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    • 13. 发明申请
    • Methods for forming electrodes in phase change memory devices
    • 在相变存储器件中形成电极的方法
    • US20090029031A1
    • 2009-01-29
    • US12113566
    • 2008-05-01
    • Tyler Lowrey
    • Tyler Lowrey
    • B05D5/12
    • H01L45/1233H01L45/06H01L45/126H01L45/144H01L45/16H01L45/1683
    • A method for forming electrode materials uniformly within openings having small dimensions, including sublithographic dimensions, or high aspect ratios. The method includes the steps of providing an insulator layer having an opening formed therein, forming a non-conformal conductive or semiresistive material over and within the opening, and mobilizing the conductive material to densify it within the opening. The method reduces the concentration of voids or defects in the conductive or semiresistive material relative to the as-deposited state. The mobilizing step may be accomplished by extrusion or thermal reflow and causes voids or defects to coalesce, collapse, percolate, or otherwise be removed from the as-deposited conductive or semiresistive material.
    • 一种用于在具有小尺寸的开口内均匀地形成电极材料的方法,包括亚光刻尺寸或高纵横比。 该方法包括提供具有形成在其中的开口的绝缘体层的步骤,在开口内部和内部形成非共形导电或半永久材料,并且动员导电材料以在开口内使其致密化。 该方法相对于沉积状态降低导电或半主体材料中的空隙或缺陷的浓度。 移动步骤可以通过挤出或热回流来实现,并且导致空隙或缺陷聚结,塌陷,渗滤或以其它方式从沉积的导电或半主体材料中除去。
    • 16. 发明申请
    • Multi-terminal chalcogenide logic circuits
    • 多端硫族化物逻辑电路
    • US20080224734A1
    • 2008-09-18
    • US11724485
    • 2007-03-15
    • Tyler Lowrey
    • Tyler Lowrey
    • H03K19/00H01L45/00
    • H03K19/1733
    • Logic circuits are disclosed that include one or more three-terminal chalcogenide devices. The three-terminal chalcogenide devices are electrically interconnected and configured to perform one or more logic operations, including AND, OR, NOT, NAND, NOR, XOR, and XNOR. Embodiments include series and parallel configurations of three-terminal chalcogenide devices. The chalcogenide devices include a chalcogenide switching material as the working medium along with three electrical terminals in electrical communication therewith.In one embodiment, the circuits include one or more input terminals, one or more output terminals, and a clock terminal. The input terminals receive one or more input signals and deliver them to the circuit for processing according to a logic operation. Upon conclusion of processing, the output of the circuit is provided to the output terminal. The clock terminal delivers a clock signal to facilitate operation of the three-terminal devices included in the instant circuits. In one embodiment, the clock signal includes an ON cycle and an OFF cycle, where the circuit performs a logic operation during the ON cycle and any three-terminal devices that are switched to the conductive state during the ON cycle are returned to their resistive state during the OFF cycle.
    • 公开了包括一个或多个三末端硫族化物装置的逻辑电路。 三端硫属化物器件电互连并被配置为执行一个或多个逻辑操作,包括AND,OR,NOT,NAND,NOR,XOR和XNOR。 实施方案包括三末端硫族化物装置的串联和并联配置。 硫族化物装置包括作为工作介质的硫族化物转换材料以及与其电连通的三个电端子。 在一个实施例中,电路包括一个或多个输入端子,一个或多个输出端子和时钟端子。 输入端子接收一个或多个输入信号,并根据逻辑运算将它们传送到电路进行处理。 在处理结束时,将电路的输出提供给输出端。 时钟终端提供时钟信号,以便于即时电路中包括的三端设备的操作。 在一个实施例中,时钟信号包括ON周期和OFF周期,其中电路在ON周期期间执行逻辑运算,并且在ON周期期间切换到导通状态的任何三端器件返回到其电阻状态 在OFF循环期间。
    • 20. 发明申请
    • Memory array having floating gate semiconductor device
    • 具有浮置栅极半导体器件的存储器阵列
    • US20080054342A1
    • 2008-03-06
    • US11933728
    • 2007-11-01
    • Trung DoanTyler Lowrey
    • Trung DoanTyler Lowrey
    • H01L29/788
    • H01L29/66825H01L21/28273H01L27/115H01L27/11521H01L29/42324H01L29/42336H01L29/7881
    • A method for forming a floating gate semiconductor device such as an electrically erasable programmable read only memory is provided. The device includes a silicon substrate having an electrically isolated active area. A gate oxide, as well as other components of a FET (e.g., source, drain) are formed in the active area. A self aligned floating gate is formed by depositing a conductive layer (e.g., polysilicon) into the recess and over the gate oxide. The conductive layer is then chemically mechanically planarized to an endpoint of the isolation layer so that all of the conductive layer except material in the recess and on the gate oxide is removed. Following formation of the floating gate an insulating layer is formed on the floating gate and a control gate is formed on the insulating layer.
    • 提供了一种用于形成诸如电可擦除可编程只读存储器的浮置栅极半导体器件的方法。 该器件包括具有电隔离的有源区的硅衬底。 栅极氧化物以及FET的其它部件(例如,源极,漏极)形成在有源区域中。 通过将导电层(例如多晶硅)沉积到栅极氧化物上而形成自对准浮栅。 然后将导电层化学机械平面化到隔离层的端点,使得去除凹部中和栅极氧化物上的材料以外的所有导电层。 在形成浮栅之后,在浮栅上形成绝缘层,在绝缘层上形成控制栅。