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    • 12. 发明申请
    • NONVOLATILE SEMICONDUCTOR MEMORY DEVICE
    • 非易失性半导体存储器件
    • US20140061578A1
    • 2014-03-06
    • US13780734
    • 2013-02-28
    • KABUSHIKI KAISHA TOSHIBA
    • Shigeki KOBAYASHIYasuhiro NojiriMasaki YamatoHiroyuki FukumizuTakeshi Yamaguchi
    • H01L27/24
    • H01L27/2481H01L27/2409H01L45/08H01L45/12H01L45/1233H01L45/146
    • A nonvolatile semiconductor memory device below comprises: a memory cell array configured having memory cells arranged therein disposed at intersections of a plurality of first lines and a plurality of second lines formed so as to intersect each other, and the memory cells each comprising a variable resistance element; and a control circuit configured to select and drive the first lines and the second lines. The variable resistance element is configured by a transition metal oxide film. The variable resistance element is electrically connected to a first electrode configured from a metal at a first surface and is electrically connected to a second electrode at a second surface which is on an opposite side to the first surface. A first insulating film is formed between the first electrode and the variable resistance element. The first insulating film is formed by a first material that is formed by covalent binding.
    • 下面的非易失性半导体存储器件包括:存储单元阵列,其配置有存储单元,其布置在多个第一线和形成为彼此交叉的多个第二线的交点处,并且每个存储单元包括可变电阻 元件; 以及控制电路,被配置为选择并驱动第一线和第二线。 可变电阻元件由过渡金属氧化物膜构成。 可变电阻元件电连接到由第一表面上的金属构成的第一电极,并且在与第一表面相反的第二表面处电连接到第二电极。 在第一电极和可变电阻元件之间形成第一绝缘膜。 第一绝缘膜由通过共价结合形成的第一材料形成。
    • 14. 发明授权
    • Nonvolatile semiconductor memory device and method of forming same
    • 非易失性半导体存储器件及其形成方法
    • US09013912B2
    • 2015-04-21
    • US13845668
    • 2013-03-18
    • Kabushiki Kaisha Toshiba
    • Yasuhiro NojiriShigeki KobayashiMasaki YamatoHiroyuki Fukumizu
    • G11C11/4193G11C13/00
    • G11C13/0002G11C13/0007G11C13/0069
    • A nonvolatile semiconductor memory device according to an embodiment comprises: a memory cell array including a plurality of memory layers; and a control unit configured to control a voltage applied to the memory cell array. Each of the memory layers comprises a first line and a second line, and further includes a memory cell disposed between the first line and the second line and including a variable resistance element. The control unit is configured to, when executing a forming operation on the memory cell array, execute the forming operation sequentially on the plurality of memory layers. The forming operation is executed sequentially on the memory layers in ascending order of a magnitude of a non-selected current flowing in a non-selected memory cell during the forming operation.
    • 根据实施例的非易失性半导体存储器件包括:包括多个存储层的存储单元阵列; 以及控制单元,被配置为控制施加到存储单元阵列的电压。 每个存储层包括第一行和第二行,并且还包括位于第一行和第二行之间并包括可变电阻元件的存储单元。 控制单元被配置为当在存储单元阵列上执行形成操作时,在多个存储层上顺序地执行形成操作。 成形操作在成形操作期间以在未选择的存储单元中流动的未选择电流的大小的升序顺序地在存储器层上执行。