structure divides incident light using the light-dividing device into a plurality of wavelength bands, and causes the divided light to fall onto the photoelectric conversion elements provided at the bottom and side, thereby making it possible to provide a photoelectric conversion device which is capable of generating a lame amount of electric power. In addition, the light-dividing device distributes pressures and impacts applied to the substrates at the bottom and side, thus making it possible to provide a photoelectric conversion device which has resistance to pressures and impacts.
摘要翻译：本发明提供一种光电转换装置。具体地，光电转换装置具有这样的结构，其中包括设置在底部的光电转换元件的基板和包括设置在侧面的光电转换元件的基板通过分光装置固定在支架形式中。该结构使用分光装置将入射光分成多个波长带，并且使分割的光落在设置在底部和侧面的光电转换元件上，从而可以提供能够产生不足的电量。此外，分光装置分布在底部和侧面上施加到基板的压力和冲击，从而可以提供耐压力和冲击的光电转换装置。

18. 发明授权

US08173977B2 Laser irradiation apparatus and laser irradiation method 有权
标题翻译：激光照射装置和激光照射方法
公开(公告)号：US08173977B2
公开(公告)日：2012-05-08
申请号：US11861456
申请日：2007-09-26
申请人： Koichiro Tanaka
发明人： Koichiro Tanaka
IPC分类号： G21G5/00
CPC分类号： G03F7/70383 , H01S3/005
摘要： It is an object of the present invention to provide a laser irradiation apparatus and a laser irradiation method that increase energy intensity distribution in a region having low energy intensity distribution in an end region in a major-axis direction of laser light, in performing laser irradiation. In irradiating an irradiation surface with laser light, laser light oscillated from a laser oscillator is converged in one direction through an optical element. The laser light which passes through the optical element and which is converged in one direction passes through a means which shields an end region in a major-axis direction of the laser light. Accordingly, a region where energy intensity distribution is precipitously high in the end region in the major-axis direction of the laser light can be formed in the irradiation surface.
摘要翻译：本发明的目的是提供一种激光照射装置和激光照射方法，该激光照射装置和激光照射方法在激光照射中在激光的长轴方向的端部区域中增加能量强度分布低的区域的能量强度分布。在用激光照射照射面的情况下，从激光振荡器振荡的激光通过光学元件沿一个方向会聚。穿过光学元件并沿一个方向会聚的激光通过屏蔽激光长轴方向的端部区域的装置。因此，能够在照射面上形成激光的长轴方向的端部区域的能量强度分布急剧下降的区域。

19. 发明授权

US08138058B2 Substrate with marker, manufacturing method thereof, laser irradiation apparatus, laser irradiation method, light exposure apparatus, and manufacturing method of semiconductor device 有权
标题翻译：具有标记的基板，其制造方法，激光照射装置，激光照射方法，曝光装置以及半导体装置的制造方法
公开(公告)号：US08138058B2
公开(公告)日：2012-03-20
申请号：US11942133
申请日：2007-11-19
申请人： Koichiro Tanaka , Takatsugu Omata
发明人： Koichiro Tanaka , Takatsugu Omata
IPC分类号： H01L21/76
CPC分类号： H01L21/02675 , B23K26/042 , B23K26/0738 , B23K26/0853 , G03F7/7085 , G03F9/7065 , G03F9/7076 , G03F9/7088 , H01L21/02678 , H01L21/2026 , H01L27/1214 , H01L27/1218 , H01L27/1266 , H01L27/1285 , Y10S438/942
摘要： To provide a laser irradiation apparatus which performs alignment of an irradiated object and emits a laser beam precisely, a laser irradiation method, and a manufacturing method of a TFT with high reliability with the use of a method for precisely targeting a desired irradiation position of the laser beam. A substrate with marker is mounted on a stage formed using a material which transmits infrared light; a marker, which is provided in the substrate with marker mounted on the stage, is detected using a camera capable of sensing infrared light, and a position of the stage is controlled; a laser beam is emitted from a laser oscillator; the laser beam emitted from the laser oscillator is processed into a linear shape by an optical system, and the substrate with marker mounted on the stage is irradiated with the laser beam.
摘要翻译：为了提供一种激光照射装置，其通过使用精确地瞄准所需照射位置的方法，可以精确地瞄准被照射物体的对准并发射激光束，激光照射方法和具有高可靠性的TFT的制造方法激光束。具有标记的基板安装在使用透射红外光的材料形成的台上; 使用能够感测红外光的照相机检测在基板中设置有安装在平台上的标记的标记，并且控制台的位置; 从激光振荡器发射激光束; 从激光振荡器发射的激光束通过光学系统被处理为线状，并且用激光束照射安装在台上的标记的基板。

20. 发明申请

US20120028391A1 METHOD OF FABRICATING DISPLAY DEVICE 有权
标题翻译：制作显示装置的方法
公开(公告)号：US20120028391A1
公开(公告)日：2012-02-02
申请号：US13270271
申请日：2011-10-11
申请人： Koichiro TANAKA
发明人： Koichiro TANAKA
IPC分类号： H01L33/00 , H01L21/768 , H01L21/336
CPC分类号： H01L27/1288 , H01L27/1214
摘要： To improve the use efficiency of materials and provide a technique of fabricating a display device by a simple process. The method includes the steps of providing a mask on a conductive layer, forming an insulating film over the conductive layer provided with the mask, removing the mask to form an insulating layer having an opening; and forming a conductive film in the opening so as to be in contact with the exposed conductive layer, whereby the conductive layer and the conductive film can be electrically connected through the insulating layer. The shape of the opening reflects the shape of the mask. A mask having a columnar shape (e.g., a prism, a cylinder, or a triangular prism), a needle shape, or the like can be used.
摘要翻译：提高材料的使用效率，提供通过简单的工艺制造显示装置的技术。该方法包括以下步骤：在导电层上提供掩模，在设置有掩模的导电层上形成绝缘膜，去除掩模以形成具有开口的绝缘层; 并且在所述开口中形成导电膜以与所述暴露的导电层接触，由此所述导电层和所述导电膜可以通过所述绝缘层电连接。开口的形状反映了掩模的形状。可以使用具有柱状形状的面罩（例如，棱镜，圆筒，或三角棱镜），针形等。

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